JPH0517698B2 - - Google Patents
Info
- Publication number
- JPH0517698B2 JPH0517698B2 JP32574887A JP32574887A JPH0517698B2 JP H0517698 B2 JPH0517698 B2 JP H0517698B2 JP 32574887 A JP32574887 A JP 32574887A JP 32574887 A JP32574887 A JP 32574887A JP H0517698 B2 JPH0517698 B2 JP H0517698B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- thickness
- work holder
- outer work
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 74
- 239000010408 film Substances 0.000 description 20
- 239000002994 raw material Substances 0.000 description 13
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 9
- 239000010409 thin film Substances 0.000 description 8
- 230000002093 peripheral effect Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62325748A JPH01168021A (ja) | 1987-12-23 | 1987-12-23 | アウターワークホルダー |
| EP88908981A EP0336979B1 (en) | 1987-10-14 | 1988-10-14 | Apparatus for thin film formation by plasma cvd |
| KR1019890700595A KR930003136B1 (ko) | 1987-10-14 | 1988-10-14 | 프라즈마 cvd에 의한 박막 형성장치 |
| US07/368,312 US4991542A (en) | 1987-10-14 | 1988-10-14 | Method of forming a thin film by plasma CVD and apapratus for forming a thin film |
| PCT/JP1988/001043 WO1989003587A1 (en) | 1987-10-14 | 1988-10-14 | Method and apparatus for thin film formation by plasma cvd |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62325748A JPH01168021A (ja) | 1987-12-23 | 1987-12-23 | アウターワークホルダー |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01168021A JPH01168021A (ja) | 1989-07-03 |
| JPH0517698B2 true JPH0517698B2 (enrdf_load_stackoverflow) | 1993-03-09 |
Family
ID=18180206
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62325748A Granted JPH01168021A (ja) | 1987-10-14 | 1987-12-23 | アウターワークホルダー |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01168021A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100306824B1 (ko) * | 1998-05-06 | 2001-11-30 | 윤종용 | 화학적기계적평탄화기계를위한웨이퍼홀더 |
| JP4496401B2 (ja) * | 2000-09-14 | 2010-07-07 | 三菱電機株式会社 | プラズマｃｖｄ装置および太陽電池の製造方法 |
-
1987
- 1987-12-23 JP JP62325748A patent/JPH01168021A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01168021A (ja) | 1989-07-03 |