JP3251971B2 - Dry film adhesive for additive method - Google Patents
Dry film adhesive for additive methodInfo
- Publication number
- JP3251971B2 JP3251971B2 JP06400492A JP6400492A JP3251971B2 JP 3251971 B2 JP3251971 B2 JP 3251971B2 JP 06400492 A JP06400492 A JP 06400492A JP 6400492 A JP6400492 A JP 6400492A JP 3251971 B2 JP3251971 B2 JP 3251971B2
- Authority
- JP
- Japan
- Prior art keywords
- adhesive layer
- solution
- base film
- adhesive
- matrix resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0756—Uses of liquids, e.g. rinsing, coating, dissolving
- H05K2203/0773—Dissolving the filler without dissolving the matrix material; Dissolving the matrix material without dissolving the filler
Landscapes
- Adhesives Or Adhesive Processes (AREA)
- Manufacturing Of Printed Wiring (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明はプリント配線基板の製造
に使用されるアディティブ法用ドライフィルム接着剤に
関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a dry film adhesive for an additive method used for manufacturing a printed wiring board.
【0002】[0002]
【従来の技術】近年、電子機器の小型化、高性能化及び
多機能化が進められており、これに使用されるプリント
配線板においてもファインパターンによる高密度化及び
高信頼性が要求されている。2. Description of the Related Art In recent years, miniaturization, high performance, and multifunctionality of electronic devices have been promoted, and high density and high reliability by fine patterns have been demanded for printed wiring boards used therein. I have.
【0003】従来、プリント配線板に導体回路を形成す
る方法としては、絶縁基板に銅箔を積層した後、フォト
エッチングすることにより導体回路を形成するサブトラ
クティブ法が広く行われている。この方法によれば絶縁
基板との密着性に優れた導体回路を形成することができ
るが、銅箔の厚みのためにエッチングにより所謂アンダ
ーカットが生じ高精度のファインパターンが得難く、高
密度化に対応することが難しいという問題がある。Conventionally, as a method of forming a conductive circuit on a printed wiring board, a subtractive method of forming a conductive circuit by laminating a copper foil on an insulating substrate and then performing photoetching has been widely used. According to this method, a conductor circuit having excellent adhesion to an insulating substrate can be formed. However, a so-called undercut occurs due to etching due to the thickness of the copper foil, and it is difficult to obtain a high-precision fine pattern. There is a problem that it is difficult to deal with.
【0004】このため、サブトラクティブ法に代わる方
法として、絶縁基板に接着剤を塗布して接着層を形成
し、この接着層の表面を粗化した後、無電解メッキを施
して導体回路を形成するアディティブ法が注目されてい
る。[0004] Therefore, as an alternative to the subtractive method, an adhesive is applied to an insulating substrate to form an adhesive layer, the surface of the adhesive layer is roughened, and electroless plating is performed to form a conductor circuit. Attention is being paid to the additive method.
【0005】このアディティブ法用接着剤として、硬化
処理により溶解液に対して難溶性となるマトリックス樹
脂液中に、溶解液に対して可溶でかつ前記マトリックス
樹脂液に難溶な平均粒径が異なる2種類のフィラーが分
散されてなる接着剤が本出願人により提案されている。
そして、絶縁基板上に接着層を形成する場合には、絶縁
基板上に前記樹脂混合液を所定厚に塗布し、塗布した樹
脂混合液を乾燥させて接着剤層を形成し、この接着剤層
を硬化処理して接着層を形成する。次に、この接着層を
溶解液に浸漬すると、溶解液に対して難溶性のマトリッ
クス樹脂と溶解液に対して可溶性のフィラーの溶解度の
差により粗化凹部が多数形成される。このとき、接着層
中に分散された可溶性のフィラーは粒径の異なる大小2
種類のフィラーから構成されているので、接着層に形成
された粗化凹部は複雑な形状となり、接着層と接着層に
施される無電解銅メッキ層との密着強度を強力なものに
している。[0005] As an adhesive for the additive method, an average particle size that is soluble in a dissolving solution and hardly soluble in the matrix resin solution is contained in a matrix resin solution that becomes sparingly soluble in a dissolving solution by curing treatment. An adhesive in which two different types of fillers are dispersed has been proposed by the present applicant.
When the adhesive layer is formed on the insulating substrate, the resin mixed solution is applied on the insulating substrate to a predetermined thickness, and the applied resin mixed solution is dried to form an adhesive layer. Is cured to form an adhesive layer. Next, when this adhesive layer is immersed in the solution, a large number of roughened concave portions are formed due to the difference in solubility between the matrix resin that is hardly soluble in the solution and the filler that is soluble in the solution. At this time, the soluble filler dispersed in the adhesive layer is large or small having a different particle size.
Since it is composed of different types of fillers, the roughened recess formed in the adhesive layer has a complicated shape, and the adhesion strength between the adhesive layer and the electroless copper plating layer applied to the adhesive layer is strong. .
【0006】[0006]
【発明が解決しようとする課題】接着層に対する無電解
銅メッキ層の密着強度を所定の値以上に確保するには、
溶解液による粗化後の接着層の表面粗度が所定の値以上
となるようにする必要がある。ところが、接着層は溶解
液に対して難溶性のマトリックス樹脂中に溶解液に対し
て可溶性のフィラーが分散した構造となっている。そし
て、接着層が溶解液に浸漬されると、溶解液に対して難
溶性のマトリックス樹脂中に分散したフィラーが溶解さ
れて凹所が形成され、この凹所が経時的に複数繋がって
粗化凹部が形成される。従って、粗化凹部が形成される
過程は、フィラーのマトリックスとして存在する難溶性
のマトリックス樹脂の溶解を伴う。このため、難溶性の
マトリックス樹脂の溶解を伴う粗化工程には長時間が必
要であった。In order to secure the adhesion strength of the electroless copper plating layer to the adhesive layer at a predetermined value or more,
It is necessary that the surface roughness of the adhesive layer after the roughening by the dissolving solution is equal to or more than a predetermined value. However, the adhesive layer has a structure in which a filler that is soluble in the solution is dispersed in a matrix resin that is hardly soluble in the solution. Then, when the adhesive layer is immersed in the solution, the filler dispersed in the matrix resin, which is hardly soluble in the solution, is dissolved to form a recess, and a plurality of the recesses are connected with time to roughen. A recess is formed. Therefore, the process of forming the roughened concave portion involves dissolving the poorly soluble matrix resin existing as the matrix of the filler. For this reason, the roughening step involving the dissolution of the hardly soluble matrix resin requires a long time.
【0007】また、粗化工程では同じ溶解液が繰返し使
用されるため、溶解液の粗化処理回数が増えるにつれて
溶解液は徐々に劣化し、その溶解力は低下してゆく。こ
のため、溶解液の粗化処理回数が増えるにつれて粗化工
程にはさらに長時間が必要となり、プリント配線基板の
生産性を著しく低下させていた。そして、粗化工程の処
理能力を向上させるため、一度に多数の絶縁基板につい
て接着層の粗化を行うには、溶解液の浴槽を大型にする
必要がある。また、劣化した溶解液と新液との交換ある
いは酸化剤の補給サイクルを長くする場合にも浴槽の大
型化が必要となる。Further, since the same solution is used repeatedly in the roughening step, the solution gradually deteriorates as the number of times of the roughening treatment of the solution increases, and the dissolving power is reduced. For this reason, as the number of times of the roughening treatment of the solution increases, the roughening step requires a longer time, which significantly reduces the productivity of the printed wiring board. In order to improve the processing capability of the roughening step, in order to roughen the adhesive layer on a large number of insulating substrates at once, it is necessary to increase the size of the bath of the solution. In addition, the bathtub needs to be increased in size when replacing the deteriorated solution with a new solution or extending the replenishment cycle of the oxidizing agent.
【0008】本発明は上記問題点を解決するためになさ
れたものであって、その目的は絶縁基板に形成した接着
層の表面を短時間で粗化するとともに、粗化に必要な溶
解量を低減して溶解液の劣化速度を小さくすることがで
き、さらに溶解液の浴槽の小型化を図ることができるア
ディティブ法用ドライフィルム接着剤を提供することに
ある。SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and has as its object to roughen the surface of an adhesive layer formed on an insulating substrate in a short time and to reduce the amount of dissolution required for roughening. It is an object of the present invention to provide a dry film adhesive for an additive method, which can reduce the rate of deterioration of a solution by reducing the amount of the solution and further reduce the size of a bath for the solution.
【0009】[0009]
【課題を解決するための手段】本発明は上記問題点を解
決するため、表面を粗した耐熱性のベースフィルムの表
面上に、硬化処理によりクロム酸水溶液に対して難溶性
となる未硬化又は不完全硬化のマトリックス樹脂と、前
記マトリックス樹脂に分散され、前記クロム酸水溶液に
対して可溶でかつ前記マトリックス樹脂に対して難溶な
フィラーとからなる接着剤層を積層した。SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, the present invention provides an uncured or hardened or hardened chromic acid aqueous solution which is hardened on a surface of a heat-resistant base film having a roughened surface. and the matrix resin of the incompletely hardened, dispersed in said matrix resin, was laminated an adhesive layer comprising a hardly soluble fillers for the soluble a and the matrix resin relative to the chromic acid aqueous solution.
【0010】[0010]
【作用】従って、本発明によれば、表面を粗した耐熱性
ベースフィルムの表面上に積層された接着剤層を絶縁基
板上にラミネートし、前記接着剤層を硬化処理した後に
耐熱性ベースフィルムを絶縁基板から剥離すると、絶縁
基板上に硬化した接着層が形成される。この接着層の表
面は耐熱性ベースフィルムの表面の粗度に対応した粗度
となる。その後、接着層をクロム酸水溶液に浸漬させる
と、クロム酸水溶液に対して難溶性のマトックス樹脂と
クロム酸水溶液に対して可溶性のフィラーとの溶解速度
の差により複雑な形状の粗化凹部が形成される。このと
き、接着層の表面は予め微細な凹部が形成された粗面で
あるので、所定の表面粗度の粗化凹部を形成するのに必
要なマトリックス樹脂及びフィラーの溶解量は少量とな
る。また、接着層の表面は粗面であり接着層とクロム酸
水溶液との接触面積が増大するので、接着層の溶解速度
は上昇する。よって、接着層をクロム酸水溶液に浸漬さ
せると、接着層の表面には多数の複雑な形状の粗化凹部
が短時間のうちに形成される。Therefore, according to the present invention, the adhesive layer laminated on the surface of the heat-resistant base film having a roughened surface is laminated on an insulating substrate, and after the adhesive layer is cured, the heat-resistant base film is cured. Is peeled from the insulating substrate, a cured adhesive layer is formed on the insulating substrate. The surface of the adhesive layer has a roughness corresponding to the surface roughness of the heat-resistant base film. Thereafter, when dipping the adhesive layer in an aqueous solution of chromic acid, and Matokkusu resin insoluble in an aqueous chromic acid solution
A roughened concave portion having a complicated shape is formed due to a difference in dissolution rate between the filler and the soluble filler in the chromic acid aqueous solution . At this time, since the surface of the adhesive layer is a rough surface on which fine concave portions are formed in advance, the amount of the matrix resin and filler required to form a roughened concave portion having a predetermined surface roughness is small. Further, the surface of the adhesive layer is a rough surface adhesive layer and the chromic acid
Since the contact area with the aqueous solution increases, the dissolution rate of the adhesive layer increases. Therefore, when the adhesive layer is immersed in the chromic acid aqueous solution , a large number of complex-shaped roughened concave portions are formed on the surface of the adhesive layer in a short time.
【0011】[0011]
【実施例】以下、本発明を具体化した一実施例を図1〜
図4に従って説明する。はじめに、本実施例のアディテ
ィブ法用ドライフィルム接着剤について図1に基づいて
説明する。ドライフィルム接着剤DFは耐熱製のベース
フィルム1と、その表面上に積層された接着剤層2と、
接着剤層2の表面に貼付された剥離紙3とから構成され
ている。ベースフィルム1の表面は表面粗度ほぼ5〜7
μmに粗された粗面であり、その粗面側に接着剤層2が
積層形成されている。接着剤層2の表面には剥離紙3が
貼付されて接着剤層2を保護している。接着剤層2は硬
化処理により溶解液としてのクロム酸水溶液に対して難
溶性となる未硬化又は不完全硬化のマトリックス樹脂4
とマトリックス樹脂4中に分散された溶解液に対して可
溶性で粒径の異なる大きいフィラー5aと小さいフィラ
ー5bから構成されている。DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will now be described with reference to FIGS.
This will be described with reference to FIG. First, a dry film adhesive for an additive method according to the present embodiment will be described with reference to FIG. The dry film adhesive DF comprises a heat-resistant base film 1, an adhesive layer 2 laminated on its surface,
And a release paper 3 attached to the surface of the adhesive layer 2. The surface of the base film 1 has a surface roughness of approximately 5 to 7
It is a rough surface roughened to μm, and the adhesive layer 2 is formed on the rough surface side. A release paper 3 is attached to the surface of the adhesive layer 2 to protect the adhesive layer 2. The adhesive layer 2 is an uncured or incompletely cured matrix resin 4 which becomes hardly soluble in a chromic acid aqueous solution as a dissolving liquid by a curing treatment
And a large filler 5a and a small filler 5b which are soluble in a solution dispersed in the matrix resin 4 and have different particle diameters.
【0012】次に、ドライフィルム接着剤の形成方法に
ついて説明する。前記接着剤層2用の接着剤を次のよう
にして調製した。マトリックス樹脂としてのビスフェノ
ールA型エポキシ樹脂(油化シェル製、商品名:E−1
001)40重量部と、マトリックス樹脂としてのフェ
ノールノボラック型エポキシ樹脂(油化シェル製、商品
名:E−154)60重量部と、イミダゾール型硬化剤
(四国化成製、商品名:2PHZ)10重量部と、フィ
ラーーとしてのエポキシ樹脂微粒子(東レ製、商品名:
トレパールEP−B、平均粒径0.5μm)10重量部
と、エポキシ樹脂微粒子(東レ製、商品名:トレパール
EP−B、平均粒径5.5μm)25重量部と、ブチル
セロソルブアセテート75重量部とを三本ローラーで攪
拌混合して接着剤を調製した。Next, a method for forming a dry film adhesive will be described. An adhesive for the adhesive layer 2 was prepared as follows. Bisphenol A type epoxy resin as a matrix resin (manufactured by Yuka Shell, trade name: E-1)
001) 40 parts by weight, 60 parts by weight of a phenol novolak type epoxy resin (manufactured by Yuka Shell, trade name: E-154) as a matrix resin, and 10 parts by weight of an imidazole type curing agent (manufactured by Shikoku Chemicals, trade name: 2PHZ) Part and epoxy resin fine particles as filler (manufactured by Toray, trade name:
10 parts by weight of Trepal EP-B, average particle size 0.5 μm), 25 parts by weight of epoxy resin fine particles (trade name: Trepal EP-B, manufactured by Toray, average particle size 5.5 μm), and 75 parts by weight of butyl cellosolve acetate Was stirred and mixed with three rollers to prepare an adhesive.
【0013】ベースフィルム1としてはポリメチルペン
テン(TPX)(三井石油化学工業製、商品名:オピュ
ランX−88,軟化点180℃)製の50μm厚のベー
スフィルム1を使用した。表面に砂を吹き付けて表面粗
度をほぼ5〜7μmとしたステンレス製のローラを用い
て200℃で10kg/cm2 の圧力でベースフィルム
1の表面をマット処理し、ベースフィルム1の表面に微
細な凹部1aを多数形成させてほぼ5〜7μmの表面粗
度とした。このベースフィルム1の粗面側にローラコー
タを使用して前記接着剤を塗布厚が30μm程度となる
ように塗布した。塗布した接着剤を乾燥処理して接着剤
の溶剤を揮発させ、ベースフィルム1上にドライフィル
ム化した接着剤層2を形成した。最後にドライフィルム
化した接着剤層2の表面に剥離紙3を貼付してドライフ
ィルム接着剤DFを形成した。As the base film 1, a base film 1 having a thickness of 50 μm made of polymethylpentene (TPX) (trade name: Opulan X-88, softening point 180 ° C., manufactured by Mitsui Petrochemical Industries, Ltd.) was used. The surface of the base film 1 is matted at 200 ° C. at a pressure of 10 kg / cm 2 using a stainless steel roller having a surface roughness of about 5 to 7 μm by spraying sand on the surface, and the surface of the base film 1 is finely ground. Many concave portions 1a were formed to have a surface roughness of approximately 5 to 7 μm. The adhesive was applied to the rough surface side of the base film 1 using a roller coater so that the applied thickness was about 30 μm. The applied adhesive was dried to evaporate the solvent of the adhesive, and a dry film adhesive layer 2 was formed on the base film 1. Finally, a release paper 3 was adhered to the surface of the adhesive layer 2 which was formed into a dry film to form a dry film adhesive DF.
【0014】次に、ドライフィルム接着剤の使用方法に
ついて説明する。使用時には必要量だけ切り取って剥離
紙3を剥がして使用する。ドライフィルム化した接着剤
層2を絶縁基板としてのガラスエポキシ基板6上にラミ
ネートし、この状態で120℃で1時間、さらに150
℃で1時間の加熱処理をし、接着剤層2を熱硬化して接
着層7とする。接着層7は熱硬化されることによりガラ
スエポキシ基板6と強固に密着する(図3(a))。Next, a method of using the dry film adhesive will be described. At the time of use, a necessary amount is cut off and the release paper 3 is peeled off before use. The adhesive layer 2 formed into a dry film is laminated on a glass epoxy substrate 6 as an insulating substrate.
The adhesive layer 2 is subjected to a heat treatment at 1 ° C. for one hour, and is thermally cured to form an adhesive layer 7. The adhesive layer 7 is firmly adhered to the glass epoxy substrate 6 by being cured by heat (FIG. 3A).
【0015】そして、接着剤層2の熱硬化後、接着層7
からベースフィルム1を剥離すると、接着層7の表面に
はベースフィルム1の粗面の凸部に対応した微細な凹部
7aが多数形成される。ベースフィルム1の剥離が接着
剤層2の完全硬化後に行われるため、表面の凸部が変形
してだれたりせず、接着層7の表面粗度はベースフィル
ム1の表面粗度に対応してほぼ5〜7μmとなる(図3
(b))。After the heat curing of the adhesive layer 2, the adhesive layer 7
When the base film 1 is peeled from the base film 1, a large number of fine concave portions 7a corresponding to the convex portions on the rough surface of the base film 1 are formed on the surface of the adhesive layer 7. Since the peeling of the base film 1 is performed after the adhesive layer 2 is completely cured, the convex portion on the surface is not deformed and does not fall off, and the surface roughness of the adhesive layer 7 corresponds to the surface roughness of the base film 1. It is approximately 5 to 7 μm (FIG. 3)
(B)).
【0016】次に、ガラスエポキシ基板6を溶解液(ク
ロム酸水溶液)に浸漬して接着層7の表面が所定の表面
粗度となるまでエッチングする。その結果、粗化後の接
着層7の表面には一様に複雑な形状の粗化凹部8が形成
される(図3(c))。Next, the glass epoxy substrate 6 is immersed in a solution ( aqueous solution of chromic acid) and etched until the surface of the adhesive layer 7 has a predetermined surface roughness. As a result, a rough concave portion 8 having a uniformly complicated shape is formed on the surface of the adhesive layer 7 after the roughening (FIG. 3C).
【0017】図2(a)に示すように、前記接着層7は
溶解液に難溶性のマトリックス樹脂4中に溶解液に可溶
性の平均粒径5.5μmの大きいフィラー5aと平均粒
径0.5μmの小さいフィラー5bとが均一に分散され
た構造となっている。そして、溶解液による処理に先立
って接着層7の表面にはベースフィルム1の粗面の凸部
に対応した微細な凹部7aが形成され、その表面粗度は
ほぼ5〜7μmとなっている。As shown in FIG. 2A, the adhesive layer 7 is composed of a large filler 5a having an average particle size of 5.5 μm and a mean particle size of 5.5 μm, which is soluble in the solution in a matrix resin 4 which is hardly soluble in the solution. It has a structure in which a 5 μm small filler 5b is uniformly dispersed. Prior to the treatment with the solution, fine concave portions 7a corresponding to the convex portions of the rough surface of the base film 1 are formed on the surface of the adhesive layer 7, and the surface roughness is approximately 5 to 7 μm.
【0018】従って、接着層7を溶解液に浸漬させる
と、接着層7を構成している難溶性のマトリックス樹脂
4と可溶性のフィラー5a,5bとの溶解速度の差から
図2(b)に示すように複雑な形状の粗化凹部8が形成
される。このとき、接着層7の表面には予め表面粗度ほ
ぼ5〜7μmの凹部7aが形成されているので、所定の
表面粗度(本実施例では12±2μm)の粗化凹部8を
形成するのに必要な溶解量は少量でよい。また、接着層
7の表面全体に一様に形成された凹部7aにより接着層
7と溶解液との接触面積は相対的に増大するので、接着
層7の溶解速度は上昇する。Therefore, when the adhesive layer 7 is immersed in the dissolving liquid, the difference in dissolution rate between the poorly soluble matrix resin 4 and the soluble fillers 5a and 5b, which constitute the adhesive layer 7, is shown in FIG. As shown, a roughened concave portion 8 having a complicated shape is formed. At this time, since the concave portion 7a having a surface roughness of approximately 5 to 7 μm is previously formed on the surface of the adhesive layer 7, the roughened concave portion 8 having a predetermined surface roughness (12 ± 2 μm in this embodiment) is formed. The amount of dissolution required for this may be small. In addition, the contact area between the adhesive layer 7 and the solution is relatively increased by the concave portions 7a uniformly formed on the entire surface of the adhesive layer 7, so that the dissolution rate of the adhesive layer 7 is increased.
【0019】従って、接着層7の表面には複雑な形状の
粗化凹部8が短時間のうちに多数形成される。また、所
定の粗化凹部8の形成に必要な接着層7の溶解量が少量
でよいことから、接着層7の溶解に伴う溶解液の劣化速
度が低下するので、溶解液の粗化処理能力が長期間所定
の水準以上に保持される。Therefore, a large number of roughened concave portions 8 having a complicated shape are formed on the surface of the adhesive layer 7 in a short time. In addition, since the amount of dissolution of the adhesive layer 7 necessary for forming the predetermined roughened recess 8 may be small, the deterioration rate of the solution accompanying the dissolution of the adhesive layer 7 is reduced. Is maintained at or above a predetermined level for a long time.
【0020】前記のように表面全体に微細な凹部7aを
有する表面粗度ほぼ5〜7μmに形成された本実施例の
接着層7をクロム酸水溶液(クロム酸800g/l)の
新液からなる70℃の溶解液に浸漬し、表面粗度と粗化
時間の関係を測定した。また、比較のため前記のように
して調製した接着剤を従来と同様にガラスエポキシ基板
の表面に直接塗布して乾燥、加熱硬化処理して形成した
平坦な接着層についても同様な測定を行った。図4にそ
の結果を示す。粗化前からほぼ5〜7μmの表面粗度を
もつ本実施例の接着層7について図中斜線部で示し、予
め表面が粗されていない接着層について図中2点鎖線で
示した。図4に示すように、本実施例の接着層7は約5
分間の浸漬により表面粗度が所定の値(12±2μm)
となった。一方、予め表面が粗されていない接着層は表
面粗度が12±2μmとなるまでに約15分間要した。
接着層7の表面粗度を予めほぼ5〜7μmとすることに
より粗化時間は約3分の1になった。尚、接着層7の粗
化時間は溶解液の新旧に大きく左右されるが、本実施例
の接着層7の粗化時間は溶解液の新旧にかかわらず常に
予め表面が粗されていない接着層の約3分の1になって
いた。As described above, the adhesive layer 7 of the present embodiment formed with the surface roughness of about 5 to 7 μm having the fine concave portions 7a on the entire surface is made of a new solution of a chromic acid aqueous solution (chromic acid 800 g / l). It was immersed in a solution at 70 ° C., and the relationship between surface roughness and roughening time was measured. For comparison, the same measurement was performed on a flat adhesive layer formed by directly applying the adhesive prepared as described above to the surface of a glass epoxy substrate, drying, and heat-curing the same as before. . FIG. 4 shows the result. The adhesive layer 7 of the present example having a surface roughness of about 5 to 7 μm before roughening is indicated by a hatched portion in the drawing, and an adhesive layer whose surface is not roughened in advance is indicated by a two-dot chain line in the drawing. As shown in FIG. 4, the adhesive layer 7 of this embodiment has a thickness of about 5
The surface roughness is a predetermined value (12 ± 2μm) by immersion for a minute
It became. On the other hand, it took about 15 minutes for the adhesive layer whose surface was not roughened beforehand to have a surface roughness of 12 ± 2 μm.
By setting the surface roughness of the adhesive layer 7 to about 5 to 7 μm in advance, the roughening time was reduced to about one third. Although the roughening time of the adhesive layer 7 largely depends on the oldness and the newness of the solution, the roughening time of the adhesive layer 7 in this embodiment is always constant regardless of the newness of the solution. About one-third of
【0021】次に、表面粗度が12±2μmに粗化され
た接着層の粗化表面に35μm厚の無電解銅メッキ層を
形成し、接着層に対する無電解銅メッキ層の密着強度を
JIS−C−6481の方法で測定した。その結果、予
め表面粗度ほぼ5〜7μmのものを粗化処理した場合
と、平坦なものを粗化処理した場合とで密着強度は等し
く、ピール強度で共に1.6kg/cmであった。すな
わち、粗化後の表面粗度が同じであれば、粗化前の表面
粗度によらず同程度の無電解銅メッキ層との密着強度が
得られた。従って、本実施例によれば、接着層7の粗化
時間が従来の約3分の1で接着層7の表面に所定の表面
粗度をもつ粗化凹部8を形成することができ、接着層7
と無電解銅メッキとの密着強度も従来と同程度の値が得
られる。Next, an electroless copper plating layer having a thickness of 35 μm was formed on the roughened surface of the adhesive layer having a surface roughness of 12 ± 2 μm, and the adhesion strength of the electroless copper plating layer to the adhesive layer was measured according to JIS. It measured by the method of -C-6481. As a result, the adhesion strength was equal between the case where the surface roughness was approximately 5 to 7 μm and the case where the surface was roughened beforehand, and the peel strength was 1.6 kg / cm in both cases. That is, if the surface roughness after roughening was the same, the same level of adhesion strength to the electroless copper plating layer was obtained regardless of the surface roughness before roughening. Therefore, according to the present embodiment, it is possible to form the roughened concave portion 8 having a predetermined surface roughness on the surface of the adhesive layer 7 with the roughening time of the adhesive layer 7 being about one third of the conventional one. Layer 7
And the adhesion strength between the electrode and the electroless copper plating are almost the same as those of the prior art.
【0022】尚、本発明は上記実施例に限定されるもの
ではなく、発明の趣旨を逸脱しない範囲で例えば次のよ
うに構成することもできる。 (1) 上記実施例では、ベースフィルム1の表面粗度
をほぼ5〜7μmとしたが、ベースフィルム1の表面粗
度はほぼ5〜7μmに限定されることなく粗化時間を短
縮できる範囲内で適宜設定してよい。It should be noted that the present invention is not limited to the above embodiment, but may be configured as follows without departing from the spirit of the invention. (1) In the above example, the surface roughness of the base film 1 was set to approximately 5 to 7 μm. However, the surface roughness of the base film 1 is not limited to approximately 5 to 7 μm and is within a range in which the roughening time can be reduced. May be set as appropriate.
【0023】(2) 接着剤としてマトリックス樹脂4
中に分散されるフィラーの大きさが均一なものや、フィ
ラーの大きさが広い分布を有するものを使用したり、エ
ポキシ樹脂−エポキシ樹脂以外の組み合わせのものを使
用してもよい。(2) Matrix resin 4 as adhesive
A filler having a uniform size of filler dispersed therein, a filler having a wide distribution of filler sizes, or a combination other than epoxy resin-epoxy resin may be used.
【0024】(3) 上記実施例では、ベースフィルム
1をポリメチルペンテン(TPX)製としたが、例え
ば、接着剤層2の熱硬化処理温度より軟化点の高い耐熱
性樹脂であるフッ素系樹脂製としたり、あるいはアルミ
ニウム製など溶解液に溶解される金属製としてもよい。
ベースフィルムを金属製とした場合、ガラスエポキシ基
板6に形成された接着層7からベースフィルムを剥離し
た際に、接着層7の表面にベースフィルムからの金属が
残存したとしても、この残存金属は粗化時の溶解液によ
り溶解除去される。(3) In the above embodiment, the base film 1 is made of polymethylpentene (TPX). However, for example, a fluorine-based resin which is a heat-resistant resin having a softening point higher than the thermosetting temperature of the adhesive layer 2 Or a metal such as aluminum which is dissolved in a solution.
When the base film is made of metal, even if the metal from the base film remains on the surface of the adhesive layer 7 when the base film is peeled off from the adhesive layer 7 formed on the glass epoxy substrate 6, the remaining metal is It is dissolved and removed by the dissolving solution at the time of roughening.
【0025】(4) 上記実施例では、ベースフィルム
1をマップ処理することによりベースフィルム1の表面
粗度をほぼ5〜7μmとしたが、例えばベースフィルム
1の表面が粗されるようにフィルム成形したり、ベース
フィルム1の表面をサンドブラスト処理したり、化学処
理によりベースフィルム1の表面を粗したりするなどベ
ースフィルム1の表面を粗すことができればその方法は
適宜選定できる。(4) In the above embodiment, the surface roughness of the base film 1 is set to approximately 5 to 7 μm by performing the map processing on the base film 1. However, for example, the film is formed so that the surface of the base film 1 is roughened. As long as the surface of the base film 1 can be roughened, for example, by sandblasting the surface of the base film 1 or roughening the surface of the base film 1 by chemical treatment, the method can be appropriately selected.
【0026】(5) 上記実施例では、接着層7の表面
粗度を12±2μmとしたが、表面粗度は12±2μm
に限定されるものではなく、密着強度が得られる範囲で
適宜設定してもよい。(5) In the above embodiment, the surface roughness of the adhesive layer 7 was 12 ± 2 μm, but the surface roughness was 12 ± 2 μm.
However, the present invention is not limited to this, and may be appropriately set as long as the adhesion strength is obtained.
【0027】[0027]
【発明の効果】以上詳述したように本発明によれば、絶
縁基板に形成された接着層の表面を短時間で粗化すると
ともに、粗化に必要な溶解量を低減して溶解液(クロム
酸水溶液)の劣化速度を小さくすることができる。ま
た、接着層の表面を短時間で粗化することができること
から溶解液の浴槽を小型化することができるという優れ
た効果を奏する。According to the present invention as described in detail above, according to the present invention, as well as roughening in a short time the surface of the adhesive layer formed on the insulating substrate, solution to reduce the dissolved amount required for roughening ( chromium
Acid solution) can be reduced. In addition, since the surface of the adhesive layer can be roughened in a short time, an excellent effect that the bath for the solution can be downsized can be obtained.
【図1】本実施例のアディティブ法用ドライフィルム接
着剤の模式部分断面図である。FIG. 1 is a schematic partial sectional view of a dry film adhesive for an additive method of the present embodiment.
【図2】(a)は粗化前の接着層の模式部分断面図、
(b)は粗化後の接着層の模式部分断面図である。FIG. 2A is a schematic partial cross-sectional view of an adhesive layer before roughening,
(B) is a schematic partial cross-sectional view of the adhesive layer after roughening.
【図3】接着層の形成手順を模式的に示す部分断面図で
ある。FIG. 3 is a partial cross-sectional view schematically showing a procedure for forming an adhesive layer.
【図4】接着層の表面粗度と粗化時間の関係を示すグラ
フである。FIG. 4 is a graph showing the relationship between the surface roughness of the adhesive layer and the roughening time.
1…ベースフィルム、1a…凹部、2…接着剤層、4…
マトリックス樹脂、5a,5b…フィラー。DESCRIPTION OF SYMBOLS 1 ... Base film, 1a ... Depression, 2 ... Adhesive layer, 4 ...
Matrix resin, 5a, 5b ... filler.
Claims (1)
表面上に、硬化処理によりクロム酸水溶液に対して難溶
性となる未硬化又は不完全硬化のマトリックス樹脂と、
前記マトリックス樹脂に分散され、前記クロム酸水溶液
に対して可溶でかつ前記マトリックス樹脂に対して難溶
なフィラーとからなる接着剤層を積層したことを特徴と
するアディティブ法用ドライフィルム接着剤。An uncured or incompletely cured matrix resin which becomes hardly soluble in a chromic acid aqueous solution by a curing treatment on a surface of a heat-resistant base film having a roughened surface,
Said dispersed in a matrix resin, dry for additive method, characterized in that a laminate of the adhesive layer made of a hardly soluble fillers for the soluble a and the matrix resin relative to the chromic acid aqueous solution <br/> Film adhesive.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP06400492A JP3251971B2 (en) | 1992-03-19 | 1992-03-19 | Dry film adhesive for additive method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP06400492A JP3251971B2 (en) | 1992-03-19 | 1992-03-19 | Dry film adhesive for additive method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH05267841A JPH05267841A (en) | 1993-10-15 |
JP3251971B2 true JP3251971B2 (en) | 2002-01-28 |
Family
ID=13245621
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP06400492A Expired - Fee Related JP3251971B2 (en) | 1992-03-19 | 1992-03-19 | Dry film adhesive for additive method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3251971B2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4666754B2 (en) * | 2000-12-12 | 2011-04-06 | 太陽ホールディングス株式会社 | Dry film for multilayer printed wiring board and method for producing multilayer printed wiring board using the same |
JP5535248B2 (en) * | 2005-03-18 | 2014-07-02 | コニカミノルタ株式会社 | Ink jet head and manufacturing method thereof |
-
1992
- 1992-03-19 JP JP06400492A patent/JP3251971B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH05267841A (en) | 1993-10-15 |
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