JPH08136714A - Production of color filter - Google Patents

Production of color filter

Info

Publication number
JPH08136714A
JPH08136714A JP27244494A JP27244494A JPH08136714A JP H08136714 A JPH08136714 A JP H08136714A JP 27244494 A JP27244494 A JP 27244494A JP 27244494 A JP27244494 A JP 27244494A JP H08136714 A JPH08136714 A JP H08136714A
Authority
JP
Japan
Prior art keywords
color
substrate
color filter
film
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27244494A
Other languages
Japanese (ja)
Inventor
Masanobu Hanehiro
昌信 羽広
Masahiko Itabashi
雅彦 板橋
Hideyuki Hashimoto
秀行 橋本
Nobuaki Takane
信明 高根
Takeshi Yoshida
健 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP27244494A priority Critical patent/JPH08136714A/en
Publication of JPH08136714A publication Critical patent/JPH08136714A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To produce a color filter capable of forming a picture element eliminating a peeling from a substrate in a producing method for color filter forming a black matrix, R, G and B picture elements on a transparent substrate by exposing the rear side of the substrate at a colored picture element forming stage. CONSTITUTION: A red photosensitive resin layer is laminated on a glass substrate 2 on which a black matrix 1 of a Cr thin film has been formed previously by using a red dry film in which a colored photosensitive resin soln. consisting of a prescribed composition is made into film. Then, after executing registration by using a negative mask having a prescribed pattern, exposure is executed from the surface side of the substrate with a 3KW-super high voltage mercury vapor lamp, then, an unexposed part is removed to form a colored pattern of the first color. The second color is formed by using a blue dry film in the same manner. Moreover, after laminating green dry film, the exposure is executed from the rear side of the substrate without interposing the mask. Then, a similar development up to the second color is executed to form the picture of the third color.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、カラー液晶表示装置に
使用されるカラーフィルタの製造法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter used in a color liquid crystal display device.

【0002】[0002]

【従来の技術】液晶ティスプレイ(以下LCDと略す)
は、薄型、小型、低消費電力などの特長を生かし、現
在、時計、電卓、TV、パソコン等の表示部に用いられ
ている。更に近年、カラーLCDが開発されOA・AV
機器を中心にナビゲーションシステム、ビュウファイン
ダーなど数多くの用途に使われ始めており、その市場は
今後、急激に拡大するものと予想されている。
2. Description of the Related Art Liquid crystal display (hereinafter abbreviated as LCD)
Taking advantage of its thinness, small size, and low power consumption, is currently used for display parts of watches, calculators, TVs, personal computers and the like. Furthermore, in recent years, color LCDs have been developed and OA / AV
It has begun to be used in many applications such as navigation systems and viewfinders mainly for devices, and the market is expected to expand rapidly in the future.

【0003】LCDをカラー表示させるためのカラーフ
ィルタは、格子状パターンのBM(ブラックマトリック
ス)1が形成されたガラス板等の基板2上に、R(赤)
G(緑)B(青)からなるカラー画素3(約100×1
00×2μm)を順次形成し、その上に透明なオーバー
コート層(OC)4を形成したものである。5は偏光
板、6はITO電極である。
A color filter for displaying an LCD in color is R (red) on a substrate 2 such as a glass plate on which a BM (black matrix) 1 having a grid pattern is formed.
Color pixel 3 consisting of G (green) and B (blue) (approximately 100 x 1
(00 × 2 μm), and a transparent overcoat layer (OC) 4 is formed thereon. Reference numeral 5 is a polarizing plate, and 6 is an ITO electrode.

【0004】カラーLCDは、カラーフィルタ7をLC
D内部に設置し、バックライト光をカラーフィルタに透
過することによって表示画面をカラー化できる。8は配
向膜、9は液晶、10はシ−ル材、11はトップコ−ト
層、12はITO電極、13はガラス板等の基板、14
は偏光板である。
A color LCD has a color filter 7 as an LC.
The display screen can be colored by being installed inside D and transmitting the backlight light to the color filter. 8 is an alignment film, 9 is a liquid crystal, 10 is a seal material, 11 is a top coat layer, 12 is an ITO electrode, 13 is a substrate such as a glass plate, 14
Is a polarizing plate.

【0005】現在、カラーフィルタは主に染色法を用い
て製造されている。しかし、この方法はガラス基板上に
透明な感光性樹脂を塗布、乾燥、露光、現像によって画
素を形成後、染料を用いて染色しその後、混色防止層を
形成するといった工程を3回繰り返し行う必要があるた
め、工程数が多くコスト高となる。また、着色剤として
染料を用いているため、カラーフィルタの重要課題であ
る信頼性(耐候性・耐熱性)が劣るという欠点がある。
そこで、着色剤として顔料を用いたカラーフィルタがい
くつか提案されており、その中に電着法、印刷法、フォ
トリソ法(フォトリソグラフィー法)がある。
At present, color filters are mainly manufactured by the dyeing method. However, in this method, it is necessary to repeat the process of applying a transparent photosensitive resin on a glass substrate, forming pixels by drying, exposing and developing, dyeing with a dye, and then forming a color mixing prevention layer three times. Therefore, the number of steps is large and the cost is high. Further, since a dye is used as a colorant, there is a drawback that the reliability (weather resistance / heat resistance), which is an important subject of the color filter, is deteriorated.
Therefore, some color filters using a pigment as a colorant have been proposed, and among them, there are an electrodeposition method, a printing method, and a photolithography method (photolithography method).

【0006】しかし、電着法は電極パターンを形成する
必要があるため(1)パターンの自由度が少ない、
(2)コストが高い、また印刷法は(1)大型基板の位
置合わせが難しく解像度が低いため微細化の対応が困
難、(2)パターンの平坦性が劣る、などの問題があ
り、現状ではフォトリソ法が主流と考えられている。フ
ォトリソ法には、液状レジストとフィルムが考えられ
る。液状レジストは、感光性樹脂中に顔料を分散させた
ワニスをスピナーでガラス基板上に塗布、乾燥後、露
光、現像によってカラー画素が形成される。一方、フィ
ルムは、プリント板用感光性フィルムと同様にワニスを
フィルム化したものであり、基板にラミネート後、露
光、現像によってカラー画素が形成される。
However, the electrodeposition method requires the formation of an electrode pattern (1) the degree of freedom of the pattern is small,
(2) The cost is high, and the printing method has problems that (1) it is difficult to align a large-sized substrate and the resolution is low, so it is difficult to miniaturize, and (2) the flatness of the pattern is poor. The photolithography method is considered to be the mainstream. A liquid resist and a film are considered for the photolithography method. In the liquid resist, color pixels are formed by applying a varnish in which a pigment is dispersed in a photosensitive resin on a glass substrate with a spinner, drying, exposing, and developing. On the other hand, the film is a varnish formed into a film like the photosensitive film for printed boards, and after being laminated on a substrate, color pixels are formed by exposure and development.

【0007】[0007]

【発明が解決しようとする課題】フォトリソ法では、従
来基板表面側から露光を行い画素を形成していた。しか
し、液状レジストあるいはフィルムにおいてもワニス中
に顔料が多量に含まれているため、感光波長に対する透
過率が通常のレジストと比べ低い。このため、基板に近
いレジストが感光不足となり現像時に画素が剥がれる問
題があった。本発明は、基板との剥がれの無い画素を形
成するカラ−フィルタの製造法を提供するものである。
In the photolithography method, pixels are conventionally formed by exposing from the surface side of the substrate. However, since the varnish also contains a large amount of pigment in the liquid resist or film, the transmittance for the photosensitive wavelength is lower than that of a normal resist. For this reason, there is a problem that the resist near the substrate is insufficiently exposed to light and pixels are peeled off during development. The present invention provides a method for manufacturing a color filter that forms pixels that are not separated from the substrate.

【0008】[0008]

【課題を解決するための手段】本発明は、透明プラスチ
ックまたはガラス基板等の透明基板上に、ブラックマト
リックス、R、G、B着色画素を形成するカラーフィル
タの製造法であって、着色画素形成工程において基板裏
面側から露光を行うこと特徴とするものである。
The present invention is a method of manufacturing a color filter for forming a black matrix, R, G, and B colored pixels on a transparent substrate such as a transparent plastic or glass substrate. In the process, the exposure is performed from the back surface side of the substrate.

【0009】露光を行う場合、フォトマスクを介して基
板裏面側から露光を行うこともできる。また、2色目ま
でを形成したカラーフィルターをマスクとして3色目を
形成することもできる。R、G、B画素は、ベースフィ
ルムと一色に着色された感光樹脂がらなる感光性ドライ
フィルムを用いて形成するもが好ましい。
When exposure is performed, it is possible to perform exposure from the back surface side of the substrate through a photomask. Further, the third color can be formed by using the color filters formed up to the second color as a mask. The R, G, and B pixels are preferably formed using a photosensitive dry film made of a photosensitive resin colored in one color with the base film.

【0010】[0010]

【実施例】所定の組成からなる着色感光性樹脂溶液をフ
ィルム化した赤色ドライフィルムを用いて、Cr薄膜の
BMがあらかじめ形成されたガラス基板(200×30
0×1.2mm、コーニング#7059)に赤色感光樹
脂層をラミネートした。ラミネート条件は、ロール温度
120℃、ロール圧4Kg/cm2、速度1.5m/分で
ある。ついで所定のパターンのネガマスクを用いて位置
合わせを行った後3kWの超高圧水銀灯により基板表面
側から露光を行った。その後2重量%のNa2CO3水溶
液で20秒間スプレー現像をして未露光部を除去して1
色目の着色パターンを形成した。同様にして青色ドライ
フィルムを用いて2色目を形成した。さらに緑色ドライ
フィルムをラミネートしたのち基板裏面側からマスクを
介さないで露光を行った。その後2色目までと同様の現
像を行い、3色目の画素を形成した。比較例としてマス
クを介して基板表面側から露光し3色目を形成した。表
1に3色目形成時の露光量と現像後の画素形成状態につ
いて示す。○は3色目の画素に剥離なし、×は剥離あり
として示す。
EXAMPLE A glass substrate (200 × 30) in which a BM of a Cr thin film is formed in advance using a red dry film formed by film-forming a colored photosensitive resin solution having a predetermined composition
A red photosensitive resin layer was laminated on 0 × 1.2 mm, Corning # 7059). The laminating conditions are a roll temperature of 120 ° C., a roll pressure of 4 kg / cm 2 and a speed of 1.5 m / min. Then, alignment was performed using a negative mask having a predetermined pattern, and then exposure was performed from the substrate surface side with a 3 kW ultra-high pressure mercury lamp. After that, spray development was performed with a 2 wt% Na 2 CO 3 aqueous solution for 20 seconds to remove the unexposed portion, and 1
A tinted pattern was formed. Similarly, a second color was formed using a blue dry film. Further, after laminating a green dry film, the back surface of the substrate was exposed without a mask. After that, the same development as that for the second color was performed to form pixels for the third color. As a comparative example, exposure was performed from the substrate surface side through a mask to form a third color. Table 1 shows the exposure amount at the time of forming the third color and the pixel formation state after the development. O indicates that the pixels of the third color did not peel, and X indicates that peeling occurred.

【0011】[0011]

【表1】 露光方向 露光量(mJ/cm2) 75 100 125 150 ─────────────────────────── 基板裏面側 ○ ○ ○ ○ 基板表面側 × × × ○[Table 1] Exposure direction Exposure amount (mJ / cm 2 ) 75 100 125 125 150 ─────────────────────────── Backside of substrate ○ ○ ○ ○ Substrate surface side × × × ○

【0010】[0010]

【発明の効果】本発明に於いては、基板との剥がれの無
い画素を形成することができる。
According to the present invention, it is possible to form pixels which are not separated from the substrate.

【図面の簡単な説明】[Brief description of drawings]

【図1】液晶ティスプレイの断面図である。FIG. 1 is a sectional view of a liquid crystal display.

【符号の説明】[Explanation of symbols]

1.BM(ブラックマトリックス) 2.ガラス基板 3.カラー画素 4.オーバーコート層(OC) 5.偏光板 6.ITO電極 7.カラーフィルタ 8.配向膜 9.液晶 10.シ−ル材 11.トップコ−ト層 12.ITO電極 13.ガラス基板 14.偏光板 1. BM (black matrix) 2. Glass substrate 3. Color pixel 4. Overcoat layer (OC) 5. Polarizing plate 6. ITO electrode 7. Color filter 8. Alignment film 9. Liquid crystal 10. Seal material 11. Top coat layer 12. ITO electrode 13. Glass substrate 14. Polarizer

───────────────────────────────────────────────────── フロントページの続き (72)発明者 高根 信明 茨城県つくば市和台48番 日立化成工業株 式会社筑波開発研究所内 (72)発明者 吉田 健 茨城県つくば市和台48番 日立化成工業株 式会社筑波開発研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Nobuaki Takane 48 Wadai, Tsukuba City, Ibaraki Hitachi Chemical Co., Ltd. Tsukuba Development Laboratory (72) Inventor Ken Yoshida 48 Wadai, Tsukuba City, Ibaraki Hitachi Chemical Co., Ltd. Incorporated company Tsukuba Development Laboratory

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 透明基板上に、ブラックマトリックス、
R、G、B着色画素を形成するカラーフィルタの製造法
であって、着色画素形成工程において基板裏面側から露
光を行うこと特徴とするカラーフィルタの製造法。
1. A black matrix on a transparent substrate,
A method of manufacturing a color filter for forming R, G, B colored pixels, wherein a method for manufacturing a color filter is characterized in that exposure is performed from the back surface side of the substrate in the colored pixel forming step.
JP27244494A 1994-11-07 1994-11-07 Production of color filter Pending JPH08136714A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27244494A JPH08136714A (en) 1994-11-07 1994-11-07 Production of color filter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27244494A JPH08136714A (en) 1994-11-07 1994-11-07 Production of color filter

Publications (1)

Publication Number Publication Date
JPH08136714A true JPH08136714A (en) 1996-05-31

Family

ID=17514006

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27244494A Pending JPH08136714A (en) 1994-11-07 1994-11-07 Production of color filter

Country Status (1)

Country Link
JP (1) JPH08136714A (en)

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