JPH06299375A - Treatment of metallic surface such as solder, electroless solder, ag, ni, zn, cu and cu alloy - Google Patents
Treatment of metallic surface such as solder, electroless solder, ag, ni, zn, cu and cu alloyInfo
- Publication number
- JPH06299375A JPH06299375A JP5354759A JP35475993A JPH06299375A JP H06299375 A JPH06299375 A JP H06299375A JP 5354759 A JP5354759 A JP 5354759A JP 35475993 A JP35475993 A JP 35475993A JP H06299375 A JPH06299375 A JP H06299375A
- Authority
- JP
- Japan
- Prior art keywords
- treatment
- solder
- acid
- chemical
- chemical formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910000679 solder Inorganic materials 0.000 title claims abstract description 39
- 229910000881 Cu alloy Inorganic materials 0.000 title abstract description 8
- 239000000126 substance Substances 0.000 claims abstract description 40
- 150000001875 compounds Chemical class 0.000 claims abstract description 13
- 239000007864 aqueous solution Substances 0.000 claims abstract description 12
- 238000005476 soldering Methods 0.000 claims abstract description 6
- 239000012670 alkaline solution Substances 0.000 claims abstract description 5
- 239000000243 solution Substances 0.000 claims abstract description 5
- 150000007522 mineralic acids Chemical class 0.000 claims abstract description 4
- 238000004381 surface treatment Methods 0.000 claims abstract 8
- 238000000034 method Methods 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 19
- 239000002184 metal Substances 0.000 claims description 19
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 150000007524 organic acids Chemical class 0.000 claims description 7
- 150000002736 metal compounds Chemical class 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- 150000003863 ammonium salts Chemical class 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 239000012299 nitrogen atmosphere Substances 0.000 claims 1
- 150000003839 salts Chemical class 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 abstract description 15
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 abstract description 14
- 229910052759 nickel Inorganic materials 0.000 abstract description 10
- 229910052709 silver Inorganic materials 0.000 abstract description 8
- 229910052725 zinc Inorganic materials 0.000 abstract description 7
- 239000002253 acid Substances 0.000 abstract description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 abstract description 4
- 238000006243 chemical reaction Methods 0.000 abstract description 3
- 238000009736 wetting Methods 0.000 abstract description 3
- 125000000217 alkyl group Chemical group 0.000 abstract 4
- 229910052739 hydrogen Inorganic materials 0.000 abstract 2
- 239000001257 hydrogen Substances 0.000 abstract 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract 2
- 229910021529 ammonia Inorganic materials 0.000 abstract 1
- 125000005843 halogen group Chemical group 0.000 abstract 1
- 150000002460 imidazoles Chemical class 0.000 abstract 1
- 229910000765 intermetallic Inorganic materials 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
- 125000003884 phenylalkyl group Chemical group 0.000 abstract 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 abstract 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 18
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 15
- 239000010949 copper Substances 0.000 description 15
- 238000007747 plating Methods 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 239000003513 alkali Substances 0.000 description 8
- 238000007739 conversion coating Methods 0.000 description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 7
- 239000004332 silver Substances 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- 230000002265 prevention Effects 0.000 description 6
- 239000011701 zinc Substances 0.000 description 6
- 239000006071 cream Substances 0.000 description 5
- 238000002845 discoloration Methods 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- 230000003449 preventive effect Effects 0.000 description 5
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 4
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- -1 copper Chemical class 0.000 description 4
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 4
- 230000004907 flux Effects 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 235000014113 dietary fatty acids Nutrition 0.000 description 3
- 229930195729 fatty acid Natural products 0.000 description 3
- 239000000194 fatty acid Substances 0.000 description 3
- 150000004665 fatty acids Chemical class 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 235000005985 organic acids Nutrition 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 239000003021 water soluble solvent Substances 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 239000004480 active ingredient Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 2
- 229910000365 copper sulfate Inorganic materials 0.000 description 2
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 2
- QTMDXZNDVAMKGV-UHFFFAOYSA-L copper(ii) bromide Chemical compound [Cu+2].[Br-].[Br-] QTMDXZNDVAMKGV-UHFFFAOYSA-L 0.000 description 2
- 229960003280 cupric chloride Drugs 0.000 description 2
- 229960004643 cupric oxide Drugs 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- WBJINCZRORDGAQ-UHFFFAOYSA-N ethyl formate Chemical compound CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 238000007788 roughening Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- VNDYJBBGRKZCSX-UHFFFAOYSA-L zinc bromide Chemical compound Br[Zn]Br VNDYJBBGRKZCSX-UHFFFAOYSA-L 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- GAWAYYRQGQZKCR-REOHCLBHSA-N (S)-2-chloropropanoic acid Chemical compound C[C@H](Cl)C(O)=O GAWAYYRQGQZKCR-REOHCLBHSA-N 0.000 description 1
- DWXSYDKEWORWBT-UHFFFAOYSA-N 2-(2-bromophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC=C1Br DWXSYDKEWORWBT-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- KYNNBXCGXUOREX-UHFFFAOYSA-N 2-(3-bromophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1 KYNNBXCGXUOREX-UHFFFAOYSA-N 0.000 description 1
- OXQGTIUCKGYOAA-UHFFFAOYSA-N 2-Ethylbutanoic acid Chemical compound CCC(CC)C(O)=O OXQGTIUCKGYOAA-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- WCOCCXZFEJGHTC-UHFFFAOYSA-N 2-[4-(bromomethyl)phenyl]acetic acid Chemical compound OC(=O)CC1=CC=C(CBr)C=C1 WCOCCXZFEJGHTC-UHFFFAOYSA-N 0.000 description 1
- XXSPGBOGLXKMDU-UHFFFAOYSA-N 2-bromo-2-methylpropanoic acid Chemical compound CC(C)(Br)C(O)=O XXSPGBOGLXKMDU-UHFFFAOYSA-N 0.000 description 1
- WAKFRZBXTKUFIW-UHFFFAOYSA-N 2-bromo-2-phenylacetic acid Chemical compound OC(=O)C(Br)C1=CC=CC=C1 WAKFRZBXTKUFIW-UHFFFAOYSA-N 0.000 description 1
- UEBARDWJXBGYEJ-UHFFFAOYSA-N 2-bromo-3-methylbutanoic acid Chemical compound CC(C)C(Br)C(O)=O UEBARDWJXBGYEJ-UHFFFAOYSA-N 0.000 description 1
- YAQLSKVCTLCIIE-UHFFFAOYSA-N 2-bromobutyric acid Chemical compound CCC(Br)C(O)=O YAQLSKVCTLCIIE-UHFFFAOYSA-N 0.000 description 1
- HZTPKMIMXLTOSK-UHFFFAOYSA-N 2-bromohexanoic acid Chemical compound CCCCC(Br)C(O)=O HZTPKMIMXLTOSK-UHFFFAOYSA-N 0.000 description 1
- GTGTXZRPJHDASG-UHFFFAOYSA-N 2-bromooctanoic acid Chemical compound CCCCCCC(Br)C(O)=O GTGTXZRPJHDASG-UHFFFAOYSA-N 0.000 description 1
- WMFATTFQNRPXBQ-UHFFFAOYSA-N 2-bromopentanoic acid Chemical compound CCCC(Br)C(O)=O WMFATTFQNRPXBQ-UHFFFAOYSA-N 0.000 description 1
- MONMFXREYOKQTI-UHFFFAOYSA-N 2-bromopropanoic acid Chemical compound CC(Br)C(O)=O MONMFXREYOKQTI-UHFFFAOYSA-N 0.000 description 1
- GBBKJNDQLLKTCX-UHFFFAOYSA-N 2-bromotetradecanoic acid Chemical compound CCCCCCCCCCCCC(Br)C(O)=O GBBKJNDQLLKTCX-UHFFFAOYSA-N 0.000 description 1
- RVBUZBPJAGZHSQ-UHFFFAOYSA-N 2-chlorobutanoic acid Chemical compound CCC(Cl)C(O)=O RVBUZBPJAGZHSQ-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- QQZJWQCLWOQDQV-UHFFFAOYSA-N 3-bromo-2-(bromomethyl)propanoic acid Chemical compound OC(=O)C(CBr)CBr QQZJWQCLWOQDQV-UHFFFAOYSA-N 0.000 description 1
- ZFJOMUKPDWNRFI-UHFFFAOYSA-N 3-bromo-4-methylbenzoic acid Chemical compound CC1=CC=C(C(O)=O)C=C1Br ZFJOMUKPDWNRFI-UHFFFAOYSA-N 0.000 description 1
- DHXNZYCXMFBMHE-UHFFFAOYSA-N 3-bromopropanoic acid Chemical compound OC(=O)CCBr DHXNZYCXMFBMHE-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- QOWSWEBLNVACCL-UHFFFAOYSA-N 4-Bromophenyl acetate Chemical compound OC(=O)CC1=CC=C(Br)C=C1 QOWSWEBLNVACCL-UHFFFAOYSA-N 0.000 description 1
- GRHQDJDRGZFIPO-UHFFFAOYSA-N 4-bromobutanoic acid Chemical compound OC(=O)CCCBr GRHQDJDRGZFIPO-UHFFFAOYSA-N 0.000 description 1
- OTLNPYWUJOZPPA-UHFFFAOYSA-N 4-nitrobenzoic acid Chemical compound OC(=O)C1=CC=C([N+]([O-])=O)C=C1 OTLNPYWUJOZPPA-UHFFFAOYSA-N 0.000 description 1
- WNXNUPJZWYOKMW-UHFFFAOYSA-N 5-bromopentanoic acid Chemical compound OC(=O)CCCCBr WNXNUPJZWYOKMW-UHFFFAOYSA-N 0.000 description 1
- BKJFDZSBZWHRNH-UHFFFAOYSA-N 8-bromooctanoic acid Chemical compound OC(=O)CCCCCCCBr BKJFDZSBZWHRNH-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- JJLJMEJHUUYSSY-UHFFFAOYSA-L Copper hydroxide Chemical compound [OH-].[OH-].[Cu+2] JJLJMEJHUUYSSY-UHFFFAOYSA-L 0.000 description 1
- 239000005750 Copper hydroxide Substances 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- 229910021595 Copper(I) iodide Inorganic materials 0.000 description 1
- 229910021590 Copper(II) bromide Inorganic materials 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- CANRESZKMUPMAE-UHFFFAOYSA-L Zinc lactate Chemical compound [Zn+2].CC(O)C([O-])=O.CC(O)C([O-])=O CANRESZKMUPMAE-UHFFFAOYSA-L 0.000 description 1
- MQRWBMAEBQOWAF-UHFFFAOYSA-N acetic acid;nickel Chemical compound [Ni].CC(O)=O.CC(O)=O MQRWBMAEBQOWAF-UHFFFAOYSA-N 0.000 description 1
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 238000003915 air pollution Methods 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical class OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- KDPAWGWELVVRCH-UHFFFAOYSA-N bromoacetic acid Chemical compound OC(=O)CBr KDPAWGWELVVRCH-UHFFFAOYSA-N 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 1
- 229940106681 chloroacetic acid Drugs 0.000 description 1
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229940116318 copper carbonate Drugs 0.000 description 1
- 229910001956 copper hydroxide Inorganic materials 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 1
- LSXDOTMGLUJQCM-UHFFFAOYSA-M copper(i) iodide Chemical compound I[Cu] LSXDOTMGLUJQCM-UHFFFAOYSA-M 0.000 description 1
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 1
- GEZOTWYUIKXWOA-UHFFFAOYSA-L copper;carbonate Chemical compound [Cu+2].[O-]C([O-])=O GEZOTWYUIKXWOA-UHFFFAOYSA-L 0.000 description 1
- HFDWIMBEIXDNQS-UHFFFAOYSA-L copper;diformate Chemical compound [Cu+2].[O-]C=O.[O-]C=O HFDWIMBEIXDNQS-UHFFFAOYSA-L 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 229940045803 cuprous chloride Drugs 0.000 description 1
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 description 1
- 229940112669 cuprous oxide Drugs 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- ZASWJUOMEGBQCQ-UHFFFAOYSA-L dibromolead Chemical compound Br[Pb]Br ZASWJUOMEGBQCQ-UHFFFAOYSA-L 0.000 description 1
- 238000004649 discoloration prevention Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004945 emulsification Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 229960002089 ferrous chloride Drugs 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- JDNTWHVOXJZDSN-UHFFFAOYSA-N iodoacetic acid Chemical compound OC(=O)CI JDNTWHVOXJZDSN-UHFFFAOYSA-N 0.000 description 1
- NMCUIPGRVMDVDB-UHFFFAOYSA-L iron dichloride Chemical compound Cl[Fe]Cl NMCUIPGRVMDVDB-UHFFFAOYSA-L 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 229940046892 lead acetate Drugs 0.000 description 1
- ZPPSOOVFTBGHBI-UHFFFAOYSA-N lead(2+);oxido(oxo)borane Chemical compound [Pb+2].[O-]B=O.[O-]B=O ZPPSOOVFTBGHBI-UHFFFAOYSA-N 0.000 description 1
- 229910021514 lead(II) hydroxide Inorganic materials 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 150000002689 maleic acids Chemical class 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- 229940078494 nickel acetate Drugs 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- OXNIZHLAWKMVMX-UHFFFAOYSA-N picric acid Chemical compound OC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O OXNIZHLAWKMVMX-UHFFFAOYSA-N 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000003223 protective agent Substances 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
- 229940102001 zinc bromide Drugs 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- SRWMQSFFRFWREA-UHFFFAOYSA-M zinc formate Chemical compound [Zn+2].[O-]C=O SRWMQSFFRFWREA-UHFFFAOYSA-M 0.000 description 1
- 239000011576 zinc lactate Substances 0.000 description 1
- 229940050168 zinc lactate Drugs 0.000 description 1
- 235000000193 zinc lactate Nutrition 0.000 description 1
- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 description 1
- 229910000165 zinc phosphate Inorganic materials 0.000 description 1
- JDLYKQWJXAQNNS-UHFFFAOYSA-L zinc;dibenzoate Chemical compound [Zn+2].[O-]C(=O)C1=CC=CC=C1.[O-]C(=O)C1=CC=CC=C1 JDLYKQWJXAQNNS-UHFFFAOYSA-L 0.000 description 1
- ZPEJZWGMHAKWNL-UHFFFAOYSA-L zinc;oxalate Chemical compound [Zn+2].[O-]C(=O)C([O-])=O ZPEJZWGMHAKWNL-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
- C23F11/14—Nitrogen-containing compounds
- C23F11/149—Heterocyclic compounds containing nitrogen as hetero atom
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/48—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 not containing phosphates, hexavalent chromium compounds, fluorides or complex fluorides, molybdates, tungstates, vanadates or oxalates
- C23C22/52—Treatment of copper or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/282—Applying non-metallic protective coatings for inhibiting the corrosion of the circuit, e.g. for preserving the solderability
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0562—Details of resist
- H05K2203/0591—Organic non-polymeric coating, e.g. for inhibiting corrosion thereby preserving solderability
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
- H05K2203/0786—Using an aqueous solution, e.g. for cleaning or during drilling of holes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/12—Using specific substances
- H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax or thiol
- H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Chemical Treatment Of Metals (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】この発明は、銅、銅合金、はん
だ、無電解はんだ、ニッケル、銀、亜鉛等の金属の防
錆、はんだ荒れ防止、変色防止、耐アルカリ性、耐湿
性、耐薬品性、耐熱性、はんだ付け性を向上させる処理
方法に関するものであり、特にこれら金属のはんだ付け
性を長期間良好な状態に維持することや、プリント配線
板製造時のアルカリ性溶液による表面荒れ防止に好適な
方法を提供するものである。また、接合した異種金属の
両者共に処理できるため、めっきのピンホールの防錆に
も最適で無電解はんだのピンホールの防錆や、コネクタ
ーのニッケル・金めっき後の封孔処理剤として好適なも
のである。BACKGROUND OF THE INVENTION This invention relates to rust prevention, solder roughening, discoloration prevention, alkali resistance, moisture resistance and chemical resistance of metals such as copper, copper alloys, solders, electroless solders, nickel, silver and zinc. The present invention relates to a treatment method for improving heat resistance and solderability, and is particularly suitable for maintaining the solderability of these metals in a good state for a long period of time and preventing surface roughness due to an alkaline solution during printed wiring board manufacturing. It provides a simple method. Also, since both dissimilar metals joined can be treated, it is ideal for rust prevention of plating pinholes and is suitable as a rustproofing for electroless solder pinholes and as a sealing agent after nickel / gold plating of connectors. It is a thing.
【0002】[0002]
【従来の技術】パターンめっき法によるプリント配線板
の製造方法は、銅張積層板に穴あけ、化学銅めっき、電
気銅めっき続いてアルカリ水溶液に可溶のアルカリ現像
型感光性フィルムを銅張積層板上に陰画回路を形成し、
次いで電気銅めっき、はんだめっき後、アルカリ性水溶
液と接触させてアルカリ現像型感光性フィルムを除く。
この時アルカリにより、はんだ表面が侵され銅素材が露
出することがある。この場合後工程のアルカリエッチン
グ液で銅がエッチングされ回路が切断される場合もあ
る。また、はんだめっきを残しはんだスルーホール基板
を製造する場合、このままでははんだ付け性が悪くフュ
ージング処理等を行う必要がある。プリント配線板のは
んだ接合技術の1つとしての無電解はんだは置換めっき
により行われる。このため多孔質となり素材の銅表面が
露出している。また、析出も鉛、錫個別に行われる両者
の混合物となっている。このためはんだ付け性の悪い
銅、錫合金の生成や鉛、錫の酸化が起りやすくめっき後
フュージングをしなければ良好なはんだ付け性を長期間
維持できない。ニッケルは強固な酸化膜を形成しやすく
はんだ付け性が悪い。そのためプリント配線板やコネク
ターでは、はんだ付け性の必要な場合ニッケル上に金め
っきを施し酸化防止している。銀、亜鉛の防錆としては
クロメート処理が行われるが、有害な6価クロム化合物
を使用するため問題がある。また、銀の防錆にはパラフ
ィン等を溶剤に溶解して塗布するが溶剤使用の問題があ
る。銅又は銅合金からなる回路部を防錆し、はんだ付け
性を保持する目的で使用されているプリフラックスは、
大別してプリント配線板全体をコーテイングするロジン
系プリフラックスと、選択的に銅又は銅合金と化学反応
させるアルキルイミダゾール系プリフラックスの2種類
がある。前者は天然ロジン、ロジンエステル、ロジン変
成マレイン酸樹脂等を、有機溶剤に溶解させたものをロ
ールコターで塗布するか、噴霧又は浸漬によつてプリン
ト配線板全体に塗布し、乾燥して被膜を形成する方法で
用いられる。このため有機溶剤の揮散によって作業環境
及び安全性が著しく損われる欠点がある。又、ロジン系
プリフラックスは揮発性溶剤を使用しているため作業時
引火の危険が伴うという欠点も有している。2. Description of the Related Art A method of manufacturing a printed wiring board by a pattern plating method is to make a hole in a copper clad laminate, chemically copper plating, electrolytic copper plating, and then an alkali development type photosensitive film soluble in an alkaline aqueous solution. Form a negative circuit on top,
Then, after electrolytic copper plating and solder plating, the film is brought into contact with an alkaline aqueous solution to remove the alkali developing type photosensitive film.
At this time, the surface of the solder may be attacked by the alkali and the copper material may be exposed. In this case, the circuit may be cut by etching copper with an alkaline etching solution in a later step. Further, when a solder through-hole substrate is manufactured with the solder plating left, the solderability is poor as it is, and it is necessary to perform a fusing treatment or the like. Electroless soldering, which is one of the solder joining techniques for printed wiring boards, is performed by displacement plating. Therefore, it becomes porous and the copper surface of the material is exposed. In addition, precipitation is a mixture of both lead and tin, which are performed separately. For this reason, copper and tin alloys having poor solderability are likely to be generated, and lead and tin are likely to be oxidized, so that good solderability cannot be maintained for a long period unless fusing after plating. Nickel easily forms a strong oxide film and has poor solderability. Therefore, in printed wiring boards and connectors, nickel is plated with gold to prevent oxidation when solderability is required. Chromate treatment is carried out for rust prevention of silver and zinc, but there is a problem because a harmful hexavalent chromium compound is used. Further, for rust prevention of silver, paraffin or the like is dissolved in a solvent and applied, but there is a problem in using the solvent. The pre-flux used for the purpose of preventing rust on the circuit part made of copper or copper alloy and maintaining solderability is
There are roughly two types: a rosin-based preflux that coats the entire printed wiring board and an alkylimidazole-based preflux that selectively chemically reacts with copper or a copper alloy. For the former, apply natural rosin, rosin ester, rosin-modified maleic acid resin, etc. dissolved in an organic solvent with a roll coater, or apply it to the entire printed wiring board by spraying or dipping, and then dry to form a film. Used in the method. Therefore, there is a drawback in that the working environment and safety are significantly impaired by the volatilization of the organic solvent. In addition, since rosin-based preflux uses a volatile solvent, it also has a drawback that it may cause a fire when working.
【0003】[0003]
【発明が解決しょうとする課題】上記、プリント配線板
の製造方法では、はんだエッチングレジスト膜としての
信頼性に劣り製造不良が発生しやすい、そこで、アルカ
リ現像型感光性フイルム剥離時、アルカリエッチング時
のはんだ荒れを防止し、良好な回路形成を得ると共には
んだ付け性を良好な状態に保つ。また、無電解はんだに
おいては、基板へのサーマルストレスが強いばかりでな
くコストも高いフュージングを行なわず防錆処理により
良好なはんだ付け性を維持する。ニッケルにおいては高
価な金めっきを使用せずに変色を防止しまた良好なはん
だ付け性を維持する。銀、亜鉛については、有害な6価
クロム化合物を含有しない安全な溶液で処理し、長期間
変色を防止したりはんだ付け性を良好なはんだ付け性を
維持する。プリント配線板に電子部品をはんだ付けする
方法として表面実装法が多く採用されている。この表面
実装法、電子部品の仮止め低融点クリームはんだのリフ
ロー等、プリント配線板が高温に曝される機会が多くな
り、プリント配線板のはんだ付け性を保持するために用
いられるプリフラックスの耐熱性、即ちプリント配線板
が高温に曝された後での低融点クリームはんだの濡れ
性、拡がり性、はんだ付け性が優れていることがプリフ
ラックスの性能に要求されるようになった。又、大気汚
染等に問題を有する揮発性溶剤を使用せず、且つ高温に
曝された後でもクリームはんだの濡れ性、はんだ付け性
の優れたプリフラックスの開発が切望されている。In the above-described method for manufacturing a printed wiring board, the reliability as a solder etching resist film is poor and a manufacturing defect is likely to occur. Therefore, at the time of peeling an alkali developing type photosensitive film and at the time of alkali etching. To prevent the solder from becoming rough and to obtain good circuit formation, and to maintain good solderability. Further, in the electroless solder, not only thermal stress to the substrate is strong but also costly fusing is not performed, but good solderability is maintained by rust preventive treatment. Nickel does not use expensive gold plating to prevent discoloration and maintain good solderability. Silver and zinc are treated with a safe solution containing no harmful hexavalent chromium compound to prevent discoloration for a long period of time and maintain good solderability. The surface mounting method is often adopted as a method for soldering electronic components to a printed wiring board. Due to this surface mounting method, reflow of low melting point cream solder for temporary fixing of electronic parts, the printed wiring board is exposed to high temperatures frequently, and the heat resistance of the pre-flux used to maintain the solderability of the printed wiring board. Of the low melting point cream solder after the printed wiring board is exposed to a high temperature, the wettability, spreadability and solderability of the low melting point solder paste are required to be excellent in the performance of the preflux. Further, it is desired to develop a preflux which does not use a volatile solvent having a problem in air pollution and has excellent wettability and solderability of cream solder even after being exposed to a high temperature.
【0004】[0004]
【課題を解決するための手段】本発明者は、このような
事情に鑑み、アルカリ現像型感光性フイルム剥離時、ア
ルカリエッチング時のはんだ荒れ、変色防止のためのは
んだ防錆剤、無電解はんだ防錆剤。また、コネクター部
品、ニッケル基板等の防錆、耐湿性、耐熱性、はんだ付
け性の優れた防錆剤。また、銅の回路部に化成被膜を形
成させアルカリ性溶液に耐える表面保護剤。また、高温
に曝された後でも低融点クリームはんだの濡れ性、拡が
り性、リフロー後のはんだ上がり性、濡れ性の良い耐熱
水溶性プリフラックス剤に関して鋭意検討を重ねた結
果、本発明の実施において用いられる有機酸としては、
酢酸、ヨード酢酸、ブロモ酢酸、ジメチル酢酸、ジエチ
ル酢酸、α−ブロモ酢酸、パラニトロ安息香酸、パラト
ルエンスルホン酸、ピクリン酸、蓚酸、蟻酸、コハク
酸、マレイン酸、アクリル酸、フマール酸、酒石酸、ア
ジピン酸、乳酸、オレイン酸、クエン酸、メタスルホン
酸、スルファミン酸等の有機酸、塩酸、硫酸、亜りん
酸、燐酸等の無機酸、その他のカルボン酸、ハロゲン化
脂肪酸、ハロゲン化芳香族カルボン酸等があり水に対し
て0.01〜20%の割合で添加すれば良い。有効成分
として(化1)〜(化5)で表わされる化合物を1種類
又は2種類以上を酸水溶液に対して0.1〜5%の割合
で添加すれば良い。本発明方法の実施において使用され
る金属イオンとしての化合物の代表的なものとしてはリ
チウム、ベリリウム、カリウム、マグネシウム、酢酸亜
鉛、蟻酸亜鉛、乳酸亜鉛、クウン酸亜鉛、安息香酸亜
鉛、蓚酸亜鉛、水酸化亜鉛、臭化亜鉛、リン酸亜鉛、酸
化亜鉛、塩化亜鉛、酢酸鉛、水酸化鉛、臭化鉛、ヨウ化
鉛、蓚酸鉛、ほう酸鉛、塩化第一鉄、塩化第二鉄、臭化
第一銅、臭化第二銅、ヨウ化第一銅、蟻酸銅、塩化ニッ
ケル、酢酸ニッケル、塩化第一銅、塩化第二銅、酸化第
一銅、酸化第二銅、水酸化銅、リン酸銅、炭酸銅、酢酸
銅、硫酸銅等の金属化合物であり、水に対して0.00
1〜5%の割合で添加すれば良い。本発明の実施におい
て用いられるハロゲン化芳香族カルボン酸としては、3
−ブロモ−4メチル安息香酸、4−(ブロモメチル)フ
ェニル酢酸、α−ブロモフェニル酢酸、α−ブロモテト
ラデカン酸、2−ブロモフェニル酢酸、3−ブロモフェ
ニル酢酸、4−ブロモフェニル酢酸等であり、水溶液に
対して0.01〜20%の範囲、好ましくは0.1〜5
%の割合で添加すれば良い。本発明の実施において用い
られるハロゲン化脂肪酸としては、ブロモ酢酸、3−ブ
ロモ−2−(ブロモメチル)プロピオン酸、2−ブロモ
ブタン酸、4−ブロモブタン酸、2−ブロモヘキサンデ
カン酸、2−ブロモヘキサン酸、2−ブロモ−3−メチ
ルブタン酸、2−ブロモ2−メチルプロピオン酸、2−
ブロモオクタン酸、8−ブロモオクタン酸、2−ブロモ
プロピオン酸、3−ブロモプロピオン酸、2−ブロモペ
ンタン酸、5−ブロモペンタン酸、クロロ酢酸、クロロ
酪酸、クロロプロピオン酸等であり、水溶液に対して
0.01〜20%の範囲、好ましくは0.1〜5%の割
合で添加すれば良い。 本発明の実施においては、
(化1)〜(化5)で表わされる化合物及び有機酸、金
属化合物、ハロゲン化芳香族カルボン酸、ハロゲン化脂
肪酸の溶解が困難となる場合には乳化あるいは、メタノ
ール、エタノール、イソプロピルアルコール、ブタノー
ル、アセトン等の水溶性溶媒を夫々単独に用いることが
できる他、任意の割合で混合して使用することも可能で
ある。例えば上記水溶性溶媒は単独で用いられる他有機
酸等と併用することもでき、特に有機酸等単独では、
(化1)〜(化5)で表される化合物あるいはその誘導
体の溶解が困難となる場合には、水溶性溶媒を含有させ
ることが好ましく、この場合の含有率は0.01〜60
%とすることが適当である場合が多い。 なお処理液に
は、アンモニア水あるいはアミン類等の緩衝作用を有す
る物質を添加することは、水溶液のPHの安定性を高め
るばかりでなく被膜形成速度を速めるために有効であ
る。本発明の金属表面処理剤により防錆化成被膜、耐熱
性化成被膜、耐薬品性化成被膜を金属表面に施すには、
金属と処理液とを接触させる。接触させる方法としては
浸漬、噴霧、塗布による方法を用いる。接触させる処理
液の温度は、0〜100℃の温度範囲で浸漬時間は数秒
〜数十分の処理が適当である。又防錆化成被膜形成後、
耐湿性、耐熱性、耐薬品性をさらに向上させる処理とし
て、赤外線・近赤外線・遠赤外線・紫外線照射処理を0
〜300℃の温度範囲で、処理時間数秒〜数十分の処理
が効果的である。In view of such circumstances, the present inventor has taken into consideration the above-mentioned circumstances, and when the alkali developing type photosensitive film is peeled off, the solder is roughened during alkali etching, and a solder rust preventive agent for preventing discoloration and an electroless solder are used. anti-rust. In addition, it is a rust preventive agent with excellent rust prevention, moisture resistance, heat resistance, and solderability for connector parts and nickel substrates. In addition, it is a surface protective agent that forms a chemical conversion film on the copper circuit and withstands alkaline solutions. Also, the wettability of the low melting point cream solder even after being exposed to high temperature, spreadability, solderability after reflow, as a result of extensive studies on a heat-resistant water-soluble preflux agent with good wettability, in the practice of the present invention. As the organic acid used,
Acetic acid, iodoacetic acid, bromoacetic acid, dimethylacetic acid, diethylacetic acid, α-bromoacetic acid, paranitrobenzoic acid, paratoluenesulfonic acid, picric acid, oxalic acid, formic acid, succinic acid, maleic acid, acrylic acid, fumaric acid, tartaric acid, adipine Acids, lactic acid, oleic acid, citric acid, metasulfonic acid, sulfamic acid and other organic acids, hydrochloric acid, sulfuric acid, phosphorous acid, phosphoric acid and other inorganic acids, other carboxylic acids, halogenated fatty acids, halogenated aromatic carboxylic acids, etc. Therefore, it may be added at a rate of 0.01 to 20% with respect to water. One or more compounds represented by (Chemical formula 1) to (Chemical formula 5) may be added as an active ingredient at a ratio of 0.1 to 5% with respect to the acid aqueous solution. Typical examples of the compound as a metal ion used in the method of the present invention include lithium, beryllium, potassium, magnesium, zinc acetate, zinc formate, zinc lactate, zinc counate, zinc benzoate, zinc oxalate, and water. Zinc oxide, zinc bromide, zinc phosphate, zinc oxide, zinc chloride, lead acetate, lead hydroxide, lead bromide, lead iodide, lead oxalate, lead borate, ferrous chloride, ferric chloride, bromide Cuprous, cupric bromide, cuprous iodide, copper formate, nickel chloride, nickel acetate, cuprous chloride, cupric chloride, cuprous oxide, cupric oxide, copper hydroxide, phosphorus It is a metal compound such as copper oxide, copper carbonate, copper acetate, and copper sulfate, and is 0.00 with respect to water.
It may be added at a rate of 1 to 5%. The halogenated aromatic carboxylic acid used in the practice of the present invention is 3
-Bromo-4-methylbenzoic acid, 4- (bromomethyl) phenylacetic acid, α-bromophenylacetic acid, α-bromotetradecanoic acid, 2-bromophenylacetic acid, 3-bromophenylacetic acid, 4-bromophenylacetic acid, etc. In the range of 0.01 to 20%, preferably 0.1 to 5
% May be added. Examples of the halogenated fatty acid used in the practice of the present invention include bromoacetic acid, 3-bromo-2- (bromomethyl) propionic acid, 2-bromobutanoic acid, 4-bromobutanoic acid, 2-bromohexanedecanoic acid, 2-bromohexanoic acid. , 2-bromo-3-methylbutanoic acid, 2-bromo-2-methylpropionic acid, 2-
Bromooctanoic acid, 8-bromooctanoic acid, 2-bromopropionic acid, 3-bromopropionic acid, 2-bromopentanoic acid, 5-bromopentanoic acid, chloroacetic acid, chlorobutyric acid, chloropropionic acid, etc. In the range of 0.01 to 20%, preferably 0.1 to 5%. In the practice of the invention,
When it becomes difficult to dissolve the compounds represented by (Chemical Formula 1) to (Chemical Formula 5) and organic acids, metal compounds, halogenated aromatic carboxylic acids, and halogenated fatty acids, emulsification or methanol, ethanol, isopropyl alcohol, butanol Water-soluble solvents such as acetone and acetone can be used alone, respectively, and can also be used by mixing them at an arbitrary ratio. For example, the water-soluble solvent may be used in combination with other organic acids or the like, which are used alone.
When it becomes difficult to dissolve the compound represented by (Chemical formula 1) to (Chemical formula 5) or its derivative, it is preferable to add a water-soluble solvent, and the content ratio in this case is 0.01 to 60.
It is often appropriate to set it as%. It should be noted that adding a substance having a buffering action such as aqueous ammonia or amines to the treatment liquid is effective not only for enhancing the stability of PH of the aqueous solution but also for accelerating the film formation rate. To apply a rust-preventive conversion coating, a heat-resistant conversion coating, and a chemical-resistant conversion coating to the metal surface with the metal surface treatment agent of the present invention,
Contact the metal with the treatment liquid. As a method of contacting, a method of dipping, spraying or coating is used. It is suitable that the temperature of the treatment liquid to be brought into contact is in the temperature range of 0 to 100 ° C. and the immersion time is several seconds to several tens of minutes. In addition, after forming the rust preventive conversion film,
Infrared / near-infrared / far-infrared / ultraviolet irradiation treatment is 0 as a treatment to further improve moisture resistance, heat resistance, and chemical resistance.
It is effective to perform the treatment at a temperature range of up to 300 ° C for a treatment time of several seconds to several tens of minutes.
【0005】[0005]
【作用】上記した処理方法によれば、はんだ、無電解は
んだ、ニッケル、銀、亜鉛、銅、銅合金等の金属表面に
防錆に有効な、(化1)〜(化5)を主体とする防錆化
成被膜、耐熱性化成被膜、耐薬品性化成被膜が形成され
る。これらの化成被膜は揆水性で耐湿性、耐熱性、耐薬
品性にも優れ金属表面を長期間保護すると共に、低融点
クリームはんだの濡れ性、拡がり性、リフロー後のはん
だ上がり性、濡れ性が良好である。また、作業環境、安
全性の面からも優れたプリント配線板の製造ができる。According to the above-mentioned treatment method, (Chemical formula 1) to (Chemical formula 5) which are effective for rust prevention on metal surfaces such as solder, electroless solder, nickel, silver, zinc, copper and copper alloy are mainly used. A rustproof chemical conversion coating, a heat resistant chemical conversion coating, and a chemical resistant chemical conversion coating are formed. These chemical conversion coatings are water-repellent, have excellent moisture resistance, heat resistance, and chemical resistance, and protect the metal surface for a long period of time, as well as the wettability, spreadability, solder rise after reflow, and wettability of low melting point cream solder. It is good. Further, it is possible to manufacture a printed wiring board excellent in terms of working environment and safety.
【0006】[0006]
【実施例】(化1)〜(化5)で表される化合物(表1
の記載の化合物)を1%、コハク酸、カルボン酸、アン
モニア水、塩化第二銅、イオン交換水等を含む各種類の
水溶液を作り、100ml容器に入れ、液温を40°C
に加熱し調整した。他方、1cm×5cm×0.3mm
の銅板に、電気はんだめっき、無電解はんだめっ
き、ニッケルめっき、硫酸銅めっき、銀めっきを
した。次いで脱脂、水洗、ソフトエッチング、水洗、酸
洗、水洗し表面を洗浄して、上記(化1)〜(化5)で
表される化合物を有効成分とする各種類の1%溶液に6
0秒間浸漬した。その後水洗した〜の試料片を準備
し次いで、(1)の試料片を熱風乾燥機に入れ200
℃で10分間加熱して測定前にポストフラックスに浸漬
してはんだ濡れ性試験機を用いて濡れ時間を測定した。
(2)〜の試料片を耐湿(MIL−STD−202
F−M−106E)処理した後、試験片をポストフラッ
クスに浸漬してはんだ濡れ性試験機を用いて濡れ時間を
測定した。(3)アルカリ性溶液を40℃に加熱し、
〜試験片を5分間浸漬した。その後水洗して表面状態
(荒れ性、変色性)を見る。(4)の試料片をガス腐
食試験(1±0.3ppmH2S、25±2℃、5%R
H、10日間)後の金属の表面状態(荒れ性、変色性)
を見る。この試験結果は表1に示した。EXAMPLES Compounds represented by (Chemical formula 1) to (Chemical formula 5) (Table 1
1% of the compound described in 1), succinic acid, carboxylic acid, aqueous ammonia, cupric chloride, ion-exchanged water, etc., to prepare an aqueous solution of each type, and put it in a 100 ml container at a liquid temperature of 40 ° C.
It was heated and adjusted. On the other hand, 1 cm x 5 cm x 0.3 mm
The copper plate of No. 1 was electrosolder plated, electroless solder plated, nickel plated, copper sulfate plated, and silver plated. Next, degreasing, washing with water, soft etching, washing with water, pickling, washing with water to wash the surface, and then adding 6% to each type of 1% solution containing the compound represented by the above (Chemical formula 1) to (Chemical formula 5) as an active ingredient.
It was immersed for 0 seconds. After that, the sample pieces washed with water were prepared, and then the sample piece of (1) was put in a hot air dryer to obtain 200
It was heated at 0 ° C. for 10 minutes, immersed in post flux before measurement, and the wetting time was measured using a solder wettability tester.
Moisture resistant (MIL-STD-202)
After FM-106E) treatment, the test piece was immersed in post flux and the wetting time was measured using a solder wettability tester. (3) heating the alkaline solution to 40 ° C.,
~ The test piece was immersed for 5 minutes. After that, wash with water and check the surface condition (roughness, discoloration). The sample piece of (4) was subjected to a gas corrosion test (1 ± 0.3 ppm H 2 S, 25 ± 2 ° C., 5% R
H, 10 days) metal surface condition (roughness, discoloration)
I see. The test results are shown in Table 1.
【表1】 [Table 1]
【0007】[0007]
【発明の効果】本発明の金属防錆処理方法によれば、は
んだ、無電解はんだ、ニッケル、銀、亜鉛、銅、銅合金
等の金属表面に、耐湿性、耐薬品性、耐熱性に優れた化
成被膜が形成し、金属表面を防錆するばかりでなく、は
んだの濡れ性、はんだの広がり性、及びリフロー後のは
んだ上がり性、濡れ性が良好という効果で、プリント配
線板の電子部品を表面実装するのに特に顕著な効果を発
揮しうるものである。また、パターンめっき法によるプ
リント配線板製造時のアルカリ性水溶液処理時のはんだ
荒れ防止、回路切断の危険性をなくすばかりでなく、は
んだ付け部のはんだを残しフュージング処理なしではん
だ付け性を良好な状態に保ち得るものである。また、作
業環境、安全性の面からも優れたプリント配線板、金属
部品の製造ができうる。EFFECTS OF THE INVENTION According to the metal rust preventive treatment method of the present invention, excellent moisture resistance, chemical resistance and heat resistance can be obtained on metal surfaces such as solder, electroless solder, nickel, silver, zinc, copper and copper alloys. The chemical conversion coating forms not only to prevent rusting of the metal surface, but also to improve the wettability of solder, spreadability of solder, solderability after reflow, and good wettability. This is particularly effective for surface mounting. In addition, it not only prevents the solder from roughening during the alkaline aqueous solution treatment at the time of manufacturing the printed wiring board by the pattern plating method and eliminates the risk of circuit disconnection, but also leaves the solder at the soldering part and has good solderability without fusing treatment. Can be kept at. Further, it is possible to manufacture a printed wiring board and a metal component which are excellent in terms of work environment and safety.
Claims (7)
はその誘導体の塩を含有する水溶液に接触させることを
特徴とする金属の表面処理方法。 【化1】 【化2】 【化3】 【化4】 【化5】 1. A method for surface treatment of a metal, which comprises contacting with an aqueous solution containing a salt of a compound represented by (Chemical formula 1) to (Chemical formula 5) or a derivative thereof. [Chemical 1] [Chemical 2] [Chemical 3] [Chemical 4] [Chemical 5]
び有機酸、無機酸、金属化合物を含む水溶液に接触させ
ることを特徴とする金属の表面処理方法。2. A method for surface treatment of a metal, which comprises contacting with an aqueous solution containing a compound represented by (Chemical formula 1) to (Chemical formula 5) and an organic acid, an inorganic acid or a metal compound.
び有機酸、無機酸、金属化合物にアンモニア塩類を含む
水溶液に接触させることを特徴とする金属の表面処理方
法。3. A method for surface treatment of a metal, which comprises contacting the compound represented by (Chemical formula 1) to (Chemical formula 5), an organic acid, an inorganic acid, and an aqueous solution containing an ammonium salt with a metal compound.
理後、はんだリフロー処理を行うことを特徴とするプリ
ント配線板の製造方法。4. A method of manufacturing a printed wiring board, which comprises performing a solder reflow treatment after the surface treatment of the metal according to any one of claims 1 to 3.
理後、はんだ付け処理を行うことを特徴とするプリント
配線板の製造方法。5. A method of manufacturing a printed wiring board, which comprises performing a soldering treatment after the surface treatment of the metal according to any one of claims 1 to 3.
理後、空気中または窒素雰囲気中で加熱する赤外線リフ
ロー、近赤外線リフロー、遠赤外線リフロー、窒素リフ
ロー、ベーパーリフロー処理を行うことを特徴とするプ
リント配線板の製造方法。6. After the surface treatment of the metal according to any one of claims 1 to 3, infrared reflow, near infrared reflow, far infrared reflow, nitrogen reflow, vapor reflow treatment of heating in air or a nitrogen atmosphere is performed. A method for manufacturing a characteristic printed wiring board.
び有機酸、金属化合物を含む溶液で表面処理後、アルカ
リ性溶液処理を行うことを特徴とするプリント配線板の
製造方法。7. A method for manufacturing a printed wiring board, which comprises performing an alkaline solution treatment after surface treatment with a solution containing the compounds represented by (Chemical formula 1) to (Chemical formula 5), an organic acid, and a metal compound.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5354759A JPH06299375A (en) | 1993-02-18 | 1993-12-24 | Treatment of metallic surface such as solder, electroless solder, ag, ni, zn, cu and cu alloy |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5-67284 | 1993-02-18 | ||
JP6728493 | 1993-02-18 | ||
JP5354759A JPH06299375A (en) | 1993-02-18 | 1993-12-24 | Treatment of metallic surface such as solder, electroless solder, ag, ni, zn, cu and cu alloy |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH06299375A true JPH06299375A (en) | 1994-10-25 |
Family
ID=26408470
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5354759A Pending JPH06299375A (en) | 1993-02-18 | 1993-12-24 | Treatment of metallic surface such as solder, electroless solder, ag, ni, zn, cu and cu alloy |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH06299375A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7479305B2 (en) | 2002-07-17 | 2009-01-20 | Atotech Deutschland Gmbh | Immersion plating of silver |
WO2016095237A1 (en) * | 2014-12-16 | 2016-06-23 | 中国科学院大连化学物理研究所 | N1-substituted imidazole compound, and alkaline anion exchange membrane and preparation |
EP3181730A1 (en) | 2015-12-16 | 2017-06-21 | Rohm and Haas Electronic Materials LLC | Method for forming organic coating on nickel surface |
-
1993
- 1993-12-24 JP JP5354759A patent/JPH06299375A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7479305B2 (en) | 2002-07-17 | 2009-01-20 | Atotech Deutschland Gmbh | Immersion plating of silver |
WO2016095237A1 (en) * | 2014-12-16 | 2016-06-23 | 中国科学院大连化学物理研究所 | N1-substituted imidazole compound, and alkaline anion exchange membrane and preparation |
EP3181730A1 (en) | 2015-12-16 | 2017-06-21 | Rohm and Haas Electronic Materials LLC | Method for forming organic coating on nickel surface |
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