JPH0440401A - Production of color filter - Google Patents

Abstract

PURPOSE:To completely dissolve away residues and to securely fix a top coating resin to a substrate by applying a photosetting resist contg. a pigment onto the substrate and patterning the resist by a photomechanical process, then repeating plural times the dissolution and removal of the residues of the unexposed photoresist by an acid or solvent. CONSTITUTION:The photosetting photoresist R is uniformly applied over the entire surface of the substrate 1 by each one color for all of the colors constituting the filter and thereafter, the patterns P are formed by the photomechanical process technique consisting of exposing and developing process. The residue R2 of the unexposed photoresist are dissolved away by the acid or solvent at every formation. The stage for dissolving away the residues of the unexposed photoresist is repeated plural times to form the patterns P over the entire color; thereafter, the pattern forming parts are overcoated. The sticking of the residue R2 of the unexposed photoresist to the substrate is obviated even after the patterns P are repetitively formed for all the colors. The easy peeling of the over coating agent does not arise any more even if the over coating agent is applied to the pattern forming parts.

Description

[Detailed description of the invention] [Industrial application field]

The present invention provides a color liquid crystal display device, a color video camera,
Color sensor The present invention relates to a method of manufacturing a color filter used in a color image input/output device such as a color image sensor.

[Conventional technology]

As a color filter used in LCD displays,
There are pigment-dispersed color filters, and the method for manufacturing these filters includes, for example, uniformly applying an acrylic resin-based photoresist containing an organic dye together with a dispersant to a glass substrate, and applying the photocurable photoresist to the photoresist. There is a method of manufacturing by drawing and forming a desired pattern using a so-called photolithography technique consisting of an exposure and development process. In order to protect the formed desired pattern, it is overcoated with a melamine-epoxy resin, an acrylic resin, a polyurethane resin, a polyimide resin, or the like.

[Problem to be solved by the invention]

However, in the conventional color filter manufactured by the above-mentioned manufacturing process, there was a problem in that the overcoat agent such as melamine-epoxy resin did not sufficiently adhere to the substrate and was easily peeled off. The reason why the overcoat agent peels off relatively easily is that the residual odor of the photocurable photoresist remains attached to the substrate. For this reason,
Conventionally, before overcoating, a cleaning process was performed in which the sheets were dipped one by one in a 2.5% sodium carbonate solution and the residual scent was manually rubbed off using a sponge or the like. However, this method was time-consuming, could not be done in-line, and had problems in that residual fragrance could not be completely removed. Therefore, an improvement in the method of applying an overcoat agent that does not easily peel off has been awaited.

[Means to solve the problem]

The present invention has been made to solve the problems of the prior art described above, and includes a process of applying a photocurable photoresist containing a pigment to a substrate, a pattern forming process using photolithography, and a process of dissolving and removing residual unexposed photoresist. The present invention provides a method for manufacturing a color filter, which comprises repeating the steps a plurality of times to form a pattern over all colors for each color, and then overcoating the pattern-formed portion.

[Effect]

In the method for manufacturing a color filter according to the present invention,
For all the colors that make up the filter, - After uniformly applying a photocurable photoresist to the entire surface of the substrate for each color,
Patterns are formed for each color using photolithography technology, which consists of exposure and development processes, and the remaining scent of the unexposed photoresist is dissolved and removed using acid or solvent each time, so the area where the photocurable photoresist is applied subsequently is free from the previous one. There is no residual odor from unexposed photoresist applied during the process. Therefore, even after repeatedly forming patterns for all colors, which is necessary for manufacturing color filters, there is no residual scent of unexposed photoresist attached to the substrate, so there is no overlay of melamine-epoxy resin, etc. on the pattern forming area. Even if a coating agent is applied, it will not peel off easily.

【Example】

Next, the present invention will be explained in more detail based on the drawings. On one side of the glass substrate 1, a 0.5 to 5 μm thick acrylic resin-based photocurable photoresist R containing 30% or less of an organic dye of a desired color, for example red, and 1% of a dispersant (surfactant) is applied. After coating and drying the photoresist R at 90°C for 30 minutes, a photomask 2 on which a desired pattern P is formed by the chromium vapor deposition layer is stacked with the photoresist R and the chromium vapor deposition layer facing each other, and the photomask 2 side is The photoresist R was partially exposed by irradiating ultraviolet rays or deep ultraviolet rays. After transferring the pattern P of the photomask 2 to the photoresist R by exposing it to light for a predetermined period of time, the pattern P of the photomask 2 was transferred to the photoresist R, and then it was developed with alkali for 1 to 3 minutes, and the photoresist (R1) that had been denatured and hardened by the exposure was left selectively, and the photoresist R1, which was not cured because it was not exposed to light, was left selectively. When the photoresist R was removed, a red modified photoresist (R1) pattern corresponding to the pattern P was formed on the substrate 1. In principle, the unexposed areas of Photoresist) H should be completely removed if development is carried out for a sufficiently long time.
Complete removal is often not possible depending on the size of the pattern P, the surface condition of the substrate 1, etc. In particular, when the development time is shortened to 1 minute or less in an attempt to increase productivity, a minute residual fragrance R2
It is inevitable that the particles remain on the surface of the substrate 1 as if they are stuck to the surface. Therefore, following the exposure and development process of Photoresist R, an appropriate chemical solution (such as HB
r) 3 for 10 to 15 minutes, the residual fragrance R
2 was completely dissolved and removed. Next, the same acrylic resin-based photoresist G containing IO to 35% of a green organic dye (pigment) and a dispersant (surfactant), for example, is added in an amount of 0.3 to 3.
.mu.m, and the same process as above was performed to form a green modified and cured photoresist G1 adjacent to the modified and cured photoresist R1. Then, the residual odor in the unexposed areas of the photoresist G was dissolved and removed in the same manner. Furthermore, 0.3 to 3 μm of the same acrylic resin-based photoresist containing a blue organic dye (pigment) mixed and added together with a dispersant (surfactant) in an amount of 0.3 to 3 μm was applied, and the same process as above was performed. A blue modified and cured photoresist B1 was formed between the red modified and cured photoresist (R1) and the green modified and cured photoresist G1. Furthermore, when the residual odor in the unexposed areas of the photoresist B is similarly dissolved and removed, the modified and cured photoresists R1, G1, and B having the colors of red, green, and blue are formed on the substrate 1.
1 was continuously and repeatedly formed in a stripe shape. At this time, the residual scent of each of the photoresists R, G, and B was completely removed from the substrate 1. Subsequently, in order to protect the pattern forming area, a suitable top coat resin (for example, melamine-epoxy resin) 4 was applied to a suitable thickness, for example, 0.8 to 2 μm, and dried. Through the above steps, the top coat resin 4 applied to the pattern forming area did not peel off even after being immersed in boiling water for 3 hours. Conventional top coat resin 4 is only 1
In comparison, the top coat resin 4 applied by the manufacturing method of the present invention peeled off after being immersed for about an hour.
It can be seen that the adhesion strength has been significantly improved. Note that the chemical solution 3 for dissolving and removing the residual odor of the photocurable photoresist in the unexposed areas remaining after development may be appropriately selected according to the characteristics of the photoresist to be used, so it is limited to HBr shown in the examples. HC instead of what is done
An acid such as 11H2S04 or a solvent such as IPA or ethyl cellosolve is appropriately used. Furthermore, since the step of dissolving and removing residual fragrance etc. need only be carried out prior to the top coating, it may be carried out after each color is developed, or may be carried out after heating and baking. The type, concentration, etc. of the chemical solution used can also be changed before and after heating and baking.

【Effect of the invention】

As explained above, the method for producing a color filter according to the present invention includes a step of applying a photocurable photoresist containing a pigment to a substrate, a pattern forming step using photolithography, and a step of dissolving and removing residual unexposed photoresist with an acid or solvent. The process is repeated multiple times to form a pattern over all colors for each color, and then the patterned area is overcoated, so the unexposed photocurable photoresist that was attached to the substrate as a residual scent after development is removed. part is completely dissolved away in each case. This makes it possible to remove residual fragrance without relying on human hands, making it possible to incorporate it into production lines. Furthermore, since the top coat resin is firmly fixed to the substrate, the product yield during manufacturing is significantly improved, and the durability when used as a color filter for color liquid crystal display devices and the like is also significantly improved.

[Brief explanation of drawings]

Figure 1 is an explanatory diagram of the first color pattern forming process, Figure 2 is an explanatory diagram of the residual fragrance dissolution and removal process, Figure 3 is an explanatory diagram of the second color pattern forming process, and Figure 4 is an explanatory diagram of the overcoated substrate. It is an explanatory diagram. DESCRIPTION OF SYMBOLS 1... Substrate, 2... Photomask, 4... Chemical solution, 4... Top coat resin, R... Photoresist, R1... Modified photoresist, R2... Remaining fragrance, P... Pattern .

Claims (1)

[Claims] The process of applying a photocurable photoresist containing pigment to a substrate, forming a pattern using photolithography, and dissolving and removing residual unexposed photoresist using an acid or solvent is repeated several times to form a pattern across all colors for each color. A method for manufacturing a color filter, which comprises overcoating the patterned portion after formation.