JPH05114673A - Back fixing agent for manufacturing tab tape carrier - Google Patents

Back fixing agent for manufacturing tab tape carrier

Info

Publication number
JPH05114673A
JPH05114673A JP3302595A JP30259591A JPH05114673A JP H05114673 A JPH05114673 A JP H05114673A JP 3302595 A JP3302595 A JP 3302595A JP 30259591 A JP30259591 A JP 30259591A JP H05114673 A JPH05114673 A JP H05114673A
Authority
JP
Japan
Prior art keywords
copolymer
alkylacrylate
resist
acrylic acid
tape carrier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3302595A
Other languages
Japanese (ja)
Inventor
Ryoichi Tajima
良一 田嶋
Yukio Ogino
幸男 荻野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Mining Co Ltd
Nikko Kyodo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining Co Ltd, Nikko Kyodo Co Ltd filed Critical Nippon Mining Co Ltd
Priority to JP3302595A priority Critical patent/JPH05114673A/en
Publication of JPH05114673A publication Critical patent/JPH05114673A/en
Pending legal-status Critical Current

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  • Adhesives Or Adhesive Processes (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PURPOSE:To prevent the deformation and melting of leads by using a polymer selected output of one or two kinds among the copolymer of alkylacrylate and acrylic acid, a cresol novolak type resin, and the copolymer of alkylacrylate and alkylmethacrylate. CONSTITUTION:A copolymer selected out of one or two kinds selected from among the copolymer of alkylacrylate and acrylic acid, a cresol novolak type resin, and the copolymer of alkylacrylate and alkylmethacrylate is used. It is preferable to use copolymers of alkylacrylate and acrylic acid and alkylacrylate and alkylmethacrylate respectively having 3 to 50 degrees of polymerization degrees and 5:1 to 1:5 molar ratio. Therefore, the deformation and melting of leads can be prevented, since a resist on copper foil is not broken by a stripped off and falling down lump of a resist.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、TAB用テープキャリ
アの製造裏止め剤に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a backing agent for manufacturing a tape carrier for TAB.

【0002】[0002]

【従来の技術】TAB用テープキャリアとして、ポリイ
ミド、ガラス入りエポキシ、ポリエステル等からなるベ
ースフィルム上に接着剤によって銅箔等の導電層をラミ
ネートした、ベースフィルム、接着剤、導電層の3層構
造からなるものが用いられている。この3層構造のTA
B用テープキャリアは、一般に次の製造工程により製造
されている。すなわち、銅箔をラミネートするため接着
剤を塗布したベースフィルムにデバイスホール及びスプ
ロケットホール等の所要のホールを形成する工程。この
フィルム上に銅箔をラミネートする工程。銅箔上にレジ
ストを塗布し、露光し、現像してレジストパターンを形
成する工程。銅箔をエッチングしてリードパターンを形
成する工程。リード表面にめっきを施す工程。
2. Description of the Related Art As a TAB tape carrier, a three-layer structure of a base film, an adhesive and a conductive layer in which a conductive layer such as a copper foil is laminated with an adhesive on a base film made of polyimide, epoxy containing glass, polyester or the like. Is used. This 3-layer TA
The tape carrier for B is generally manufactured by the following manufacturing process. That is, a step of forming required holes such as device holes and sprocket holes in a base film coated with an adhesive for laminating copper foil. Step of laminating copper foil on this film. A step of forming a resist pattern by applying a resist on a copper foil, exposing it, and developing it. A step of etching a copper foil to form a lead pattern. The process of plating the lead surface.

【0003】このうち、銅箔をエッチングして導体パタ
ーンを形成する工程では、エッチングの際、エッチング
液のデバイスホール側からの浸入とエッチング液のスプ
レー圧によるリードの変形を防止する目的で、デバイス
ホール内にエッチングレジスト等の裏止め剤を充填する
方法が一般的に行なわれている。しかしながら、エッチ
ングレジストでは、エッチングの際に、このレジストが
剥離して抜け落ち、これにより銅箔上のレジストが割
れ、規定のリードパターンが得られないという問題があ
った。
Among them, in the step of etching the copper foil to form the conductor pattern, the device is formed in order to prevent the penetration of the etching solution from the device hole side and the deformation of the lead due to the spray pressure of the etching solution during the etching. A method of filling a hole with a backing agent such as an etching resist is generally performed. However, the etching resist has a problem in that during etching, the resist is peeled off and falls off, whereby the resist on the copper foil is cracked and a prescribed lead pattern cannot be obtained.

【0004】このため、ドライフィルムを銅箔をラミネ
ートした面と反対の面にドライフィルム等の保護フィル
ムを接合して補強する方法が提案された(特開平2−2
03545号公報)。しかし、この方法ではデバイスホ
ールの端部に空隙が残り、エッチング液がその部分に滞
留してリードを溶解するという問題があった。また、裏
止め剤を充填した後、保護フィルムを接合する方法は工
程が一つ増えるため好ましいものではなかった。
Therefore, a method has been proposed in which a protective film such as a dry film is joined to the surface of the dry film opposite to the surface laminated with the copper foil to reinforce the dry film (Japanese Patent Laid-Open No. 2-2).
No. 03545). However, this method has a problem in that a void remains at the end of the device hole, and the etching liquid stays in that portion to dissolve the lead. In addition, the method of joining the protective film after filling the backing agent is not preferable because the number of steps is increased by one.

【0005】一方、この種の裏止め剤としては、溶剤に
溶解してデバイスホールに塗布乾燥するだけで、ホール
端部に空隙を残さずに膜形成できるもので、この形成し
た膜はエッチング液のスプレー圧(通常1kg/c
2)に十分耐えうる程強靱なものであり、当然にエッ
チング液(塩化第2鉄又は塩化第2銅)に不溶なものであ
り、銅箔との接着強度が良好であることが要求される。
On the other hand, as this kind of backing agent, it is possible to form a film without leaving voids at the end of the hole simply by dissolving it in a solvent and coating and drying it on the device hole. Spray pressure (usually 1 kg / c
m 2 ), which is tough enough to withstand m 2 ), is naturally insoluble in an etching solution (ferric chloride or cupric chloride), and is required to have good adhesive strength with a copper foil. It

【0006】[0006]

【発明が解決しようとする課題】本発明は上記の問題を
解決したもので、本発明の目的はエッチングの際に、こ
のレジストが剥離して抜け落ちることがなく、しかも上
記要求を満たしたTAB用テープキャリア製造裏止め剤
を提供することにある。
SUMMARY OF THE INVENTION The present invention solves the above problems, and an object of the present invention is to prevent the resist from peeling off during etching and to satisfy the above requirements. To provide a backing agent for manufacturing a tape carrier.

【0007】[0007]

【課題を解決するための手段】本発明者は鋭意研究を進
めた結果、特定の重合物を裏止め剤として用いることに
より上述の課題を達成することを見い出した。
As a result of earnest research, the present inventor has found that the above-mentioned problems can be achieved by using a specific polymer as a backing agent.

【0008】すなわち、本発明はTAB用テープキャリ
ア製造裏止め剤としてアルキルアクリレートとアクリル
酸の共重合体、クレゾールノボラック型樹脂、或いはア
ルキルアクリレートとアルキルメタクリレートの共重合
体の1種又は2種以上から選定された重合物を用いるこ
とからなるものである。
That is, the present invention comprises one or more of a copolymer of alkyl acrylate and acrylic acid, a cresol novolac type resin, or a copolymer of alkyl acrylate and alkyl methacrylate as a backing agent for producing a tape carrier for TAB. It consists of using the selected polymer.

【0009】上記アルキルアクリレートとアクリル酸の
共重合体としては、重合度が3〜50、特には6〜12
のもので、アルキルアクリレート:アクリル酸が5:1
〜1:5のモル比のものが好ましく、またアルキルアク
リレート中のアルキル基として、メチル基又はエチル基
が、溶液の粘度及び溶解除去の短縮化のために、特に望
ましい。
The above-mentioned copolymer of alkyl acrylate and acrylic acid has a degree of polymerization of 3 to 50, particularly 6 to 12.
With alkyl acrylate: acrylic acid 5: 1
A molar ratio of ˜1: 5 is preferred, and as the alkyl group in the alkyl acrylate, a methyl group or an ethyl group is particularly desirable for the viscosity of the solution and the shortening of dissolution removal.

【0010】一方、クレゾールノボラック型樹脂として
は、分子量1000〜3000、50%エタノール溶液
での粘度が50〜100cP、融点が50〜100℃の
ものが、特に好ましい。
On the other hand, as the cresol novolac type resin, one having a molecular weight of 1000 to 3000, a viscosity in a 50% ethanol solution of 50 to 100 cP and a melting point of 50 to 100 ° C. is particularly preferable.

【0011】さらに、アルキルアクリレートとアルキル
メタクリレートの共重合体としては、重合度が3〜5
0、特には6〜11のもので、アルキルアクリレート:
アルキルメタクリレートが5:1〜1:5のモル比のも
のが特に好ましく、またアルキルアクリレート及びアル
キルメタクリレート中のアルキル基として、メチル基又
はエチル基が、溶液の粘度及び溶解除去の短縮化のため
に、特に望ましい。
Further, the copolymer of alkyl acrylate and alkyl methacrylate has a degree of polymerization of 3-5.
0, especially 6 to 11, alkyl acrylates:
Alkyl methacrylate having a molar ratio of 5: 1 to 1: 5 is particularly preferable, and a methyl group or an ethyl group is used as an alkyl group in the alkyl acrylate and the alkyl methacrylate in order to reduce the viscosity of the solution and the dissolution removal. , Especially desirable.

【0012】これらの樹脂はそれ単独でも他の樹脂と混
合して用いることができ、特にはアルキルアクリレート
とアクリル酸の共重合体とクレゾールノボラック型樹脂
とを混合して用いると膜強度の面で優れており、かなり
強力なエッチングスプレーでも耐えることができる。
These resins can be used alone or as a mixture with other resins. Particularly, when a copolymer of alkyl acrylate and acrylic acid and a cresol novolac type resin are used as a mixture, the film strength is improved. It is excellent and can withstand fairly powerful etching sprays.

【0013】これらの樹脂は溶剤に溶解或いは分散して
用いられるが、この場合、固形分が10〜30%となる
ように溶剤量を調整することが望ましい。固形分が10
%以下では塗布むら発生しやすく、また30%以上では
乾燥し難くなる。この溶剤としては、メタノール、エタ
ノール等のアルコール系、MEK等のケトン系、或いは
グリコール系等、一般に用いられているこれらの樹脂の
溶媒を用いることができる。
These resins are used after being dissolved or dispersed in a solvent. In this case, it is desirable to adjust the amount of solvent so that the solid content is 10 to 30%. Solid content is 10
If it is less than 30%, uneven coating tends to occur, and if it exceeds 30%, it becomes difficult to dry. As the solvent, solvents of these commonly used resins such as alcohols such as methanol and ethanol, ketones such as MEK, and glycols can be used.

【0014】上記裏止め剤は、エッチング終了後のパタ
ーン形成用レジスト除去の前後に除去されるが、アルキ
ルアクリレートとアクリル酸の共重合体及びクレゾール
ノボラック型樹脂はNaOH水溶液に、アルキルアクリ
レートとアルキルメタクリレートの共重合体はアセト
ン、メタノール等の溶剤に可溶であるため、パターン形
成用レジストと同時に溶解除去することができる。
The backing agent is removed before and after the removal of the resist for pattern formation after the etching is completed. The copolymer of alkyl acrylate and acrylic acid and the cresol novolac type resin are used in an aqueous NaOH solution, and the alkyl acrylate and alkyl methacrylate are used. Since the copolymer (1) is soluble in a solvent such as acetone or methanol, it can be dissolved and removed simultaneously with the pattern forming resist.

【0015】本発明の裏止め剤を使用するときは、膜厚
が10〜30μmとすると良く、10μm未満ではエッチ
ング液のスプレー圧に耐えられず、30μmを超えると
剥離困難となるので望ましくない。
When the backing agent of the present invention is used, the film thickness is preferably 10 to 30 μm, and if it is less than 10 μm, it cannot withstand the spray pressure of the etching solution, and if it exceeds 30 μm, peeling becomes difficult, which is not desirable.

【0016】[0016]

【実施例】以下本発明を実施例について説明するが、本
発明はこれらによって限定されるものではない。
EXAMPLES The present invention will be described below with reference to examples, but the present invention is not limited thereto.

【0017】巾35mm、厚さ0.1mmのポリイミドフィ
ルムにエポキシ系接着剤を塗布し、面積50mm2のデバ
イスホールを形成した。本テープに厚さ0.025mmの
圧延銅箔をラミネートした。銅箔表面上にポジ型フォト
レジストを塗布し、デバイスホール上に長さ0.6mm、
巾0.08mm、本数40のリードパターンを露光現像し
た。そして、表1に示す裏止め剤をデバイスホール内に
塗布乾燥した。尚、比較として、比較例2でドライフィ
ルムを接合する方法を行ったが、この場合、ロール温度
140℃でラミネートした。これらをさらに銅箔を塩化
第2鉄水溶液からなるエッチング液に浸漬してエッチン
グを行い、リードの変形と溶解の有無を光学顕微鏡(5
0倍)で確認した。次に、残存するポジ型フォトレジス
トに再度露光(1000mJ/cm2)し、9%濃度のNa
OH水溶液(実施例3ではアセトンを使用)にテープを
25℃で、4分間浸漬して、フォトレジスト及び裏止め
剤を溶解除去し、裏止め剤の残存の有無を光学顕微鏡
(50倍)で確認した。この結果を表2に示す。
An epoxy adhesive was applied to a polyimide film having a width of 35 mm and a thickness of 0.1 mm to form a device hole having an area of 50 mm 2 . This tape was laminated with 0.025 mm thick rolled copper foil. Positive type photoresist is applied on the surface of copper foil, and the length is 0.6mm on the device hole.
A lead pattern having a width of 0.08 mm and a number of 40 was exposed and developed. Then, the backing agent shown in Table 1 was applied inside the device hole and dried. As a comparison, a method of joining dry films was performed in Comparative Example 2, but in this case, lamination was performed at a roll temperature of 140 ° C. These are further etched by immersing the copper foil in an etching solution consisting of an aqueous solution of ferric chloride, and checking the presence or absence of lead deformation and dissolution with an optical microscope (5
0 times). Then, the remaining positive photoresist was exposed again (1000 mJ / cm 2 ) to obtain a 9% Na solution.
The tape and the backing agent were dissolved and removed by immersing the tape in an OH aqueous solution (acetone was used in Example 3) at 25 ° C. for 4 minutes, and the presence or absence of the backing agent was checked by an optical microscope.
(50 times) confirmed. The results are shown in Table 2.

【0018】[0018]

【表1】 [Table 1]

【0019】[0019]

【表2】 [Table 2]

【0020】[0020]

【発明の効果】以上説明したように、本発明による裏止
め剤を使用することにより、エッチング時に、このレジ
ストが剥離して抜け落ちて銅箔上のレジストが割れるこ
とがなく、リード変形及び溶解を防止することができ、
精度良く規定のリードパターンが得られる。
As described above, by using the backing agent according to the present invention, during etching, the resist on the copper foil does not peel off and fall off, and the resist on the copper foil is not cracked. Can be prevented,
A specified lead pattern can be obtained with high accuracy.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 アルキルアクリレートとアクリル酸の共
重合体、クレゾールノボラック型樹脂、或いはアルキル
アクリレートとアルキルメタクリレートの共重合体の1
種又は2種以上から選定された重合物を含有することを
特徴とするTAB用テープキャリア製造裏止め剤。
1. A copolymer of alkyl acrylate and acrylic acid, a cresol novolac type resin, or a copolymer of alkyl acrylate and alkyl methacrylate.
A backing agent for producing a tape carrier for TAB, which contains a polymer selected from two or more kinds.
JP3302595A 1991-10-23 1991-10-23 Back fixing agent for manufacturing tab tape carrier Pending JPH05114673A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3302595A JPH05114673A (en) 1991-10-23 1991-10-23 Back fixing agent for manufacturing tab tape carrier

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3302595A JPH05114673A (en) 1991-10-23 1991-10-23 Back fixing agent for manufacturing tab tape carrier

Publications (1)

Publication Number Publication Date
JPH05114673A true JPH05114673A (en) 1993-05-07

Family

ID=17910874

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3302595A Pending JPH05114673A (en) 1991-10-23 1991-10-23 Back fixing agent for manufacturing tab tape carrier

Country Status (1)

Country Link
JP (1) JPH05114673A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6169845B1 (en) 1989-07-26 2001-01-02 Canon Kabushiki Kaisha Moving-image data recording/reproducing apparatus for simultaneously recording/reproducing a plurality of moving image data items using a plurality of recording/reproducing means
US11822242B2 (en) 2019-11-14 2023-11-21 Merck Patent Gmbh DNQ-type photoresist composition including alkali-soluble acrylic resins

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58106536A (en) * 1981-12-19 1983-06-24 Daikin Ind Ltd Resist material and formation of resist micropattern using it
JPS61130946A (en) * 1984-11-29 1986-06-18 Hitachi Chem Co Ltd Photosensitive resin composition
JPH0272361A (en) * 1988-09-07 1990-03-12 Fujitsu Ltd Electron ray resist having two-layered structure
JPH02142152A (en) * 1988-11-22 1990-05-31 Hitachi Cable Ltd Manufacture of film carrier
JPH02289607A (en) * 1989-02-09 1990-11-29 Mitsubishi Rayon Co Ltd Crosslinking, hardening resin composition

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58106536A (en) * 1981-12-19 1983-06-24 Daikin Ind Ltd Resist material and formation of resist micropattern using it
JPS61130946A (en) * 1984-11-29 1986-06-18 Hitachi Chem Co Ltd Photosensitive resin composition
JPH0272361A (en) * 1988-09-07 1990-03-12 Fujitsu Ltd Electron ray resist having two-layered structure
JPH02142152A (en) * 1988-11-22 1990-05-31 Hitachi Cable Ltd Manufacture of film carrier
JPH02289607A (en) * 1989-02-09 1990-11-29 Mitsubishi Rayon Co Ltd Crosslinking, hardening resin composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6169845B1 (en) 1989-07-26 2001-01-02 Canon Kabushiki Kaisha Moving-image data recording/reproducing apparatus for simultaneously recording/reproducing a plurality of moving image data items using a plurality of recording/reproducing means
US11822242B2 (en) 2019-11-14 2023-11-21 Merck Patent Gmbh DNQ-type photoresist composition including alkali-soluble acrylic resins

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