JPH0513005Y2 - - Google Patents
Info
- Publication number
- JPH0513005Y2 JPH0513005Y2 JP1986015251U JP1525186U JPH0513005Y2 JP H0513005 Y2 JPH0513005 Y2 JP H0513005Y2 JP 1986015251 U JP1986015251 U JP 1986015251U JP 1525186 U JP1525186 U JP 1525186U JP H0513005 Y2 JPH0513005 Y2 JP H0513005Y2
- Authority
- JP
- Japan
- Prior art keywords
- plasma generation
- waveguide
- generation chamber
- plasma
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Control Of Motors That Do Not Use Commutators (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1986015251U JPH0513005Y2 (enrdf_load_stackoverflow) | 1986-02-04 | 1986-02-04 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1986015251U JPH0513005Y2 (enrdf_load_stackoverflow) | 1986-02-04 | 1986-02-04 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62126831U JPS62126831U (enrdf_load_stackoverflow) | 1987-08-12 |
JPH0513005Y2 true JPH0513005Y2 (enrdf_load_stackoverflow) | 1993-04-06 |
Family
ID=30806010
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1986015251U Expired - Lifetime JPH0513005Y2 (enrdf_load_stackoverflow) | 1986-02-04 | 1986-02-04 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0513005Y2 (enrdf_load_stackoverflow) |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61131450A (ja) * | 1984-11-30 | 1986-06-19 | Canon Inc | ドライエツチング装置 |
-
1986
- 1986-02-04 JP JP1986015251U patent/JPH0513005Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS62126831U (enrdf_load_stackoverflow) | 1987-08-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6051151A (en) | Apparatus and method of producing a negative ion plasma | |
US6444084B1 (en) | Low density high frequency process for a parallel-plate electrode plasma reactor having an inductive antenna | |
KR100363820B1 (ko) | 플라스마 처리장치 | |
KR20040042873A (ko) | 플라즈마 처리 장치 | |
JPH04279044A (ja) | 試料保持装置 | |
JP2000348897A (ja) | プラズマ処理装置 | |
JP2000273646A (ja) | マイクロ波プラズマ処理装置 | |
JPH11288798A (ja) | プラズマ生成装置 | |
JPH0513005Y2 (enrdf_load_stackoverflow) | ||
JP3343629B2 (ja) | プラズマ処理装置 | |
JP2001237226A (ja) | プラズマ処理装置 | |
KR101916925B1 (ko) | 복합 플라즈마 소스를 갖는 플라즈마 챔버 | |
TW392215B (en) | Surface processing apparatus | |
CN112687510B (zh) | 一种防止约束环发生电弧损伤的等离子体处理器和方法 | |
JPH05299382A (ja) | プラズマ処理装置およびその方法 | |
JPH06120169A (ja) | プラズマ生成装置 | |
KR102467296B1 (ko) | 차폐 구조의 점화전극 | |
JP2522661B2 (ja) | マイクロ波イオン源 | |
JPH08203881A (ja) | 表面処理装置 | |
JP3077144B2 (ja) | 試料保持装置 | |
US20250140532A1 (en) | Plasma processing apparatus and manufacturing method of wafer stage for plasma processing apparatus | |
JPH06310436A (ja) | 薄膜形成装置 | |
JP4107738B2 (ja) | マイクロ波プラズマ処理装置 | |
KR20070012995A (ko) | 쿨링 플레이트를 구비한 플라즈마 식각 장치 | |
JP4076645B2 (ja) | マイクロ波プラズマ処理装置及びその処理方法 |