JPH05202492A - Surface treatment of metal - Google Patents

Surface treatment of metal

Info

Publication number
JPH05202492A
JPH05202492A JP34935791A JP34935791A JPH05202492A JP H05202492 A JPH05202492 A JP H05202492A JP 34935791 A JP34935791 A JP 34935791A JP 34935791 A JP34935791 A JP 34935791A JP H05202492 A JPH05202492 A JP H05202492A
Authority
JP
Japan
Prior art keywords
water
washed
minutes
hot air
heated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP34935791A
Other languages
Japanese (ja)
Inventor
Hideaki Yamaguchi
秀明 山口
Daikichi Tachibana
大吉 橘
Kenichi Yamaguchi
謙一 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP34935791A priority Critical patent/JPH05202492A/en
Publication of JPH05202492A publication Critical patent/JPH05202492A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F11/00Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
    • C23F11/08Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
    • C23F11/10Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
    • C23F11/14Nitrogen-containing compounds
    • C23F11/149Heterocyclic compounds containing nitrogen as hetero atom
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3489Composition of fluxes; Methods of application thereof; Other methods of activating the contact surfaces

Abstract

PURPOSE:To prevent the rust formation in the metal exposed parts of a printed circuit board and to improve a soldering property by subjecting the printed circuit board to a surface treatment with a preflux soln. contg. a specific benzimidazole deriv. or its salt. CONSTITUTION:The metallic surface of the printed circuit board is treated with the preflux soln. contg. the salt of the compd. expressed by formula I, II (where n=0 to 3) or its deriv. The above-mentioned compd., etc., are incorporated as effective components at about 0.01 to 50% into an aq. soln., solvent, etc., of org. acids, alcohol, etc. The circuit board is immersed into such soln. and is thereby subjected to the surface treatment. The preflux film surface is thereafter subjected to an oxidation treatment to improve the heat resistance. This oxidation treatment is executed by irradiation with IR rays or UV rays, exposing to ozone, immersion into hydrogen peroxide water, etc. As a result, the printed circuit board which has the good spreading property and wettability of cream solder, and soldering rate and wettability after reflow and is excellent in terms of working environment and safety is obtd.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、金属の表面処理に関
するものであり、特にプリント配線板の銅又は銅合金の
回路部を防錆し、半田付け性を向上させる耐熱プリフラ
ックスとして好適なものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface treatment of metal, and is particularly suitable as a heat-resistant preflux for preventing the circuit portion of a printed wiring board made of copper or copper alloy from rusting and improving solderability. Is.

【0002】[0002]

【従来の技術】従来、プリント配線板の銅又は銅合金か
らなる回路部を防錆し、半田付け性を保持する目的で使
用されているプレフラックスは、大別してプリント配線
板全体をコーティングするロジン系プレフラックスと、
選択的に銅又は銅合金と化学反応させるアルキルイミダ
ゾール系プレフラックスの2種類がある。前者は天然ロ
ジン、ロジンエステル、ロジン変成マレイン酸樹脂等
を、有機溶剤に溶解させたものをロールコターで塗布す
るか、噴霧又は浸漬によつてプリント配線板全体に塗布
し、乾燥して被膜を形成する方法で用いられる。このた
め有機溶剤の揮散によって作業環境及び安全性が著しく
損われる欠点がある。又、ロジン系プレフラックスは揮
発性溶剤を使用しているため作業時引火の危険が伴うと
いう欠点も有している。他方、アルキルイミダゾール系
プレフラックスは水溶性であり、作業環境の面でも安全
性の面でも優れているが、化学反応したアルキルイミダ
ゾール銅錯体が高温に曝されると空気中の酸素と銅の触
媒作用で変質してポストフラックスの作用を阻害して、
半田付け性を悪くするという欠点を有している。
2. Description of the Related Art Pre-flux, which has been conventionally used for the purpose of preventing corrosion of a circuit portion made of copper or a copper alloy of a printed wiring board and maintaining solderability, is roughly classified into rosins for coating the entire printed wiring board. System preflux,
There are two types of alkylimidazole-based preflux that selectively chemically react with copper or copper alloys. For the former, apply natural rosin, rosin ester, rosin-modified maleic acid resin, etc. dissolved in an organic solvent with a roll coater, or spray or dip it on the entire printed wiring board and dry to form a film. Used in the method. Therefore, there is a drawback that the working environment and safety are significantly impaired by the volatilization of the organic solvent. The rosin-based preflux also has a drawback that it involves a risk of ignition during work because it uses a volatile solvent. On the other hand, the alkylimidazole-based preflux is water-soluble and is excellent in terms of working environment and safety, but when the chemically reacted alkylimidazole copper complex is exposed to high temperatures, it is a catalyst for oxygen and copper in the air. It deteriorates by the action and inhibits the action of postflux,
It has the drawback of deteriorating the solderability.

【0003】[0003]

【発明が解決しょうとする課題】近年プリント配線板に
電子部品を半田付けする方法として表面実装法が多く採
用されている。この表面実装法、電子部品の仮止めクリ
ーム半田のリフロー等、プリント配線板が高温に曝され
る機会が多くなり、プリント配線板の半田付け性を保持
するために用いられるプレフラックスの耐熱性、即ちプ
リント配線板が高温に曝された後での半田付け性が優れ
ていることがプレフラックスの性能に要求されるように
なった。又、大気汚染等に問題を有する揮発性溶剤を使
用せず、且つ高温に曝された後でも半田付け性の優れた
プレフラックスの開発が切望されている。
In recent years, a surface mounting method has been widely adopted as a method for soldering an electronic component to a printed wiring board. The surface mounting method, the reflow of solder paste solder for electronic components, the printed wiring board is often exposed to high temperatures, and the heat resistance of the pre-flux used to maintain the solderability of the printed wiring board, That is, the pre-flux performance is required to have excellent solderability after the printed wiring board is exposed to high temperature. Further, it is desired to develop a preflux which does not use a volatile solvent having a problem in air pollution and has excellent solderability even after being exposed to a high temperature.

【0004】[0004]

【課題を解決するための手段】本発明者らは、このよう
な事情に鑑み、揮発性溶剤を使用せず且つ高温に曝され
た後でも半田付け性の良いプレフラックスに関して鋭意
検討を重ねた結果、酢酸、カプリン酸、グリコール酸、
パラニトロ安息香酸、パラトルエンスルホン酸、ピクリ
ン酸、蓚酸、蟻酸、コハク酸、亜りん酸、マレイン酸、
アクリル酸、フマール酸、酒石酸、アジピン酸、乳酸、
オレイン酸等の有機酸、塩酸、硫酸、燐酸、又は酢酸亜
鉛、酢酸鉛、水酸化亜鉛、水酸化鉛、硫化亜鉛、リン酸
亜鉛、酸化亜鉛、塩化亜鉛、塩化第一鉄、塩化第二鉄、
酸化第一鉄、酸化第二鉄、塩化第一銅、塩化第二銅、酸
化第一銅、酸化第二銅、水酸化銅、リン酸銅、炭酸銅、
酢酸銅、硫酸銅等の金属化合物を含む水溶液、又はメタ
ノール、エタノール、イソプロピルアルコール、ブタノ
ール、アセトン等の水溶性溶媒、のいずれかの群から選
ばれた少なくとも一つの液と、有効成分として(化1)
〜(化11)で表わされる化合物を1種類又は2種類以
上を混合した溶液を金属表面処理剤として用いる場合に
は、上述した従来の問題点を解決し所期の目的を達成出
来ることを見出し、本発明を完成するに至ったものであ
る。(化1)〜(化11)で表わされる化合物を可溶化
あるいは乳化させるために用いられる上記した有機酸等
は、有機酸、有機酸の塩、あるいはアルコール等の水溶
性溶媒を夫々単独に用いることができる他、任意の割合
で混合して使用することも可能である。例えば上記水溶
性溶媒は単独で用いられる他有機酸等と併用することも
でき、特に有機酸等単独では、(化1)〜(化11)で
表される化合物あるいはその誘導体の溶解が困難となる
場合には、水溶性溶媒を含有させることが好ましく、こ
の場合の含有率は0.01〜50%とすることが適当で
ある場合が多い。上記各溶媒により溶解して得られた溶
液は、上記有効成分を0・01〜40%、好ましくは0
・5〜5%含有した可溶化溶液あるいは、乳化溶液に浸
漬処理する方法が一般的であり、浸漬は0〜100℃の
温度範囲で浸漬時間は数秒〜数十分の処理範囲が適当で
ある。又化成被膜形成後、酸化処理赤外線・近赤外線
・遠赤外線・紫外線照射処理を0〜300℃の温度範囲
で、処理時間数秒〜数十分の処理範囲が適当である。
オゾンOに数秒〜数十分の暴露処理範囲が適当であ
る。過酸化水素水1〜20%の濃度に数秒〜数十分の
浸漬、噴霧の薬液処理の範囲が適当である。〜の処
理を行なうことにより耐熱性に優れた化成被膜が出来
る。本発明の金属表面処理剤の有効成分としては、(化
1)〜(化11)が好適なものとして例示される。本発
明の表面処理剤を金属表面又は、プリント配線板の表面
に塗布するには、浸漬、噴霧による方法を用いる。
In view of such circumstances, the inventors of the present invention have made extensive studies on a preflux which does not use a volatile solvent and has good solderability even after being exposed to a high temperature. As a result, acetic acid, capric acid, glycolic acid,
Paranitrobenzoic acid, paratoluenesulfonic acid, picric acid, oxalic acid, formic acid, succinic acid, phosphorous acid, maleic acid,
Acrylic acid, fumaric acid, tartaric acid, adipic acid, lactic acid,
Organic acids such as oleic acid, hydrochloric acid, sulfuric acid, phosphoric acid, or zinc acetate, lead acetate, zinc hydroxide, lead hydroxide, zinc sulfide, zinc phosphate, zinc oxide, zinc chloride, ferrous chloride, ferric chloride ,
Ferrous oxide, ferric oxide, cuprous chloride, cupric chloride, cuprous oxide, cupric oxide, copper hydroxide, copper phosphate, copper carbonate,
At least one liquid selected from the group consisting of an aqueous solution containing a metal compound such as copper acetate and copper sulfate, or a water-soluble solvent such as methanol, ethanol, isopropyl alcohol, butanol, and acetone, and 1)
It has been found that, when a solution prepared by mixing one kind or two or more kinds of the compounds represented by (Chemical Formula 11) is used as a metal surface treatment agent, the above-mentioned conventional problems can be solved and the intended purpose can be achieved. The present invention has been completed. As the above-mentioned organic acid or the like used for solubilizing or emulsifying the compounds represented by (Chemical Formula 1) to (Chemical Formula 11), an organic acid, a salt of an organic acid, or a water-soluble solvent such as alcohol is used alone. In addition to the above, it is also possible to mix and use them at an arbitrary ratio. For example, the water-soluble solvent may be used alone or in combination with other organic acids, etc. In particular, the organic acid alone may make it difficult to dissolve the compounds represented by (Chemical Formula 1) to (Chemical Formula 11) or their derivatives. In this case, it is preferable to add a water-soluble solvent, and in this case, it is often appropriate that the content rate is 0.01 to 50%. The solution obtained by dissolving with each of the above-mentioned solvents contains the above-mentioned active ingredient in an amount of 0.01 to 40%, preferably 0.
The method of immersing in a solubilizing solution containing 5 to 5% or an emulsifying solution is generally used. Immersion is suitably performed in a temperature range of 0 to 100 ° C. for an immersion time of several seconds to several tens of minutes. .. Further, after the formation of the chemical conversion film, oxidation treatment of infrared rays / near infrared rays / far infrared rays / ultraviolet rays is carried out at a temperature range of 0 to 300 ° C. for a treatment time of several seconds to several tens of minutes.
An exposure treatment range of a few seconds to a few tens of minutes is suitable for ozone O 3 . The range of treatment with a chemical solution such as immersion and spraying for several seconds to several tens of minutes in a concentration of hydrogen peroxide water of 1 to 20% is appropriate. By performing the treatments 1 to 3, a chemical conversion coating having excellent heat resistance can be obtained. As the active ingredient of the metal surface treating agent of the present invention, (Chemical formula 1) to (Chemical formula 11) are exemplified as preferable ones. To apply the surface treatment agent of the present invention to a metal surface or the surface of a printed wiring board, a method of dipping or spraying is used.

【0005】[0005]

【作用】上記したプレフラックスの処理方法によれば、
クリーム半田の広がり性、濡れ性及びリフロー後の半田
上がり率、濡れ性が良好で、且つ作業環境、安全性の面
からも優れたプリント配線板を製造できる。
According to the above-mentioned preflux processing method,
It is possible to manufacture a printed wiring board which has good spreadability and wettability of cream solder, a solder rising rate after reflow, and wettability, and is excellent in terms of working environment and safety.

【0006】[0006]

【実施例】2−(1−メチルプロピル)ベンズイミダゾ
ールを有効成分とする1%溶液を5リットル容器に入
れ、液温を40°Cに加熱し調整した。他方、1cm×
5cm×0.3mmの銅板及び20cm×24cm×
1.6mmのスルーホール基板を脱脂、水洗、ソフトエ
ッチング、水洗、酸洗、水洗し表面を洗浄した試料片を
準備し、上記2−(1−メチルプロピル)ベンズイミダ
ゾールを有効成分とする1%溶液に60秒間浸漬した。
その後水洗し次いで熱風乾燥機に入れ、120℃で5分
加熱した後、熱風乾燥機に入れ200℃で10分間加
熱して測定前にポストフラックスを刷毛塗りしてスルー
ホールの半田上りを測定した。熱風乾燥機に入れ20
0℃で10分間加熱して測定前にポストフラックスに浸
漬し半田濡れ性試験器を用いて濡れ時間を測定した。
耐湿(90%RH/40℃/96hr)処理後の試験片
をポストフラックスに浸漬して半田濡れ性試験機を用い
て濡れ時間を測定した。この試験結果は表1に示した。
Example A 1% solution containing 2- (1-methylpropyl) benzimidazole as an active ingredient was placed in a 5 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x
5 cm x 0.3 mm copper plate and 20 cm x 24 cm x
A 1.6 mm through-hole substrate was degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a sample piece, and 1% containing 2- (1-methylpropyl) benzimidazole as an active ingredient was prepared. It was immersed in the solution for 60 seconds.
After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. Put in hot air dryer 20
It was heated at 0 ° C. for 10 minutes, immersed in post flux before measurement, and the wetting time was measured using a solder wettability tester.
The test piece after the moisture resistance (90% RH / 40 ° C./96 hr) treatment was dipped in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 1.

【0007】[0007]

【実施例】2−(2−メチルプロピル)ベンズイミダゾ
ールを有効成分とする1%溶液を5リットル容器に入
れ、液温を40℃に加熱し調整した。他方、1cm×5
cm×0.3mmの銅板及び20cm×24cm×1.
6mmのスルーホール基板を脱脂、水洗、ソフトエッチ
ング、水洗、酸洗、水洗し表面を洗浄し試験片を準備
し、上記2−(2−メチルプロピル)ベンズイミダゾー
ルを有効成分とする1%溶液に60秒間浸漬した。その
後水洗し次いで熱風乾燥機に入れ、120℃で5分加熱
した後、熱風乾燥機に入れ200℃で10分間加熱し
て測定前にポストフラックスを刷毛塗りしてスルーホー
ルの半田上りを測定した。熱風乾燥機に入れ200℃
で10分間加熱して測定前にポストフラックスに浸漬し
半田濡れ性試験器を用いて濡れ時間を測定した。耐湿
(90%RH/40℃/96hr)処理後の試験片をポ
ストフラックスに浸漬して半田濡れ性試験器を用いて濡
れ時間を測定した。この試験結果は表1に示した。
Example A 1% solution containing 2- (2-methylpropyl) benzimidazole as an active ingredient was placed in a 5 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5
cm × 0.3 mm copper plate and 20 cm × 24 cm × 1.
A 6 mm through-hole substrate is degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and then a 1% solution containing 2- (2-methylpropyl) benzimidazole as an active ingredient is prepared. It was immersed for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. Put in a hot air dryer, 200 ℃
Was heated for 10 minutes, immersed in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the moisture resistance (90% RH / 40 ° C./96 hr) treatment was dipped in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 1.

【0008】[0008]

【実施例】2−(1−メチルブチル)ベンズルイミダゾ
ールを有効成分とする1%溶液を5リットル容器に入
れ、液温を40℃に加熱し調整した。他方、1cm×5
cm×0.3mmの銅板及び20cm×24cm×1.
6mmのスルーホール基板を脱脂、水洗、ソフトエッチ
ング、水洗、酸洗、水洗し表面を洗浄し試験片を準備
し、上記2−(1−メチルブチル)ベンズルイミダゾー
ルを有効成分とする1%溶液に60秒間浸漬した。その
後水洗し次いで熱風乾燥機に入れ、120℃で5分加熱
した後、熱風乾燥機に入れ200℃で10分間加熱し
て測定前にポストフラックスを刷毛塗りしてスルーホー
ルの半田上りを測定した。熱風乾燥機に入れ200℃
で10分間加熱して測定前にポストフラックスに浸漬し
半田濡れ性試験器を用いて濡れ時間を測定した。対湿
(90%RH/40℃/96hr)処理後の試験片をポ
ストフラックスに浸漬して半田濡れ性試験器を用いて濡
れ時間を測定した。この試験結果は表1に示した。
EXAMPLE A 1% solution containing 2- (1-methylbutyl) benzimidazole as an active ingredient was placed in a 5 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5
cm × 0.3 mm copper plate and 20 cm × 24 cm × 1.
A 6 mm through-hole substrate was degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and prepared into a 1% solution containing 2- (1-methylbutyl) benzimidazole as an active ingredient. It was immersed for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. Put in a hot air dryer, 200 ℃
Was heated for 10 minutes, immersed in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 1.

【0009】[0009]

【実施例】2−(1−エチルプロピル)ベンズルイミダ
ゾールを有効成分とする1%溶液を5リットル容器に入
れ、液温を40℃に加熱し調整した。他方、1cm×5
cm×0.3mmの銅板及び20cm×24cm×1.
6mmのスルーホール基板を脱脂、水洗、ソフトエッチ
ング、水洗、酸洗、水洗し表面を洗浄し試験片を準備
し、上記2−(1−エチルプロピル)ベンズルイミダゾ
ールを有効成分とする1%溶液に60秒間浸漬した。そ
の後水洗し次いで熱風乾燥機に入れ、120℃で5分加
熱した後、熱風乾燥機に入れ200℃で10分間加熱
して測定前にポストフラックスを刷毛塗りしてスルーホ
ールの半田上りを測定した。熱風乾燥機に入れ200
℃で10分間加熱して測定前にポストフラックスに浸漬
し半田濡れ性試験器を用いて濡れ時間を測定した。対
湿(90%RH/40℃/96hr)処理後の試験片を
ポストフラックスに浸漬して半田濡れ性試験器を用いて
濡れ時間を測定した。この試験結果は表1に示した。
Example A 1% solution containing 2- (1-ethylpropyl) benzimidazole as an active ingredient was placed in a 5 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5
cm × 0.3 mm copper plate and 20 cm × 24 cm × 1.
A 6 mm through-hole substrate is degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and a 1% solution containing the above-mentioned 2- (1-ethylpropyl) benzimidazole as an active ingredient. Was soaked for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. Put in hot air dryer 200
It was heated at 0 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 1.

【0010】[0010]

【実施例】2−(2−メチルブチル)ベンズルイミダゾ
ールを有効成分とする1%溶液を5リットル容器に入
れ、液温を40℃に加熱し調整した。他方、1cm×5
cm×0.3mmの銅板及び20cm×24cm×1.
6mmのスルーホール基板を脱脂、水洗、ソフトエッチ
ング、水洗、酸洗、水洗し表面を洗浄し試験片を準備
し、上記2−(2−メチルブチル)ベンズルイミダゾー
ルを有効成分とする1%溶液に60秒間浸漬した。その
後水洗し次いで熱風乾燥機に入れ、120℃で5分加熱
した後、熱風乾燥機に入れ200℃で10分間加熱し
て測定前にポストフラックスを刷毛塗りしてスルーホー
ルの半田上りを測定した。熱風乾燥機に入れ200℃
で10分間加熱して測定前にポストフラックスに浸漬し
半田濡れ性試験器を用いて濡れ時間を測定した。対湿
(90%RH/40℃/96hr)処理後の試験片をポ
ストフラックスに浸漬して半田濡れ性試験器を用いて濡
れ時間を測定した。この試験結果は表1に示した。
EXAMPLE A 1% solution containing 2- (2-methylbutyl) benzlumidimidazole as an active ingredient was placed in a 5 liter container and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5
cm × 0.3 mm copper plate and 20 cm × 24 cm × 1.
A 6 mm through-hole substrate was degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and was prepared into a 1% solution containing 2- (2-methylbutyl) benzimidazole as an active ingredient. It was immersed for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. Put in a hot air dryer, 200 ℃
Was heated for 10 minutes, immersed in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 1.

【0011】[0011]

【実施例】2−(1−メチルペンチル)ベンズルイミダ
ゾールを有効成分とする1%溶液を5リットル容器に入
れ、液温を40℃に加熱し調整した。他方、1cm×5
cm×0.3mmの銅板及び20cm×24cm×1.
6mmのスルーホール基板を脱脂、水洗、ソフトエッチ
ング、水洗、酸洗、水洗し表面を洗浄し試験片を準備
し、上記2−(1−メチルペンチル)ベンズルイミダゾ
ールを有効成分とする1%溶液に60秒間浸漬した。そ
の後水洗し次いで熱風乾燥機に入れ、120℃で5分加
熱した後、熱風乾燥機に入れ200℃で10分間加熱
して測定前にポストフラックスを刷毛塗りしてスルーホ
ールの半田上りを測定した。熱風乾燥機に入れ200
℃で10分間加熱して測定前にポストフラックスに浸漬
し半田濡れ性試験器を用いて濡れ時間を測定した。対
湿(90%RH/40℃/96hr)処理後の試験片を
ポストフラックスに浸漬して半田濡れ性試験器を用いて
濡れ時間を測定した。この試験結果は表1に示した。
EXAMPLE A 1% solution containing 2- (1-methylpentyl) benzimidazole as an active ingredient was placed in a 5 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5
cm × 0.3 mm copper plate and 20 cm × 24 cm × 1.
A 6 mm through-hole substrate is degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and a 1% solution containing the above 2- (1-methylpentyl) benzimidazole as an active ingredient. Was soaked for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. Put in hot air dryer 200
It was heated at 0 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 1.

【0012】[0012]

【実施例】2−(1−プロピルブチル)ベンズイミダゾ
ールを有効成分とする1%溶液を5リットル容器に入
れ、液温を40℃に加熱し調整した。他方、1cm×5
cm×0.3mmの銅板及び20cm×24cm×1.
6mmのスルーホール基板を脱脂、水洗、ソフトエッチ
ング、水洗、酸洗、水洗し表面を洗浄し試験片を準備
し、上記2−(1−プロピルブチル)ベンズイミダゾー
ルを有効成分とする1%溶液に60秒間浸漬した。その
後水洗し次いで熱風乾燥機に入れ、120℃で5分加熱
した後、熱風乾燥機に入れ200℃で10分間加熱し
て測定前にポストフラックスを刷毛塗りしてスルーホー
ルの半田上りを測定した。熱風乾燥機に入れ200℃
で10分間加熱して測定前にポストフラックスに浸漬し
半田濡れ性試験器を用いて濡れ時間を測定した。対湿
(90%RH/40℃/96hr)処理後の試験片をポ
ストフラックスに浸漬して半田濡れ性試験器を用いて濡
れ時間を測定した。この試験結果は表2に示した。
Example A 1% solution containing 2- (1-propylbutyl) benzimidazole as an active ingredient was placed in a 5 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5
cm × 0.3 mm copper plate and 20 cm × 24 cm × 1.
A 6 mm through-hole substrate is degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and then a 1% solution containing 2- (1-propylbutyl) benzimidazole as an active ingredient is prepared. It was immersed for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. Put in a hot air dryer, 200 ℃
Was heated for 10 minutes, immersed in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 2.

【0013】[0013]

【実施例】2−(2−メチル−4,4−ジメチルペンチ
ル)ベンズルイミダゾールを有効成分とする1%溶液を
5リットル容器に入れ、液温を40℃に加熱し調整し
た。他方、1cm×5cm×0.3mmの銅板及び20
cm×24cm×1.6mmのスルーホール基板を脱
脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表面
を洗浄し試験片を準備し、上記2−(2−メチル−4,
4−ジメチルペンチル)ベンズルイミダゾールを有効成
分とする1%溶液に60秒間浸漬した。その後水洗し次
いで熱風乾燥機に入れ、120℃で5分加熱した後、
熱風乾燥機に入れ200℃で10分間加熱して測定前に
ポストフラックスを刷毛塗りしてスルーホールの半田上
りを測定した。熱風乾燥機に入れ200℃で10分間
加熱して測定前にポストフラックスに浸漬し半田濡れ性
試験器を用いて濡れ時間を測定した。対湿(90%R
H/40℃/96hr)処理後の試験片をポストフラッ
クスに浸漬して半田濡れ性試験器を用いて濡れ時間を測
定した。この試験結果は表2に示した。
[Example] A 1% solution containing 2- (2-methyl-4,4-dimethylpentyl) benzluimidazole as an active ingredient was placed in a 5 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5 cm x 0.3 mm copper plate and 20
The test piece is prepared by degreasing, washing with water, soft etching, washing with water, pickling, washing with water the through-hole substrate having a size of cm × 24 cm × 1.6 mm, and preparing the above-mentioned 2- (2-methyl-4
It was immersed for 60 seconds in a 1% solution containing 4-dimethylpentyl) benzimidazole as an active ingredient. After that, rinse with water, put in a hot air dryer, and heat at 120 ° C for 5 minutes,
It was put in a hot air dryer and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder buildup of the through hole. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% R
The test piece after the H / 40 ° C./96 hr) treatment was dipped in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 2.

【0014】[0014]

【実施例】2−(1−へキシルノニル)ベンズルイミダ
ゾールを有効成分とする1%溶液を5リットル容器に入
れ、液温を40℃に加熱し調整した。他方、1cm×5
cm×0.3mmの銅板及び20cm×24cm×1.
6mmのスルーホール基板を脱脂、水洗、ソフトエッチ
ング、水洗、酸洗、水洗し表面を洗浄し試験片を準備
し、上記2−(1−ヘキシルノニル)ベンズルイミダゾ
ールを有効成分とする1%溶液に60秒間浸漬した。そ
の後水洗し次いで熱風乾燥機に入れ、120℃で5分加
熱した後、熱風乾燥機に入れ200℃で10分間加熱
して測定前にポストフラックスを刷毛塗りしてスルーホ
ールの半田上りを測定した。熱風乾燥機に入れ200
℃で10分間加熱して測定前にポストフラックスに浸漬
し半田濡れ性試験器を用いて濡れ時間を測定した。対
湿(90%RH/40℃/96hr)処理後の試験片を
ポストフラックスに浸漬して半田濡れ性試験器を用いて
濡れ時間を測定した。この試験結果は表2に示した。
EXAMPLE A 1% solution containing 2- (1-hexylnonyl) benzluimidazole as an active ingredient was placed in a 5 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5
cm × 0.3 mm copper plate and 20 cm × 24 cm × 1.
A 6 mm through-hole substrate is degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and a 1% solution containing the above 2- (1-hexylnonyl) benzimidazole as an active ingredient. Was soaked for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. Put in hot air dryer 200
It was heated at 0 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 2.

【0015】[0015]

【実施例】2−(1−ヘプチルデシル)ベンズルイミダ
ゾールを有効成分とする1%溶液を5リットル容器に入
れ、液温を40℃に加熱し調整した。他方、1cm×5
cm×0.3mmの銅板及び20cm×24cm×1.
6mmのスルーホール基板を脱脂、水洗、ソフトエッチ
ング、水洗、酸洗、水洗し表面を洗浄し試験片を準備
し、上記2−(1−ヘプチルデシル)ベンズルイミダゾ
ールを有効成分とする1%溶液に60秒間浸漬した。そ
の後水洗し次いで熱風乾燥機に入れ、120℃で5分加
熱した後、熱風乾燥機に入れ200℃で10分間加熱
して測定前にポストフラックスを刷毛塗りしてスルーホ
ールの半田上りを測定した。熱風乾燥機に入れ200
℃で10分間加熱して測定前にポストフラックスに浸漬
し半田濡れ性試験器を用いて濡れ時間を測定した。対
湿(90%RH/40℃/96hr)処理後の試験片を
ポストフラックスに浸漬して半田濡れ性試験器を用いて
濡れ時間を測定した。この試験結果は表2に示した。
EXAMPLE A 1% solution containing 2- (1-heptyldecyl) benzluimidazole as an active ingredient was placed in a 5 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5
cm × 0.3 mm copper plate and 20 cm × 24 cm × 1.
A 6 mm through-hole substrate was degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and prepared into a 1% solution containing the above 2- (1-heptyldecyl) benzimidazole as an active ingredient. It was immersed for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. Put in hot air dryer 200
It was heated at 0 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 2.

【0016】[0016]

【実施例】2−(1−メチルエチル)ベンズルイミダゾ
ール、2−(1−エチルプロピル)ベンズイミダゾール
を有効成分とする1%混合溶液を5リットル容器に入
れ、液温を40℃に加熱し調整した。他方、1cm×5
cm×0.3mmの銅板及び20cm×24cm×1.
6mmのスルーホール基板を脱脂、水洗、ソフトエッチ
ング、水洗、酸洗、水洗し表面を洗浄し試験片を準備
し、上記2−(1−メチルエチル)ベンズルイミダゾー
ル、2−(1−エチルプロピル)ベンズイミダゾールを
有効成分とする1%混合溶液に60秒間浸漬した。その
後水洗し次いで熱風乾燥機に入れ、120℃で5分加熱
した後、熱風乾燥機に入れ200℃で10分間加熱し
て測定前にポストフラックスを刷毛塗りしてスルーホー
ルの半田上りを測定した。熱風乾燥機に入れ200℃
で10分間加熱して測定前にポストフラックスに浸漬し
半田濡れ性試験器を用いて濡れ時間を測定した。対湿
(90%RH/40℃/96hr)処理後の試験片をポ
ストフラックスに浸漬して半田濡れ性試験器を用いて濡
れ時間を測定した。この試験結果は表2に示した。
[Examples] A 1% mixed solution containing 2- (1-methylethyl) benzimidazole and 2- (1-ethylpropyl) benzimidazole as active ingredients was placed in a 5 liter container and heated to 40 ° C. It was adjusted. On the other hand, 1 cm x 5
cm × 0.3 mm copper plate and 20 cm × 24 cm × 1.
A 6 mm through-hole substrate was degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and the above-mentioned 2- (1-methylethyl) benzimidazole, 2- (1-ethylpropyl) was prepared. ) It was immersed for 60 seconds in a 1% mixed solution containing benzimidazole as an active ingredient. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. Put in a hot air dryer, 200 ℃
Was heated for 10 minutes, immersed in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 2.

【0017】[0017]

【実施例】2−(1−メチルプロピル)トシルイミダゾ
ールを有効成分とする1%溶液を5リットル容器に入
れ、液温を40℃に加熱し調整した。他方、1cm×5
cm×0.3mmの銅板及び20cm×24cm×1.
6mmのスルーホール基板を脱脂、水洗、ソフトエッチ
ング、水洗、酸洗、水洗し表面を洗浄し試験片を準備
し、上記2−(1−メチルプロピル)トシルイミダゾー
ルを有効成分とする1%溶液に60秒間浸漬した。その
後水洗し次いで熱風乾燥機に入れ、120℃で5分加熱
した後、熱風乾燥機に入れ200℃で10分間加熱し
て測定前にポストフラックスを刷毛塗りしてスルーホー
ルの半田上りを測定した。熱風乾燥機に入れ200℃
で10分間加熱して測定前にポストフラックスに浸漬し
半田濡れ性試験器を用いて濡れ時間を測定した。対湿
(90%RH/40℃/96hr)処理後の試験片をポ
ストフラックスに浸漬して半田濡れ性試験器を用いて濡
れ時間を測定した。この試験結果は表2に示した。
Example A 1% solution containing 2- (1-methylpropyl) tosylimidazole as an active ingredient was placed in a 5 liter container and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5
cm × 0.3 mm copper plate and 20 cm × 24 cm × 1.
A 6 mm through-hole substrate was degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and then a 1% solution containing 2- (1-methylpropyl) tosylimidazole as an active ingredient was prepared. It was immersed for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. Put in a hot air dryer, 200 ℃
Was heated for 10 minutes, immersed in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 2.

【0018】[0018]

【実施例】2−(2−メチルプロピル)トシルイミダゾ
ールを有効成分とする1%溶液を5リットル容器に入
れ、液温を40℃に加熱し調整した。他方、1cm×5
cm×0.3mmの銅板及び20cm×24cm×1.
6mmのスルーホール基板を脱脂、水洗、ソフトエッチ
ング、水洗、酸洗、水洗し表面を洗浄し試験片を準備
し、上記2−(2−メチルプロピル)トシルイミダゾー
ルを有効成分とする1%溶液に60秒間浸漬した。その
後水洗し次いで熱風乾燥機に入れ、120℃で5分加熱
した後、熱風乾燥機に入れ200℃で10分間加熱し
て測定前にポストフラックスを刷毛塗りしてスルーホー
ルの半田上りを測定した。熱風乾燥機に入れ200℃
で10分間加熱して測定前にポストフラックスに浸漬し
半田濡れ性試験器を用いて濡れ時間を測定した。対湿
(90%RH/40℃/96hr)処理後の試験片をポ
ストフラックスに浸漬して半田濡れ性試験器を用いて濡
れ時間を測定した。この試験結果は表3に示した。
Example A 1% solution containing 2- (2-methylpropyl) tosylimidazole as an active ingredient was placed in a 5 liter container and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5
cm × 0.3 mm copper plate and 20 cm × 24 cm × 1.
A 6 mm through-hole substrate is degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and then a 1% solution containing 2- (2-methylpropyl) tosylimidazole as an active ingredient is prepared. It was immersed for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. Put in a hot air dryer, 200 ℃
Was heated for 10 minutes, immersed in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 3.

【0020】[0020]

【実施例】2−(1−メチルブチル)トシルイミダゾー
ルを有効成分とする1%溶液を5リットル容器に入れ、
液温を40℃に加熱し調整した。他方、1cm×5cm
×0.3mmの銅板及び20cm×24cm×1.6m
mのスルーホール基板を脱脂、水洗、ソフトエッチン
グ、水洗、酸洗、水洗し表面を洗浄し試験片を準備し、
上記2−(1−メチルブチル)トシルイミダゾールを有
効成分とする1%溶液に60秒間浸漬した。その後水洗
し次いで熱風乾燥機に入れ、120℃で5分加熱した
後、熱風乾燥機に入れ200℃で10分間加熱して測
定前にポストフラックスを刷毛塗りしてスルーホールの
半田上りを測定した。熱風乾燥機に入れ200℃で1
0分間加熱して測定前にポストフラックスに浸漬し半田
濡れ性試験器を用いて濡れ時間を測定した。対湿(9
0%RH/40℃/96hr)処理後の試験片をポスト
フラックスに浸漬して半田濡れ性試験器を用いて濡れ時
間を測定した。この試験結果は表3に示した。
EXAMPLE A 1% solution containing 2- (1-methylbutyl) tosylimidazole as an active ingredient was placed in a 5 liter container,
The liquid temperature was adjusted to 40 ° C. by heating. On the other hand, 1 cm x 5 cm
× 0.3mm copper plate and 20cm × 24cm × 1.6m
Prepare the test piece by degreasing, washing with water, soft etching, washing with water, pickling, washing with water on the through-hole substrate of m.
It was immersed in a 1% solution containing 2- (1-methylbutyl) tosylimidazole as an active ingredient for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. Put in a hot air dryer at 200 ° C for 1
It was heated for 0 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (9
The test piece after the treatment of 0% RH / 40 ° C./96 hr) was dipped in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 3.

【0021】[0021]

【実施例】2−(1−エチルプロピル)トシルイミダゾ
ールを有効成分とする1%溶液を5リットル容器に入
れ、液温を40℃に加熱し調整した。他方、1cm×5
cm×0.3mmの銅板及び20cm×24cm×1.
6mmのスルーホール基板を脱脂、水洗、ソフトエッチ
ング、水洗、酸洗、水洗し表面を洗浄し試験片を準備
し、上記2−(1−エチルプロピル)トシルイミダゾー
ルを有効成分とする1%溶液に60秒間浸漬した。その
後水洗し次いで熱風乾燥機に入れ、120℃で5分加熱
した後、熱風乾燥機に入れ200℃で10分間加熱し
て測定前にポストフラックスを刷毛塗りしてスルーホー
ルの半田上りを測定した。熱風乾燥機に入れ200℃
で10分間加熱して測定前にポストフラックスに浸漬し
半田濡れ性試験器を用いて濡れ時間を測定した。対湿
(90%RH/40℃/96hr)処理後の試験片をポ
ストフラックスに浸漬して半田濡れ性試験器を用いて濡
れ時間を測定した。この試験結果は表3に示した。
Example A 1% solution containing 2- (1-ethylpropyl) tosylimidazole as an active ingredient was placed in a 5 liter container and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5
cm × 0.3 mm copper plate and 20 cm × 24 cm × 1.
A 6 mm through-hole substrate is degreased, washed with water, soft-etched, washed with water, pickled, and washed with water to prepare a test piece, and a 1% solution containing 2- (1-ethylpropyl) tosylimidazole as an active ingredient is prepared. It was immersed for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. Put in a hot air dryer, 200 ℃
Was heated for 10 minutes, immersed in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 3.

【0022】[0022]

【実施例】2−(2−メチルブチル)トシルイミダゾー
ルを有効成分とする1%溶液を5リットル容器に入れ、
液温を40℃に加熱し調整した。他方、1cm×5cm
×0.3mmの銅板及び20cm×24cm×1.6m
mのスルーホール基板を脱脂、水洗、ソフトエッチン
グ、水洗、酸洗、水洗し表面を洗浄し試験片を準備し、
上記2−(2−メチルブチル)トシルイミダゾールを有
効成分とする1%溶液に60秒間浸漬した。その後水洗
し次いで熱風乾燥機に入れ、120℃で5分加熱した
後、熱風乾燥機に入れ200℃で10分間加熱して測
定前にポストフラックスを刷毛塗りしてスルーホールの
半田上りを測定した。熱風乾燥機に入れ200℃で1
0分間加熱して測定前にポストフラックスに浸漬し半田
濡れ性試験器を用いて濡れ時間を測定した。対湿(9
0%RH/40℃/96hr)処理後の試験片をポスト
フラックスに浸漬して半田濡れ性試験器を用いて濡れ時
間を測定した。この試験結果は表3に示した。
EXAMPLE A 1% solution containing 2- (2-methylbutyl) tosylimidazole as an active ingredient was placed in a 5 liter container,
The liquid temperature was adjusted to 40 ° C. by heating. On the other hand, 1 cm x 5 cm
× 0.3mm copper plate and 20cm × 24cm × 1.6m
Prepare the test piece by degreasing, washing with water, soft etching, washing with water, pickling, washing with water on the through-hole substrate of m.
It was immersed for 60 seconds in a 1% solution containing 2- (2-methylbutyl) tosylimidazole as an active ingredient. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. Put in a hot air dryer at 200 ° C for 1
It was heated for 0 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (9
The test piece after the treatment of 0% RH / 40 ° C./96 hr) was dipped in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 3.

【0023】[0023]

【実施例】2−(1−メチルペンチル)トシルイミダゾ
ールを有効成分とする1%溶液を5リットル容器に入
れ、液温を40℃に加熱し調整した。他方、1cm×5
cm×0.3mmの銅板及び20cm×24cm×1.
6mmのスルーホール基板を脱脂、水洗、ソフトエッチ
ング、水洗、酸洗、水洗し表面を洗浄し試験片を準備
し、上記2−(1−メチルペンチル)トシルイミダゾー
ルを有効成分とする1%溶液に60秒間浸漬した。その
後水洗し次いで熱風乾燥機に入れ、120℃で5分加熱
した後、熱風乾燥機に入れ200℃で10分間加熱し
て測定前にポストフラックスを刷毛塗りしてスルーホー
ルの半田上りを測定した。熱風乾燥機に入れ200℃
で10分間加熱して測定前にポストフラックスに浸漬し
半田濡れ性試験器を用いて濡れ時間を測定した。対湿
(90%RH/40℃/96hr)処理後の試験片をポ
ストフラックスに浸漬して半田濡れ性試験器を用いて濡
れ時間を測定した。この試験結果は表3に示した。
Example A 1% solution containing 2- (1-methylpentyl) tosylimidazole as an active ingredient was placed in a 5 liter container and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5
cm × 0.3 mm copper plate and 20 cm × 24 cm × 1.
A 6 mm through-hole substrate was degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and prepared into a 1% solution containing 2- (1-methylpentyl) tosylimidazole as an active ingredient. It was immersed for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. Put in a hot air dryer, 200 ℃
Was heated for 10 minutes, immersed in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 3.

【0024】[0024]

【実施例】2−(1−プロピルブチル)トシルイミダゾ
ールを有効成分とする1%溶液を5リットル容器に入
れ、液温を40℃に加熱し調整した。他方、1cm×5
cm×0.3mmの銅板及び20cm×24cm×1.
6mmのスルーホール基板を脱脂、水洗、ソフトエッチ
ング、水洗、酸洗、水洗し表面を洗浄し試験片を準備
し、上記2−(1−プロピルブチル)トシルイミダゾー
ルを有効成分とする1%溶液に60秒間浸漬した。その
後水洗し次いで熱風乾燥機に入れ、120℃で5分加熱
した後、熱風乾燥機に入れ200℃で10分間加熱し
て測定前にポストフラックスを刷毛塗りしてスルーホー
ルの半田上りを測定した。熱風乾燥機に入れ200℃
で10分間加熱して測定前にポストフラックスに浸漬し
半田濡れ性試験器を用いて濡れ時間を測定した。対湿
(90%RH/40℃/96hr)処理後の試験片をポ
ストフラックスに浸漬して半田濡れ性試験器を用いて濡
れ時間を測定した。この試験結果は表4に示した。
Example A 1% solution containing 2- (1-propylbutyl) tosylimidazole as an active ingredient was placed in a 5 liter container and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5
cm × 0.3 mm copper plate and 20 cm × 24 cm × 1.
A 6 mm through-hole substrate is degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and then a 1% solution containing 2- (1-propylbutyl) tosylimidazole as an active ingredient is prepared. It was immersed for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. Put in a hot air dryer, 200 ℃
Was heated for 10 minutes, immersed in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 4.

【0025】[0025]

【実施例】2−(2−メチル−4,4−ジメチルペンチ
ル)トシルイミダゾールを有効成分とする1%溶液を5
リットル容器に入れ、液温を40℃に加熱し調整した。
他方、1cm×5cm×0.3mmの銅板及び20cm
×24cm×1.6mmのスルーホール基板を脱脂、水
洗、ソフトエッチング、水洗、酸洗、水洗し表面を洗浄
し試験片を準備し、上記2−(2−メチル−4,4−ジ
メチルペンチル)トシルイミダゾールを有効成分とする
1%溶液に60秒間浸漬した。その後水洗し次いで熱風
乾燥機に入れ、120℃で5分加熱した後、熱風乾燥
機に入れ200℃で10分間加熱して測定前にポストフ
ラックスを刷毛塗りしてスルーホールの半田上りを測定
した。熱風乾燥機に入れ200℃で10分間加熱して
測定前にポストフラックスに浸漬し半田濡れ性試験器を
用いて濡れ時間を測定した。対湿(90%RH/40
℃/96hr)処理後の試験片をポストフラックスに浸
漬して半田濡れ性試験器を用いて濡れ時間を測定した。
この試験結果は表4に示した。
EXAMPLE A 1% solution containing 2- (2-methyl-4,4-dimethylpentyl) tosylimidazole as an active ingredient was added 5 times.
It was put in a liter container, and the liquid temperature was adjusted to 40 ° C. by heating.
On the other hand, 1 cm x 5 cm x 0.3 mm copper plate and 20 cm
The test piece was prepared by degreasing, washing with water, soft etching, washing with water, pickling, washing the surface of a through-hole substrate of × 24 cm × 1.6 mm, and preparing the above-mentioned 2- (2-methyl-4,4-dimethylpentyl). It was immersed for 60 seconds in a 1% solution containing tosylimidazole as an active ingredient. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40
(° C / 96 hr) The test piece after the treatment was immersed in post flux and the wetting time was measured using a solder wettability tester.
The test results are shown in Table 4.

【0026】[0026]

【実施例】2−(1−ヘキシルノニル)トシルイミダゾ
ールを有効成分とする1%溶液を5リットル容器に入
れ、液温を40℃に加熱し調整した。他方、1cm×5
cm×0.3mmの銅板及び20cm×24cm×1.
6mmのスルーホール基板を脱脂、水洗、ソフトエッチ
ング、水洗、酸洗、水洗し表面を洗浄し試験片を準備
し、上記2−(1−ヘキシルノニル)トシルイミダゾー
ルを有効成分とする1%溶液に60秒間浸漬した。その
後水洗し次いで熱風乾燥機に入れ、120℃で5分加熱
した後、熱風乾燥機に入れ200℃で10分間加熱し
て測定前にポストフラックスを刷毛塗りしてスルーホー
ルの半田上りを測定した。熱風乾燥機に入れ200℃
で10分間加熱して測定前にポストフラックスに浸漬し
半田濡れ性試験器を用いて濡れ時間を測定した。対湿
(90%RH/40℃/96hr)処理後の試験片をポ
ストフラックスに浸漬して半田濡れ性試験器を用いて濡
れ時間を測定した。この試験結果は表4に示した。
EXAMPLE A 1% solution containing 2- (1-hexylnonyl) tosylimidazole as an active ingredient was placed in a 5 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5
cm × 0.3 mm copper plate and 20 cm × 24 cm × 1.
A 6 mm through-hole substrate is degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and then a 1% solution containing 2- (1-hexylnonyl) tosylimidazole as an active ingredient is prepared. It was immersed for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. Put in a hot air dryer, 200 ℃
Was heated for 10 minutes, immersed in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 4.

【0027】[0027]

【実施例】2−(1−ヘプチルデシル)トシルイミダゾ
ールを有効成分とする1%溶液を5リットル容器に入
れ、液温を40℃に加熱し調整した。他方、1cm×5
cm×0.3mmの銅板及び20cm×24cm×1.
6mmのスルーホール基板を脱脂、水洗、ソフトエッチ
ング、水洗、酸洗、水洗し表面を洗浄し試験片を準備
し、上記2−(1−ヘプチルデシル)トシルイミダゾー
ルを有効成分とする1%溶液に60秒間浸漬した。その
後水洗し次いで熱風乾燥機に入れ、120℃で5分加熱
した後、熱風乾燥機に入れ200℃で10分間加熱し
て測定前にポストフラックスを刷毛塗りしてスルーホー
ルの半田上りを測定した。熱風乾燥機に入れ200℃
で10分間加熱して測定前にポストフラックスに浸漬し
半田濡れ性試験器を用いて濡れ時間を測定した。対湿
(90%RH/40℃/96hr)処理後の試験片をポ
ストフラックスに浸漬して半田濡れ性試験器を用いて濡
れ時間を測定した。この試験結果は表4に示した。
[Example] A 1% solution containing 2- (1-heptyldecyl) tosylimidazole as an active ingredient was placed in a 5 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5
cm × 0.3 mm copper plate and 20 cm × 24 cm × 1.
A 6 mm through-hole substrate is degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and 60% is added to a 1% solution containing 2- (1-heptyldecyl) tosylimidazole as an active ingredient. Soaked for 2 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. Put in a hot air dryer, 200 ℃
Was heated for 10 minutes, immersed in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 4.

【0028】[0028]

【実施例】2−(1−エチルプロピル)キシリルイミダ
ゾールを有効成分とする1%溶液を5リットル容器に入
れ、液温を40℃に加熱し調整した。他方、1cm×5
cm×0.3mmの銅板及び20cm×24cm×1.
6mmのスルーホール基板を脱脂、水洗、ソフトエッチ
ング、水洗、酸洗、水洗し表面を洗浄し試験片を準備
し、上記2−(1−エチルプロピル)キシリルイミダゾ
ールを有効成分とする1%溶液に60秒間浸漬した。そ
の後水洗し次いで熱風乾燥機に入れ、120℃で5分加
熱した後、熱風乾燥機に入れ200℃で10分間加熱
して測定前にポストフラックスを刷毛塗りしてスルーホ
ールの半田上りを測定した。熱風乾燥機に入れ200
℃で10分間加熱して測定前にポストフラックスに浸漬
し半田濡れ性試験器を用いて濡れ時間を測定した。対
湿(90%RH/40℃/96hr)処理後の試験片を
ポストフラックスに浸漬して半田濡れ性試験器を用いて
濡れ時間を測定した。この試験結果は表4に示した。
Example A 1% solution containing 2- (1-ethylpropyl) xylylimidazole as an active ingredient was placed in a 5 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5
cm × 0.3 mm copper plate and 20 cm × 24 cm × 1.
A 6 mm through-hole substrate is degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and a 1% solution containing the above 2- (1-ethylpropyl) xylylimidazole as an active ingredient. Was soaked for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. Put in hot air dryer 200
It was heated at 0 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 4.

【0029】[0029]

【実施例】2−(1−プロピルブチル)キシリルイミダ
ゾールを有効成分とする1%溶液を5リットル容器に入
れ、液温を40℃に加熱し調整した。他方、1cm×5
cm×0.3mmの銅板及び20cm×24cm×1.
6mmのスルーホール基板を脱脂、水洗、ソフトエッチ
ング、水洗、酸洗、水洗し表面を洗浄し試験片を準備
し、上記2−(1−プロピルブチル)キシリルイミダゾ
ールを有効成分とする1%溶液に60秒間浸漬した。そ
の後水洗し次いで熱風乾燥機に入れ、120℃で5分加
熱した後、熱風乾燥機に入れ200℃で10分間加熱
して測定前にポストフラックスを刷毛塗りしてスルーホ
ールの半田上りを測定した。熱風乾燥機に入れ200
℃で10分間加熱して測定前にポストフラックスに浸漬
し半田濡れ性試験器を用いて濡れ時間を測定した。対
湿(90%RH/40℃/96hr)処理後の試験片を
ポストフラックスに浸漬して半田濡れ性試験器を用いて
濡れ時間を測定した。この試験結果は表4に示した。
Example A 1% solution containing 2- (1-propylbutyl) xylylimidazole as an active ingredient was placed in a 5 liter container and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5
cm × 0.3 mm copper plate and 20 cm × 24 cm × 1.
A 6 mm through-hole substrate was degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and a 1% solution containing the above 2- (1-propylbutyl) xylylimidazole as an active ingredient. Was soaked for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. Put in hot air dryer 200
It was heated at 0 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 4.

【0030】[0030]

【発明の効果】本発明のプレフラックスを、銅又は銅合
金の表面に形成させた被膜は耐熱性に優れ、高温下に曝
された後でもクリーム半田の広がり、濡れ性が良好又リ
フロー半田の半田上がり率、濡れ性も良好という効果
で、且つ、作業環境、安全性の面からもプリント配線板
に電子部品を表面実装するのに、特に顕著な効果を発揮
しうるものである。
The pre-flux of the present invention has a coating film formed on the surface of copper or a copper alloy, which has excellent heat resistance, spreads cream solder well even after being exposed to high temperature, has good wettability, and has excellent reflow solderability. This is particularly effective in terms of good solderability and wettability, and in terms of working environment and safety, in surface mounting electronic components on a printed wiring board.

【表1】 [Table 1]

【表2】 [Table 2]

【表3】 [Table 3]

【表4】 [Table 4]

─────────────────────────────────────────────────────
─────────────────────────────────────────────────── ───

【手続補正書】[Procedure amendment]

【提出日】平成4年9月22日[Submission date] September 22, 1992

【手続補正1】[Procedure Amendment 1]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】全文[Name of item to be corrected] Full text

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【書類名】 明細書[Document name] Statement

【発明の名称】 金属の表面処理方法Title: Method for surface treatment of metal

【特許請求の範囲】[Claims]

【化1】 [Chemical 1]

【化2】 [Chemical 2]

【化3】 [Chemical 3]

【化4】 [Chemical 4]

【化5】 [Chemical 5]

【化6】 [Chemical 6]

【化7】 [Chemical 7]

【化8】 [Chemical 8]

【化9】 [Chemical 9]

【化10】 [Chemical 10]

【化11】 [Chemical 11]

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、金属の防錆処理に関
するものであり、プリント配線板の金属の露出部を防錆
し、半田付け性を向上させる耐熱プリフラックスとして
好適なものである。又、はんだ、無電解はんだ、ニッケ
ル金、銀、亜鉛等の防錆、コネクターのピンホール、無
電解はんだ等に潤滑性を有した封孔処理剤としても好適
なものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a metal rust preventive treatment, and is suitable as a heat-resistant preflux for preventing a metal exposed portion of a printed wiring board from rusting and improving solderability. Also, solder, electroless solder, nickel
Rust prevention of gold, silver, zinc, etc., connector pinholes, no
Also suitable as a sealing agent with lubricity for electrolytic solder, etc.
It is something.

【0002】[0002]

【従来の技術】従来、プリント配線板の銅又は銅合金か
らなる回路部を防錆し、半田付け性を保持する目的で使
用されているプリフラックスは、大別してプリント配線
板全体をコーティングするロジン系プリフラックスと、
選択的に銅又は銅合金と化学反応させるアルキルイミダ
ゾール系プリフラックスの2種類がある。前者は天然ロ
ジン、ロジンエステル、ロジン変成マレイン酸樹脂等
を、有機溶剤に溶解させたものをロールコターで塗布す
るか、噴霧又は浸漬によってプリント配線板全体に塗布
し、乾燥して被膜を形成する方法で用いられる。このた
め有機溶剤の揮散によって作業環境及び安全性が著しく
損われる欠点がある。又、ロジン系プリフラックスは揮
発性溶剤を使用しているため作業時引火の危険が伴うと
いう欠点も有している。他方、アルキルイミダゾール系
プリフラックスは水溶性であり、作業環境の面でも安全
性の面でも優れているが、化学反応したアルキルイミダ
ゾール銅錯体が高温に曝されると空気中の酸素と銅の触
媒作用で変質してポストフラックスの作用を阻害して、
半田付け性を悪くするという欠点を有している。
2. Description of the Related Art Preflux, which has been conventionally used for the purpose of preventing corrosion of a circuit portion made of copper or a copper alloy of a printed wiring board and maintaining solderability, is roughly classified into a rosin that coats the entire printed wiring board. System preflux,
There are two types of alkylimidazole-based preflux that selectively chemically react with copper or a copper alloy. The former is a method in which a natural rosin, a rosin ester, a rosin-modified maleic acid resin, etc. dissolved in an organic solvent is applied by a roll coater, or by spraying or dipping it on the entire printed wiring board and then drying to form a film. Used in. Therefore, there is a drawback that the working environment and safety are significantly impaired by the volatilization of the organic solvent. In addition, since rosin-based preflux uses a volatile solvent, it also has a drawback that there is a danger of ignition during work. On the other hand, the alkyl imidazole pre-flux is water-soluble and is excellent in terms of working environment and safety, but when the chemically reacted alkyl imidazole copper complex is exposed to high temperature, it is a catalyst of oxygen and copper in the air. It deteriorates by the action and inhibits the action of postflux,
It has the drawback of deteriorating the solderability.

【0003】[0003]

【発明が解決しようとする課題】近年プリント配線板に
電子部品を半田付けする方法として表面実装法が多く採
用されている。この表面実装法、電子部品の仮止めクリ
ーム半田のリフロー等、プリント配線板が高温に曝され
る機会が多くなり、プリント配線板の半田付け性を保持
するために用いられるプレフラックスの耐熱性、即ちプ
リント配線板が高温に曝された後での半田付け性が優れ
ていることがプリフラックスの性能に要求されるように
なった。又、大気汚染等に問題を有する揮発性溶剤を使
用せず、且つ高温に曝された後でも半田付け性の優れた
プリフラックスの開発が切望されている。
Recently, a surface mounting method has been widely adopted as a method for soldering an electronic component to a printed wiring board. The surface mounting method, the reflow of solder paste solder for electronic components, the printed wiring board is often exposed to high temperatures, and the heat resistance of the pre-flux used to maintain the solderability of the printed wiring board, That is, the pre-flux performance is required to have excellent solderability after the printed wiring board is exposed to high temperature. Further, development of a preflux which does not use a volatile solvent having a problem in air pollution and has excellent solderability even after being exposed to a high temperature has been earnestly desired.

【0004】[0004]

【課題を解決するための手段】本発明者らは、このよう
な事情に鑑み、揮発性溶剤を使用せず且つ高温に曝され
た後でも半田付け性の良いプリフラックスに関して鋭意
検討を重ねた結果、酢酸、ヨード酢酸、ブロム酢酸、パ
ラニトロ安息香酸、パラトルエンスルホン酸、ピクリン
酸、蓚酸、蟻酸、コハク酸、亜りん酸、マレイン酸、ア
クリル酸、フマール酸、酒石酸、アジピン酸、乳酸、オ
レイン酸等の有機酸、塩酸、硫酸、燐酸等の無機酸、又
は酢酸亜鉛、酢酸鉛、水酸化亜鉛、水酸化鉛、化亜
鉛、リン酸亜鉛、酸化亜鉛、塩化亜鉛、塩化第一鉄、塩
化第二鉄、臭化第一銅、臭化第二銅、よう化第一銅、蟻
酸銅、塩化ニッケル、塩化第一銅、塩化第二銅、酸化第
一銅、酸化第二銅、水酸化銅、リン酸銅、炭酸銅、酢酸
銅、硫酸銅等の金属化合物を含む溶液、又はメタノー
ル、エタノール、イソプロピルアルコール、ブタノー
ル、アセトン等の水溶性溶媒、のいずれかの群から選ば
れた少なくとも一つの液と、有効成分として(化1)〜
(化11)で表わされる化合物を1種類又は2種類以上
を混合した溶液を金属表面処理剤として用いる場合に
は、上述した従来の問題点を解決し所期の目的を達成出
来ることを見出し、本発明を完成するに至ったものであ
る。(化1)〜(化11)で表わされる化合物を可溶化
あるいは乳化させるために用いられる上記した有機酸等
は、有機酸、有機酸の塩、あるいはアルコール等の水溶
性溶媒を夫々単独に用いることができる他、任意の割合
で混合して使用することも可能である。例えば上記水溶
性溶媒は単独で用いられる他有機酸等と併用することも
でき、特に有機酸等単独では、(化1)〜(化11)で
表される化合物あるいはその誘導体の溶解が困難となる
場合には、水溶性溶媒を含有させることが好ましく、こ
の場合の含有率は0.01〜50%とすることが適当で
ある場合が多い。上記各溶媒により溶解して得られた溶
液は、上記有効成分を0・01〜20%、好ましくは0
・5〜5%含有した可溶化溶液あるいは、乳化溶液に浸
漬処理する方法が一般的であり、浸漬は0〜100℃の
温度範囲で浸漬時間は数秒〜数十分の処理が適当であ
る。又化成被膜形成後、錯体形成処理赤外線・近赤外
線・遠赤外線・紫外線照射処理を0〜300℃の温度範
囲で、処理時間数秒〜数十分の処理が適当である。オ
ゾンOに数秒〜数十分の暴露処理が適当である。過
酸化水素水1〜20%の濃度範囲で数秒〜数十分の浸
漬、噴霧の薬液処理が適当である。〜の処理を行な
うことにより耐熱性に優れた化成被膜が出来る。本発明
の金属表面処理剤の有効成分としては、(化1)〜(化
11)が好適なものとして例示される。本発明の表面処
理剤を金属表面又は、プリント配線板の表面に塗布する
には、浸漬、噴霧による方法を用いる。
In view of such circumstances, the present inventors have made earnest studies on a preflux which does not use a volatile solvent and has good solderability even after being exposed to a high temperature. Results acetic acid, iodoacetic acid, bromacetic acid, paranitrobenzoic acid, paratoluenesulfonic acid, picric acid, oxalic acid, formic acid, succinic acid, phosphorous acid, maleic acid, acrylic acid, fumaric acid, tartaric acid, adipic acid, lactic acid, olein organic acids such as acids, hydrochloric, sulfuric, inorganic acids phosphoric, etc., or zinc acetate, lead acetate, zinc hydroxide, lead hydroxide, bromide, zinc phosphate, zinc oxide, zinc chloride, ferrous chloride, Ferric chloride, cuprous bromide, cupric bromide, cuprous iodide, ants
Copper acid , nickel chloride, cuprous chloride, cupric chloride, cuprous oxide, cupric oxide, copper hydroxide, copper phosphate, copper carbonate, copper acetate, a solution containing a metal compound such as copper sulfate, Or at least one liquid selected from the group consisting of water-soluble solvents such as methanol, ethanol, isopropyl alcohol, butanol, and acetone, and (Chemical formula 1) to
When a solution prepared by mixing one kind or two or more kinds of the compounds represented by (Chemical Formula 11) is used as a metal surface treating agent, it was found that the above-mentioned conventional problems can be solved and a desired object can be achieved, The present invention has been completed. As the above-mentioned organic acid or the like used for solubilizing or emulsifying the compounds represented by (Chemical Formula 1) to (Chemical Formula 11), an organic acid, a salt of an organic acid, or a water-soluble solvent such as alcohol is used alone. In addition to the above, it is also possible to mix and use them at an arbitrary ratio. For example, the water-soluble solvent may be used alone or in combination with other organic acids, etc. In particular, the organic acid alone may make it difficult to dissolve the compounds represented by (Chemical Formula 1) to (Chemical Formula 11) or their derivatives. In this case, it is preferable to add a water-soluble solvent, and in this case, it is often appropriate that the content rate is 0.01 to 50%. The solution obtained by dissolving with each of the above-mentioned solvents contains 0.01 to 20%, preferably 0 to 20% of the above-mentioned active ingredient.
A general method is to immerse in a solubilizing solution containing 5 to 5% or an emulsifying solution. Immersion is suitably performed in a temperature range of 0 to 100 ° C. for an immersion time of several seconds to several tens of minutes. Further, after the formation of the chemical conversion film, it is suitable to carry out a complex forming infrared ray / near infrared ray / far infrared ray / ultraviolet ray irradiation treatment in the temperature range of 0 to 300 ° C. for a treatment time of several seconds to several tens of minutes. Exposure treatment of ozone O 3 for several seconds to several tens of minutes is appropriate. It is suitable to carry out chemical treatment such as immersion and spraying for several seconds to several tens of minutes in a concentration range of hydrogen peroxide water of 1 to 20%. By performing the treatments 1 to 3, a chemical conversion coating having excellent heat resistance can be obtained. As the active ingredient of the metal surface treating agent of the present invention, (Chemical formula 1) to (Chemical formula 11) are exemplified as preferable ones. To apply the surface treatment agent of the present invention to a metal surface or the surface of a printed wiring board, a method of dipping or spraying is used.

【0005】[0005]

【作用】上記したプリフラックスの処理方法によれば、
耐熱性に優れた防錆被膜ができクリーム半田の広がり
性、濡れ性及びリフロー後の半田上がり率、濡れ性が良
好で、且つ作業環境、安全性の面からも優れたプリント
配線板の製造ができる。
According to the above method of treating preflux,
A rust preventive coating with excellent heat resistance can be formed, and the spreadability of cream solder, wettability, and the rate of solder rise after reflow, wettability are good, and the production of printed wiring boards is also excellent in terms of work environment and safety. it can.

【0006】[0006]

【実施例】2−(1−メチルプロピル)ベンズイミダゾ
ール1%、蟻酸、アンモニア、塩化第二銅を含む溶液を
5リットル容器に入れ、液温を40°Cに加熱し調整し
た。他方、1cm×5cm×0.3mmの銅板及び20
cm×24cm×1.6mmのスルーホール基板を脱
脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表面
を洗浄した試料片を準備し、上記2−(1−メチルプロ
ピル)ベンズイミダゾールを有効成分とする1%溶液に
60秒間浸漬した。その後水洗し次いで熱風乾燥機に入
れ、120℃で5分加熱した後、熱風乾燥機に入れ2
00℃で10分間加熱して測定前にポストフラックスを
刷毛塗りしてスルーホールの半田上りを測定した。熱
風乾燥機に入れ200℃で10分間加熱して測定前にポ
ストフラックスに浸漬し半田濡れ性試験器を用いて濡れ
時間を測定した。耐湿(90%RH/40℃/96h
r)処理後の試験片をポストフラックスに浸漬して半田
濡れ性試験機を用いて濡れ時間を測定した。この試験結
果は表1に示した。
Example A solution containing 1% of 2- (1-methylpropyl) benzimidazole , formic acid, ammonia and cupric chloride was placed in a 5 liter container and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5 cm x 0.3 mm copper plate and 20
cm × 24 cm × 1.6 mm through-hole substrate was degreased, washed with water, soft etching, washed with water, pickled, washed with water to prepare a sample piece, and the above-mentioned 2- (1-methylpropyl) benzimidazole was used as an active ingredient. It was immersed in a 1% solution for 60 seconds. Then, rinse with water, put in a hot air dryer, heat at 120 ° C for 5 minutes, and put in a hot air dryer. 2
It was heated at 00 ° C. for 10 minutes and brushed with post flux before the measurement to measure the solder rise of the through hole. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Moisture resistance (90% RH / 40 ° C / 96h
r) The treated test piece was dipped in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 1.

【表1】 [Table 1]

【0007】[0007]

【実施例】2−(2−メチルプロピル)ベンズイミダゾ
ール1%、蟻酸、アンモニア、塩化第二銅を含む溶液を
5リットル容器に入れ、液温を40℃に加熱し調整し
た。他方、1cm×5cm×0.3mmの銅板及び20
cm×24cm×1.6mmのスルーホール基板を脱
脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表面
を洗浄し試験片を準備し、上記2−(2−メチルプロピ
ル)ベンズイミダゾールを有効成分とする1%溶液に6
0秒間浸漬した。その後水洗し次いで熱風乾燥機に入
れ、120℃で5分加熱した後、熱風乾燥機に入れ2
00℃で10分間加熱して測定前にポストフラックスを
刷毛塗りしてスルーホールの半田上りを測定した。熱
風乾燥機に入れ200℃で10分間加熱して測定前にポ
ストフラックスに浸漬し半田濡れ性試験器を用いて濡れ
時間を測定した。耐湿(90%RH/40℃/96h
r)処理後の試験片をポストフラックスに浸漬して半田
濡れ性試験器を用いて濡れ時間を測定した。この試験結
果は表2に示した。
Example A solution containing 1% of 2- (2-methylpropyl) benzimidazole , formic acid, ammonia and cupric chloride was placed in a 5 liter container and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5 cm x 0.3 mm copper plate and 20
cm * 24 cm * 1.6 mm through-hole substrate is degreased, washed with water, soft etching, washed with water, pickled, washed with water to prepare a test piece and prepare the above-mentioned 2- (2-methylpropyl) benzimidazole as an active ingredient. 6 in 1% solution
It was immersed for 0 seconds. Then, rinse with water, put in a hot air dryer, heat at 120 ° C for 5 minutes, and put in a hot air dryer. 2
It was heated at 00 ° C. for 10 minutes and brushed with post flux before the measurement to measure the solder rise of the through hole. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Moisture resistance (90% RH / 40 ° C / 96h
r) The treated test piece was dipped in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 2 .

【表2】 [Table 2]

【0008】[0008]

【実施例】2−(1−メチルブチル)ベンズイミダゾー
1%、蟻酸、アンモニア、塩化第二銅を含む溶液を5
リットル容器に入れ、液温を40℃に加熱し調整した。
他方、1cm×5cm×0.3mmの銅板及び20cm
×24cm×1.6mmのスルーホール基板を脱脂、水
洗、ソフトエッチング、水洗、酸洗、水洗し表面を洗浄
し試験片を準備し、上記2−(1−メチルブチル)ベン
ズイミダゾールを有効成分とする1%溶液に60秒間浸
漬した。その後水洗し次いで熱風乾燥機に入れ、120
℃で5分加熱した後、熱風乾燥機に入れ200℃で1
0分間加熱して測定前にポストフラックスを刷毛塗りし
てスルーホールの半田上りを測定した。熱風乾燥機に
入れ200℃で10分間加熱して測定前にポストフラッ
クスに浸漬し半田濡れ性試験器を用いて濡れ時間を測定
した。対湿(90%RH/40℃/96hr)処理後
の試験片をポストフラックスに浸漬して半田濡れ性試験
器を用いて濡れ時間を測定した。この試験結果は表3
示した。
EXAMPLE A solution containing 1% of 2- (1-methylbutyl) benzimidazole , formic acid, ammonia and cupric chloride was added to 5 parts.
It was put in a liter container, and the liquid temperature was adjusted to 40 ° C. by heating.
On the other hand, 1 cm x 5 cm x 0.3 mm copper plate and 20 cm
A test piece is prepared by degreasing, washing with water, soft etching, washing with water, pickling and washing a through hole substrate of × 24 cm × 1.6 mm to prepare a test piece, and the above-mentioned 2- (1-methylbutyl) benzimidazole is used as an active ingredient. It was immersed in a 1% solution for 60 seconds. After that, rinse with water and put in a hot air drier for 120
After heating at ℃ for 5 minutes, put it in a hot air dryer at 200 ℃ for 1
After heating for 0 minutes, a post flux was brush-painted before the measurement to measure the solder rise of the through hole. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 3 .

【表3】 [Table 3]

【0009】[0009]

【実施例】2−(1−エチルプロピル)ベンズイミダゾ
ール1%、蟻酸、アンモニア、塩化第二銅を含む溶液を
5リットル容器に入れ、液温を40℃に加熱し調整し
た。他方、1cm×5cm×0.3mmの銅板及び20
cm×24cm×1.6mmのスルーホール基板を脱
脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表面
を洗浄し試験片を準備し、上記2−(1−エチルプロピ
ル)ベンズイミダゾールを有効成分とする1%溶液に6
0秒間浸漬した。その後水洗し次いで熱風乾燥機に入
れ、120℃で5分加熱した後、熱風乾燥機に入れ2
00℃で10分間加熱して測定前にポストフラックスを
刷毛塗りしてスルーホールの半田上りを測定した。熱
風乾燥機に入れ200℃で10分間加熱して測定前にポ
ストフラックスに浸漬し半田濡れ性試験器を用いて濡れ
時間を測定した。対湿(90%RH/40℃/96h
r)処理後の試験片をポストフラックスに浸漬して半田
濡れ性試験器を用いて濡れ時間を測定した。この試験結
果は表4に示した。
EXAMPLE A solution containing 1% of 2- (1-ethylpropyl) benzimidazole , formic acid, ammonia and cupric chloride was placed in a 5 liter container and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5 cm x 0.3 mm copper plate and 20
cm * 24cm * 1.6mm through-hole substrate is degreased, washed with water, soft etching, washed with water, pickled, washed with water to prepare a test piece and prepare the above-mentioned 2- (1-ethylpropyl) benzimidazole as an active ingredient. 6 in 1% solution
It was immersed for 0 seconds. Then, rinse with water, put in a hot air dryer, heat at 120 ° C for 5 minutes, and put in a hot air dryer. 2
It was heated at 00 ° C. for 10 minutes and brushed with post flux before the measurement to measure the solder rise of the through hole. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40 ° C / 96h
r) The treated test piece was dipped in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 4 .

【表4】 [Table 4]

【0010】[0010]

【実施例】2−(2−メチルブチル)ベンズイミダゾー
1%、蟻酸、アンモニア、塩化第二銅を含む溶液を5
リットル容器に入れ、液温を40℃に加熱し調整した。
他方、1cm×5cm×0.3mmの銅板及び20cm
×24cm×1.6mmのスルーホール基板を脱脂、水
洗、ソフトエッチング、水洗、酸洗、水洗し表面を洗浄
し試験片を準備し、上記2−(2−メチルブチル)ベン
ズイミダゾールを有効成分とする1%溶液に60秒間浸
漬した。その後水洗し次いで熱風乾燥機に入れ、120
℃で5分加熱した後、熱風乾燥機に入れ200℃で1
0分間加熱して測定前にポストフラックスを刷毛塗りし
てスルーホールの半田上りを測定した。熱風乾燥機に
入れ200℃で10分間加熱して測定前にポストフラッ
クスに浸漬し半田濡れ性試験器を用いて濡れ時間を測定
した。対湿(90%RH/40℃/96hr)処理後
の試験片をポストフラックスに浸漬して半田濡れ性試験
器を用いて濡れ時間を測定した。この試験結果は表5
示した。
EXAMPLE A solution containing 1% of 2- (2-methylbutyl) benzimidazole , formic acid, ammonia and cupric chloride was added to 5 parts.
It was put in a liter container, and the liquid temperature was adjusted to 40 ° C. by heating.
On the other hand, 1 cm x 5 cm x 0.3 mm copper plate and 20 cm
A test piece is prepared by degreasing, washing with water, soft etching, washing with water, pickling, washing with water on a through hole substrate of × 24 cm × 1.6 mm, and the above-mentioned 2- (2-methylbutyl) benzimidazole is used as an active ingredient. It was immersed in a 1% solution for 60 seconds. Then rinse with water and put in a hot air dryer to
After heating at ℃ for 5 minutes, put it in a hot air dryer at 200 ℃ for 1
After heating for 0 minutes, a post flux was brush-painted before the measurement to measure the solder rise of the through hole. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 5 .

【表5】 [Table 5]

【0011】[0011]

【実施例】2−(1−メチルペンチル)ベンズイミダゾ
ール1%、蟻酸、アンモニア、塩化第二銅を含む溶液を
5リットル容器に入れ、液温を40℃に加熱し調整し
た。他方、1cm×5cm×0.3mmの銅板及び20
cm×24cm×1.6mmのスルーホール基板を脱
脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表面
を洗浄し試験片を準備し、上記2−(1−メチルペンチ
ル)ベンズイミダゾールを有効成分とする1%溶液に6
0秒間浸漬した。その後水洗し次いで熱風乾燥機に入
れ、120℃で5分加熱した後、熱風乾燥機に入れ2
00℃で10分間加熱して測定前にポストフラックスを
刷毛塗りしてスルーホールの半田上りを測定した。熱
風乾燥機に入れ200℃で10分間加熱して測定前にポ
ストフラックスに浸漬し半田濡れ性試験器を用いて濡れ
時間を測定した。対湿(90%RH/40℃/96h
r)処理後の試験片をポストフラックスに浸漬して半田
濡れ性試験器を用いて濡れ時間を測定した。この試験結
果は表6に示した。
EXAMPLE A solution containing 1% of 2- (1-methylpentyl) benzimidazole , formic acid, ammonia and cupric chloride was placed in a 5 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5 cm x 0.3 mm copper plate and 20
cm * 24 cm * 1.6 mm through-hole substrate is degreased, washed with water, soft etching, washed with water, pickled, washed with water to prepare a test piece, and the 2- (1-methylpentyl) benzimidazole is used as an active ingredient. 6 in 1% solution
It was immersed for 0 seconds. Then, rinse with water, put in a hot air dryer, heat at 120 ° C for 5 minutes, and put in a hot air dryer. 2
It was heated at 00 ° C. for 10 minutes and brushed with post flux before the measurement to measure the solder rise of the through hole. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40 ° C / 96h
r) The treated test piece was dipped in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 6 .

【表6】 [Table 6]

【0012】[0012]

【実施例】2−(1−プロピルブチル)ベンズイミダゾ
ール1%、蟻酸、アンモニア、塩化第二銅を含む溶液を
5リットル容器に入れ、液温を40℃に加熱し調整し
た。他方、1cm×5cm×0.3mmの銅板及び20
cm×24cm×1.6mmのスルーホール基板を脱
脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表面
を洗浄し試験片を準備し、上記2−(1−プロピルブチ
ル)ベンズイミダゾールを有効成分とする1%溶液に6
0秒間浸漬した。その後水洗し次いで熱風乾燥機に入
れ、120℃で5分加熱した後、熱風乾燥機に入れ2
00℃で10分間加熱して測定前にポストフラックスを
刷毛塗りしてスルーホールの半田上りを測定した。熱
風乾燥機に入れ200℃で10分間加熱して測定前にポ
ストフラックスに浸漬し半田濡れ性試験器を用いて濡れ
時間を測定した。対湿(90%RH/40℃/96h
r)処理後の試験片をポストフラックスに浸漬して半田
濡れ性試験器を用いて濡れ時間を測定した。この試験結
果は表7に示した。
EXAMPLE A solution containing 1% of 2- (1-propylbutyl) benzimidazole , formic acid, ammonia and cupric chloride was placed in a 5 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5 cm x 0.3 mm copper plate and 20
cm * 24cm * 1.6mm through-hole substrate is degreased, washed with water, soft etching, washed with water, pickled, washed with water to prepare a test piece and prepare the above-mentioned 2- (1-propylbutyl) benzimidazole as an active ingredient. 6 in 1% solution
It was immersed for 0 seconds. Then, rinse with water, put in a hot air dryer, heat at 120 ° C for 5 minutes, and put in a hot air dryer. 2
It was heated at 00 ° C. for 10 minutes and brushed with post flux before the measurement to measure the solder rise of the through hole. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40 ° C / 96h
r) The treated test piece was dipped in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 7 .

【表7】 [Table 7]

【0013】[0013]

【実施例】2−(2−メチル−4,4−ジメチルペンチ
ル)ベンズイミダゾール1%、蟻酸、アンモニア、塩化
第二銅を含む溶液を5リットル容器に入れ、液温を40
℃に加熱し調整した。他方、1cm×5cm×0.3m
mの銅板及び20cm×24cm×1.6mmのスルー
ホール基板を脱脂、水洗、ソフトエッチング、水洗、酸
洗、水洗し表面を洗浄し試験片を準備し、上記2−(2
−メチル−4,4−ジメチルペンチル)ベンズイミダゾ
ールを有効成分とする1%溶液に60秒間浸漬した。そ
の後水洗し次いで熱風乾燥機に入れ、120℃で5分加
熱した後、熱風乾燥機に入れ200℃で10分間加熱
して測定前にポストフラックスを刷毛塗りしてスルーホ
ールの半田上りを測定した。熱風乾燥機に入れ200
℃で10分間加熱して測定前にポストフラックスに浸漬
し半田濡れ性試験器を用いて濡れ時間を測定した。対
湿(90%RH/40℃/96hr)処理後の試験片を
ポストフラックスに浸漬して半田濡れ性試験器を用いて
濡れ時間を測定した。この試験結果は表8に示した。
Examples 1-% 2- (2-methyl-4,4-dimethylpentyl) benzimidazole , formic acid, ammonia, chloride
Put the solution containing cupric acid in a 5 liter container and keep the liquid temperature at 40
The temperature was adjusted to 0 ° C. On the other hand, 1 cm x 5 cm x 0.3 m
The copper plate of m and the through-hole substrate of 20 cm × 24 cm × 1.6 mm are degreased, washed with water, soft etching, washed with water, pickled, washed with water to prepare the test piece, and the above-mentioned 2- (2
It was immersed for 60 seconds in a 1% solution containing -methyl-4,4-dimethylpentyl) benzimidazole as an active ingredient. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. Put in hot air dryer 200
It was heated at 0 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 8 .

【表8】 [Table 8]

【0014】[0014]

【実施例】2−(1−ヘキシルノニル)ベンズイミダゾ
ール1%、蟻酸、アンモニア、塩化第二銅を含む溶液を
5リットル容器に入れ、液温を40℃に加熱し調整し
た。他方、1cm×5cm×0.3mmの銅板及び20
cm×24cm×1.6mmのスルーホール基板を脱
脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表面
を洗浄し試験片を準備し、上記2−(1−ヘキシルノニ
ル)ベンズイミダゾールを有効成分とする1%溶液に6
0秒間浸漬した。その後水洗し次いで熱風乾燥機に入
れ、120℃で5分加熱した後、熱風乾燥機に入れ2
00℃で10分間加熱して測定前にポストフラックスを
刷毛塗りしてスルーホールの半田上りを測定した。熱
風乾燥機に入れ200℃で10分間加熱して測定前にポ
ストフラックスに浸漬し半田濡れ性試験器を用いて濡れ
時間を測定した。対湿(90%RH/40℃/96h
r)処理後の試験片をポストフラックスに浸漬して半田
濡れ性試験器を用いて濡れ時間を測定した。この試験結
果は表9に示した。
Example A solution containing 1% of 2- (1-hexylnonyl) benzimidazole , formic acid, ammonia and cupric chloride was placed in a 5 liter container and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5 cm x 0.3 mm copper plate and 20
cm × 24 cm × 1.6 mm through-hole substrate was degreased, washed with water, soft etching, washed with water, pickled, washed with water to prepare a test piece, and the above-mentioned 2- (1-hexylnonyl) benzimidazole was used as an active ingredient. 6 in 1% solution
It was immersed for 0 seconds. Then, rinse with water, put in a hot air dryer, heat at 120 ° C for 5 minutes, and put in a hot air dryer. 2
It was heated at 00 ° C. for 10 minutes and brushed with post flux before the measurement to measure the solder rise of the through hole. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40 ° C / 96h
r) The treated test piece was dipped in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 9 .

【表9】 [Table 9]

【0015】[0015]

【実施例】2−(1−ヘプチルデシル)ベンズイミダゾ
ール1%、蟻酸、アンモニア、塩化第ニ銅を含む溶液を
5リットル容器に入れ、液温を40℃に加熱し調整し
た。他方、1cm×5cm×0.3mmの銅板及び20
cm×24cm×1.6mmのスルーホール基板を脱
脂、水洗、ソフトエッチンゲ、水洗、酸洗、水洗し表面
を洗浄し試験片を準備し、上記2−(1−ヘプチルデシ
ル)ベンズイミダゾールを有効成分とする1%溶液に6
0秒間浸漬した。その後水洗し次いで熱風乾燥機に入
れ、120℃で5分加熱した後、熱風乾燥機に入れ2
00℃で10分間加熱して測定前にポストフラックスを
刷毛塗りしてスルーホールの半田上りを測定した。熱
風乾燥機に入れ200℃で10分間加熱して測定前にポ
ストフラックスに浸漬し半田濡れ性試験器を用いて濡れ
時間を測定した。対湿(90%RH/40℃/96h
r)処理後の試験片をポストフラックスに浸漬して半田
濡れ性試験器を用いて濡れ時間を測定した。この試験結
果は表10に示した。
EXAMPLE A solution containing 1% of 2- (1-heptyldecyl) benzimidazole , formic acid, ammonia and cupric chloride was placed in a 5 liter container and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5 cm x 0.3 mm copper plate and 20
cm * 24cm * 1.6mm through-hole substrate is degreased, washed with water, soft etching, washed with water, pickled, washed with water to prepare a test piece, and the 2- (1-heptyldecyl) benzimidazole is used as an active ingredient. 6 in 1% solution
It was immersed for 0 seconds. Then, rinse with water, put in a hot air dryer, heat at 120 ° C for 5 minutes, and put in a hot air dryer. 2
It was heated at 00 ° C. for 10 minutes and brushed with post flux before the measurement to measure the solder rise of the through hole. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40 ° C / 96h
r) The treated test piece was dipped in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 10 .

【表10】 [Table 10]

【0016】[0016]

【実施例】2−(1−メチルエチル)ベンズイミダゾー
0.5%、2−(1−エチルプロピル)ベンズイミダ
ゾール0.5%、蟻酸、アンモニア、塩化第二銅を含む
混合溶液を5リットル容器に入れ、液温を40℃に加熱
し調整した。他方、1cm×5cm×0.3mmの銅板
及び20cm×24cm×1.6mmのスルーホール基
板を脱脂、水洗、ソフトエッチング、水洗、酸洗、水洗
し表面を洗浄し試験片を準備し、上記2−(1−メチル
エチル)ベンズイミダゾール、2−(1−エチルプロピ
ル)ベンズイミダゾールを有効成分とする1%混合溶液
に60秒間浸漬した。その後水洗し次いで熱風乾燥機に
入れ、120℃で5分加熱した後、熱風乾燥機に入れ
200℃で10分間加熱して測定前にポストフラックス
を刷毛塗りしてスルーホールの半田上りを測定した。
熱風乾燥機に入れ200℃で10分間加熱して測定前に
ポストフラックスに浸漬し半田濡れ性試験器を用いて濡
れ時間を測定した。対湿(90%RH/40℃/96
hr)処理後の試験片をポストフラックスに浸漬して半
田濡れ性試験器を用いて濡れ時間を測定した。この試験
結果は表11に示した。
EXAMPLES Mixed solution containing 0.5% of 2- (1-methylethyl) benzimidazole, 0.5% of 2- (1-ethylpropyl) benzimidazole , formic acid, ammonia and cupric chloride Was placed in a 5 liter container, and the liquid temperature was adjusted to 40 ° C. by heating. On the other hand, a 1 cm × 5 cm × 0.3 mm copper plate and a 20 cm × 24 cm × 1.6 mm through-hole substrate are degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece and prepare the above-mentioned 2 It was immersed for 60 seconds in a 1% mixed solution containing-(1-methylethyl) benzimidazole and 2- (1-ethylpropyl) benzimidazole as active ingredients. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. ..
It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40 ° C / 96
hr) The test piece after the treatment was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 11 .

【表11】 [Table 11]

【0017】[0017]

【実施例】2−(1−メチルプロピル)メチルベンズ
ミダゾール1%、蟻酸、アンモニア、塩化第二銅を含む
溶液を5リットル容器に入れ、液温を40℃に加熱し調
整した。他方、1cm×5cm×0.3mmの銅板及び
20cm×24cm×1.6mmのスルーホール基板を
脱脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表
面を洗浄し試験片を準備し、上記2−(1−メチルプロ
ピル)メチルベンズイミダゾールを有効成分とする1%
溶液に60秒間浸漬した。その後水洗し次いで熱風乾燥
機に入れ、120℃で5分加熱した後、熱風乾燥機に
入れ200℃で10分間加熱して測定前にポストフラッ
クスを刷毛塗りしてスルーホールの半田上りを測定し
た。熱風乾燥機に入れ200℃で10分間加熱して測
定前にポストフラックスに浸漬し半田濡れ性試験器を用
いて濡れ時間を測定した。対湿(90%RH/40℃
/96hr)処理後の試験片をポストフラックスに浸漬
して半田濡れ性試験器を用いて濡れ時間を測定した。こ
の試験結果は表12に示した。
EXAMPLES 2- (1-methylpropyl) Mechirubenzu Lee <br/> imidazole 1% formic acid, ammonia, a <br/> solution containing cupric chloride was placed to a 5 liter vessel, a liquid temperature of 40 ° C. It was heated and adjusted. On the other hand, a 1 cm × 5 cm × 0.3 mm copper plate and a 20 cm × 24 cm × 1.6 mm through-hole substrate are degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece and prepare the above-mentioned 2 1% containing-(1-methylpropyl) methylbenzimidazole as an active ingredient
It was immersed in the solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40 ℃
/ 96 hr) The test piece after the treatment was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 12 .

【表12】 [Table 12]

【0018】[0018]

【実施例】2−(2−メチルプロピル)メチルベンズ
ミダゾール1%、蟻酸、アンモニア、塩化第二銅を含む
溶液を5リットル容器に入れ、液温を40℃に加熱し調
整した。他方、1cm×5cm×0.3mmの銅板及び
20cm×24cm×1.6mmのスルーホール基板を
脱脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表
面を洗浄し試験片を準備し、上記2−(2−メチルプロ
ピル)メチルベンズイミダゾールを有効成分とする1%
溶液に60秒間浸漬した。その後水洗し次いで熱風乾燥
機に入れ、120℃で5分加熱した後、熱風乾燥機に
入れ200℃で10分間加熱して測定前にポストフラッ
クスを刷毛塗りしてスルーホールの半田上りを測定し
た。熱風乾燥機に入れ200℃で10分間加熱して測
定前にポストフラックスに浸漬し半田濡れ性試験器を用
いて濡れ時間を測定した。対湿(90%RH/40℃
/96hr)処理後の試験片をポストフラックスに浸漬
して半田濡れ性試験器を用いて濡れ時間を測定した。こ
の試験結果は表13に示した。
EXAMPLES 2- (2-methylpropyl) Mechirubenzu Lee <br/> imidazole 1% formic acid, ammonia, a <br/> solution containing cupric chloride was placed to a 5 liter vessel, a liquid temperature of 40 ° C. It was heated and adjusted. On the other hand, a 1 cm × 5 cm × 0.3 mm copper plate and a 20 cm × 24 cm × 1.6 mm through-hole substrate are degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece and prepare the above-mentioned 2 1% containing-(2-methylpropyl) methylbenzimidazole as an active ingredient
It was immersed in the solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40 ℃
/ 96 hr) The test piece after the treatment was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 13 .

【表13】 [Table 13]

【0019】[0019]

【実施例】2−(1−メチルブチル)メチルベンズイミ
ダゾール1%、蟻酸、アンモニア、塩化第二銅を含む
液を5リットル容器に入れ、液温を40℃に加熱し調整
した。他方、1cm×5cm×0.3mmの銅板及び2
0cm×24cm×1.6mmのスルーホール基板を脱
脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表面
を洗浄し試験片を準備し、上記2−(1−メチルブチ
ル)メチルベンズイミダゾールを有効成分とする1%溶
液に60秒間浸漬した。その後水洗し次いで熱風乾燥機
に入れ、120℃で5分加熱した後、熱風乾燥機に入
れ200℃で10分間加熱して測定前にポストフラック
スを刷毛塗りしてスルーホールの半田上りを測定した。
熱風乾燥機に入れ200℃で10分間加熱して測定前
にポストフラックスに浸漬し半田濡れ性試験器を用いて
濡れ時間を測定した。対湿(90%RH/40℃/9
6hr)処理後の試験片をポストフラックスに浸漬して
半田濡れ性試験器を用いて濡れ時間を測定した。この試
験結果は表14に示した。
EXAMPLE A solution containing 1% 2- (1-methylbutyl) methylbenzimidazole , formic acid, ammonia and cupric chloride was placed in a 5 liter container, and the temperature of the solution was adjusted to 40 ° C. It was heated and adjusted. On the other hand, 1 cm x 5 cm x 0.3 mm copper plate and 2
A 0 cm × 24 cm × 1.6 mm through-hole substrate was degreased, washed with water, soft etching, washed with water, pickled, washed with water to prepare a test piece, and the 2- (1-methylbutyl) methylbenzimidazole was used as an active ingredient. It was immersed in a 1% solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. ..
It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40 ° C / 9
6 hr) The treated test piece was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 14 .

【表14】 [Table 14]

【0020】[0020]

【実施例】2−(1−エチルプロピル)メチルベンズ
ミダゾール1%、蟻酸、アンモニア、塩化第二銅を含む
溶液を5リットル容器に入れ、液温を40℃に加熱し調
整した。他方、1cm×5cm×0.3mmの板及び2
0cm×24cm×1.6mmのスルーホール基板を脱
脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表面
を洗浄し試験片を準備し、上記2−(1−エチルプロピ
ル)メチルベンズイミダゾールを有効成分とする1%溶
液に60秒間浸漬した。その後水洗し次いで熱風乾燥機
に入れ、120℃で5分加熱した後、熱風乾燥機に入
れ200℃で10分間加熱して測定前にポストフラック
スを刷毛塗りしてスルーホールの半田上りを測定した。
熱風乾燥機に入れ200℃で10分間加熱して測定前
にポストフラックスに浸漬し半田濡れ性試験器を用いて
濡れ時間を測定した。対湿(90%RH/40℃/9
6hr)処理後の試験片をポストフラックスに浸漬して
半田濡れ性試験器を用いて濡れ時間を測定した。この試
験結果は表15に示した。
EXAMPLES 2- (1-ethylpropyl) Mechirubenzu Lee <br/> imidazole 1% formic acid, ammonia, a <br/> solution containing cupric chloride was placed to a 5 liter vessel, a liquid temperature of 40 ° C. It was heated and adjusted. On the other hand, 1 cm x 5 cm x 0.3 mm plate and 2
A 0 cm x 24 cm x 1.6 mm through-hole substrate is degreased, washed with water, soft etching, washed with water, pickled, washed with water to prepare a test piece, and the 2- (1-ethylpropyl) methylbenzimidazole is used as an active ingredient. It was immersed in a 1% solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. ..
It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40 ° C / 9
6 hr) The treated test piece was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 15 .

【表15】 [Table 15]

【0021】[0021]

【実施例】2−(2−メチルブチル)メチルベンズイミ
ダゾール1%、蟻酸、アンモニア、塩化第二銅を含む
液を5リットル容器に入れ、液温を40℃に加熱し調整
した。他方、1cm×5cm×0.3mmの銅板及び2
0cm×24cm×1.6mmのスルーホール基板を脱
脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表面
を洗浄し試験片を準備し、上記2−(2−メチルブチ
ル)メチルベンズイミダゾールを有効成分とする1%溶
液に60秒間浸漬した。その後水洗し次いで熱風乾燥機
に入れ、120℃で5分加熱した後、熱風乾燥機に入
れ200℃で10分間加熱して測定前にポストフラック
スを刷毛塗りしてスルーホールの半田上りを測定した。
熱風乾燥機に入れ200℃で10分間加熱して測定前
にポストフラックスに浸漬し半田濡れ性試験器を用いて
濡れ時間を測定した。対湿(90%RH/40℃/9
6hr)処理後の試験片をポストフラックスに浸漬して
半田濡れ性試験器を用いて濡れ時間を測定した。この試
験結果は表16に示した。
EXAMPLE A solution containing 2- (2-methylbutyl) methylbenzimidazole 1%, formic acid, ammonia and cupric chloride was placed in a 5 liter container, and the solution temperature was adjusted to 40 ° C. It was heated and adjusted. On the other hand, 1 cm x 5 cm x 0.3 mm copper plate and 2
A 0 cm × 24 cm × 1.6 mm through-hole substrate was degreased, washed with water, soft etching, washed with water, pickled, washed with water to prepare a test piece, and the 2- (2-methylbutyl) methylbenzimidazole was used as an active ingredient. It was immersed in a 1% solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. ..
It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40 ° C / 9
6 hr) The treated test piece was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 16 .

【表16】 [Table 16]

【0022】[0022]

【実施例】2−(1−メチルペンチル)メチルベンズ
ミダゾール1%、蟻酸、アンモニア、塩化第二銅を含む
溶液を5リットル容器に入れ、液温を40℃に加熱し調
整した。他方、1cm×5cm×0.3mmの銅板及び
20cm×24cm×1.6mmのスルーホール基板を
脱脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表
面を洗浄し試験片を準備し、上記2−(1−メチルペン
チル)メチルベンズイミダゾールを有効成分とする1%
溶液に60秒間浸漬した。その後水洗し次いで熱風乾燥
機に入れ、120℃で5分加熱した後、熱風乾燥機に
入れ200℃で10分間加熱して測定前にポストフラッ
クスを刷毛塗りしてスルーホールの半田上りを測定し
た。熱風乾燥機に入れ200℃で10分間加熱して測
定前にポストフラックスに浸漬し半田濡れ性試験器を用
いて濡れ時間を測定した。対湿(90%RH/40℃
/96hr)処理後の試験片をポストフラックスに浸漬
して半田濡れ性試験器を用いて濡れ時間を測定した。こ
の試験結果は表17に示した。
EXAMPLES 2- (1-methylpentyl) Mechirubenzu Lee <br/> imidazole 1% formic acid, ammonia, a <br/> solution containing cupric chloride was placed to a 5 liter vessel, a liquid temperature of 40 ° C. It was heated and adjusted. On the other hand, a 1 cm × 5 cm × 0.3 mm copper plate and a 20 cm × 24 cm × 1.6 mm through-hole substrate are degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece and prepare the above-mentioned 2 1% containing-(1-methylpentyl) methylbenzimidazole as an active ingredient
It was immersed in the solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40 ℃
/ 96 hr) The test piece after the treatment was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 17 .

【表17】 [Table 17]

【0023】[0023]

【実施例】2−(1−プロピルブチル)メチルベンズ
ミダゾール1%、蟻酸、アンモニア、塩化第二銅を含む
溶液を5リットル容器に入れ、液温を40℃に加熱し調
整した。他方、1cm×5cm×0.3mmの銅板及び
20cm×24cm×1.6mmのスルーホール基板を
脱脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表
面を洗浄し試験片を準備し、上記2−(1−プロピルブ
チル)チルベンズイミダゾールを有効成分とする1%溶
液に60秒間浸漬した。その後水洗し次いで熱風乾燥機
に入れ、120℃で5分加熱した後、熱風乾燥機に入
れ200℃で10分間加熱して測定前にポストフラック
スを刷毛塗りしてスルーホールの半田上りを測定した。
熱風乾燥機に入れ200℃で10分間加熱して測定前
にポストフラックスに浸漬し半田濡れ性試験器を用いて
濡れ時間を測定した。対湿(90%RH/40℃/9
6hr)処理後の試験片をポストフラックスに浸漬して
半田濡れ性試験器を用いて濡れ時間を測定した。この試
験結果は表18に示した。
EXAMPLES 2- (1-propyl-butyl) Mechirubenzu Lee <br/> imidazole 1% formic acid, ammonia, a <br/> solution containing cupric chloride was placed to a 5 liter vessel, a liquid temperature of 40 ° C. It was heated and adjusted. On the other hand, a 1 cm × 5 cm × 0.3 mm copper plate and a 20 cm × 24 cm × 1.6 mm through-hole substrate are degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece and prepare the above-mentioned 2 It was immersed for 60 seconds in a 1% solution containing-(1-propylbutyl) tylbenzimidazole as an active ingredient. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. ..
It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40 ° C / 9
6 hr) The treated test piece was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 18 .

【表18】 [Table 18]

【0024】[0024]

【実施例】2−(2−メチル−4,4−ジメチルペンチ
ル)メチルベンズイミダゾール1%、蟻酸、アンモニ
ア、塩化第二銅を含む溶液を5リットル容器に入れ、液
温を40℃に加熱し調整した。他方、1cm×5cm×
0.3mmの銅板及び20cm×24cm×1.6mm
のスルーホール基板を脱脂、水洗、ソフトエッチング、
水洗、酸洗、水洗し表面を洗浄し試験片を準備し、上記
2−(2−メチル−4,4−ジメチルペンチル)メチル
ベンズイミダゾールを有効成分とする1%溶液に60秒
間浸漬した。その後水洗し次いで熱風乾燥機に入れ、1
20℃で5分加熱した後、熱風乾燥機に入れ200℃
で10分間加熱して測定前にポストフラックスを刷毛塗
りしてスルーホールの半田上りを測定した。熱風乾燥
機に入れ200℃で10分間加熱して測定前にポストフ
ラックスに浸漬し半田濡れ性試験器を用いて濡れ時間を
測定した。対湿(90%RH/40℃/96hr)処
理後の試験片をポストフラックスに浸漬して半田濡れ性
試験器を用いて濡れ時間を測定した。この試験結果は
19に示した。
Examples 1-% 2- (2-methyl-4,4-dimethylpentyl) methylbenzimidazole , formic acid, ammonium
(A) A solution containing cupric chloride was placed in a 5 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5 cm x
0.3 mm copper plate and 20 cm x 24 cm x 1.6 mm
Degreasing, washing with water, soft etching,
Wash the surface with water, pickle, and water to prepare a test piece, and prepare the above-mentioned 2- (2-methyl-4,4-dimethylpentyl) methyl.
It was immersed for 60 seconds in a 1% solution containing benzimidazole as an active ingredient. After that, rinse with water and put in a hot air dryer. 1
After heating at 20 ° C for 5 minutes, put in a hot air dryer to 200 ° C
After heating for 10 minutes, the post flux was brush-painted before the measurement to measure the solder rise of the through hole. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. This test result is a table
19 shows.

【表19】 [Table 19]

【0025】[0025]

【実施例】2−(1−ヘキシルノニル)メチルベンズ
ミダゾール1%、蟻酸、アンモニア、塩化第二銅を含む
溶液を5リットル容器に入れ、液温を40℃に加熱し調
整した。他方、1cm×5cm×0.3mmの銅板及び
20cm×24cm×1.6mmのスルーホール基板を
脱脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表
面を洗浄し試験片を準備し、上記2−(1−ヘキシルノ
ニル)メチルベンズイミダゾールを有効成分とする1%
溶液に60秒間浸漬した。その後水洗し次いで熱風乾燥
機に入れ、120℃で5分加熱した後、熱風乾燥機に
入れ200℃で10分間加熱して測定前にポストフラッ
クスを刷毛塗りしてスルーホールの半田上りを測定し
た。熱風乾燥機に入れ200℃で10分間加熱して測
定前にポストフラックスに浸漬し半田濡れ性試験器を用
いて濡れ時間を測定した。対湿(90%RH/40℃
/96hr)処理後の試験片をポストフラックスに浸漬
して半田濡れ性試験器を用いて濡れ時間を測定した。こ
の試験結果は表20に示した。
EXAMPLES 2- (1-hexyl-nonyl) Mechirubenzu Lee <br/> imidazole 1% formic acid, ammonia, a <br/> solution containing cupric chloride was placed to a 5 liter vessel, a liquid temperature of 40 ° C. It was heated and adjusted. On the other hand, a 1 cm × 5 cm × 0.3 mm copper plate and a 20 cm × 24 cm × 1.6 mm through-hole substrate are degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece and prepare the above-mentioned 2 1% containing-(1-hexylnonyl) methylbenzimidazole as an active ingredient
It was immersed in the solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40 ℃
/ 96 hr) The test piece after the treatment was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 20 .

【表20】 [Table 20]

【0026】[0026]

【実施例】2−(1−ヘプチルデシル)メチルベンズ
ミダゾール1%、蟻酸、アンモニア、塩化第二銅を含む
溶液を5リットル容器に入れ、液温を40℃に加熱し調
整した。他方、1cm×5cm×0.3mmの銅板及び
20cm×24cm×1.6mmのスルーホール基板を
脱脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表
面を洗浄し試験片を準備し、上記2−(1−ヘプチルデ
シル)メチルベンズイミダゾールを有効成分とする1%
溶液に60秒間浸漬した。その後水洗し次いで熱風乾燥
機に入れ、120℃で5分加熱した後、熱風乾燥機に
入れ200℃で10分間加熱して測定前にポストフラッ
クスを刷毛塗りしてスルーホールの半田上りを測定し
た。熱風乾燥機に入れ200℃で10分間加熱して測
定前にポストフラックスに浸漬し半田濡れ性試験器を用
いて濡れ時間を測定した。対湿(90%RH/40℃
/96hr)処理後の試験片をポストフラックスに浸漬
して半田濡れ性試験器を用いて濡れ時間を測定した。こ
の試験結果は表21に示した。
EXAMPLES 2- (1-Hepuchirudeshiru) Mechirubenzu Lee <br/> imidazole 1% formic acid, ammonia, placed <br/> solution containing cupric chloride to a 5 liter vessel, a liquid temperature of 40 ° C. heating I adjusted it. On the other hand, a 1 cm × 5 cm × 0.3 mm copper plate and a 20 cm × 24 cm × 1.6 mm through-hole substrate are degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, 1% containing 1- (1-heptyldecyl) methylbenzimidazole as an active ingredient
It was immersed in the solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40 ℃
/ 96 hr) The test piece after the treatment was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 21 .

【表21】 [Table 21]

【0027】[0027]

【実施例】2−(1−エチルプロピル)ジメチルベンズ
イミダゾール1%、蟻酸、アンモニア、塩化第二銅を含
溶液を5リットル容器に入れ、液温を40℃に加熱し
調整した。他方、1cm×5cm×0.3mmの銅板及
び20cm×24cm×1.6mmのスルーホール基板
を脱脂、水洗、ソフトエッチング、水洗、酸洗、水洗し
表面を洗浄し試験片を準備し、上記2−(1−エチルプ
ロピル)ジメチルベンズイミダゾールを有効成分とする
1%溶液に60秒間浸漬した。その後水洗し次いで熱風
乾燥機に入れ、120℃で5分加熱した後、熱風乾燥
機に入れ200℃で10分間加熱して測定前にポストフ
ラックスを刷毛塗りしてスルーホールの半田上りを測定
した。熱風乾燥機に入れ200℃で10分間加熱して
測定前にポストフラックスに浸漬し半田濡れ性試験器を
用いて濡れ時間を測定した。対湿(90%RH/40
℃/96hr)処理後の試験片をポストフラックスに浸
漬して半田濡れ性試験器を用いて濡れ時間を測定した。
この試験結果は表22に示した。
EXAMPLE 2- (1-Ethylpropyl) dimethylbenzimidazole 1%, formic acid, ammonia, cupric chloride
The solution was placed in a 5 liter container and the liquid temperature was adjusted to 40 ° C. On the other hand, a 1 cm × 5 cm × 0.3 mm copper plate and a 20 cm × 24 cm × 1.6 mm through-hole substrate are degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, It was immersed for 60 seconds in a 1% solution containing-(1-ethylpropyl) dimethylbenzimidazole as an active ingredient. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40
(° C / 96 hr) The test piece after the treatment was immersed in post flux and the wetting time was measured using a solder wettability tester.
The test results are shown in Table 22 .

【表22】 [Table 22]

【0028】[0028]

【実施例】2−(1−プロピルブチル)ジメチルベンズ
イミダゾール1%、蟻酸、アンモニア、塩化第二銅を含
溶液を5リットル容器に入れ、液温を40℃に加熱し
調整した。他方、1cm×5cm×0.3mmの銅板及
び20cm×24cm×1.6mmのスルーホール基板
を脱脂、水洗、ソフトエッチング、水洗、酸洗、水洗し
表面を洗浄し試験片を準備し、上記2−(1−プロピル
ブチル)ジメチルベンズイミダゾールを有効成分とする
1%溶液に60秒間浸漬した。その後水洗し次いで熱風
乾燥機に入れ、120℃で5分加熱した後、熱風乾燥
機に入れ200℃で10分間加熱して測定前にポストフ
ラックスを刷毛塗りしてスルーホールの半田上りを測定
した。熱風乾燥機に入れ200℃で10分間加熱して
測定前にポストフラックスに浸漬し半田濡れ性試験器を
用いて濡れ時間を測定した。対湿(90%RH/40
℃/96hr)処理後の試験片をポストフラックスに浸
漬して半田濡れ性試験器を用いて濡れ時間を測定した。
この試験結果は表23に示した。
EXAMPLE 2- (1-Propylbutyl) dimethylbenzimidazole 1%, formic acid, ammonia, cupric chloride
The solution was placed in a 5 liter container and the liquid temperature was adjusted to 40 ° C. On the other hand, a 1 cm × 5 cm × 0.3 mm copper plate and a 20 cm × 24 cm × 1.6 mm through-hole substrate are degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, It was immersed for 60 seconds in a 1% solution containing-(1-propylbutyl) dimethylbenzimidazole as an active ingredient. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40
(° C / 96 hr) The test piece after the treatment was immersed in post flux and the wetting time was measured using a solder wettability tester.
The test results are shown in Table 23 .

【表23】 [Table 23]

【0029】[0029]

【発明の効果】本発明のプリフラックスを、金属の表面
に形成させた被膜は防錆、耐熱性に優れ、高温下に曝さ
れた後でもクリーム半田の広がり、濡れ性が良好又リフ
ロー半田の半田上がり性、濡れ性も良好という効果で、
且つ、作業環境、安全性の面からもプリント配線板に電
子部品を表面実装するのに、特に顕著な効果を発揮しう
るものである。
EFFECTS OF THE INVENTION The coating formed on the surface of a metal with the pre-flux of the present invention is excellent in rust prevention and heat resistance, spreads cream solder even after being exposed to high temperature, has good wettability, and has excellent reflow solderability. With the effect of good solderability and wettability,
In addition, in terms of working environment and safety, it is possible to exert a particularly remarkable effect in surface-mounting electronic components on a printed wiring board.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 (化1)〜(化11)で表される化合物
又はその誘導体の塩を含有するプレフラックス溶液で表
面処理することを特徴とする金属の表面処理方法。 【化1】 【化2】 【化3】 【化4】 【化5】 【化6】 【化7】 【化8】 【化9】 【化10】 【化11】
1. A method for surface treatment of a metal, which comprises performing surface treatment with a preflux solution containing a salt of a compound represented by (Chemical formula 1) to (Chemical formula 11) or a derivative thereof. [Chemical 1] [Chemical 2] [Chemical 3] [Chemical 4] [Chemical 5] [Chemical 6] [Chemical 7] [Chemical 8] [Chemical 9] [Chemical 10] [Chemical 11]
【請求項2】 (化1)〜(化11)で表される化合物
又はその誘導体の塩を含有するプレフラックス溶液で表
面処理後、酸化処理を行なうことを特徴とする金属の処
理方法。
2. A method for treating a metal, which comprises performing a surface treatment with a pre-flux solution containing a salt of a compound represented by (Chemical formula 1) to (Chemical formula 11) or a derivative thereof and then performing an oxidation treatment.
JP34935791A 1991-11-05 1991-11-05 Surface treatment of metal Pending JPH05202492A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP34935791A JPH05202492A (en) 1991-11-05 1991-11-05 Surface treatment of metal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP34935791A JPH05202492A (en) 1991-11-05 1991-11-05 Surface treatment of metal

Publications (1)

Publication Number Publication Date
JPH05202492A true JPH05202492A (en) 1993-08-10

Family

ID=18403220

Family Applications (1)

Application Number Title Priority Date Filing Date
JP34935791A Pending JPH05202492A (en) 1991-11-05 1991-11-05 Surface treatment of metal

Country Status (1)

Country Link
JP (1) JPH05202492A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05175643A (en) * 1991-12-20 1993-07-13 Nec Corp Surface treating method for printed circuit board
CN107365521A (en) * 2016-05-12 2017-11-21 株式会社田村制作所 Water-soluble preflux, electric substrate and surface treatment method using it

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05175643A (en) * 1991-12-20 1993-07-13 Nec Corp Surface treating method for printed circuit board
CN107365521A (en) * 2016-05-12 2017-11-21 株式会社田村制作所 Water-soluble preflux, electric substrate and surface treatment method using it
CN107365521B (en) * 2016-05-12 2021-11-02 株式会社田村制作所 Water-soluble pre-flux, electronic substrate using same, and surface treatment method

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