JPH0513370B2 - - Google Patents

Info

Publication number
JPH0513370B2
JPH0513370B2 JP60098473A JP9847385A JPH0513370B2 JP H0513370 B2 JPH0513370 B2 JP H0513370B2 JP 60098473 A JP60098473 A JP 60098473A JP 9847385 A JP9847385 A JP 9847385A JP H0513370 B2 JPH0513370 B2 JP H0513370B2
Authority
JP
Japan
Prior art keywords
exposure
reduction projection
semiconductor substrate
alignment
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60098473A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61256636A (ja
Inventor
Hisashi Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP60098473A priority Critical patent/JPS61256636A/ja
Publication of JPS61256636A publication Critical patent/JPS61256636A/ja
Publication of JPH0513370B2 publication Critical patent/JPH0513370B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60098473A 1985-05-09 1985-05-09 縮小投影露光装置 Granted JPS61256636A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60098473A JPS61256636A (ja) 1985-05-09 1985-05-09 縮小投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60098473A JPS61256636A (ja) 1985-05-09 1985-05-09 縮小投影露光装置

Publications (2)

Publication Number Publication Date
JPS61256636A JPS61256636A (ja) 1986-11-14
JPH0513370B2 true JPH0513370B2 (enExample) 1993-02-22

Family

ID=14220630

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60098473A Granted JPS61256636A (ja) 1985-05-09 1985-05-09 縮小投影露光装置

Country Status (1)

Country Link
JP (1) JPS61256636A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0715878B2 (ja) * 1985-07-24 1995-02-22 株式会社ニコン 露光方法及びフォトリソグラフィ装置
JPS6313331A (ja) * 1986-07-04 1988-01-20 Hitachi Ltd 縮小投影露光装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2388300A1 (fr) * 1977-04-20 1978-11-17 Thomson Csf Dispositif optique de projection de motifs comportant un asservissement de focalisation a grandissement constant
JPS58110040A (ja) * 1981-12-23 1983-06-30 Fujitsu Ltd パタ−ン形成方法

Also Published As

Publication number Publication date
JPS61256636A (ja) 1986-11-14

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