JPH0598474A - Surface treatment of metal - Google Patents

Surface treatment of metal

Info

Publication number
JPH0598474A
JPH0598474A JP32495991A JP32495991A JPH0598474A JP H0598474 A JPH0598474 A JP H0598474A JP 32495991 A JP32495991 A JP 32495991A JP 32495991 A JP32495991 A JP 32495991A JP H0598474 A JPH0598474 A JP H0598474A
Authority
JP
Japan
Prior art keywords
water
minutes
washed
hot air
heated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32495991A
Other languages
Japanese (ja)
Inventor
Hideaki Yamaguchi
秀明 山口
Daikichi Tachibana
大吉 橘
Kenichi Yamaguchi
謙一 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP32495991A priority Critical patent/JPH0598474A/en
Publication of JPH0598474A publication Critical patent/JPH0598474A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F11/00Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
    • C23F11/08Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
    • C23F11/10Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
    • C23F11/14Nitrogen-containing compounds
    • C23F11/149Heterocyclic compounds containing nitrogen as hetero atom
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3489Composition of fluxes; Methods of application thereof; Other methods of activating the contact surfaces

Abstract

PURPOSE:To prevent the rust of the copper (alloy) circuit part of a printed circuit board and to improve the solderability by carrying out surface treatment with a preflux soln. contg. a salt of a compd. or a deriv. thereof represented by a prescribed chemical formula. CONSTITUTION:A preflux soln. contg. a salt of a compd. or a deriv. thereof represented by the chemical formula [where R is 0-6C alkyl, (m) is 2-7, (n) is 0-3.0, (o) is 0-4 and (p) is 0-4] is prepd. The surface of a metal or the surface of a printed circuit board is coated with the preflux soln. or this surface-treated board is further subjected to complex forming treatment.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、金属の表面処理に関
するものであり、特にプリント配線板の銅又は銅合金の
回路部を防錆し、半田付け性を向上させる耐熱プリフラ
ックスとして好適なものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface treatment of metal, and is particularly suitable as a heat-resistant preflux for preventing the circuit portion of a printed wiring board made of copper or copper alloy from rusting and improving solderability. Is.

【0002】[0002]

【従来の技術】従来、プリント配線板の銅又は銅合金か
らなる回路部を防錆し、半田付け性を保持する目的で使
用されているプレフラックスは、大別してプリント配線
板全体をコーティングするロジン系プレフラックスと、
選択的に銅又は銅合金と化学反応させるアルキルイミダ
ゾール系プレフラックスの2種類がある。前者は天然ロ
ジン、ロジンエステル、ロジン変成マレイン酸樹脂等
を、有機溶剤に溶解させたものをロールコターで塗布す
るか、噴霧又は浸漬によつてプリント配線板全体に塗布
し、乾燥して被膜を形成する方法で用いられる。このた
め有機溶剤の揮散によって作業環境及び安全性が著しく
損われる欠点がある。又、ロジン系プレフラックスは揮
発性溶剤を使用しているため作業時引火の危険が伴うと
いう欠点も有している。他方、アルキルイミダゾール系
プレフラックスは水溶性であり、作業環境の面でも安全
性の面でも優れているが、化学反応したアルキルイミダ
ゾール銅錯体が高温に曝されると空気中の酸素と銅の触
媒作用で変質してポストフラックスの作用を阻害して、
半田付け性を悪くするという欠点を有している。
2. Description of the Related Art Pre-flux, which has been conventionally used for the purpose of preventing corrosion of a circuit portion made of copper or a copper alloy of a printed wiring board and maintaining solderability, is roughly classified into rosins for coating the entire printed wiring board. System preflux,
There are two types of alkylimidazole-based preflux that selectively chemically react with copper or copper alloys. For the former, apply natural rosin, rosin ester, rosin-modified maleic acid resin, etc. dissolved in an organic solvent with a roll coater, or spray or dip it on the entire printed wiring board and dry to form a film. Used in the method. Therefore, there is a drawback that the working environment and safety are significantly impaired by the volatilization of the organic solvent. The rosin-based preflux also has a drawback that it involves a risk of ignition during work because it uses a volatile solvent. On the other hand, the alkylimidazole-based preflux is water-soluble and is excellent in terms of working environment and safety, but when the chemically reacted alkylimidazole copper complex is exposed to high temperatures, it is a catalyst for oxygen and copper in the air. It deteriorates by the action and inhibits the action of postflux,
It has the drawback of deteriorating the solderability.

【0003】[0003]

【発明が解決しょうとする課題】近年プリント配線板に
電子部品を半田付けする方法として表面実装法が多く採
用されている。この表面実装法、電子部品の仮止めクリ
ーム半田のリフロー等、プリント配線板が高温に曝され
る機会が多くなり、プリント配線板の半田付け性を保持
するために用いられるプレフラックスの耐熱性、即ちプ
リント配線板が高温に曝された後での半田付け性が優れ
ていることがプレフラックスの性能に要求されるように
なった。又、大気汚染等に問題を有する揮発性溶剤を使
用せず、且つ高温に曝された後でも半田付け性の優れた
プレフラックスの開発が切望されている。
In recent years, a surface mounting method has been widely adopted as a method for soldering an electronic component to a printed wiring board. The surface mounting method, the reflow of solder paste solder for electronic components, the printed wiring board is often exposed to high temperatures, and the heat resistance of the pre-flux used to maintain the solderability of the printed wiring board, That is, the pre-flux performance is required to have excellent solderability after the printed wiring board is exposed to high temperature. Further, it is desired to develop a preflux which does not use a volatile solvent having a problem in air pollution and has excellent solderability even after being exposed to a high temperature.

【0004】[0004]

【課題を解決するための手段】本発明者らは、このよう
な事情に鑑み、揮発性溶剤を使用せず且つ高温に曝され
た後でも半田付け性の良いプレフラックスに関して鋭意
検討を重ねた結果、酢酸、カプリン酸、グリコール酸、
パラニトロ安息香酸、パラトルエンスルホン酸、ピクリ
ン酸、蓚酸、蟻酸、コハク酸、亜りん酸、マレイン酸、
アクリル酸、フマール酸、酒石酸、アジピン酸、乳酸、
オレイン酸等の有機酸、塩酸、硫酸、燐酸、又は酢酸亜
鉛、酢酸鉛、水酸化亜鉛、水酸化鉛、硫化亜鉛、リン酸
亜鉛、酸化亜鉛、塩化亜鉛、塩化第一鉄、塩化第二鉄、
酸化第一鉄、酸化第二鉄、塩化第一銅、塩化第二銅、酸
化第一銅、酸化第二銅、水酸化銅、リン酸銅、炭酸銅、
酢酸銅、硫酸銅等の金属化合物を含む水溶液、又はメタ
ノール、エタノール、イソプロピルアルコール、ブタノ
ール、アセトン等の水溶性溶媒、のいずれかの群から選
ばれた少なくとも一つの液と、有効成分として(化1)
で表わされる化合物を1種類又は2種類以上を混合した
溶液を金属表面処理剤として用いる場合には、上述した
従来の問題点を解決し所期の目的を達成出来ることを見
出し、本発明を完成するに至ったものである。(化1)
で表わされる化合物を可溶化あるいは乳化させるために
用いられる上記した有機酸等は、有機酸、有機酸の塩、
あるいはアルコール等の水溶性溶媒を夫々単独に用いる
ことができる他、任意の割合で混合して使用することも
可能である。例えば上記水溶性溶媒は単独で用いられる
他有機酸等と併用することもでき、特に有機酸等単独で
は、(化1)で表される化合物あるいはその誘導体の溶
解が困難となる場合には、水溶性溶媒を含有させること
が好ましく、この場合の含有は0.01〜60%とする
ことが適当である場合が多い。上記各溶媒により溶解し
て得られた溶液は、上記有効成分を0・01〜20%、
好ましくは0・5〜5%含有した可溶化溶液あるいは、
乳化溶液に浸漬処理する方法が一般的であり、浸漬は0
〜100℃の温度範囲で浸漬時間は数秒〜数十分の処理
範囲が適当である。又化成被膜形成後、酸化処理赤外
線・近赤外線・遠赤外線・紫外線照射処理を0〜300
℃の温度範囲で、処理時間数秒〜数十分の処理範囲が適
当である。オゾンOに数秒〜数十分の暴露処理範囲
が適当である。過酸化水素水1〜20%の濃度に数秒
〜数十分の浸漬、噴霧の薬液処理の範囲が適当である。
〜の処理を行なうことにより耐熱性に優れた化成被
膜が出来る。本発明の金属表面処理剤の有効成分として
は、(化1)が好適なものとして例示される。本発明の
表面処理剤を金属表面又は、プリント配線板の表面に塗
布するには、浸漬、噴霧による方法を用いる。
In view of such circumstances, the inventors of the present invention have made extensive studies on a preflux which does not use a volatile solvent and has good solderability even after being exposed to a high temperature. As a result, acetic acid, capric acid, glycolic acid,
Paranitrobenzoic acid, paratoluenesulfonic acid, picric acid, oxalic acid, formic acid, succinic acid, phosphorous acid, maleic acid,
Acrylic acid, fumaric acid, tartaric acid, adipic acid, lactic acid,
Organic acids such as oleic acid, hydrochloric acid, sulfuric acid, phosphoric acid, or zinc acetate, lead acetate, zinc hydroxide, lead hydroxide, zinc sulfide, zinc phosphate, zinc oxide, zinc chloride, ferrous chloride, ferric chloride ,
Ferrous oxide, ferric oxide, cuprous chloride, cupric chloride, cuprous oxide, cupric oxide, copper hydroxide, copper phosphate, copper carbonate,
At least one liquid selected from the group consisting of an aqueous solution containing a metal compound such as copper acetate and copper sulfate, or a water-soluble solvent such as methanol, ethanol, isopropyl alcohol, butanol, and acetone, and 1)
When a solution prepared by mixing one kind or two or more kinds of the compounds represented by the above is used as a metal surface treatment agent, it was found that the above-mentioned conventional problems can be solved and the intended purpose can be achieved, and the present invention has been completed. It has come to do. (Chemical formula 1)
The above-mentioned organic acids used for solubilizing or emulsifying the compound represented by are organic acids, salts of organic acids,
Alternatively, water-soluble solvents such as alcohols can be used alone, respectively, or can be mixed and used at an arbitrary ratio. For example, the above water-soluble solvent may be used alone or in combination with other organic acids. In particular, when the organic acid or the like alone makes it difficult to dissolve the compound represented by (Chemical Formula 1) or its derivative, It is preferable to contain a water-soluble solvent, and in this case, it is often appropriate that the content is 0.01 to 60%. The solution obtained by dissolving with each of the above-mentioned solvents contains 0.01 to 20% of the above-mentioned active ingredient,
Preferably a solubilization solution containing 0.5-5%, or
The method of dipping in an emulsified solution is generally used, and dipping is 0
In the temperature range of 100 ° C to 100 ° C, the dipping time is preferably in the range of several seconds to several tens of minutes. Also, after forming the chemical conversion film, oxidize infrared rays / near infrared rays / far infrared rays / ultraviolet rays to 0-300
A treatment range of several seconds to several tens of minutes is suitable in the temperature range of ° C. An exposure treatment range of a few seconds to a few tens of minutes is suitable for ozone O 3 . The range of treatment with a chemical solution such as immersion and spraying for several seconds to several tens of minutes in a concentration of hydrogen peroxide water of 1 to 20% is appropriate.
By performing the treatments 1 to 3, a chemical conversion coating having excellent heat resistance can be obtained. As the active ingredient of the metal surface treating agent of the present invention, (Chemical Formula 1) is exemplified as a preferable example. To apply the surface treatment agent of the present invention to a metal surface or the surface of a printed wiring board, a method of dipping or spraying is used.

【0005】[0005]

【作用】上記したプレフラックスの処理方法によれば、
クリーム半田の広がり性、濡れ性及びリフロー後の半田
上がり率、濡れ性が良好で、且つ作業環境、安全性の面
からも優れたプリント配線板を製造できる。
According to the above-mentioned preflux processing method,
It is possible to manufacture a printed wiring board which has good spreadability and wettability of cream solder, a solder rising rate after reflow, and wettability, and is excellent in terms of working environment and safety.

【0006】[0006]

【実施例】2−シクロプロピルベンズイミダゾールを有
効成分とする1%溶液を1リットル容器に入れ、液温を
40℃に加熱し調整した。他方、1cm×5cm×0.
3mmの銅板及び10cm×12cm×1.6mmのス
ルーホール基板を脱脂、水洗、ソフトエッチング、水
洗、酸洗、水洗し表面を洗浄した試料片を準備し、上記
2−シクロプロピルベンズイミダゾールを有効成分とす
る1%溶液に60秒間浸漬した。その後水洗し次いで熱
風乾燥機に入れ、120℃で5分加熱した後、熱風乾
燥機に入れ200℃で10分間加熱して測定前にポスト
フラックスを刷毛塗りしてスルーホールの半田上りを測
定した。熱風乾燥機に入れ200℃で10分間加熱し
て測定前にポストフラックスに浸漬し半田濡れ性試験器
を用いて濡れ時間を測定した。耐湿(90%RH/4
0℃/96hr)処理後の試験片をポストフラックスに
浸漬して半田濡れ性試験機を用いて濡れ時間を測定し
た。この試験結果は表1に示した。
EXAMPLE A 1% solution containing 2-cyclopropylbenzimidazole as an active ingredient was placed in a 1 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm × 5 cm × 0.
A 3 mm copper plate and a 10 cm × 12 cm × 1.6 mm through-hole substrate were degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a sample piece, and the 2-cyclopropylbenzimidazole was used as an active ingredient. It was immersed in a 1% solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Moisture resistance (90% RH / 4
The test piece after the 0 ° C./96 hr) treatment was dipped in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 1.

【0007】[0007]

【実施例】2−シクロブチルベンズイミダゾールを有効
成分とする1%溶液を1リットル容器に入れ、液温を4
0℃に加熱し調整した。他方、1cm×5cm×0.3
mmの銅板及び10cm×12cm×1.6mmのスル
ーホール基板を脱脂、水洗、ソフトエッチング、水洗、
酸洗、水洗し表面を洗浄し試験片を準備し、上記2−シ
クロブチルベンズイミダゾールを有効成分とする1%溶
液に60秒間浸漬した。その後水洗し次いで熱風乾燥機
に入れ、120℃で5分加熱した後、熱風乾燥機に入
れ200℃で10分間加熱して測定前にポストフラック
スを刷毛塗りしてスルーホールの半田上りを測定した。
熱風乾燥機に入れ200℃で10分間加熱して測定前
にポストフラックスに浸漬し半田濡れ性試験器を用いて
濡れ時間を測定した。耐湿(90%RH/40℃/9
6hr)処理後の試験片をポストフラックスに浸漬して
半田濡れ性試験器を用いて濡れ時間を測定した。この試
験結果は表1に示した。
[Example] A 1% solution containing 2-cyclobutylbenzimidazole as an active ingredient was placed in a 1-liter container and the liquid temperature was adjusted to 4
The temperature was adjusted to 0 ° C. On the other hand, 1 cm x 5 cm x 0.3
mm copper plate and 10 cm x 12 cm x 1.6 mm through-hole substrate are degreased, washed with water, soft etching, washed with water,
The surface of the test piece was prepared by pickling and washing with water, and the test piece was prepared. The test piece was immersed in a 1% solution containing 2-cyclobutylbenzimidazole as an active ingredient for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. ..
It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Moisture resistance (90% RH / 40 ° C / 9
6 hr) The treated test piece was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 1.

【0008】[0008]

【実施例】2−シクロペンチルベンズイミダゾールを有
効成分とする1%溶液を1リットル容器に入れ、液温を
40℃に加熱し調整した。他方、1cm×5cm×0.
3mmの銅板及び10cm×12cm×1.6mmのス
ルーホール基板を脱脂、水洗、ソフトエッチング、水
洗、酸洗、水洗し表面を洗浄し試験片を準備し、上記2
−シクロペンチベンズルイミダゾールを有効成分とする
1%溶液に60秒間浸漬した。その後水洗し次いで熱風
乾燥機に入れ、120℃で5分加熱した後、熱風乾燥
機に入れ200℃で10分間加熱して測定前にポストフ
ラックスを刷毛塗りしてスルーホールの半田上りを測定
した。熱風乾燥機に入れ200℃で10分間加熱して
測定前にポストフラックスに浸漬し半田濡れ性試験器を
用いて濡れ時間を測定した。対湿(90%RH/40
℃/96hr)処理後の試験片をポストフラックスに浸
漬して半田濡れ性試験器を用いて濡れ時間を測定した。
この試験結果は表1に示した。
EXAMPLE A 1% solution containing 2-cyclopentylbenzimidazole as an active ingredient was placed in a 1-liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm × 5 cm × 0.
A 3 mm copper plate and a 10 cm × 12 cm × 1.6 mm through-hole substrate are degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare the test piece,
-Dip for 60 seconds in a 1% solution of cyclopentibenzlumidimidazole as the active ingredient. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40
(° C / 96 hr) The test piece after the treatment was immersed in post flux and the wetting time was measured using a solder wettability tester.
The test results are shown in Table 1.

【0009】[0009]

【実施例】2−シクロヘキシルベンズイミダゾールを有
効成分とする1%溶液を1リットル容器に入れ、液温を
40℃に加熱し調整した。他方、1cm×5cm×0.
3mmの銅板及び10cm×12cm×1.6mmのス
ルーホール基板を脱脂、水洗、ソフトエッチング、水
洗、酸洗、水洗し表面を洗浄し試験片を準備し、上記2
−シクロヘキシルベンズイミダゾールを有効成分とする
1%溶液に60秒間浸漬した。その後水洗し次いで熱風
乾燥機に入れ、120℃で5分加熱した後、熱風乾燥
機に入れ200℃で10分間加熱して測定前にポストフ
ラックスを刷毛塗りしてスルーホールの半田上りを測定
した。熱風乾燥機に入れ200℃で10分間加熱して
測定前にポストフラックスに浸漬し半田濡れ性試験器を
用いて濡れ時間を測定した。対湿(90%RH/40
℃/96hr)処理後の試験片をポストフラックスに浸
漬して半田濡れ性試験器を用いて濡れ時間を測定した。
この試験結果は表1に示した。
EXAMPLE A 1% solution containing 2-cyclohexylbenzimidazole as an active ingredient was placed in a 1-liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm × 5 cm × 0.
A 3 mm copper plate and a 10 cm × 12 cm × 1.6 mm through-hole substrate are degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare the test piece,
It was immersed for 60 seconds in a 1% solution containing cyclohexylbenzimidazole as the active ingredient. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40
(° C / 96 hr) The test piece after the treatment was immersed in post flux and the wetting time was measured using a solder wettability tester.
The test results are shown in Table 1.

【0010】[0010]

【実施例】2−シクロヘプチルベンズイミダゾールを有
効成分とする1%溶液を1リットル容器に入れ、液温を
40℃に加熱し調整した。他方、1cm×5cm×0.
3mmの銅板及び10cm×12cm×1.6mmのス
ルーホール基板を脱脂、水洗、ソフトエッチング、水
洗、酸洗、水洗し表面を洗浄し試験片を準備し、上記2
−シクロヘプチルベンズイミダゾールを有効成分とする
1%溶液に60秒間浸漬した。その後水洗し次いで熱風
乾燥機に入れ、120℃で5分加熱した後、熱風乾燥
機に入れ200℃で10分間加熱して測定前にポストフ
ラックスを刷毛塗りしてスルーホールの半田上りを測定
した。熱風乾燥機に入れ200℃で10分間加熱して
測定前にポストフラックスに浸漬し半田濡れ性試験器を
用いて濡れ時間を測定した。対湿(90%RH/40
℃/96hr)処理後の試験片をポストフラックスに浸
漬して半田濡れ性試験器を用いて濡れ時間を測定した。
この試験結果は表1に示した。
EXAMPLE A 1% solution containing 2-cycloheptylbenzimidazole as an active ingredient was placed in a 1 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm × 5 cm × 0.
A 3 mm copper plate and a 10 cm × 12 cm × 1.6 mm through-hole substrate are degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare the test piece,
It was immersed for 60 seconds in a 1% solution containing cycloheptylbenzimidazole as the active ingredient. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40
(° C / 96 hr) The test piece after the treatment was immersed in post flux and the wetting time was measured using a solder wettability tester.
The test results are shown in Table 1.

【0011】[0011]

【実施例】2−シクロペンチルメチルベンズイミダゾー
ルを有効成分とする1%溶液を1リットル容器に入れ、
液温を40℃に加熱し調整した。他方、1cm×5cm
×0.3mmの銅板及び10cm×12cm×1.6m
mのスルーホール基板を脱脂、水洗、ソフトエッチン
グ、水洗、酸洗、水洗し表面を洗浄し試験片を準備し、
上記2−シクロペンチルメチルベンズイミダゾールを有
効成分とする1%溶液に60秒間浸漬した。その後水洗
し次いで熱風乾燥機に入れ、120℃で5分加熱した
後、熱風乾燥機に入れ200℃で10分間加熱して測
定前にポストフラックスを刷毛塗りしてスルーホールの
半田上りを測定した。熱風乾燥機に入れ200℃で1
0分間加熱して測定前にポストフラックスに浸漬し半田
濡れ性試験器を用いて濡れ時間を測定した。対湿(9
0%RH/40℃/96hr)処理後の試験片をポスト
フラックスに浸漬して半田濡れ性試験器を用いて濡れ時
間を測定した。この試験結果は表1に示した。
EXAMPLE A 1% solution containing 2-cyclopentylmethylbenzimidazole as an active ingredient was placed in a 1 liter container,
The liquid temperature was adjusted to 40 ° C. by heating. On the other hand, 1 cm x 5 cm
× 0.3mm copper plate and 10cm × 12cm × 1.6m
Prepare the test piece by degreasing, washing with water, soft etching, washing with water, pickling, washing with water on the through-hole substrate of m.
It was immersed for 60 seconds in a 1% solution containing the above-mentioned 2-cyclopentylmethylbenzimidazole as an active ingredient. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. Put in a hot air dryer at 200 ° C for 1
It was heated for 0 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (9
The test piece after the treatment of 0% RH / 40 ° C./96 hr) was dipped in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 1.

【0012】[0012]

【実施例】2−(2−シクロペンチルエチル)ベンズイ
ミダゾールを有効成分とする1%溶液を1リットル容器
に入れ、液温を40℃に加熱し調整した。他方、1cm
×5cm×0.3mmの銅板及び10cm×12cm×
1.6mmのスルーホール基板を脱脂、水洗、ソフトエ
ッチング、水洗、酸洗、水洗し表面を洗浄し試験片を準
備し、上記2−(2−シクロペンチルエチル)ベンズイ
ミダゾールを有効成分とする1%溶液に60秒間浸漬し
た。その後水洗し次いで熱風乾燥機に入れ、120℃で
5分加熱した後、熱風乾燥機に入れ200℃で10分
間加熱して測定前にポストフラックスを刷毛塗りしてス
ルーホールの半田上りを測定した。熱風乾燥機に入れ
200℃で10分間加熱して測定前にポストフラックス
に浸漬し半田濡れ性試験器を用いて濡れ時間を測定し
た。対湿(90%RH/40℃/96hr)処理後の
試験片をポストフラックスに浸漬して半田濡れ性試験器
を用いて濡れ時間を測定した。この試験結果は表2に示
した。
Example A 1% solution containing 2- (2-cyclopentylethyl) benzimidazole as an active ingredient was placed in a 1 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm
× 5 cm × 0.3 mm copper plate and 10 cm × 12 cm ×
A 1.6 mm through-hole substrate was degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and 1% containing 2- (2-cyclopentylethyl) benzimidazole as an active ingredient It was immersed in the solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 2.

【0013】[0013]

【実施例】2−(2−シクロヘキシルエチル)ベンズイ
ミダゾールを有効成分とする1%溶液を1リットル容器
に入れ、液温を40℃に加熱し調整した。他方、1cm
×5cm×0.3mmの銅板及び10cm×12cm×
1.6mmのスルーホール基板を脱脂、水洗、ソフトエ
ッチング、水洗、酸洗、水洗し表面を洗浄し試験片を準
備し、上記2−(2−シクロヘキシルエチル)ベンズイ
ミダゾールを有効成分とする1%溶液に60秒間浸漬し
た。その後水洗し次いで熱風乾燥機に入れ、120℃で
5分加熱した後、熱風乾燥機に入れ200℃で10分
間加熱して測定前にポストフラックスを刷毛塗りしてス
ルーホールの半田上りを測定した。熱風乾燥機に入れ
200℃で10分間加熱して測定前にポストフラックス
に浸漬し半田濡れ性試験器を用いて濡れ時間を測定し
た。対湿(90%RH/40℃/96hr)処理後の
試験片をポストフラックスに浸漬して半田濡れ性試験器
を用いて濡れ時間を測定した。この試験結果は表2に示
した。
[Example] A 1% solution containing 2- (2-cyclohexylethyl) benzimidazole as an active ingredient was placed in a 1-liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm
× 5 cm × 0.3 mm copper plate and 10 cm × 12 cm ×
A 1.6 mm through-hole substrate was degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and 1% containing 2- (2-cyclohexylethyl) benzimidazole as an active ingredient It was immersed in the solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 2.

【0014】[0014]

【実施例】2−(3−シクロヘキシルプロピル)ベンズ
イミダゾールを有効成分とする1%溶液を1リットル容
器に入れ、液温を40℃に加熱し調整した。他方、1c
m×5cm×0.3mmの銅板及び10cm×12cm
×1.6mmのスルーホール基板を脱脂、水洗、ソフト
エッチング、水洗、酸洗、水洗し表面を洗浄し試験片を
準備し、上記2−(3−シクロヘキシルプロピル)ベン
ズイミダゾールを有効成分とする1%溶液に60秒間浸
漬した。その後水洗し次いで熱風乾燥機に入れ、120
℃で5分加熱した後、熱風乾燥機に入れ200℃で1
0分間加熱して測定前にポストフラックスを刷毛塗りし
てスルーホールの半田上りを測定した。熱風乾燥機に
入れ200℃で10分間加熱して測定前にポストフラッ
クスに浸漬し半田濡れ性試験器を用いて濡れ時間を測定
した。対湿(90%RH/40℃/96hr)処理後
の試験片をポストフラックスに浸漬して半田濡れ性試験
器を用いて濡れ時間を測定した。この試験結果は表2に
示した。
EXAMPLE A 1% solution containing 2- (3-cyclohexylpropyl) benzimidazole as an active ingredient was placed in a 1 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1c
m × 5cm × 0.3mm copper plate and 10cm × 12cm
A 1.6 mm through-hole substrate is degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and the above-mentioned 2- (3-cyclohexylpropyl) benzimidazole is used as an active ingredient 1. % Solution for 60 seconds. After that, rinse with water and put in a hot air drier for 120
After heating at ℃ for 5 minutes, put it in a hot air dryer at 200 ℃ for 1
After heating for 0 minutes, a post flux was brush-painted before the measurement to measure the solder rise of the through hole. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 2.

【0015】[0015]

【実施例】2−(4−シクロヘキシルブチル)ベンズイ
ミダゾールを有効成分とする1%溶液を1リットル容器
に入れ、液温を40℃に加熱し調整した。他方、1cm
×5cm×0.3mmの銅板及び10cm×12cm×
1.6mmのスルーホール基板を脱脂、水洗、ソフトエ
ッチング、水洗、酸洗、水洗し表面を洗浄し試験片を準
備し、上記2−(4−シクロヘキシルブチル)ベンズイ
ミダゾールを有効成分とする1%溶液に60秒間浸漬し
た。その後水洗し次いで熱風乾燥機に入れ、120℃で
5分加熱した後、熱風乾燥機に入れ200℃で10分
間加熱して測定前にポストフラックスを刷毛塗りしてス
ルーホールの半田上りを測定した。熱風乾燥機に入れ
200℃で10分間加熱して測定前にポストフラックス
に浸漬し半田濡れ性試験器を用いて濡れ時間を測定し
た。対湿(90%RH/40℃/96hr)処理後の
試験片をポストフラックスに浸漬して半田濡れ性試験器
を用いて濡れ時間を測定した。この試験結果は表2に示
した。
Example A 1% solution containing 2- (4-cyclohexylbutyl) benzimidazole as an active ingredient was placed in a 1-liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm
× 5 cm × 0.3 mm copper plate and 10 cm × 12 cm ×
A 1.6 mm through-hole substrate was degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and 1% containing the above-mentioned 2- (4-cyclohexylbutyl) benzimidazole as an active ingredient It was immersed in the solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 2.

【0016】[0016]

【実施例】2−シクロプロピルベンズイミダゾール、2
−シクロペンチルベンズイミダゾールを有効成分とする
1%混合溶液を1リットル容器に入れ、液温を40℃に
加熱し調整した。他方、1cm×5cm×0.3mmの
銅板及び10cm×12cm×1.6mmのスルーホー
ル基板を脱脂、水洗、ソフトエッチング、水洗、酸洗、
水洗し表面を洗浄し試験片を準備し、上記2−シクロプ
ロピルベンズルイミダゾール、2−シクロペンチルベン
ズイミダゾールを有効成分とする1%混合溶液に60秒
間浸漬した。その後水洗し次いで熱風乾燥機に入れ、1
20℃で5分加熱した後、熱風乾燥機に入れ200℃
で10分間加熱して測定前にポストフラックスを刷毛塗
りしてスルーホールの半田上りを測定した。熱風乾燥
機に入れ200℃で10分間加熱して測定前にポストフ
ラックスに浸漬し半田濡れ性試験器を用いて濡れ時間を
測定した。対湿(90%RH/40℃/96hr)処
理後の試験片をポストフラックスに浸漬して半田濡れ性
試験器を用いて濡れ時間を測定した。この試験結果は表
2に示した。
EXAMPLES 2-Cyclopropylbenzimidazole, 2
-A 1% mixed solution containing cyclopentylbenzimidazole as an active ingredient was placed in a 1-liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, a 1 cm × 5 cm × 0.3 mm copper plate and a 10 cm × 12 cm × 1.6 mm through-hole substrate are degreased, washed with water, soft-etched, washed with water, pickled,
The surface was washed by washing with water to prepare a test piece, and the test piece was immersed in a 1% mixed solution containing 2-cyclopropylbenzimidazole and 2-cyclopentylbenzimidazole as active ingredients for 60 seconds. After that, rinse with water and put in a hot air dryer. 1
After heating at 20 ° C for 5 minutes, put in a hot air dryer to 200 ° C
After heating for 10 minutes, the post flux was brush-painted before the measurement to measure the solder rise of the through hole. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 2.

【0017】[0017]

【実施例】2−(1−メチルシクロプロピル)ベンズイ
ミダゾールを有効成分とする1%溶液を1リットル容器
に入れ、液温を40℃に加熱し調整した。他方、1cm
×5cm×0.3mmの銅板及び10cm×12cm×
1.6mmのスルーホール基板を脱脂、水洗、ソフトエ
ッチング、水洗、酸洗、水洗し表面を洗浄し試験片を準
備し、上記2−(1−メチルシクロプロピル)ベンズイ
ミダゾールを有効成分とする1%溶液に60秒間浸漬し
た。その後水洗し次いで熱風乾燥機に入れ、120℃で
5分加熱した後、熱風乾燥機に入れ200℃で10分
間加熱して測定前にポストフラックスを刷毛塗りしてス
ルーホールの半田上りを測定した。熱風乾燥機に入れ
200℃で10分間加熱して測定前にポストフラックス
に浸漬し半田濡れ性試験器を用いて濡れ時間を測定し
た。対湿(90%RH/40℃/96hr)処理後の
試験片をポストフラックスに浸漬して半田濡れ性試験器
を用いて濡れ時間を測定した。この試験結果は表2に示
した。
Example A 1% solution containing 2- (1-methylcyclopropyl) benzimidazole as an active ingredient was placed in a 1-liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm
× 5 cm × 0.3 mm copper plate and 10 cm × 12 cm ×
A 1.6 mm through-hole substrate is degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and the above-mentioned 2- (1-methylcyclopropyl) benzimidazole is used as an active ingredient 1. % Solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 2.

【0018】[0018]

【実施例】2−(2−メチルシクロプロピル)ベンズイ
ミダゾールを有効成分とする1%溶液を1リットル容器
に入れ、液温を40℃に加熱し調整した。他方、1cm
×5cm×0.3mmの銅板及び10cm×12cm×
1.6mmのスルーホール基板を脱脂、水洗、ソフトエ
ッチング、水洗、酸洗、水洗し表面を洗浄し試験片を準
備し、上記2−(2−メチルシクロプロピル)ベンズイ
ミダゾールを有効成分とする1%溶液に60秒間浸漬し
た。その後水洗し次いで熱風乾燥機に入れ、120℃で
5分加熱した後、熱風乾燥機に入れ200℃で10分
間加熱して測定前にポストフラックスを刷毛塗りしてス
ルーホールの半田上りを測定した。熱風乾燥機に入れ
200℃で10分間加熱して測定前にポストフラックス
に浸漬し半田濡れ性試験器を用いて濡れ時間を測定し
た。対湿(90%RH/40℃/96hr)処理後の
試験片をポストフラックスに浸漬して半田濡れ性試験器
を用いて濡れ時間を測定した。この試験結果は表3に示
した。
Example A 1% solution containing 2- (2-methylcyclopropyl) benzimidazole as an active ingredient was placed in a 1-liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm
× 5 cm × 0.3 mm copper plate and 10 cm × 12 cm ×
A 1.6 mm through-hole substrate is degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and the 2- (2-methylcyclopropyl) benzimidazole is used as an active ingredient 1. % Solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 3.

【0020】[0020]

【実施例】2−(2,2,3,3−テトラメチルプロピ
ル)ベンズイミダゾールを有効成分とする1%溶液を1
リットル容器に入れ、液温を40℃に加熱し調整した。
他方、1cm×5cm×0.3mmの銅板及び10cm
×12cm×1.6mmのスルーホール基板を脱脂、水
洗、ソフトエッチング、水洗、酸洗、水洗し表面を洗浄
し試験片を準備し、上記2−(2,2,3,3−テトラ
メチルプロピル)ベンズイミダゾールを有効成分とする
1%溶液に60秒間浸漬した。その後水洗し次いで熱風
乾燥機に入れ、120℃で5分加熱した後、熱風乾燥
機に入れ200℃で10分間加熱して測定前にポストフ
ラックスを刷毛塗りしてスルーホールの半田上りを測定
した。熱風乾燥機に入れ200℃で10分間加熱して
測定前にポストフラックスに浸漬し半田濡れ性試験器を
用いて濡れ時間を測定した。対湿(90%RH/40
℃/96hr)処理後の試験片をポストフラックスに浸
漬して半田濡れ性試験器を用いて濡れ時間を測定した。
この試験結果は表3に示した。
EXAMPLE A 1% solution containing 2- (2,2,3,3-tetramethylpropyl) benzimidazole as an active ingredient
It was put in a liter container, and the liquid temperature was adjusted to 40 ° C. by heating.
On the other hand, 1 cm x 5 cm x 0.3 mm copper plate and 10 cm
A test piece was prepared by degreasing, washing with water, soft etching, washing with water, pickling, washing with water on a through-hole substrate of × 12 cm × 1.6 mm, and preparing the above-mentioned 2- (2,2,3,3-tetramethylpropyl). ) It was immersed for 60 seconds in a 1% solution containing benzimidazole as an active ingredient. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40
(° C / 96 hr) The test piece after the treatment was immersed in post flux and the wetting time was measured using a solder wettability tester.
The test results are shown in Table 3.

【0021】[0021]

【実施例】2−(1−メチルシクロヘキシル)ベンズイ
ミダゾールを有効成分とする1%溶液を1リットル容器
に入れ、液温を40℃に加熱し調整した。他方、1cm
×5cm×0.3mmの銅板及び10cm×12cm×
1.6mmのスルーホール基板を脱脂、水洗、ソフトエ
ッチング、水洗、酸洗、水洗し表面を洗浄し試験片を準
備し、上記2−(1−メチルシクロヘキシル)ベンズイ
ミダゾールを有効成分とする1%溶液に60秒間浸漬し
た。その後水洗し次いで熱風乾燥機に入れ、120℃で
5分加熱した後、熱風乾燥機に入れ200℃で10分
間加熱して測定前にポストフラックスを刷毛塗りしてス
ルーホールの半田上りを測定した。熱風乾燥機に入れ
200℃で10分間加熱して測定前にポストフラックス
に浸漬し半田濡れ性試験器を用いて濡れ時間を測定し
た。対湿(90%RH/40℃/96hr)処理後の
試験片をポストフラックスに浸漬して半田濡れ性試験器
を用いて濡れ時間を測定した。この試験結果は表3に示
した。
[Example] A 1% solution containing 2- (1-methylcyclohexyl) benzimidazole as an active ingredient was placed in a 1-liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm
× 5 cm × 0.3 mm copper plate and 10 cm × 12 cm ×
A 1.6 mm through-hole substrate was degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and 1% containing 2- (1-methylcyclohexyl) benzimidazole as an active ingredient It was immersed in the solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 3.

【0022】[0022]

【実施例】2−(2−メチルシクロヘキシル)ベンズイ
ミダゾールを有効成分とする1%溶液を1リットル容器
に入れ、液温を40℃に加熱し調整した。他方、1cm
×5cm×0.3mmの銅板及び10cm×12cm×
1.6mmのスルーホール基板を脱脂、水洗、ソフトエ
ッチング、水洗、酸洗、水洗し表面を洗浄し試験片を準
備し、上記2−(2−メチルシクロヘキシル)ベンズイ
ミダゾールを有効成分とする1%溶液に60秒間浸漬し
た。その後水洗し次いで熱風乾燥機に入れ、120℃で
5分加熱した後、熱風乾燥機に入れ200℃で10分
間加熱して測定前にポストフラックスを刷毛塗りしてス
ルーホールの半田上りを測定した。熱風乾燥機に入れ
200℃で10分間加熱して測定前にポストフラックス
に浸漬し半田濡れ性試験器を用いて濡れ時間を測定し
た。対湿(90%RH/40℃/96hr)処理後の
試験片をポストフラックスに浸漬して半田濡れ性試験器
を用いて濡れ時間を測定した。この試験結果は表3に示
した。
Example A 1% solution containing 2- (2-methylcyclohexyl) benzimidazole as an active ingredient was placed in a 1 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm
× 5 cm × 0.3 mm copper plate and 10 cm × 12 cm ×
A 1.6 mm through-hole substrate is degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and 1% containing 2- (2-methylcyclohexyl) benzimidazole as an active ingredient It was immersed in the solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 3.

【0023】[0023]

【実施例】2−(3−メチルシクロヘキシル)ベンズイ
ミダゾールを有効成分とする1%溶液を1リットル容器
に入れ、液温を40℃に加熱し調整した。他方、1cm
×5cm×0.3mmの銅板及び10cm×12cm×
1.6mmのスルーホール基板を脱脂、水洗、ソフトエ
ッチング、水洗、酸洗、水洗し表面を洗浄し試験片を準
備し、上記2−(3−メチルシクロヘキシル)ベンズイ
ミダゾールを有効成分とする1%溶液に60秒間浸漬し
た。その後水洗し次いで熱風乾燥機に入れ、120℃で
5分加熱した後、熱風乾燥機に入れ200℃で10分
間加熱して測定前にポストフラックスを刷毛塗りしてス
ルーホールの半田上りを測定した。熱風乾燥機に入れ
200℃で10分間加熱して測定前にポストフラックス
に浸漬し半田濡れ性試験器を用いて濡れ時間を測定し
た。対湿(90%RH/40℃/96hr)処理後の
試験片をポストフラックスに浸漬して半田濡れ性試験器
を用いて濡れ時間を測定した。この試験結果は表3に示
した。
[Example] A 1% solution containing 2- (3-methylcyclohexyl) benzimidazole as an active ingredient was placed in a 1-liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm
× 5 cm × 0.3 mm copper plate and 10 cm × 12 cm ×
A 1.6 mm through-hole substrate is degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and 1% containing 2- (3-methylcyclohexyl) benzimidazole as an active ingredient It was immersed in the solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 3.

【0024】[0024]

【実施例】2−(4−メチルシクロヘキシル)ベンズイ
ミダゾールを有効成分とする1%溶液を1リットル容器
に入れ、液温を40℃に加熱し調整した。他方、1cm
×5cm×0.3mmの銅板及び10cm×12cm×
1.6mmのスルーホール基板を脱脂、水洗、ソフトエ
ッチング、水洗、酸洗、水洗し表面を洗浄し試験片を準
備し、上記2−(4−メチルシクロヘキシル)ベンズイ
ミダゾールを有効成分とする1%溶液に60秒間浸漬し
た。その後水洗し次いで熱風乾燥機に入れ、120℃で
5分加熱した後、熱風乾燥機に入れ200℃で10分
間加熱して測定前にポストフラックスを刷毛塗りしてス
ルーホールの半田上りを測定した。熱風乾燥機に入れ
200℃で10分間加熱して測定前にポストフラックス
に浸漬し半田濡れ性試験器を用いて濡れ時間を測定し
た。対湿(90%RH/40℃/96hr)処理後の
試験片をポストフラックスに浸漬して半田濡れ性試験器
を用いて濡れ時間を測定した。この試験結果は表4に示
した。
[Example] A 1% solution containing 2- (4-methylcyclohexyl) benzimidazole as an active ingredient was placed in a 1-liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm
× 5 cm × 0.3 mm copper plate and 10 cm × 12 cm ×
A 1.6 mm through-hole substrate is degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and 1% containing 2- (4-methylcyclohexyl) benzimidazole as an active ingredient It was immersed in the solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 4.

【0025】[0025]

【実施例】2−(4−ペンチルシクロヘキシル)ベンズ
イミダゾールを有効成分とする1%溶液を1リットル容
器に入れ、液温を40℃に加熱し調整した。他方、1c
m×5cm×0.3mmの銅板及び10cm×12cm
×1.6mmのスルーホール基板を脱脂、水洗、ソフト
エッチング、水洗、酸洗、水洗し表面を洗浄し試験片を
準備し、上記2−(4−ペンチルシクロヘキシル)ベン
ズイミダゾールを有効成分とする1%溶液に60秒間浸
漬した。その後水洗し次いで熱風乾燥機に入れ、120
℃で5分加熱した後、熱風乾燥機に入れ200℃で1
0分間加熱して測定前にポストフラックスを刷毛塗りし
てスルーホールの半田上りを測定した。熱風乾燥機に
入れ200℃で10分間加熱して測定前にポストフラッ
クスに浸漬し半田濡れ性試験器を用いて濡れ時間を測定
した。対湿(90%RH/40℃/96hr)処理後
の試験片をポストフラックスに浸漬して半田濡れ性試験
器を用いて濡れ時間を測定した。この試験結果は表4に
示した。
EXAMPLE A 1% solution containing 2- (4-pentylcyclohexyl) benzimidazole as an active ingredient was placed in a 1-liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1c
m × 5cm × 0.3mm copper plate and 10cm × 12cm
A 1.6 mm through-hole substrate was degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and the above-mentioned 2- (4-pentylcyclohexyl) benzimidazole was used as an active ingredient 1. % Solution for 60 seconds. After that, rinse with water and put in a hot air drier for 120
After heating at ℃ for 5 minutes, put it in a hot air dryer at 200 ℃ for 1
After heating for 0 minutes, a post flux was brush-painted before the measurement to measure the solder rise of the through hole. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 4.

【0026】[0026]

【実施例】2−シクロペンチルトシルイミダゾールを有
効成分とする1%溶液を1リットル容器に入れ、液温を
40℃に加熱し調整した。他方、1cm×5cm×0.
3mmの銅板及び10cm×12cm×1.6mmのス
ルーホール基板を脱脂、水洗、ソフトエッチング、水
洗、酸洗、水洗し表面を洗浄し試験片を準備し、上記2
−シクロペンチルトシルイミダゾールを有効成分とする
1%溶液に60秒間浸漬した。その後水洗し次いで熱風
乾燥機に入れ、120℃で5分加熱した後、熱風乾燥
機に入れ200℃で10分間加熱して測定前にポストフ
ラックスを刷毛塗りしてスルーホールの半田上りを測定
した。熱風乾燥機に入れ200℃で10分間加熱して
測定前にポストフラックスに浸漬し半田濡れ性試験器を
用いて濡れ時間を測定した。対湿(90%RH/40
℃/96hr)処理後の試験片をポストフラックスに浸
漬して半田濡れ性試験器を用いて濡れ時間を測定した。
この試験結果は表4に示した。
[Example] A 1% solution containing 2-cyclopentylsilimidazole as an active ingredient was placed in a 1-liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm × 5 cm × 0.
A 3 mm copper plate and a 10 cm × 12 cm × 1.6 mm through-hole substrate are degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare the test piece,
It was immersed for 60 seconds in a 1% solution containing cyclopentyl silimidazole as the active ingredient. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40
(° C / 96 hr) The test piece after the treatment was immersed in post flux and the wetting time was measured using a solder wettability tester.
The test results are shown in Table 4.

【0027】[0027]

【実施例】2−(2−シクロペンチルエチル)トシルイ
ミダゾールを有効成分とする1%溶液を1リットル容器
に入れ、液温を40℃に加熱し調整した。他方、1cm
×5cm×0.3mmの銅板及び10cm×12cm×
1.6mmのスルーホール基板を脱脂、水洗、ソフトエ
ッチング、水洗、酸洗、水洗し表面を洗浄し試験片を準
備し、上記2−(2−シクロペンチルエチル)トシルイ
ミダゾールを有効成分とする1%溶液に60秒間浸漬し
た。その後水洗し次いで熱風乾燥機に入れ、120℃で
5分加熱した後、熱風乾燥機に入れ200℃で10分
間加熱して測定前にポストフラックスを刷毛塗りしてス
ルーホールの半田上りを測定した。熱風乾燥機に入れ
200℃で10分間加熱して測定前にポストフラックス
に浸漬し半田濡れ性試験器を用いて濡れ時間を測定し
た。対湿(90%RH/40℃/96hr)処理後の
試験片をポストフラックスに浸漬して半田濡れ性試験器
を用いて濡れ時間を測定した。この試験結果は表4に示
した。
[Example] A 1% solution containing 2- (2-cyclopentylethyl) tosylimidazole as an active ingredient was placed in a 1 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm
× 5 cm × 0.3 mm copper plate and 10 cm × 12 cm ×
A 1.6 mm through-hole substrate is degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and 1% containing 2- (2-cyclopentylethyl) tosylimidazole as an active ingredient It was immersed in the solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 4.

【0028】[0028]

【実施例】2−(1−メチルシクロヘキシル)トシリル
イミダゾールを有効成分とする1%溶液を1リットル容
器に入れ、液温を40℃に加熱し調整した。他方、1c
m×5cm×0.3mmの銅板及び10cm×12cm
×1.6mmのスルーホール基板を脱脂、水洗、ソフト
エッチング、水洗、酸洗、水洗し表面を洗浄し試験片を
準備し、上記2−(1−メチルシクロヘキシル)トシリ
ルイミダゾールを有効成分とする1%溶液に60秒間浸
漬した。その後水洗し次いで熱風乾燥機に入れ、120
℃で5分加熱した後、熱風乾燥機に入れ200℃で1
0分間加熱して測定前にポストフラックスを刷毛塗りし
てスルーホールの半田上りを測定した。熱風乾燥機に
入れ200℃で10分間加熱して測定前にポストフラッ
クスに浸漬し半田濡れ性試験器を用いて濡れ時間を測定
した。対湿(90%RH/40℃/96hr)処理後
の試験片をポストフラックスに浸漬して半田濡れ性試験
器を用いて濡れ時間を測定した。この試験結果は表4に
示した。
Example A 1% solution containing 2- (1-methylcyclohexyl) tosilylimidazole as an active ingredient was placed in a 1-liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1c
m × 5cm × 0.3mm copper plate and 10cm × 12cm
A 1.6 mm through-hole substrate is degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and the above-mentioned 2- (1-methylcyclohexyl) tosilylimidazole is used as an active ingredient. It was immersed in a 1% solution for 60 seconds. After that, rinse with water and put in a hot air drier for 120
After heating at ℃ for 5 minutes, put it in a hot air dryer at 200 ℃ for 1
After heating for 0 minutes, a post flux was brush-painted before the measurement to measure the solder rise of the through hole. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 4.

【0029】[0029]

【実施例】2−シクロペンチルキシリルイミダゾールを
有効成分とする1%溶液を1リットル容器に入れ、液温
を40℃に加熱し調整した。他方、1cm×5cm×
0.3mmの銅板及び10cm×12cm×1.6mm
のスルーホール基板を脱脂、水洗、ソフトエッチング、
水洗、酸洗、水洗し表面を洗浄し試験片を準備し、上記
2−シクロペンチルキシリルイミダゾールを有効成分と
する1%溶液に60秒間浸漬した。その後水洗し次いで
熱風乾燥機に入れ、120℃で5分加熱した後、熱風
乾燥機に入れ200℃で10分間加熱して測定前にポス
トフラックスを刷毛塗りしてスルーホールの半田上りを
測定した。熱風乾燥機に入れ200℃で10分間加熱
して測定前にポストフラックスに浸漬し半田濡れ性試験
器を用いて濡れ時間を測定した。対湿(90%RH/
40℃/96hr)処理後の試験片をポストフラックス
に浸漬して半田濡れ性試験器を用いて濡れ時間を測定し
た。この試験結果は表4に示した。
[Example] A 1% solution containing 2-cyclopentylxylylimidazole as an active ingredient was placed in a 1-liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5 cm x
0.3mm copper plate and 10cm × 12cm × 1.6mm
Degreasing, washing with water, soft etching,
The surface of the test piece was prepared by washing with water, pickling, and washing with water to prepare a test piece, which was then immersed in a 1% solution containing 2-cyclopentylxylylimidazole as an active ingredient for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH /
The test piece after the 40 ° C./96 hr) treatment was dipped in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 4.

【0030】[0030]

【発明の効果】本発明のプレフラックスを、銅又は銅合
金の表面に形成させた被膜は耐熱性に優れ、高温下に曝
された後でもクリーム半田の広がり、濡れ性が良好又リ
フロー半田の半田上がり率、濡れ性も良好という効果
で、且つ、作業環境、安全性の面からもプリント配線板
に電子部品を表面実装するのに、特に顕著な効果を発揮
しうるものである。
The pre-flux of the present invention has a coating film formed on the surface of copper or a copper alloy, which has excellent heat resistance, spreads cream solder well even after being exposed to high temperature, has good wettability, and has excellent reflow solderability. This is particularly effective in terms of good solderability and wettability, and in terms of working environment and safety, in surface mounting electronic components on a printed wiring board.

【表1】 [Table 1]

【表2】 [Table 2]

【表3】 [Table 3]

【表4】 [Table 4]

─────────────────────────────────────────────────────
─────────────────────────────────────────────────── ───

【手続補正書】[Procedure amendment]

【提出日】平成4年9月22日[Submission date] September 22, 1992

【手続補正1】[Procedure Amendment 1]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】全文[Name of item to be corrected] Full text

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【書類名】 明細書[Document name] Statement

【発明の名称】 金属の表面処理方法Title of method for surface treatment of metal

【特許請求の範囲】[Claims]

【化1】 [Chemical 1]

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、金属の防錆処理に関
するものであり、プリント配線板の金属の露出部を防錆
し、半田付け性を向上させる耐熱プリフラックスとして
好適なものである。又、はんだ、無電解はんだ、ニッケ
ル金、銀、亜鉛等の防錆、コネクターのピンホール、無
電解はんだ等に潤滑性を有した封孔処理剤としても好適
なものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a metal rust preventive treatment, and is suitable as a heat-resistant preflux for preventing a metal exposed portion of a printed wiring board from rusting and improving solderability. Also, solder, electroless solder, nickel
Rust prevention of gold, silver, zinc, etc., connector pinholes, no
Also suitable as a sealing agent with lubricity for electrolytic solder, etc.
It is something.

【0002】[0002]

【従来の技術】従来、プリント配線板の銅又は銅合金か
らなる回路部を防錆し、半田付け性を保持する目的で使
用されているプリフラックスは、大別してプリント配線
板全体をコーティングするロジン系プリフラックスと、
選択的に銅又は銅合金と化学反応させるアルキルイミダ
ゾール系プリフラックスの2種類がある。前者は天然ロ
ジン、ロジンエステル、ロジン変成マレイン酸樹脂等
を、有機溶剤に溶解させたものをロールコターで塗布す
るか、噴霧又は浸漬によつてプリント配線板全体に塗布
し、乾燥して被膜を形成する方法で用いられる。このた
め有機溶剤の揮散によって作業環境及び安全性が著しく
損われる欠点がある。又、ロジン系プリフラックスは揮
発性溶剤を使用しているため作業時引火の危険が伴うと
いう欠点も有している。他方、アルキルイミダゾール系
プリフラックスは水溶性であり、作業環境の面でも安全
性の面でも優れているが、化学反応したアルキルイミダ
ゾール銅錯体が高温に曝されると空気中の酸素と銅の触
媒作用で変質してポストフラックスの作用を阻害して、
半田付け性を悪くするという欠点を有している。
2. Description of the Related Art Preflux, which has been conventionally used for the purpose of preventing corrosion of a circuit portion made of copper or a copper alloy of a printed wiring board and maintaining solderability, is roughly classified into a rosin that coats the entire printed wiring board. System preflux,
There are two types of alkylimidazole-based preflux that selectively chemically react with copper or a copper alloy. For the former, apply natural rosin, rosin ester, rosin-modified maleic acid resin, etc. dissolved in an organic solvent with a roll coater, or spray or dip it on the entire printed wiring board and dry to form a film. Used in the method. Therefore, there is a drawback that the working environment and safety are significantly impaired by the volatilization of the organic solvent. In addition, since rosin-based preflux uses a volatile solvent, it also has a drawback that there is a danger of ignition during work. On the other hand, the alkyl imidazole pre-flux is water-soluble and is excellent in terms of working environment and safety, but when the chemically reacted alkyl imidazole copper complex is exposed to high temperature, it is a catalyst of oxygen and copper in the air. It deteriorates by the action and inhibits the action of postflux,
It has the drawback of deteriorating the solderability.

【0003】[0003]

【発明が解決しようとする課題】近年プリント配線板に
電子部品を半田付けする方法として表面実装法が多く採
用されている。この表面実装法、電子部品の仮止めクリ
ーム半田のリフロー等、プリント配線板が高温に曝され
る機会が多くなり、プリント配線板の半田付け性を保持
するために用いられるプリフラックスの耐熱性、即ちプ
リント配線板が高温に曝された後での半田付け性が優れ
ていることがプリフラックスの性能に要求されるように
なった。又、大気汚染等に問題を有する揮発性溶剤を使
用せず、旦つ高温に曝された後でも半田付け性の優れた
プリフラックスの開発が切望されている。
Recently, a surface mounting method has been widely adopted as a method for soldering an electronic component to a printed wiring board. Due to this surface mounting method, reflow of solder paste solder for electronic parts, and the like, the printed wiring board is more often exposed to high temperatures, and the heat resistance of the pre-flux used to maintain the solderability of the printed wiring board, That is, the pre-flux performance is required to have excellent solderability after the printed wiring board is exposed to high temperature. Further, it is desired to develop a preflux which does not use a volatile solvent having a problem of air pollution and has excellent solderability even after being exposed to a high temperature.

【0004】[0004]

【課題を解決するための手段】本発明者らは、このよう
な事情に鑑み、揮発性溶剤を使用せず且つ高温に曝され
た後でも半田付け性の良いプリフラックスに関して鋭意
検討を重ねた結果、酢酸、ヨード酢酸、ブロモ酢酸、パ
ラニトロ安息香酸、パラトルエンスルホン酸、ピクリン
酸、蓚酸、蟻酸、コハク酸、亜りん酸、マレイン酸、ア
クリル酸、フマール酸、酒石酸、アジピン酸、乳酸、オ
レイン酸等の有機酸、塩酸、硫酸、燐酸等の無機酸、又
は酢酸亜鉛、酢酸鉛、水酸化亜鉛、水酸化鉛、化亜
鉛、リン酸亜鉛、酸化亜鉛、塩化亜鉛、塩化第一鉄、塩
化第二鉄、臭化第一銅、臭化第二銅、よう化第一銅、蟻
酸銅、塩化ニッケル、塩化第一銅、塩化第二銅、酸化第
一銅、酸化第二銅、水酸化銅、リン酸銅、炭酸銅、酢酸
銅、硫酸銅等の金属化合物を含む溶液、又はメタノー
ル、エタノール、イソプロピルアルコール、ブタノー
ル、アセトン等の水溶性溶媒、のいずれかの群から選ば
れた少なくとも一つの液と、有効成分として(化1)で
表わされる化合物を1種類又は2種類以上を混合した溶
液を金属表面処理剤として用いる場合には、上述した従
来の問題点を解決し所期の目的を達成出来ることを見出
し、本発明を完成するに至ったものである。(化1)で
表わされる化合物を可溶化あるいは乳化させるために用
いられる上記した有機酸等は、有機酸、有機酸の塩、あ
るいはアルコール等の水溶性溶媒を夫々単独に用いるこ
とができる他、任意の割合で混合して使用することも可
能である。例えば上記水溶性溶媒は単独で用いられる他
有機酸等と併用することもでき、特に有機酸等単独で
は、(化1)で表される化合物あるいはその誘導体の溶
解が困難となる場合には、水溶性溶媒を含有させること
が好ましく、この場合の含有率は0.01〜60%とす
ることが適当である場合が多い。上記各溶媒により溶解
して得られた溶液は、上記有効成分を0.01〜20
%、好ましくは0・5〜5%含有した可溶化溶液あるい
は、乳化溶液に浸漬処理する方法が一般的であり、浸漬
は0〜100℃の温度範囲で浸漬時間は数秒〜数十分の
処理が適当である。又化成被膜形成後、錯体形成処理
赤外線・近赤外線・遠赤外線・紫外線照射処理を0〜3
00℃の温度範囲で、処理時間数秒〜数十分の処理が適
当である。オゾンOに数秒〜数十分の暴露処理が適
当である。過酸化水素水1〜20%の濃度範囲で数秒
〜数十分の浸漬、噴霧の薬液処理が適当である。〜
の処理を行なうことにより耐熱性に優れた化成被膜が出
来る。本発明の金属表面処理剤の有効成分としては、
(化1)が好適なものとして例示される。本発明の表面
処理剤を金属表面又は、プリント配線板の表面に塗布す
るには、浸漬、噴霧による方法を用いる。
In view of such circumstances, the present inventors have made earnest studies on a preflux which does not use a volatile solvent and has good solderability even after being exposed to a high temperature. Results acetic acid, iodoacetic acid, bromoacetic acid , paranitrobenzoic acid, paratoluenesulfonic acid, picric acid, oxalic acid, formic acid, succinic acid, phosphorous acid, maleic acid, acrylic acid, fumaric acid, tartaric acid, adipic acid, lactic acid, olein organic acids such as acids, hydrochloric, sulfuric, inorganic acids phosphoric, etc., or zinc acetate, lead acetate, zinc hydroxide, lead hydroxide, bromide, zinc phosphate, zinc oxide, zinc chloride, ferrous chloride, Ferric chloride, cuprous bromide, cupric bromide, cuprous iodide, ants
Copper acid , nickel chloride, cuprous chloride, cupric chloride, cuprous oxide, cupric oxide, copper hydroxide, copper phosphate, copper carbonate, copper acetate, a solution containing a metal compound such as copper sulfate, Or at least one liquid selected from the group consisting of water-soluble solvents such as methanol, ethanol, isopropyl alcohol, butanol, and acetone, and one or more kinds of the compound represented by (Chemical formula 1) as an active ingredient. The present invention has been completed by finding that the above-mentioned conventional problems can be solved and the intended purpose can be achieved when a solution obtained by mixing the above is used as a metal surface treatment agent. As the above-mentioned organic acid or the like used for solubilizing or emulsifying the compound represented by (Chemical Formula 1), an organic acid, a salt of an organic acid, or a water-soluble solvent such as alcohol can be used alone, respectively. It is also possible to mix and use it at an arbitrary ratio. For example, the above water-soluble solvent may be used alone or in combination with other organic acids. In particular, when the organic acid or the like alone makes it difficult to dissolve the compound represented by (Chemical Formula 1) or its derivative, It is preferable to contain a water-soluble solvent, and the content ratio in this case is often appropriate to be 0.01 to 60%. The solution obtained by dissolving each of the above-mentioned solvents contains 0.01 to 20 of the above-mentioned active ingredient.
%, Preferably 0.5 to 5% of a solubilized solution or an emulsified solution is generally used for the immersion treatment. The immersion is performed at a temperature range of 0 to 100 ° C. for an immersion time of several seconds to several tens of minutes. Is appropriate. In addition, after forming the chemical conversion film, complex formation treatment infrared, near infrared, far infrared, and ultraviolet irradiation treatment is performed 0 to 3 times.
A treatment with a treatment time of several seconds to several tens of minutes in the temperature range of 00 ° C. is suitable. Exposure treatment of ozone O 3 for several seconds to several tens of minutes is appropriate. It is suitable to carry out chemical treatment such as immersion and spraying for several seconds to several tens of minutes in a concentration range of hydrogen peroxide water of 1 to 20%. ~
By carrying out the above treatment, a chemical conversion coating having excellent heat resistance can be formed. As the active ingredient of the metal surface treating agent of the present invention,
(Chemical formula 1) is illustrated as a suitable example. To apply the surface treatment agent of the present invention to a metal surface or the surface of a printed wiring board, a method of dipping or spraying is used.

【0005】[0005]

【作用】上記したプリフラックスの処理方法によれば、
クリーム半田の広がり性、濡れ性及びリフロー後の半田
上がり率、濡れ性が良好で、且つ作業環境、安全性の面
からも優れたプリント配線板の製造ができる。
According to the above method of treating preflux,
It is possible to manufacture a printed wiring board which has good spreadability and wettability of cream solder, a solder rising rate after reflow, and wettability, and is excellent in terms of working environment and safety.

【0006】[0006]

【実施例】2−シクロプロピルベンズイミダゾール
%、蟻酸、アンモニア、臭化第二銅を含む溶液を1リッ
トル容器に入れ、液温を40゜Cに加熱し調整した。他
方、1cm×5cm×0.3mmの銅板及び10cm×
12cm×1.6mmのスルーホール基板を脱脂、水
洗、ソフトエッチング、水洗、酸洗、水洗し表面を洗浄
した試料片を準備し、上記2−シクロプロピルベンズイ
ミダゾールを有効成分とする1%溶液に60秒間浸漬し
た。その後水洗し次いで熱風乾燥機に入れ、120℃で
5分加熱した後、熱風乾燥機に入れ200℃で10分
間加熱して測定前にポストフラックスを刷毛塗りしてス
ルーホールの半田上りを測定した。熱風乾燥機に入れ
200℃で10分間加熱して測定前にポストフラックス
に浸漬し半田濡れ性試験器を用いて濡れ時間を測定し
た。耐湿(90%RH/40℃/96hr)処理後の
試験片をポストフラックスに浸漬して半田濡れ性試験機
を用いて濡れ時間を測定した。この試験結果は表1に示
した。
Examples 2-Cyclopropylbenzimidazole 1
%, Formic acid, ammonia and cupric bromide were placed in a 1 liter container and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5 cm x 0.3 mm copper plate and 10 cm x
A 12 cm x 1.6 mm through-hole substrate was degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a sample piece, and prepared into a 1% solution containing 2-cyclopropylbenzimidazole as an active ingredient. It was immersed for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the moisture resistance (90% RH / 40 ° C./96 hr) treatment was dipped in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 1.

【表1】 [Table 1]

【0007】[0007]

【実施例】2−シクロブチルベンズイミダゾール1%、
蟻酸、アンモニア、塩化第二銅を含む溶液を1リットル
容器に入れ、液温を40℃に加熱し調整した。他方、1
cm×5cm×0.3mmの銅板及び10cm×12c
m×1.6mmのスルーホール基板を脱脂、水洗、ソフ
トエッチング、水洗、酸洗、水洗し表面を洗浄し試験片
を準備し、上記2−シクロブチルベンズイミダゾールを
有効成分とする1%溶液に60秒間浸漬した。その後水
洗し次いで熱風乾燥機に入れ、120℃で5分加熱した
後、熱風乾燥機に入れ200℃で10分間加熱して測
定前にポストフラックスを刷毛塗りしてスルーホールの
半田上りを測定した。熱風乾燥機に入れ200℃で1
0分間加熱して測定前にポストフラックスに浸漬し半田
濡れ性試験器を用いて濡れ時間を測定した。耐湿(9
0%RH/40℃/96hr)処理後の試験片をポスト
フラックスに浸潰して半田濡れ性試験器を用いて濡れ時
間を測定した。この試験結果は表2に示した。
Examples 1% of 2-cyclobutylbenzimidazole ,
A solution containing formic acid, ammonia, and cupric chloride was placed in a 1-liter container and the liquid temperature was adjusted to 40 ° C. On the other hand, 1
cm × 5 cm × 0.3 mm copper plate and 10 cm × 12 c
Prepare a test piece by degreasing, washing with water, soft etching, washing with water, pickling, washing the surface of a through-hole substrate of m × 1.6 mm with a 1% solution containing 2-cyclobutylbenzimidazole as an active ingredient. It was immersed for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. Put in a hot air dryer at 200 ° C for 1
It was heated for 0 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Moisture resistance (9
The test piece after 0% RH / 40 ° C./96 hr) treatment was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 2 .

【表2】 [Table 2]

【0008】[0008]

【実施例】2−シクロベンチルベンズイミダゾール
%、蟻酸、アンモニア、塩化第二銅を含む溶液を1リッ
トル容器に入れ、液温を40℃に加熱し調整した。他
方、1cm×5cm×0.3mmの銅板及び10cm×
12cm×1.6mmのスルーホール基板を脱脂、水
洗、ソフトエッチング、水洗、酸洗、水洗し表面を洗浄
し試験片を準備し、上記2−シクロベンチベンズルイミ
ダゾールを有効成分とする1%溶液に60秒間浸漬し
た。その後水洗し次いで熱風乾燥機に入れ、120℃で
5分加熱した後、熱風乾燥機に入れ200℃で10分
間加熱して測定前にポストフラックスを刷毛塗りしてス
ルーホールの半田上りを測定した。熱風乾燥機に入れ
200℃で10分間加熱して測定前にポストフラックス
に浸漬し半田濡れ性試験器を用いて濡れ時間を測定し
た。対湿(90%RH/40℃/96hr)処理後の
試験片をポストフラックスに浸漬して半田濡れ性試験器
を用いて濡れ時間を測定した。この試験結果は表3に示
した。
EXAMPLE 2-Cyclobenthylbenzimidazole 1
%, Formic acid, ammonia and cupric chloride were placed in a 1 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5 cm x 0.3 mm copper plate and 10 cm x
A test piece is prepared by degreasing, washing with water, soft etching, washing with water, pickling, washing the surface of a 12 cm × 1.6 mm through-hole substrate, and preparing a test piece, and a 1% solution containing the above-mentioned 2-cyclobenchbenzimidazole as an active ingredient. Was soaked for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 3 .

【表3】 [Table 3]

【0009】[0009]

【実施例】2−シクロヘキシルベンズイミダゾール
%、蟻酸、アンモニア、塩化第二銅をを含む溶液を1リ
ットル容器に入れ、液温を40℃に加熱し調整した。他
方、1cm×5cm×0.3mmの銅板及び10cm×
12cm×1.6mmのスルーホール基板を脱脂、水
洗、ソフトエッチング、水洗、酸洗、水洗し表面を洗浄
し試験片を準備し、上記2−シクロヘキシルベンズイミ
ダゾールを有効成分とする1%溶液に60秒間浸漬し
た。その後水洗し次いで熱風乾燥機に入れ、120℃で
5分加熱した後、熱風乾燥機に入れ200℃で10分
間加熱して測定前にポストフラックスを刷毛塗りしてス
ルーホールの半田上りを測定した。熱風乾燥機に入れ
200℃で10分間加熱して測定前にポストフラックス
に浸漬し半田濡れ性試験器を用いて濡れ時間を測定し
た。対湿(90%RH/40℃/96hr)処理後の
試験片をポストフラックスに浸漬して半田濡れ性試験器
を用いて濡れ時間を測定した。この試験結果は表4に示
した。
EXAMPLE 2-Cyclohexylbenzimidazole 1
%, Formic acid, ammonia and cupric chloride were placed in a 1 liter container, and the liquid temperature was adjusted to 40 ° C. by heating. On the other hand, 1 cm x 5 cm x 0.3 mm copper plate and 10 cm x
A 12 cm × 1.6 mm through-hole substrate is degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and a 1% solution containing 2-cyclohexylbenzimidazole as an active ingredient is added to the 60% solution. Soaked for 2 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 4 .

【表4】 [Table 4]

【0010】[0010]

【実施例】2−シクロヘプチルベンズイミダゾール
%、蟻酸、アンモニア、塩化第二銅を含む溶液を1リッ
トル容器に入れ、液温を40℃に加熱し調整した。他
方、1cm×5cm×0.3mmの銅板及び10cm×
12cm×1.6mmのスルーホール基板を脱脂、水
洗、ソフトエッチング、水洗、酸洗、水洗し表面を洗浄
し試験片を準備し、上記2−シクロヘプチルベンズイミ
ダゾールを有効成分とする1%溶液に60秒間浸漬し
た。その後水洗し次いで熱風乾燥機に入れ、120℃で
5分加熱した後、熱風乾燥機に入れ200℃で10分
間加熱して測定前にポストフラックスを刷毛塗りしてス
ルーホールの半田上りを測定した。熱風乾燥機に入れ
200℃で10分間加熱して測定前にポストフラックス
に浸漬し半田濡れ性試験器を用いて濡れ時間を測定し
た。対湿(90%RH/40℃/96hr)処理後の
試験片をポストフラックスに浸漬して半田濡れ性試験器
を用いて濡れ時間を測定した。この試験結果は表5に示
した。
EXAMPLE 2-Cycloheptylbenzimidazole 1
%, Formic acid, ammonia and cupric chloride were placed in a 1 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm x 5 cm x 0.3 mm copper plate and 10 cm x
Prepare a test piece by degreasing, washing with water, soft etching, washing with water, pickling, washing the surface of a 12 cm × 1.6 mm through-hole substrate, and prepare a 1% solution containing the above 2-cycloheptylbenzimidazole as an active ingredient. It was immersed for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 5 .

【表5】 [Table 5]

【0011】[0011]

【実施例】2−シクロペンチルメチルベンズイミダゾー
1%、蟻酸、アンモニア、塩化第二銅を含む溶液を1
リットル容器に入れ、液温を40℃に加熱し調整した他
方、1cm×5cm×0.3mmの銅板及び10cm×
12cm×1.6mmのスルーホール基板を脱脂、水
洗、ソフトエッチング、水洗、酸洗、水洗し表面を洗浄
し試験片を準備し、上記2−シクロペンチルメチルベン
ズイミダゾールを有効成分とする1%溶液に60秒間浸
漬した。その後水洗し次いで熱風乾燥機に入れ、120
℃で5分加熱した後、熱風乾燥機に入れ200℃で1
0分間加熱して測定前にポストフラックスを刷毛塗りし
てスルーホールの半田上りを測定した。熱風乾燥機に
入れ200℃で10分間加熱して測定前にポストフラッ
クスに浸漬し半田濡れ性試験器を用いて濡れ時間を測定
した。対湿(90%RH/40℃/96hr)処理後
の試験片をポストフラックスに浸漬して半田濡れ性試験
器を用いて濡れ時間を測定した。この試験結果は表6
示した。
Example 1 A solution containing 1% of 2-cyclopentylmethylbenzimidazole , formic acid, ammonia and cupric chloride was used.
In a liter container, the liquid temperature was adjusted to 40 ° C by heating, while the 1 cm x 5 cm x 0.3 mm copper plate and 10 cm x
A 12 cm × 1.6 mm through-hole substrate is degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and then a 1% solution containing 2-cyclopentylmethylbenzimidazole as an active ingredient is prepared. It was immersed for 60 seconds. After that, rinse with water and put in a hot air drier for 120
After heating at ℃ for 5 minutes, put it in a hot air dryer at 200 ℃ for 1
After heating for 0 minutes, a post flux was brush-painted before the measurement to measure the solder rise of the through hole. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 6 .

【表6】 [Table 6]

【0012】[0012]

【実施例】2−(2−シクロペンチルエチル)ベンズイ
ミダゾール1%、蟻酸、アンモニア、塩化第二銅を含む
溶液を1リットル容器に入れ、液温を40℃に加熱し調
整した。他方、1cm×5cm×0.3mmの銅板及び
10cm×12cm×1.6mmのスルーホール基板を
脱脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表
面を洗浄し試験片を準備し、上記2−(2−シクロペン
チルエチル)ベンズイミダゾールを有効成分とする1%
溶液に60秒間浸漬した。その後水洗し次いで熱風乾燥
機に入れ、120℃で5分加熱した後、熱風乾燥機に
入れ200℃で10分間加熱して測定前にポストフラッ
クスを刷毛塗りしてスルーホールの半田上りを測定し
た。熱風乾燥機に入れ200℃で10分間加熱して測
定前にポストフラックスに浸漬し半田濡れ性試験器を用
いて濡れ時間を測定した。対湿(90%RH/40℃
/96hr)処理後の試験片をポストフラックスに浸漬
して半田濡れ性試験器を用いて濡れ時間を測定した。こ
の試験結果は表7に示した。
Example A solution containing 1% of 2- (2-cyclopentylethyl) benzimidazole , formic acid, ammonia and cupric chloride was placed in a 1 liter container, and the solution temperature was adjusted to 40 ° C. On the other hand, a 1 cm × 5 cm × 0.3 mm copper plate and a 10 cm × 12 cm × 1.6 mm through-hole substrate were degreased, washed with water, soft etching, washed with water, pickled, washed with water to prepare a test piece, 1% containing-(2-cyclopentylethyl) benzimidazole as an active ingredient
It was immersed in the solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40 ℃
/ 96 hr) The test piece after the treatment was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 7 .

【表7】 [Table 7]

【0013】[0013]

【実施例】2−(2−シクロヘキシルエチル)ベンズイ
ミダゾール1%、蟻酸、アンモニア、塩化第二銅を含む
溶液を1リットル容器に入れ、液温を40℃に加熱し調
整した。他方、1cm×5cm×0.3mmの銅板及び
10cm×12cm×1.6mmのスルーホール基板を
脱脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表
面を洗浄し試験片を準備し、上記2−(2−シクロヘキ
シルエチル)ベンズイミダゾールを有効成分とする1%
溶液に60秒間浸漬した。その後水洗し次いで熱風乾燥
機に入れ、120℃で5分加熱した後、熱風乾燥機に
入れ200℃で10分間加熱して測定前にポストフラッ
クスを刷毛塗りしてスルーホールの半田上りを測定し
た。熱風乾燥機に入れ200℃で10分間加熱して測
定前にポストフラックスに浸漬し半田濡れ性試験器を用
いて濡れ時間を測定した。対湿(90%RH/40℃
/96hr)処理後の試験片をポストフラックスに浸漬
して半田濡れ性試験器を用いて濡れ時間を測定した。こ
の試験結果は表8に示した。
EXAMPLE A solution containing 1% of 2- (2-cyclohexylethyl) benzimidazole , formic acid, ammonia and cupric chloride was placed in a 1 liter container and the liquid temperature was adjusted to 40 ° C. On the other hand, a 1 cm × 5 cm × 0.3 mm copper plate and a 10 cm × 12 cm × 1.6 mm through-hole substrate were degreased, washed with water, soft etching, washed with water, pickled, washed with water to prepare a test piece, 1% containing-(2-cyclohexylethyl) benzimidazole as an active ingredient
It was immersed in the solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40 ℃
/ 96 hr) The test piece after the treatment was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 8 .

【表8】 [Table 8]

【0014】[0014]

【実施例】2−(3−シクロヘキシルプロピル)ベンズ
イミダゾール1%、蟻酸、アンモニア、塩化第二銅を含
溶液を1リットル容器に入れ、液温を40℃に加熱し
調整した。他方、1cm×5cm×0.3mmの銅板及
び10cm×12cm×1.6mmのスルーホール基板
を脱脂、水洗、ソフトエッチング、水洗、酸洗、水洗し
表面を洗浄し試験片を準備し、上記2−(3−シクロヘ
キシルプロピル)ベンズイミダゾールを有効成分とする
1%溶液に60秒間浸漬した。その後水洗し次いで熱風
乾燥機に入れ、120℃で5分加熱した後、熱風乾燥
機に入れ200℃で10分間加熱して測定前にポストフ
ラックスを刷毛塗りしてスルーホールの半田上りを測定
した。熱風乾燥機に入れ200℃で10分間加熱して
測定前にポストフラックスに浸漬し半田濡れ性試験器を
用いて濡れ時間を測定した。対湿(90%RH/40
℃/96hr)処理後の試験片をポストフラックスに浸
漬して半田濡れ性試験器を用いて濡れ時間を測定した。
この試験結果は表9に示した。
Example: 1% of 2- (3-cyclohexylpropyl) benzimidazole , formic acid, ammonia, cupric chloride
The solution was placed in a 1 liter container and the liquid temperature was adjusted to 40 ° C. On the other hand, a 1 cm × 5 cm × 0.3 mm copper plate and a 10 cm × 12 cm × 1.6 mm through-hole substrate were degreased, washed with water, soft etching, washed with water, pickled, washed with water to prepare a test piece, It was immersed for 60 seconds in a 1% solution containing-(3-cyclohexylpropyl) benzimidazole as an active ingredient. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40
(° C / 96 hr) The test piece after the treatment was immersed in post flux and the wetting time was measured using a solder wettability tester.
The test results are shown in Table 9 .

【表9】 [Table 9]

【0015】[0015]

【実施例】2−(4−シクロヘキシルブチル)ベンズイ
ミダゾール1%、蟻酸、アンモニア、塩化第二銅を含む
溶液を1リットル容器に入れ、液温を40℃に加熱し調
整した。他方、1cm×5cm×0.3mmの銅板及び
10cm×12cm×1.6mmのスルーホール基板を
脱脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表
面を洗浄し試験片を準備し、上記2−(4−シクロヘキ
シルブチル)ベンズイミダゾールを有効成分とする1%
溶液に60秒間浸漬した。その後水洗し次いで熱風乾燥
機に入れ、120℃で5分加熱した後、熱風乾燥機に
入れ200℃で10分間加熱して測定前にポストフラッ
クスを刷毛塗りしてスルーホールの半田上りを測定し
た。熱風乾燥機に入れ200℃で10分間加熱して測
定前にポストフラックスに浸漬し半田濡れ性試験器を用
いて濡れ時間を測定した。対湿(90%RH/40℃
/96hr)処理後の試験片をポストフラックスに浸漬
して半田濡れ性試験器を用いて濡れ時間を測定した。こ
の試験結果は表10に示した。
Example A solution containing 1% of 2- (4-cyclohexylbutyl) benzimidazole , formic acid, ammonia and cupric chloride was placed in a 1 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, a 1 cm × 5 cm × 0.3 mm copper plate and a 10 cm × 12 cm × 1.6 mm through-hole substrate were degreased, washed with water, soft etching, washed with water, pickled, washed with water to prepare a test piece, 1% containing-(4-cyclohexylbutyl) benzimidazole as an active ingredient
It was immersed in the solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40 ℃
/ 96 hr) The test piece after the treatment was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 10 .

【表10】 [Table 10]

【0016】[0016]

【実施例】2−シクロプロピルベンズイミダゾール0.
5%、2−シクロペンチルベンズイミダゾール0.5%
蟻酸、アンモニア、塩化第二銅を含む溶液を1リットル
容器に入れ、液温を40℃に加熱し調整した。他方、1
cm×5cm×0.3mmの銅板及び10cm×12c
m×1.6mmのスルーホール基板を脱脂、水洗、ソフ
トエッチング、水洗、酸洗、水洗し表面を洗浄し試験片
を準備し、上記2−シクロプロピルベンズルイミダゾー
ル、2−シクロベンチルベンズイミダゾールを有効成分
とする1%混合溶液に60秒間浸漬した。その後水洗し
次いで熱風乾燥機に入れ、120℃で5分加熱した後、
熱風乾燥機に入れ200℃で10分間加熱して測定前
にポストフラックスを刷毛塗りしてスルーホールの半田
上りを測定した。熱風乾燥機に入れ200℃で10分
間加熱して測定前にポストフラックスに浸漬し半田濡れ
性試験器を用いて濡れ時間を測定した。対湿(90%
RH/40℃/96hr)処理後の試験片をポストフラ
ックスに浸漬して半田濡れ性試験器を用いて濡れ時間を
測定した。この試験結果は表11に示した。
EXAMPLES 2-cyclopropyl benzimidazole 0.
5%, 2-cyclopentylbenzimidazole 0.5%
A solution containing formic acid, ammonia, and cupric chloride was placed in a 1-liter container and the liquid temperature was adjusted to 40 ° C. On the other hand, 1
cm × 5 cm × 0.3 mm copper plate and 10 cm × 12 c
A test piece was prepared by degreasing, washing with water, soft etching, washing with water, pickling, washing with water the through hole substrate of m × 1.6 mm to prepare a test piece, and the above-mentioned 2-cyclopropylbenzimidazole, 2-cyclobenthylbenzimidazole. It was immersed for 60 seconds in a 1% mixed solution containing as an active ingredient. After that, rinse with water, put in a hot air dryer, and heat at 120 ° C for 5 minutes,
It was put in a hot air dryer and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder buildup of the through hole. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90%
The test piece after RH / 40 ° C./96 hr) treatment was dipped in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 11 .

【表11】 [Table 11]

【0017】[0017]

【実施例】2−(1−メチルシクロプロピル)ベンズイ
ミダゾール1%、蟻酸、アンモニア、塩化第二銅を含む
溶液を1リットル容器に入れ、液温を40℃に加熱し調
整した。他方、1cm×5cm×0.3mm0銅板及び
10cm×12cm×1.6mmのスルーホール基板を
脱脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表
面を洗浄し試験片を準備し、上記2−(1−メチルシク
ロプロピル)ベンズイミダゾールを有効成分とする1%
溶液に60秒間浸漬した。その後水洗し次いで熱風乾燥
機に入れ、120℃で5分加熱した後、熱風乾燥機に
入れ200℃で10分間加熱して測定前にポストフラッ
クスを刷毛塗りしてスルーホールの半田上りを測定し
た。熱風乾燥機に入れ200℃で10分間加熱して測
定前にポストフラックスに浸漬し半田濡れ性試験器を用
いて濡れ時間を測定した。対湿(90%RH/40℃
/96hr)処理後の試験片をポストフラックスに浸漬
して半田濡れ性試験器を用いて濡れ時間を測定した。こ
の試験結果は表12に示した。
Example: A solution containing 1% of 2- (1-methylcyclopropyl) benzimidazole , formic acid, ammonia and cupric chloride was placed in a 1 liter container, and the solution temperature was adjusted to 40 ° C. .. On the other hand, a 1 cm × 5 cm × 0.3 mm0 copper plate and a 10 cm × 12 cm × 1.6 mm through-hole substrate were degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and the above-mentioned 2- 1% with (1-methylcyclopropyl) benzimidazole as active ingredient
It was immersed in the solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40 ℃
/ 96 hr) The test piece after the treatment was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 12 .

【表12】 [Table 12]

【0018】[0018]

【実施例】2−(2−メチルシクロプロピル)ベンズイ
ミダゾール1%、蟻酸、アンモニア、塩化第二銅を含
溶液を1リットル容器に入れ、液温を40℃に加熱し調
整した。他方、1cm×5cm×0.3mmの銅板及び
10cm×12cm×1.6mmのスルーホール基板を
脱脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表
面を洗浄し試験片を準備し、上記2−(2−メチルシク
ロプロピル)ベンズイミダゾールを有効成分とする1%
溶液に60秒間浸漬した。その後水洗し次いで熱風乾燥
機に入れ、120℃で5分加熱した後、熱風乾燥機に
入れ200℃で10分間加熱して測定前にポストフラッ
クスを刷毛塗りしてスルーホールの半田上りを測定し
た。熱風乾燥機に入れ200℃で10分間加熱して測
定前にポストフラックスに浸漬し半田濡れ性試験器を用
いて濡れ時間を測定した。対湿(90%RH/40℃
/96hr)処理後の試験片をポストフラックスに浸漬
して半田濡れ性試験器を用いて濡れ時間を測定した。こ
の試験結果は表13に示した。
EXAMPLES 2- (2-methylcyclopropyl) benzimidazole 1% formic acid, ammonia, placed in cupric chloride including solution to 1 liter vessel was adjusted by heating at a liquid temperature of 40 ° C.. On the other hand, a 1 cm × 5 cm × 0.3 mm copper plate and a 10 cm × 12 cm × 1.6 mm through-hole substrate were degreased, washed with water, soft etching, washed with water, pickled, washed with water to prepare a test piece, 1% containing-(2-methylcyclopropyl) benzimidazole as an active ingredient
It was immersed in the solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40 ℃
/ 96 hr) The test piece after the treatment was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 13 .

【表13】 [Table 13]

【0019】[0019]

【実施例】2−シクロヘキシルメチルベンズイミダゾーExample: 2-Cyclohexylmethylbenzimidazo
ル1%、蟻酸、アンモニア、塩化第二銅を含む溶液を11% solution containing formic acid, ammonia and cupric chloride
リットル容器に入れ、液温を40℃に加熱し調整した。It was put in a liter container, and the liquid temperature was adjusted to 40 ° C. by heating.
他方、1cm×5cm×0.3mmの銅及び10cm×On the other hand, 1 cm x 5 cm x 0.3 mm copper and 10 cm x
12cm×1.6mmのスルーホール基板を脱脂、水Degreasing a 12 cm x 1.6 mm through-hole board with water
洗、ソフトエッチング、水洗、酸洗、水洗し表面を洗浄Washing, soft etching, washing with water, pickling, washing with water to clean the surface
し試験片を準備し、上記2−シクロヘキシルメチルベンThen prepare a test piece, and
ズイミダゾールを有効成分とする1%溶液に60秒間浸Soak for 60 seconds in a 1% solution containing zimidazole as the active ingredient.
漬した。その後水洗し次いで熱風乾燥機に入れ、120Pickled After that, wash with water and put in a hot air drier for 120
℃で5分加熱した後、熱風乾燥機に入れ200℃で1After heating at ℃ for 5 minutes, put it in a hot air dryer at 200 ℃ for 1
0分間加熱して測定前にポストフラックスを刷毛塗りしHeat for 0 minutes and brush with post flux before measurement
てスルーホールの半田上りを測定した。熱風乾燥機にThe solder rise of the through hole was measured. For hot air dryer
入れ200℃で10分間加熱して測定前にポストフラッPut it in the oven and heat it at 200 ℃ for 10 minutes, and post-
クスに浸漬し半田濡れ性試験器を用いて濡れ時間を測定And wetting time is measured using a solder wettability tester
した。対湿(90%RH/40℃/96hr)処理後did. After treatment against humidity (90% RH / 40 ° C / 96hr)
の試験片をポストフラックスに浸漬して半田濡れ性試験Solder wettability test by immersing the test piece of
器を用いて濡れ時間を測定した。この試験結果は表14Wetting time was measured using a vessel. The test results are shown in Table 14.
に示した。It was shown to.

【表14】 [Table 14]

【0020】[0020]

【実施例】2−(2,2,3,3−テトラメチルプロピ
ル)ベンズイミダゾール1%、蟻酸、アンモニア、塩化
第二銅を含む溶液を1リットル容器に入れ、液温を40
℃に加熱し調整した。他方、1cm×5cm×0.3m
mの銅板及び10cm×12cm×1.6mmのスルー
ホール基板を脱脂、水洗、ソフトエッチング、水洗、酸
洗、水洗し表面を洗浄し試験片を準備し、上記2−
(2,2,3,3−テトラメチルプロピル)ベンズイミ
ダゾールを有効成分とする1%溶液に60秒間浸漬し
た。その後水洗し次いで熱風乾燥機に入れ、120℃で
5分加熱した後、熱風乾燥機に入れ200℃で10分
間加熱して測定前にポストフラックスを刷毛塗りしてス
ルーホールの半田上りを測定した。熱風乾燥機に入れ
200℃で10分間加熱して測定前にポストフラックス
に浸漬し半田濡れ性試験器を用いて濡れ時間を測定し
た。対湿(90%RH/40℃/96hr)処理後の
試験片をポストフラックスに浸漬して半田濡れ性試験器
を用いて濡れ時間を測定した。この試験結果は表15
示した。
Example 1 2- (2,2,3,3-tetramethylpropyl) benzimidazole 1%, formic acid, ammonia, chloride
Put the solution containing cupric acid in a 1 liter container and adjust the temperature to 40
The temperature was adjusted to 0 ° C. On the other hand, 1 cm x 5 cm x 0.3 m
A copper plate of m and a through-hole substrate of 10 cm × 12 cm × 1.6 mm are degreased, washed with water, soft etching, washed with water, pickled, washed with water to prepare a test piece, and the above-mentioned 2-
It was immersed for 60 seconds in a 1% solution containing (2,2,3,3-tetramethylpropyl) benzimidazole as an active ingredient. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 15 .

【表15】 [Table 15]

【0021】[0021]

【実施例】2−(1−メチルシクロヘキシル)ベンズイ
ミダゾール1%、蟻酸、アンモニア、塩化第二銅を含む
溶液を1リットル容器に入れ、液温を40℃に加熱し調
整した。他方、1cm×5cm×0.3mmの銅板及び
10cm×12cm×1.6mmのスルーホール基板を
脱脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表
面を洗浄し試験片を準備し、上記2−(1−メチルシク
ロヘキシル)ベンズイミダゾールを有効成分とする1%
溶液に60秒間浸漬した。その後水洗し次いで熱風乾燥
機に入れ、120℃で5分加熱した後、熱風乾燥機に
入れ200℃で10分間加熱して測定前にポストフラッ
クスを刷毛塗りしてスルーホールの半田上りを測定し
た。熱風乾燥機に入れ200℃で10分間加熱して測
定前にポストフラックスに浸漬し半田濡れ性試験器を用
いて濡れ時間を測定した。対湿(90%RH/40℃
/96hr)処理後の試験片をポストフラックスに浸漬
して半田濡れ性試験器を用いて濡れ時間を測定した。こ
の試験結果は表16に示した。
Example A solution containing 1% of 2- (1-methylcyclohexyl) benzimidazole , formic acid, ammonia and cupric chloride was placed in a 1 liter container and the liquid temperature was adjusted to 40 ° C. On the other hand, a 1 cm × 5 cm × 0.3 mm copper plate and a 10 cm × 12 cm × 1.6 mm through-hole substrate were degreased, washed with water, soft etching, washed with water, pickled, washed with water to prepare a test piece, 1% containing-(1-methylcyclohexyl) benzimidazole as an active ingredient
It was immersed in the solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40 ℃
/ 96 hr) The test piece after the treatment was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 16 .

【表16】 [Table 16]

【0022】[0022]

【実施例】2−(2−メチルシクロヘキシル)ベンズイ
ミダゾール1%、蟻酸、アンモニア、塩化第二銅を含む
溶液を1リットル容器に入れ、液温を40℃に加熱し調
整した他方、1cm×5cm×0.3mmの銅板及び1
0cm×12cm×1.6mmのスルーホール基板を脱
脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表面
を洗浄し試験片を準備し、上記2−(2−メチルシクロ
ヘキシル)ベンズイミダゾールを有効成分とする1%溶
液に60秒間浸漬した。その後水洗し次いで熱風乾燥機
に入れ、120℃で5分加熱した後、熱風乾燥機に入
れ200℃で10分間加熱して測定前にポストフラック
スを刷毛塗りしてスルーホールの半田上りを測定した。
熱風乾燥機に入れ200℃で10分間加熱して測定前
にポストフラックスに浸漬し半田濡れ性試験器を用いて
濡れ時間を測定した。対湿(90%RH/40℃/9
6hr)処理後の試験片をポストフラックスに浸漬して
半田濡れ性試験器を用いて濡れ時間を測定した。この試
験結果は表17に示した。
[Example] A solution containing 1% of 2- (2-methylcyclohexyl) benzimidazole , formic acid, ammonia and cupric chloride was placed in a 1 liter container, and the liquid temperature was adjusted to 40 ° C while adjusting the other. 1 cm x 5 cm x 0.3 mm copper plate and 1
A 0 cm x 12 cm x 1.6 mm through-hole substrate is degreased, washed with water, soft-etched, washed with water, pickled, washed with water to prepare a test piece, and the 2- (2-methylcyclohexyl) benzimidazole is used as an active ingredient. It was immersed in a 1% solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. ..
It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40 ° C / 9
6 hr) The treated test piece was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 17 .

【表17】 [Table 17]

【0023】[0023]

【実施例】2−(3−メチルシクロヘキシル)ベンズイ
ミダゾール1%、蟻酸、アンモニア、塩化第二銅を含む
溶液を1リットル容器に入れ、液温を40℃に加熱し調
整した。他方、1cm×5cm×0.3mmの銅板及び
10cm×12cm×1.6mmのスルーホール基板を
脱脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表
面を洗浄し試験片を準備し、上記2−(3−メチルシク
ロヘキシル)ベンズイミダゾールを有効成分とする1%
溶液に60秒間浸漬した。その後水洗し次いで熱風乾燥
機に入れ、120℃で5分加熱した後、熱風乾燥機に
入れ200℃で10分間加熱して測定前にポストフラッ
クスを刷毛塗りしてスルーホールの半田上りを測定し
た。熱風乾燥機に入れ200℃で10分間加熱して測
定前にポストフラックスに浸漬し半田濡れ性試験器を用
いて濡れ時間を測定した。対湿(90%RH/40℃
/96hr)処理後の試験片をポストフラックスに浸漬
して半田濡れ性試験器を用いて濡れ時間を測定した。こ
の試験結果は表18に示した。
Example A solution containing 1% of 2- (3-methylcyclohexyl) benzimidazole , formic acid, ammonia and cupric chloride was placed in a 1 liter container, and the liquid temperature was adjusted to 40 ° C. On the other hand, a 1 cm × 5 cm × 0.3 mm copper plate and a 10 cm × 12 cm × 1.6 mm through-hole substrate were degreased, washed with water, soft etching, washed with water, pickled, washed with water to prepare a test piece, -(3-Methylcyclohexyl) benzimidazole as an active ingredient 1%
It was immersed in the solution for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40 ℃
/ 96 hr) The test piece after the treatment was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 18 .

【表18】 [Table 18]

【0024】[0024]

【実施例】2−(4−メチルシクロヘキシル)ベンズイ
ミダゾール1%、蟻酸、アンモニア、蟻酸、塩化第二銅
を含む溶液を1リットル容器に入れ、液温を40℃に加
熱し調整した。他方、1cm×5cm×0.3mmの銅
板及び10cm×12cm×1.6mmのスルーホール
基板を脱脂、水洗、ソフトエッチング、水洗、酸洗、水
洗し表面を洗浄し試験片を準備し、上記2−(4−メチ
ルシクロヘキシル)ベンズイミダゾールを有効成分とす
る1%溶液に60秒間浸漬した。その後水洗し次いで熱
風乾燥機に入れ、120℃で5分加熱した後、熱風乾
燥機に入れ200℃で10分間加熱して測定前にポスト
フラックスを刷毛塗りしてスルーホールの半田上りを測
定した。熱風乾燥機に入れ200℃で10分間加熱し
て測定前にポストフラックスに浸漬し半田濡れ性試験器
を用いて濡れ時間を測定した。対湿(90%RH/4
0℃/96hr)処理後の試験片をポストフラックスに
浸漬して半田濡れ性試験器を用いて濡れ時間を測定し
た。この試験結果は表19に示した。
EXAMPLE 2- (4-Methylcyclohexyl) benzimidazole 1%, formic acid, ammonia, formic acid, cupric chloride
The solution containing was placed in a 1 liter container, and the liquid temperature was adjusted to 40 ° C. by heating. On the other hand, a 1 cm × 5 cm × 0.3 mm copper plate and a 10 cm × 12 cm × 1.6 mm through-hole substrate were degreased, washed with water, soft etching, washed with water, pickled, washed with water to prepare a test piece, It was immersed for 60 seconds in a 1% solution containing-(4-methylcyclohexyl) benzimidazole as an active ingredient. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 4
The test piece after the 0 ° C./96 hr) treatment was dipped in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 19 .

【表19】 [Table 19]

【0025】[0025]

【実施例】2−(4−ベンチルシクロヘキシル)ベンズ
イミダゾール1%、蟻酸、アンモニア、塩化第二銅を含
溶液を1リットル容器に入れ、液温を40℃に加熱し
調整した。他方、1cm×5cm×0.3mmの銅板及
び10cm×12cm×1.6mmのスルーホール基板
を脱脂、水洗、ソフトエッチング、水洗、酸洗、水洗し
表面を洗浄し試験片を準備し、上記2−(4−ペンチル
シクロヘキシル)ベンズイミダゾールを有効成分とする
1%溶液に60秒間浸漬した。その後水洗し次いで熱風
乾燥機に入れ、120℃で5分加熱した後、熱風乾燥
機に入れ200℃で10分間加熱して測定前にポストフ
ラックスを刷毛塗りしてスルーホールの半田上りを測定
した。熱風乾燥機に入れ200℃で10分間加熱して
測定前にポストフラックスに浸漬し半田濡れ性試験器を
用いて濡れ時間を測定した。対湿(90%RH/40
℃/96hr)処理後の試験片をポストフラックスに浸
漬して半田濡れ性試験器を用いて濡れ時間を測定した。
この試験結果は表20に示した。
EXAMPLE 1- (2-Bentylcyclohexyl) benzimidazole 1%, formic acid, ammonia, cupric chloride
The solution was placed in a 1 liter container and the liquid temperature was adjusted to 40 ° C. On the other hand, a 1 cm × 5 cm × 0.3 mm copper plate and a 10 cm × 12 cm × 1.6 mm through-hole substrate were degreased, washed with water, soft etching, washed with water, pickled, washed with water to prepare a test piece, It was immersed for 60 seconds in a 1% solution containing-(4-pentylcyclohexyl) benzimidazole as an active ingredient. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH / 40
(° C / 96 hr) The test piece after the treatment was immersed in post flux and the wetting time was measured using a solder wettability tester.
The test results are shown in Table 20 .

【表20】 [Table 20]

【0026】[0026]

【実施例】2−シクロベンチルメチルベンズイミダゾー
1%、蟻酸、アンモニア、塩化第二銅を含む溶液を1
リットル容器に入れ、液温を40℃に加熱し調整した。
他方、1cm×5cm×0.3mmの銅板及び10cm
×12cm×1.6mmのスルーホール基板を脱脂、水
洗、ソフトエッチング、水洗、酸洗、水洗し表面を洗浄
し試験片を準備し、上記2−シクロペンチルメチルベン
イミダゾールを有効成分とする1%溶液に60秒間浸
漬した。その後水洗し次いで熱風乾燥機に入れ、120
℃で5分加熱した後、熱風乾燥機に入れ200℃で1
0分間加熱して測定前にポストフラックスを刷毛塗りし
てスルーホールの半田上りを測定した。熱風乾燥機に
入れ200℃で10分間加熱して測定前にポストフラッ
クスに浸漬し半田濡れ性試験器を用いて濡れ時間を測定
した。対湿(90%RH/40℃/96hr)処理後
の試験片をポストフラックスに浸漬して半田濡れ性試験
器を用いて濡れ時間を測定した。この試験結果は表21
に示した。
EXAMPLES 2 Shikurobenchiru Mechirubenzu imidazole <br/> Le 1% formic acid, ammonia, a solution containing a cupric chloride 1
It was put in a liter container, and the liquid temperature was adjusted to 40 ° C. by heating.
On the other hand, 1 cm x 5 cm x 0.3 mm copper plate and 10 cm
× 12cm × 1.6 mm degreased through hole board, washing with water, soft etching, prepared rinsing, pickling, washed specimens washing surface, the 2-cyclopentyl Mechiruben
It was immersed for 60 seconds in a 1% solution containing zimidazole as an active ingredient. After that, rinse with water and put in a hot air drier for 120
After heating at ℃ for 5 minutes, put it in a hot air dryer at 200 ℃ for 1
After heating for 0 minutes, a post flux was brush-painted before the measurement to measure the solder rise of the through hole. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 21.
It was shown to.

【表21】 [Table 21]

【0027】[0027]

【実施例】2−(2−シクロベンチルエチル)メチルベ
ンズイミダゾール1%、蟻酸、アンモニア、塩化第二銅
を含む溶液を1リットル容器に入れ、液温を40℃に加
熱し調整した他方、1cm×5cm×0.3mmの銅板
及び10cm×12cm×1.6mmのスルーホール基
板を脱脂、水洗、ソフトエッチング、水洗、酸洗、水洗
し表面を洗浄し試験片を準備し、上記2−(2−シクロ
ペンチルエチル)メチルベンズイミダゾールを有効成分
とする1%溶液に60秒間浸漬した。その後水洗し次い
で熱風乾燥機に入れ、120℃で5分加熱した後、熱
風乾燥機に入れ200℃で10分間加熱して測定前にポ
ストフラックスを刷毛塗りしてスルーホールの半田上り
を測定した。熱風乾燥機に入れ200℃で10分間加
熱して測定前にポストフラックスに浸漬し半田濡れ性試
験器を用いて濡れ時間を測定した。対湿(90%RH
/40℃/96hr)処理後の試験片をポストフラック
スに浸漬して半田濡れ性試験器を用いて濡れ時間を測定
した。この試験結果は表22に示した。
Example 2- (2-cyclopentylethyl) methyl ester
Insimidazole 1%, formic acid, ammonia, cupric chloride
The solution containing is placed in a 1 liter container and the liquid temperature is adjusted to 40 ° C., while the copper plate of 1 cm × 5 cm × 0.3 mm and the through-hole substrate of 10 cm × 12 cm × 1.6 mm are degreased, washed with water, and soft-etched. The test piece was prepared by washing the surface with water, washing with water, washing with water, and immersing it in a 1% solution containing 2- (2-cyclopentylethyl) methylbenzimidazole as an active ingredient for 60 seconds. After that, it was washed with water and then put in a hot air drier and heated at 120 ° C. for 5 minutes, then put in a hot air drier and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder rise of through holes. .. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90% RH
/ 40 ° C./96 hr) The treated test piece was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 22 .

【表22】 [Table 22]

【0028】[0028]

【実施例】2−(1−メチルシクロヘキシル)ジメチル
ベンズイミダゾー1%、蟻酸、アンモニア、塩化第二銅
を含む溶液を1リットル容器に入れ、液温を40℃に加
熱し調整した。他方、1cm×5cm×0.3mmの銅
板及び10cm×12cm×1.6mmのスルーホール
基板を脱脂、水洗、ソフトエッチング、水洗、酸洗、水
洗し表面を洗浄し試験片を準備し、上記2−(1−メチ
ルシクロヘキシル)ジメチルベンズイミダゾールを有効
成分とする1%溶液に60秒間浸漬した。その後水洗し
次いで熱風乾燥機に入れ、120℃で5分加熱した後、
熱風乾燥機に入れ200℃で10分間加熱して測定前
にポストフラックスを刷毛塗りしてスルーホールの半田
上りを測定した。熱風乾燥機に入れ200℃で10分
間加熱して測定前にポストフラックスに浸漬し半田濡れ
性試験器を用いて濡れ時間を測定した。対湿(90%
RH/40℃/96hr)処理後の試験片をポストフラ
ックスに浸漬して半田濡れ性試験器を用いて濡れ時間を
測定した。この試験結果は表23に示した。
Example 2- (1-methylcyclohexyl) dimethyl
Benz imidazole 1% formic acid, ammonia, cupric chloride
The solution containing was placed in a 1 liter container, and the liquid temperature was adjusted to 40 ° C. by heating. On the other hand, a 1 cm × 5 cm × 0.3 mm copper plate and a 10 cm × 12 cm × 1.6 mm through-hole substrate were degreased, washed with water, soft etching, washed with water, pickled, washed with water to prepare a test piece, It was immersed for 60 seconds in a 1% solution containing-(1-methylcyclohexyl) dimethylbenzimidazole as an active ingredient. After that, rinse with water, put in a hot air dryer, and heat at 120 ° C for 5 minutes,
It was put in a hot air dryer and heated at 200 ° C. for 10 minutes, and brushed with post flux before measurement to measure the solder buildup of the through hole. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. Against humidity (90%
The test piece after RH / 40 ° C./96 hr) treatment was dipped in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 23 .

【表23】 [Table 23]

【0029】[0029]

【実施例】2−シクロペンチルジメチルベンズイミダゾ
ール1%、蟻酸、アンモニア、化第二銅を含む溶液を1
リットル容器に入れ、液温を40℃に加熱し調整した。
他方、1cm×5cm×0.3mm0銅板及び10cm
×12cm×1.6mmのスルーホール基板を脱脂、水
洗、ソフトエッチング、水洗、酸洗、水洗し表面を洗浄
し試験片を準備し、上記2−シクロペンチルジメチルベ
ンズイミダゾールを有効成分とする1%溶液に60秒間
浸漬した。その後水洗し次いで熱風乾燥機に入れ、12
0℃で5分加熱した後、熱風乾燥機に入れ200℃で
10分間加熱して測定前にポストフラックスを刷毛塗り
してスルーホールの半田上りを測定した。熱風乾燥機
に入れ200℃で10分間加熱して測定前にポストフラ
ックスに浸漬し半田濡れ性試験器を用いて濡れ時間を測
定した。対湿(90%RH/40℃/96hr)処理
後の試験片をポストフラックスに浸漬して半田濡れ性試
験器を用いて濡れ時間を測定した。この試験結果は表2
に示した。
EXAMPLES 2-Cyclopentyl-dimethyl benzimidazole <br/> Lumpur 1% formic acid, ammonia, a solution containing a cupric of 1
It was put in a liter container, and the liquid temperature was adjusted to 40 ° C. by heating.
On the other hand, 1 cm x 5 cm x 0.3 mm 0 copper plate and 10 cm
A test piece is prepared by degreasing, washing with water, soft etching, washing with water, pickling, washing with water on a through-hole substrate of × 12 cm × 1.6 mm to prepare a test piece, and a 1% solution containing the above-mentioned 2-cyclopentyldimethylbenzimidazole as an active ingredient. Was soaked for 60 seconds. After that, rinse with water and put in a hot air dryer,
After heating at 0 ° C. for 5 minutes, it was placed in a hot air drier and heated at 200 ° C. for 10 minutes, and post flux was brush-coated before measurement to measure the solder rise of the through hole. It was placed in a hot air dryer and heated at 200 ° C. for 10 minutes, dipped in post flux before measurement, and the wetting time was measured using a solder wettability tester. The test piece after the treatment against humidity (90% RH / 40 ° C./96 hr) was immersed in post flux and the wetting time was measured using a solder wettability tester. The test results are shown in Table 2.
4 shown in.

【表24】 [Table 24]

【0030】[0030]

【発明の効果】本発明のプレフラックスを、金属の表面
に形成させた防錆被膜は耐熱性に優れ、高温下に曝され
た後でもクリーム半田の広がり、濡れ性が良好又リフロ
ー半田の半田上がり率、濡れ性も良好という効果で、且
つ、作業環境、安全性の面からもプリント配線板に電子
部品を表面実装するのに、特に顕著な効果を発揮しうる
ものである。
The pre-flux of the present invention has a rust preventive coating formed on the surface of a metal , which has excellent heat resistance, spreads cream solder well even after being exposed to high temperatures, has good wettability, and is a solder for reflow solder. It is possible to exert a particularly remarkable effect in surface mounting an electronic component on a printed wiring board from the viewpoints of good rising rate and wettability as well as in terms of working environment and safety.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 (化1)で表される化合物又はその誘導
体の塩を含有するプレフラックス溶液で表面処理するこ
とを特徴とする金属の表面処理方法。 【化1】
1. A method for surface treatment of a metal, which comprises performing surface treatment with a preflux solution containing a salt of the compound represented by (Chemical formula 1) or a derivative thereof. [Chemical 1]
【請求項2】 (化1)で表される化合物又はその誘導
体の塩を含有するプレフラックス溶液で表面処理後、酸
化処理を行なうことを特徴とする金属の処理方法。
2. A method for treating a metal, which comprises performing a surface treatment with a pre-flux solution containing a salt of a compound represented by (Chemical formula 1) or a derivative thereof, and then performing an oxidation treatment.
JP32495991A 1991-10-07 1991-10-07 Surface treatment of metal Pending JPH0598474A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32495991A JPH0598474A (en) 1991-10-07 1991-10-07 Surface treatment of metal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32495991A JPH0598474A (en) 1991-10-07 1991-10-07 Surface treatment of metal

Publications (1)

Publication Number Publication Date
JPH0598474A true JPH0598474A (en) 1993-04-20

Family

ID=18171542

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32495991A Pending JPH0598474A (en) 1991-10-07 1991-10-07 Surface treatment of metal

Country Status (1)

Country Link
JP (1) JPH0598474A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5735973A (en) * 1993-12-20 1998-04-07 Tamura Kaken Corporation Printed circuit board surface protective agent
WO2001078931A1 (en) * 2000-04-17 2001-10-25 Fujitsu Limited Solder joining

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5735973A (en) * 1993-12-20 1998-04-07 Tamura Kaken Corporation Printed circuit board surface protective agent
WO2001078931A1 (en) * 2000-04-17 2001-10-25 Fujitsu Limited Solder joining

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