JPH0518253B2 - - Google Patents
Info
- Publication number
- JPH0518253B2 JPH0518253B2 JP59117768A JP11776884A JPH0518253B2 JP H0518253 B2 JPH0518253 B2 JP H0518253B2 JP 59117768 A JP59117768 A JP 59117768A JP 11776884 A JP11776884 A JP 11776884A JP H0518253 B2 JPH0518253 B2 JP H0518253B2
- Authority
- JP
- Japan
- Prior art keywords
- resist film
- resist
- film
- pattern
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H10P76/202—
Landscapes
- Drying Of Semiconductors (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59117768A JPS60262427A (ja) | 1984-06-08 | 1984-06-08 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59117768A JPS60262427A (ja) | 1984-06-08 | 1984-06-08 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60262427A JPS60262427A (ja) | 1985-12-25 |
| JPH0518253B2 true JPH0518253B2 (en:Method) | 1993-03-11 |
Family
ID=14719839
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59117768A Granted JPS60262427A (ja) | 1984-06-08 | 1984-06-08 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60262427A (en:Method) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2105950A1 (en) * | 2008-03-27 | 2009-09-30 | United Radiant Technology Corp. | Thin film etching method |
-
1984
- 1984-06-08 JP JP59117768A patent/JPS60262427A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60262427A (ja) | 1985-12-25 |
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