JPH0513371B2 - - Google Patents
Info
- Publication number
- JPH0513371B2 JPH0513371B2 JP60033280A JP3328085A JPH0513371B2 JP H0513371 B2 JPH0513371 B2 JP H0513371B2 JP 60033280 A JP60033280 A JP 60033280A JP 3328085 A JP3328085 A JP 3328085A JP H0513371 B2 JPH0513371 B2 JP H0513371B2
- Authority
- JP
- Japan
- Prior art keywords
- alignment
- beam splitter
- light
- excimer laser
- optical path
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 29
- 238000005286 illumination Methods 0.000 claims description 13
- 239000004065 semiconductor Substances 0.000 description 6
- 230000000007 visual effect Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 2
- 238000012800 visualization Methods 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60033280A JPS61193449A (ja) | 1985-02-21 | 1985-02-21 | 照明光学装置 |
US06/708,784 US4667109A (en) | 1984-03-09 | 1985-03-06 | Alignment device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60033280A JPS61193449A (ja) | 1985-02-21 | 1985-02-21 | 照明光学装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61193449A JPS61193449A (ja) | 1986-08-27 |
JPH0513371B2 true JPH0513371B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-02-22 |
Family
ID=12382112
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60033280A Granted JPS61193449A (ja) | 1984-03-09 | 1985-02-21 | 照明光学装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61193449A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2629709B2 (ja) * | 1987-05-28 | 1997-07-16 | 株式会社ニコン | 位置合わせ方法及び装置 |
JPH05243122A (ja) * | 1992-07-23 | 1993-09-21 | Nec Corp | 干渉露光装置 |
-
1985
- 1985-02-21 JP JP60033280A patent/JPS61193449A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS61193449A (ja) | 1986-08-27 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |