JPH05206329A - Epoxy resin composition - Google Patents
Epoxy resin compositionInfo
- Publication number
- JPH05206329A JPH05206329A JP1334192A JP1334192A JPH05206329A JP H05206329 A JPH05206329 A JP H05206329A JP 1334192 A JP1334192 A JP 1334192A JP 1334192 A JP1334192 A JP 1334192A JP H05206329 A JPH05206329 A JP H05206329A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- weight
- parts
- equation
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、半導体デバイスの表面
実装化における耐半田ストレス性に優れた半導体封止用
エポキシ樹脂組成物に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition for semiconductor encapsulation which is excellent in resistance to solder stress in surface mounting semiconductor devices.
【0002】[0002]
【従来の技術】従来、ダイオード、トランジスタ、集積
回路等の電子部品を熱硬化性樹脂で封止しているが、特
に集積回路では耐熱性、耐湿性に優れたオルソクレゾー
ルノボラックエポキシ樹脂をノボラック型フェノール樹
脂で硬化させるエポキシ樹脂組成物が用いられている。
ところが近年、集積回路の高集積化に伴いチップがだん
だん大型化し、かつパッケージは従来のDIPタイプか
ら表面実装化された小型、薄型のフラットパッケージ、
SOP、SOJ、PLCCに変わっていている。2. Description of the Related Art Conventionally, electronic parts such as diodes, transistors, and integrated circuits have been sealed with thermosetting resin. Especially in integrated circuits, orthocresol novolac epoxy resin, which is excellent in heat resistance and moisture resistance, is a novolac type. Epoxy resin compositions that are cured with phenolic resins have been used.
However, in recent years, as the integration of integrated circuits has increased, the size of chips has gradually increased, and the package is a small and thin flat package that is surface-mounted from the conventional DIP type.
It has changed to SOP, SOJ, PLCC.
【0003】即ち大型チップを小型で薄いパッケージに
封入することになり、応力によりクラック発生、これら
のクラックによる耐湿性の低下等の問題が大きくクロー
ズアップされてきている。特に半田付けの工程において
急激に 200℃以上の高温にさらされることによりパッケ
ージの割れや樹脂とチップの剥離により耐湿性が劣化し
てしまうといった問題点がでてきている。これらの大型
チップを封止するのに適した、信頼性の高い封止用樹脂
組成物の開発が望まれてきている。That is, a large chip is to be enclosed in a small and thin package, and cracks are generated due to stress, and moisture resistance due to these cracks is becoming a serious problem. Particularly, in the soldering process, there is a problem that moisture resistance is deteriorated due to cracking of the package and peeling of the chip from the resin when exposed to a high temperature of 200 ° C or more. Development of a highly reliable encapsulating resin composition suitable for encapsulating these large chips has been desired.
【0004】これらの問題を解決するためにエポキシ樹
脂として下記式(1)で示されるエポキシ樹脂の使用
(特開昭64−65116号公報)がIn order to solve these problems, use of an epoxy resin represented by the following formula (1) as an epoxy resin (Japanese Patent Laid-Open No. 64-65116) has been proposed.
【0005】[0005]
【化3】 [Chemical 3]
【0006】(式中のR1 〜R8 は、水素、ハロゲン、
アルキル基の中から選択される同一もしくは異なる原子
または基)検討されてきた。式(1)で示されるエポキ
シ樹脂の使用によりレジン系の低粘度化が図られ、従っ
て溶融シリカ粉末を更に多く配合することにより組成物
の成形後の低熱膨張化及び低吸水化により、耐半田スト
レス性の向上が図られた。ただし溶融シリカ粉末を多く
配合することによる弾性率の増加も一方の弊害であり、
更なる耐半田ストレス性の向上が必要である。(Wherein R 1 to R 8 are hydrogen, halogen,
Same or different atoms or groups selected from among alkyl groups) have been investigated. By using the epoxy resin represented by the formula (1), it is possible to reduce the viscosity of the resin system. Therefore, by adding a larger amount of fused silica powder, the composition can have low thermal expansion and low water absorption after molding, and thus can be solder resistant. The stress property was improved. However, increasing the elastic modulus by blending a large amount of fused silica powder is also one of the harmful effects,
Further improvement of solder stress resistance is required.
【0007】[0007]
【発明が解決しようとする課題】本発明はこのような問
題に対してエポキシ樹脂として式(1)で示されるエポ
キシ樹脂を用い、成形品の弾性率、吸水量、熱膨張係数
を低下せしめるために、式(2)で示される多官能フェ
ノール樹脂と2官能フェノール類の溶融混合物からなる
硬化剤を併用することにより、基板実装時における半導
体パッケージの耐半田ストレス性を著しく向上させた半
導体封止用エポキシ樹脂組成物を提供するところにあ
る。The present invention uses the epoxy resin represented by the formula (1) as an epoxy resin to solve the above problems and reduces the elastic modulus, water absorption amount, and thermal expansion coefficient of a molded product. In addition, a polyfunctional phenol resin represented by the formula (2) and a curing agent composed of a molten mixture of bifunctional phenols are used together to significantly improve the solder stress resistance of the semiconductor package when mounting on a semiconductor. An epoxy resin composition for use is provided.
【0008】[0008]
【課題を解決するための手段】即ち、 本発明は(A)
下記式(1)で示されるエポキシ樹脂を総エポキシ樹脂
量に対して50〜100 重量%含むエポキシ樹脂Means for Solving the Problems That is, the present invention provides (A)
An epoxy resin containing the epoxy resin represented by the following formula (1) in an amount of 50 to 100% by weight based on the total amount of the epoxy resin.
【0009】[0009]
【化4】 [Chemical 4]
【0010】(式中のR1 〜R8 は水素、ハロゲン、ア
ルキル基の中から選択される同一もしくは異なる原子ま
たは基)、(B)下記式(2)で示される多官能フェノ
ール樹脂100重量部に対して2官能フェノール類を1
5〜 100重量部溶融混合した硬化剤、(Wherein R 1 to R 8 are the same or different atoms or groups selected from hydrogen, halogen and alkyl groups), (B) 100 parts by weight of a polyfunctional phenol resin represented by the following formula (2) 1 part bifunctional phenols
5 to 100 parts by weight of a melt-mixed curing agent,
【0011】[0011]
【化5】 [Chemical 5]
【0012】(n=1〜6)(C)無機充填材および
(D)硬化促進剤を必須成分とする半導体封止用エポキ
シ樹脂組成物であり、従来のエポキシ樹脂組成物に比
べ、優れた耐半田ストレス性を有するものである。(N = 1 to 6) An epoxy resin composition for semiconductor encapsulation containing (C) an inorganic filler and (D) a curing accelerator as essential components, which is superior to conventional epoxy resin compositions. It has resistance to soldering stress.
【0013】式(1)の構造で示されるビフェニル型エ
ポキシ樹脂は1分子中に2個のエポキシ基を有する2官
能性エポキシ樹脂で、従来の多官能性エポキシ樹脂に比
べ溶融粘度が低くトランスファー成形時の流動性に優れ
る。従って組成物の溶融シリカ粉末を多く配合すること
ができ、低熱膨張化及び低吸水化が図られ、耐半田スト
レス性に優れるエポキシ樹脂組成物を得られることがで
きる。The biphenyl type epoxy resin represented by the structure of the formula (1) is a bifunctional epoxy resin having two epoxy groups in one molecule and has a lower melt viscosity than the conventional polyfunctional epoxy resin and is transfer molded. Excellent fluidity over time. Therefore, a large amount of fused silica powder of the composition can be blended, low thermal expansion and low water absorption can be achieved, and an epoxy resin composition having excellent solder stress resistance can be obtained.
【0014】このビフェニル型エポキシ樹脂の使用量は
これを調節することにより耐半田ストレス性を最大限に
引き出すことができる。耐半田ストレス性の効果をだす
ためには式(1)で示されるビフェニル型エポキシ樹脂
を総エポキシ樹脂量の50重量%以上、好ましくは70
重量%以上の使用が望ましい。50重量%未満だと低熱
膨張化及び低吸水性が得られず耐半田ストレス性が不充
分である。更に式中のR1 〜R4 はメチル基、R5 〜R
8 は水素原子が好ましい。By adjusting the amount of the biphenyl type epoxy resin used, the solder stress resistance can be maximized. In order to exert the effect of resistance to soldering stress, the biphenyl type epoxy resin represented by the formula (1) is used in an amount of 50% by weight or more, preferably 70% by weight or more of the total amount of epoxy resin.
It is desirable to use more than weight%. If it is less than 50% by weight, low thermal expansion and low water absorption cannot be obtained, and the solder stress resistance is insufficient. Further, in the formula, R 1 to R 4 are methyl groups, R 5 to R
8 is preferably a hydrogen atom.
【0015】式(1)で示されるビフェニル型エポキシ
樹脂以外の他のエポキシ樹脂を併用する場合、用いるエ
ポキシ樹脂とはエポキシ基を有するポリマー全般をい
う。例えばビスフェノール型エポキシ樹脂、クレゾール
ノボラック型エポキシ樹脂、フェノールノボラック型エ
ポキシ樹脂、及びトリフェノールメタン型エポキシ樹
脂、アルキル変性トリフェノールメタン型エポキシ樹脂
等の3官能型エポキシ樹脂、トリアジン核含有エポキシ
樹脂等のことをいう。When an epoxy resin other than the biphenyl type epoxy resin represented by the formula (1) is used in combination, the epoxy resin used means all polymers having an epoxy group. For example, bisphenol type epoxy resin, cresol novolac type epoxy resin, phenol novolac type epoxy resin, triphenol methane type epoxy resin, trifunctional epoxy resin such as alkyl modified triphenol methane type epoxy resin, triazine nucleus-containing epoxy resin, etc. Say.
【0016】式(2)の分子構造で示される多官能フェ
ノール樹脂と2官能フェノール類とを溶融混合した硬化
剤を使用すると、従来のフェノールノボラック樹脂硬化
剤等の使用に比べると半田処理温度近辺での弾性率の低
下とリードフレーム及び半導体チップとの密着力を向上
せしめ、また分子内に3官能構造が導入されていること
から高い耐熱性を得ることができる。従って半田付け時
の熱衝撃に対し、発生応力の低下とそれに伴う半導体チ
ップ等との剥離不良の防止に有効である。When a curing agent prepared by melt-mixing a polyfunctional phenol resin represented by the molecular structure of the formula (2) and a bifunctional phenol is used, the temperature around the soldering temperature is higher than that of the conventional phenol novolac resin curing agent. It is possible to obtain a high heat resistance because it lowers the elastic modulus and improves the adhesion between the lead frame and the semiconductor chip, and the trifunctional structure is introduced in the molecule. Therefore, it is effective in preventing the reduction of the generated stress against the thermal shock at the time of soldering and the defective peeling from the semiconductor chip or the like.
【0017】このような樹脂硬化剤の使用量はこれを調
節することにより耐半田ストレス性を最大限に引き出す
ことができる。耐半田ストレス性の効果を引き出すため
には式(2)で示される多官能フェノール樹脂と2官能
フェノール類との溶融混合比率は多官能フェノール樹脂
100重量部に対して2官能フェノール類を15〜10
0重量部、好ましくは25〜70重量部である。2官能
フェノール類の混合量が100重量部を超えると、高耐
熱性、低弾性等のバランス及びリードフレーム、半導体
チップとの密着力が不充分で耐半田ストレス性の向上が
望めず、15重量部未満だと溶融混合物の粘度が高くな
りミキサー及び2軸ロール等を用いる混練作業時の分散
性が不充分で、かつ該硬化剤を用いた組成物をトランス
ファー成形する際の流動性が低下して成形性が低下す
る。By adjusting the amount of such a resin curing agent used, solder stress resistance can be maximized. In order to bring out the effect of resistance to soldering stress, the melt mixing ratio of the polyfunctional phenol resin represented by the formula (2) and the bifunctional phenols is 15 to 100 parts by weight of the polyfunctional phenol resin. 10
It is 0 part by weight, preferably 25 to 70 parts by weight. If the mixing amount of the bifunctional phenols exceeds 100 parts by weight, the balance of high heat resistance and low elasticity and the adhesion to the lead frame and the semiconductor chip are insufficient, and the improvement of the solder stress resistance cannot be expected. If it is less than 10 parts by weight, the viscosity of the molten mixture becomes high, the dispersibility during kneading work using a mixer, a biaxial roll, etc. is insufficient, and the fluidity at the time of transfer molding of a composition using the curing agent decreases. Formability is reduced.
【0018】更に式(2)中のnの値は1から6の範囲
であることが望ましくnの値が6を超えるとトランスフ
ァー成形時の流動性が低下し、成形性が低下する傾向が
ある。式(2)で示される多官能フェノール樹脂硬化剤
に溶融混合される2官能フェノール類としてはフェノー
ル性水酸基を2個有する化合物全般をいう。例えばビス
フェノールA、ビスフェノールF、ビスフェノールZ、
4、4’−ジビフェノール、シクロヘキシリデンビスフ
ェノールA等が挙げられる。式(2)の多官能フェノー
ル樹脂と2官能フェノール類の溶融混合条件は両者が均
一に混合分散されるならば特には限定しない。式(2)
の多官能フェノール樹脂と2官能フェノール類の溶融混
合物は単独で用いても、他の硬化剤と併用してもよい。
併用する硬化剤にはフェノール性水酸基を有するポリマ
ー全般を用いることができる。例えばフェノールノボラ
ック樹脂、クレゾールノボラック樹脂、ジシクロペンタ
ジエン変性フェノール樹脂、ジシクロペンタジエン変性
フェノール樹脂とフェノールノボラック及びクレゾール
ノボラック樹脂との共重合物、パラキシレン変性フェノ
ール樹脂等を用いることができる。これらは単独もしく
は2種以上混合して用いてもよい。Further, the value of n in the formula (2) is preferably in the range of 1 to 6, and when the value of n exceeds 6, the fluidity at the time of transfer molding is lowered and the moldability tends to be lowered. .. The bifunctional phenols melt-mixed with the polyfunctional phenol resin curing agent represented by the formula (2) refer to all compounds having two phenolic hydroxyl groups. For example, bisphenol A, bisphenol F, bisphenol Z,
4,4'-dibiphenol, cyclohexylidene bisphenol A and the like can be mentioned. The conditions for melt-mixing the polyfunctional phenol resin of the formula (2) and the bifunctional phenols are not particularly limited as long as they are uniformly mixed and dispersed. Formula (2)
The molten mixture of the polyfunctional phenol resin and the bifunctional phenols may be used alone or in combination with another curing agent.
Polymers having a phenolic hydroxyl group can be used for the curing agent used in combination. For example, a phenol novolac resin, a cresol novolac resin, a dicyclopentadiene modified phenol resin, a copolymer of a dicyclopentadiene modified phenol resin and a phenol novolac or a cresol novolac resin, and a paraxylene modified phenol resin can be used. You may use these individually or in mixture of 2 or more types.
【0019】本発明で用いる無機充填材としては、溶融
シリカ粉末、球状シリカ粉末、結晶シリカ粉末、2次凝
集シリカ粉末、多孔質シリカ粉末、2次凝集シリカ粉末
または多孔質シリカ粉末を粉砕したシリカ粉末、アルミ
ナ等が挙げられ、特に溶融シリカ粉末、球状シリカ粉末
及び溶融シリカ粉末と球状シリカ粉末との混合物が好ま
しい。また無機充填材の配合量としては耐半田ストレス
性と成形性のバランスから総組成物量に対して70〜9
0重量%が好ましい。As the inorganic filler used in the present invention, fused silica powder, spherical silica powder, crystalline silica powder, secondary agglomerated silica powder, porous silica powder, secondary agglomerated silica powder or silica obtained by crushing porous silica powder is used. Examples thereof include powder and alumina, and fused silica powder, spherical silica powder, and a mixture of fused silica powder and spherical silica powder are particularly preferable. Further, the amount of the inorganic filler compounded is 70 to 9 relative to the total amount of the composition in view of the balance between solder stress resistance and moldability.
0% by weight is preferred.
【0020】本発明に使用される硬化促進剤はエポキシ
基と水酸基との反応を促進するものであればよく、一般
に封止用材料に使用されているものを広く使用すること
ができ、例えばジアザビシクロウンデセン(DBU)、
トリフェニルホスフィン(TPP)、ジメチルベンジル
アミン(BDMA)や2メチルイミダゾール(2MZ)
等が単独もしくは2種類以上混合して用いられる。本発
明の封止用エポキシ樹脂組成物はエポキシ樹脂、硬化
剤、無機充填材及び硬化促進剤を必須成分とするが、こ
れ以外に必要に応じてシランカップリング剤、ブロム化
エポキシ樹脂、三酸化アンチモン、ヘキサブロムベンゼ
ン等の難燃剤、カーボンブラック、ベンガラ等の着色
剤、天然ワックス、合成ワックス等の離型剤及びシリコ
ーンオイル、ゴム等の低応力添加剤等の種々の添加剤を
適宜配合しても差し支えがない。The curing accelerator used in the present invention may be any one as long as it accelerates the reaction between the epoxy group and the hydroxyl group, and those generally used for sealing materials can be widely used. Zabicyclo undecene (DBU),
Triphenylphosphine (TPP), dimethylbenzylamine (BDMA) and 2-methylimidazole (2MZ)
Etc. are used alone or in combination of two or more. The encapsulating epoxy resin composition of the present invention contains an epoxy resin, a curing agent, an inorganic filler, and a curing accelerator as essential components, but other than this, a silane coupling agent, a brominated epoxy resin, and trioxide may be added if necessary. Flame retardants such as antimony and hexabromobenzene, colorants such as carbon black and red iron oxide, release agents such as natural wax and synthetic wax, and various additives such as low-stress additives such as silicone oil and rubber are appropriately mixed. But there is no problem.
【0021】又、本発明の封止用エポキシ樹脂組成物を
成形材料として製造するには、エポキシ樹脂、硬化剤、
充填材、硬化促進剤、その他の添加剤をミキサー等によ
って十分に均一に混合した後、さらに熱ロールまたはニ
ーダー等で溶融混練し、冷却後粉砕して成形材料とする
ことができる。これらの成形材料は電子部品あるいは電
気部品の封止、被覆、絶縁等に適用することができる。In order to produce the encapsulating epoxy resin composition of the present invention as a molding material, an epoxy resin, a curing agent,
After the filler, the curing accelerator, and other additives are sufficiently and uniformly mixed by a mixer or the like, the mixture can be melt-kneaded with a hot roll or a kneader, cooled, and then pulverized to obtain a molding material. These molding materials can be applied to sealing, coating, insulating, etc. of electronic parts or electric parts.
【実施例】以下本発明を実施例で具体的に説明する。EXAMPLES The present invention will be specifically described below with reference to examples.
【0022】実施例1 下記組成物 式(3)で示されるエポキシ樹脂 13重量部Example 1 13 parts by weight of an epoxy resin represented by the following composition (3)
【0023】[0023]
【化6】 [Chemical 6]
【0024】 式(4)で示される多官能フェノール樹脂硬化剤(イ)(nは1〜6の混合物 で、水酸基当量106、軟化点145℃)とビスフェノールA(ロ)の重量比( イ)/(ロ)が4/1である溶融混合物 7重量部A polyfunctional phenol resin curing agent (a) represented by the formula (4) (n is a mixture of 1 to 6, hydroxyl group equivalent 106, softening point 145 ° C.) and bisphenol A (b) in weight ratio (a) / (B) 7/1 by weight of the melt mixture of 4/1
【0025】[0025]
【化7】 [Chemical 7]
【0026】 溶融シリカ 78.8重量部 トリフェニルホスフィン 0.2重量部 カーボンブラック 0.5重量部 カルナバワックス 0.5重量部 を、ミキサーで常温で混合し、70〜100℃で2軸ロ
ールにより混練し、冷却後粉砕した成形材料とした。得
られた成形材料を、タブレット化し、低圧トランスファ
ー成形機にて175℃、70kg/cm2 、120秒の条件
で半田クラック試験用として6×6mmのチップを52p
パッケージに封止し、又半田耐湿性試験用として3×6
mmのチップを16pSOPパッケージに封止した。封止
したテスト用素子について下記の半田クラック試験及び
半田耐湿性試験を行った。Fused silica 78.8 parts by weight Triphenylphosphine 0.2 parts by weight Carbon black 0.5 parts by weight Carnauba wax 0.5 parts by weight are mixed at room temperature with a mixer, and the mixture is mixed with a biaxial roll at 70 to 100 ° C. A molding material was obtained by kneading, cooling and pulverizing. The obtained molding material is made into a tablet, and a 6 × 6 mm chip for solder crack test is put on a low pressure transfer molding machine under conditions of 175 ° C., 70 kg / cm 2 and 120 seconds for 52 p.
3 × 6 for sealing in package and for solder moisture resistance test
The mm chip was encapsulated in a 16p SOP package. The sealed test element was subjected to the following solder crack test and solder moisture resistance test.
【0027】半田クラック試験:封止したテスト用素子
を85℃、85%RHの環境下で48Hr及び72Hr
処理し、その後260℃の半田槽に10秒間浸漬後、顕
微鏡で外部クラックを観察した。 半田耐湿性試験:封止したテスト用素子を85℃で、8
5%RHの環境下で72Hr処理し、その後260℃の
半田槽に10秒間浸漬後、プレッシャークッカー試験
(125℃、100%RH)を行い回路のオープン不良
を測定した。試験結果を表1に示す。Solder crack test: The sealed test element was subjected to an environment of 85 ° C. and 85% RH for 48 hours and 72 hours.
After processing, it was immersed in a solder bath at 260 ° C. for 10 seconds, and external cracks were observed with a microscope. Solder moisture resistance test: Sealed test element at 85 ° C for 8
After 72 Hr treatment in an environment of 5% RH, and after dipping in a solder bath at 260 ° C. for 10 seconds, a pressure cooker test (125 ° C., 100% RH) was performed to measure open circuit failure. The test results are shown in Table 1.
【0028】実施例2〜5 表1の処方に従って配合し、実施例1と同様にして成形
材料を得、同様に評価した。試験結果を表1に示す。Examples 2 to 5 Compounding was performed according to the formulation shown in Table 1, molding materials were obtained in the same manner as in Example 1, and evaluated in the same manner. The test results are shown in Table 1.
【0029】比較例1〜5 表1の処方に従って配合し、実施例1と同様にして成形
材料を得た。比較例1、3においてはビスフェノールA
を用いないため、樹脂の溶融工程は適用しない。実施例
1と同様に評価した。試験結果を表1に示す。Comparative Examples 1 to 5 Compounding was carried out in accordance with the formulation shown in Table 1, and molding materials were obtained in the same manner as in Example 1. Bisphenol A in Comparative Examples 1 and 3
Since the resin is not used, the resin melting step is not applied. Evaluation was performed in the same manner as in Example 1. The test results are shown in Table 1.
【0030】[0030]
【表1】 [Table 1]
【0031】[0031]
【発明の効果】本発明に従うと、通常法では均一分散が
困難なために適用不可能であった樹脂を容易に均一分散
化することが可能となり、従来技術では得ることのでき
なかった耐半田ストレス性を有するエポキシ樹脂組成物
を得ることができるので、半田付け工程による急激な温
度変化による熱ストレスを受けた時の耐クラック性に非
常に優れ、更に耐湿性が良好なことから電子、電気部品
の封止用、被覆用、絶縁用等に用いた場合、特に表面実
装パッケージに搭載された高集積大型チップICにおい
て信頼性を特に必要とする製品について好適である。According to the present invention, it is possible to easily uniformly disperse a resin which cannot be applied because it is difficult to uniformly disperse by the conventional method, and it is possible to obtain a soldering resistance which cannot be obtained by the conventional technique. Since it is possible to obtain an epoxy resin composition having a stress property, it is very excellent in crack resistance when it is subjected to thermal stress due to a rapid temperature change in the soldering process, and since it has good humidity resistance When it is used for sealing, covering, insulating, etc. of parts, it is suitable for a product particularly requiring high reliability in a highly integrated large chip IC mounted in a surface mount package.
【手続補正書】[Procedure amendment]
【提出日】平成4年2月4日[Submission date] February 4, 1992
【手続補正1】[Procedure Amendment 1]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】0024[Correction target item name] 0024
【補正方法】変更[Correction method] Change
【補正内容】[Correction content]
【0024】 式(4)で示される多官能フェノール樹脂硬化剤(イ)(nは1〜6の混合物 で、水酸基当量106、軟化点145℃)とビスフェノールA(ロ)の重量比( イ)/(ロ)が2/1である溶融混合物 7重量部A polyfunctional phenol resin curing agent (a) represented by the formula (4) (n is a mixture of 1 to 6, hydroxyl group equivalent 106, softening point 145 ° C.) and bisphenol A (b) in weight ratio (a) / (B) 2/1 melted mixture 7 parts by weight
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 C08L 63/00 NKT 8830−4J ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Office reference number FI technical display location C08L 63/00 NKT 8830-4J
Claims (1)
樹脂を総エポキシ樹脂量に対して50〜100 重量%
含むエポキシ樹脂 【化1】 (式中のR1 〜R8 は水素、ハロゲン、アルキル基の中
から選択される同一もしくは異なる原子または基)、 (B)下記式(2)で示される多官能フェノール樹脂1
00重量部に対して2官能フェノール類を15〜 10
0重量部溶融混合した硬化剤、 【化2】 (n=1〜6) (C)無機充填材および (D)硬化促進剤 を必須成分とする半導体封止用エポキシ樹脂組成物。1. (A) An epoxy resin represented by the following formula (1) is contained in an amount of 50 to 100% by weight based on the total amount of epoxy resin.
Epoxy resin containing (Wherein R 1 to R 8 are the same or different atoms or groups selected from hydrogen, halogen and alkyl groups), (B) a polyfunctional phenol resin 1 represented by the following formula (2)
15 to 10 parts of bifunctional phenol with respect to 00 parts by weight
0 parts by weight of a melt-mixed curing agent, (N = 1 to 6) An epoxy resin composition for semiconductor encapsulation, which comprises (C) an inorganic filler and (D) a curing accelerator as essential components.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1334192A JP2991849B2 (en) | 1992-01-28 | 1992-01-28 | Epoxy resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1334192A JP2991849B2 (en) | 1992-01-28 | 1992-01-28 | Epoxy resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH05206329A true JPH05206329A (en) | 1993-08-13 |
JP2991849B2 JP2991849B2 (en) | 1999-12-20 |
Family
ID=11830423
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1334192A Expired - Fee Related JP2991849B2 (en) | 1992-01-28 | 1992-01-28 | Epoxy resin composition |
Country Status (1)
Country | Link |
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JP (1) | JP2991849B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11106612A (en) * | 1997-08-07 | 1999-04-20 | Sumitomo Bakelite Co Ltd | Epoxy resin composition and semiconductor device |
EP0943639A3 (en) * | 1998-03-13 | 2001-02-07 | Sumitomo Chemical Company, Limited | Epoxy resin composition and resin-encapsulated semiconductor device |
JP2003003080A (en) * | 2002-04-26 | 2003-01-08 | Sumitomo Chem Co Ltd | Molding resin composition |
KR20190061832A (en) * | 2017-11-28 | 2019-06-05 | 주식회사 케이씨씨 | Epoxy resin composition |
-
1992
- 1992-01-28 JP JP1334192A patent/JP2991849B2/en not_active Expired - Fee Related
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11106612A (en) * | 1997-08-07 | 1999-04-20 | Sumitomo Bakelite Co Ltd | Epoxy resin composition and semiconductor device |
EP0943639A3 (en) * | 1998-03-13 | 2001-02-07 | Sumitomo Chemical Company, Limited | Epoxy resin composition and resin-encapsulated semiconductor device |
JP2003003080A (en) * | 2002-04-26 | 2003-01-08 | Sumitomo Chem Co Ltd | Molding resin composition |
KR20190061832A (en) * | 2017-11-28 | 2019-06-05 | 주식회사 케이씨씨 | Epoxy resin composition |
Also Published As
Publication number | Publication date |
---|---|
JP2991849B2 (en) | 1999-12-20 |
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