JPH0770537A - Backing agent for production of tape carrier for tab - Google Patents

Backing agent for production of tape carrier for tab

Info

Publication number
JPH0770537A
JPH0770537A JP24621793A JP24621793A JPH0770537A JP H0770537 A JPH0770537 A JP H0770537A JP 24621793 A JP24621793 A JP 24621793A JP 24621793 A JP24621793 A JP 24621793A JP H0770537 A JPH0770537 A JP H0770537A
Authority
JP
Japan
Prior art keywords
backing agent
compound
ester compound
tab
desirably
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24621793A
Other languages
Japanese (ja)
Inventor
Yoshinori Akutsu
義徳 阿久津
Yukio Ogino
幸男 荻野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Japan Energy Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Energy Corp filed Critical Japan Energy Corp
Priority to JP24621793A priority Critical patent/JPH0770537A/en
Publication of JPH0770537A publication Critical patent/JPH0770537A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings

Landscapes

  • Wire Bonding (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

PURPOSE:To obtain a backing agent for production of a tape carrier for TAB which does not cause the resist on a copper foil to crack during etching, does not cause the deformation or dissolution of leads, and can give a prescribed lead pattern with good precision by mixing a specified ester compound with a cresol novolac resin. CONSTITUTION:This backing agent is prepared by mixing an ester compound (e.g. Paogen PP-15, a product of Dai-ichi Kogyo Seiyaku KK) which is a reaction product of a polyhydroxy compound prepared by addition-polymerizing an alkylene oxide component desirably of an ethylene oxide content of 70wt.% or above with a compound having two active hydrogen groups and desirably having an average molecular weight of 1000 or above with a dicarboxylic acid with a cresol novolac resin (e.g. Sumilite Resin PR-51767, a product of Sumitomo Bakelite KK) desirably in a ratio of the former to the latter of 4:6 to 2:8.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、TAB用テープキャリ
アの製造裏止め剤に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a backing agent for manufacturing a tape carrier for TAB.

【0002】[0002]

【従来の技術】TAB用テープキャリアとして、ポリイ
ミド、ガラス入りエポキシ、ポリエステル等からなるベ
ースフィルム上に接着剤によって銅箔等の導電層をラミ
ネートした、ベースフィルム、接着剤、導電層の3層構
造からなるものが用いられている。この3層構造のTA
B用テープキャリアは、一般に次の製造工程により製造
されている。すなわち、銅箔をラミネートするため接着
剤を塗布したベースフィルムにデバイスホール及びスプ
ロケットホール等の所要のホールを形成する工程。この
フィルム上に銅箔をラミネートする工程。銅箔上にレジ
ストを塗布し、露光し、現像してレジストパターンを形
成する工程。銅箔をエッチングしてリードパターンを形
成する工程。リード表面にめっきを施す工程。レジスト
を剥離する工程。
As a tape carrier for TAB, a three-layer structure of a base film, an adhesive and a conductive layer, which is obtained by laminating a conductive layer such as a copper foil with an adhesive on a base film made of polyimide, epoxy containing glass, polyester or the like. Is used. This 3-layer TA
The tape carrier for B is generally manufactured by the following manufacturing process. That is, a step of forming required holes such as device holes and sprocket holes in a base film coated with an adhesive for laminating copper foil. Step of laminating copper foil on this film. A step of forming a resist pattern by applying a resist on a copper foil, exposing it, and developing it. A step of etching a copper foil to form a lead pattern. The process of plating the lead surface. Step of stripping the resist.

【0003】このうち、銅箔をエッチングして導体パタ
ーンを形成する工程では、エッチングの際、エッチング
液のデバイスホール側からの浸入とエッチング液のスプ
レー圧によるリードの変形を防止する目的で、デバイス
ホール内にエッチングレジスト等の裏止め剤を充填する
方法が一般的に行なわれている。しかしながら、エッチ
ングレジストでは、エッチングの際に、この裏止め剤と
して使用されたレジストが剥離して抜け落ち、これによ
り銅箔上のレジストが割れ、規定のリードパターンが得
られないという問題があった。
Of these, in the step of etching the copper foil to form a conductor pattern, the device is formed for the purpose of preventing the penetration of the etching liquid from the device hole side and the deformation of the leads due to the spray pressure of the etching liquid during etching. A method of filling a hole with a backing agent such as an etching resist is generally performed. However, the etching resist has a problem in that during etching, the resist used as the backing agent peels off and falls off, which breaks the resist on the copper foil and a prescribed lead pattern cannot be obtained.

【0004】このため、銅箔をラミネートした面と反対
の面にドライフィルム等の保護フィルムを接合して補強
する方法が提案された(特開平2−203545号公
報)。しかし、この方法ではデバイスホールの端部に空
隙が残り、エッチング液がその部分に滞留してリードを
溶解するという問題があった。また、裏止め剤を充填し
た後、保護フィルムを接合する方法は工程が一つ増える
ため好ましいものではなかった。
For this reason, a method has been proposed in which a protective film such as a dry film is joined to the surface opposite to the surface laminated with the copper foil to reinforce it (JP-A-2-203545). However, this method has a problem in that voids remain at the ends of the device holes, and the etching liquid stays in those portions to dissolve the leads. In addition, the method of joining the protective film after filling the backing agent is not preferable because the number of steps is increased by one.

【0005】一方、この種の裏止め剤としては、溶剤に
溶解してデバイスホールに塗布乾燥するだけで、ホール
端部に空隙を残さずに膜形成できるもので、この形成し
た膜はエッチング液のスプレー圧(通常1kg/c
2)に十分耐えうる程強靱なものであり、当然にエッ
チング液(塩化第2鉄又は塩化第2銅)に不溶なものであ
り、銅箔との密着強度が良好であることが要求される。
On the other hand, as this kind of backing agent, it is possible to form a film without leaving voids at the end of the hole simply by dissolving it in a solvent and coating and drying it on the device hole. Spray pressure (usually 1 kg / c
m 2 ), which is tough enough to endure, is naturally insoluble in an etching solution (ferric chloride or cupric chloride), and is required to have good adhesion strength with a copper foil. It

【0006】[0006]

【発明が解決しようとする課題】本発明は上記の問題を
解決したもので、本発明の目的はエッチングの際に、こ
の裏止め剤が剥離して抜け落ちることがなく、しかも上
記要求を満たしたTAB用テープキャリア製造裏止め剤
を提供することにある。
SUMMARY OF THE INVENTION The present invention has solved the above problems, and an object of the present invention is to prevent the backing agent from peeling off during etching and satisfying the above requirements. To provide a backing agent for manufacturing a tape carrier for TAB.

【0007】[0007]

【課題を解決するための手段】本発明者は鋭意研究を進
めた結果、特定の化合物を裏止め剤として用いることに
より上述の課題を達成することを見い出した。
As a result of earnest research, the present inventor has found that the above-mentioned problems can be achieved by using a specific compound as a backing agent.

【0008】すなわち、本発明はTAB用テープキャリ
ア製造裏止め剤として、(1)活性水素基を2個有する
有機化合物にアルキレンオキサイドを付加重合せしめた
ポリヒドロキシル化合物と二価カルボン酸との反応生成
物であるエステル化合物と(2)クレゾ−ルノボラック
型樹脂を含有することを特徴とするものである。
That is, according to the present invention, as a backing agent for producing a tape carrier for TAB, (1) a reaction product of a polyhydroxyl compound obtained by addition-polymerizing an alkylene oxide with an organic compound having two active hydrogen groups and a divalent carboxylic acid. It is characterized by containing an ester compound which is a product and (2) a cresol-novolak type resin.

【0009】本発明において、上記活性水素基を2個有
する有機化合物にアルキレンオキサイドを付加重合せし
めたポリヒドロキシル化合物と二価カルボン酸との反応
生成物であるエステル化合物(以下、本発明において、
単にエステル化合物という)としては、特開平4−35
6526、特開平5−5031等に記載されている高分
子量化合物が好ましい。
In the present invention, an ester compound which is a reaction product of a polyhydroxyl compound obtained by addition-polymerizing an alkylene oxide with an organic compound having two active hydrogen groups and a divalent carboxylic acid (hereinafter, in the present invention,
(Referred to simply as “ester compound”) is disclosed in JP-A-4-35.
The high molecular weight compounds described in 6526 and JP-A-5-5031 are preferred.

【0010】この高分子量化合物は、活性水素基を2個
有する有機化合物に、エチレンオキサイド含有率が70
重量%以上のアルキレンオキサイドを付加重合せしめた
平均分子量が1000以上でエチレンオキサイド含有率
が68重量%以上のポリヒドロキシル化合物と、二価カ
ルボン酸との反応物であって、重合度が4.5〜21、
平均分子量が20000よりも大きく、水溶性でかつ成
形可能なエステル化合物である。
This high molecular weight compound has an ethylene oxide content of 70 in addition to an organic compound having two active hydrogen groups.
A reaction product of a polyhydroxyl compound having an average molecular weight of 1000 or more and an ethylene oxide content of 68% by weight or more obtained by addition polymerization of alkylene oxide in an amount of at least% by weight, and a dicarboxylic acid having a degree of polymerization of 4.5. ~ 21,
It is a water-soluble and moldable ester compound having an average molecular weight of more than 20,000.

【0011】エチレンオキサイド含有率が70重量%未
満のアルキレンオキサイドを用いた場合には、その生成
物は、水膨潤性であり、完全には水に溶解しないので好
ましくない。又、エチレンオキサイド含有率が70重量
%以上のアルキレンオキサイドを付加重合せしめたエチ
レンオキサイドの平均分子量が1000未満の場合は、
フィルム形成能がないので好ましくない。
When an alkylene oxide having an ethylene oxide content of less than 70% by weight is used, the product is water-swellable and is not completely dissolved in water, which is not preferable. When the average molecular weight of ethylene oxide obtained by addition polymerization of alkylene oxide having an ethylene oxide content of 70% by weight or more is less than 1,000,
It is not preferable because it has no film forming ability.

【0012】重合度が4.5未満の場合は、フィルム形
成能がなく、重合度が21を超えると水に不溶となるな
ので好ましくない。一方、エステル化合物の平均分子量
は、20000より大きいもの、好ましくは30000
以上、特に好ましくは50000以上である。2000
0以下の場合は、フィルム形成能がないので好ましくな
い。
If the degree of polymerization is less than 4.5, there is no film-forming ability, and if the degree of polymerization exceeds 21, it becomes insoluble in water, which is not preferable. On the other hand, the average molecular weight of the ester compound is larger than 20,000, preferably 30,000.
More preferably, it is 50,000 or more. 2000
A value of 0 or less is not preferable because it has no film forming ability.

【0013】この様なエステル化合物は、水溶性で、フ
ィルム形成能があるが、密着性が悪いという問題点があ
る。そこで、この密着性を改善するために、本発明で
は、上記エステル化合物にクレゾールノボラック型樹脂
を添加することを特徴とする。一般に、クレゾールノボ
ラック型樹脂は、密着性は良いが生成するフィルムが脆
いという問題点があるが、上記エステル化合物と併用す
ることにより、両者の長所を活かすと共に問題点を解消
することができる。
Such an ester compound is water-soluble and has film-forming ability, but has a problem of poor adhesion. Therefore, in order to improve the adhesion, the present invention is characterized by adding a cresol novolac type resin to the above ester compound. Generally, a cresol novolac type resin has a problem in that it has good adhesion but the resulting film is brittle. By using the cresol novolac type resin in combination with the above ester compound, the advantages of both can be utilized and the problem can be solved.

【0014】本発明において使用するクレゾールノボラ
ック型樹脂としては、その原料としてメタクレゾ−ルと
パラクレゾ−ルを8:2〜4:6、好ましくは7:3〜
5:5、特に好ましくは6:4の割合のものを反応させ
たものが好ましい。8:2を超えると密着性が悪くな
り、又4:6未満では溶解性が悪くなる。そして、分子
量1000〜3000、50%エタノール溶液での粘度
が50〜100cP、融点が50〜100℃のものが、
溶液の粘度及び溶解除去の短縮化を考慮に入れると好ま
しい。
As the cresol novolac type resin used in the present invention, metacresol and paracresol as the raw materials are 8: 2 to 4: 6, preferably 7: 3 to.
It is preferable to react one having a ratio of 5: 5, particularly preferably 6: 4. If it exceeds 8: 2, the adhesion will be poor, and if it is less than 4: 6, the solubility will be poor. And, those having a molecular weight of 1000 to 3000, a viscosity in a 50% ethanol solution of 50 to 100 cP, and a melting point of 50 to 100 ° C.
It is preferable to take into account the viscosity of the solution and the shortening of dissolution removal.

【0015】そして、クレゾールノボラック型樹脂とエ
ステル化合物との混合割合は、6:4〜8:2、特に好
ましくは7:3である。6:4未満では、密着性が悪く
なり、一方、8:2を超えるとフィルムが脆くなるから
である。
The mixing ratio of the cresol novolac type resin and the ester compound is 6: 4 to 8: 2, particularly preferably 7: 3. If it is less than 6: 4, the adhesion will be poor, while if it exceeds 8: 2, the film will be brittle.

【0016】本発明のエステル化合物とクレゾ−ルノボ
ラック型樹脂を含有する裏止め剤は、他の化合物または
樹脂を混合して用いることができ、特に粘着付与剤、可
塑剤等を混合して用いると、より密着性が高く柔軟性の
ある裏止め剤となる。
The backing agent containing the ester compound of the present invention and the cresol-novolak type resin can be used by mixing with other compounds or resins, and especially when a tackifier, a plasticizer and the like are mixed and used. , Which is a backing agent having higher adhesiveness and flexibility.

【0017】次に、本発明のエステル化合物とクレゾ−
ルノボラック型樹脂を含有する裏止め剤は、溶剤に溶解
或いは分散して用いられるが、この場合、固形分が10
〜30%となるように溶剤量を調整することが望まし
い。固形分が10%未満では塗布むらが発生しやすく、
また30%を超えると乾燥し難くなる。
Next, the ester compound of the present invention and cresol
The backing agent containing the Lunovolac type resin is used by being dissolved or dispersed in a solvent. In this case, the solid content is 10
It is desirable to adjust the amount of solvent so that the amount becomes 30%. If the solid content is less than 10%, uneven coating tends to occur,
Further, if it exceeds 30%, it becomes difficult to dry.

【0018】この溶剤としては、メタノール、エタノー
ル等のアルコール系、MEK等のケトン系、或いはグリ
コール系等、一般に用いられている溶媒を用いることが
できるが、0℃においても析出しないためには、エチル
カルビト−ル、アセトン及び水の混合溶液が良く、その
割合は5〜7:2〜4:0.5〜1、好ましくは6:
3:1である。
As the solvent, commonly used solvents such as alcohols such as methanol and ethanol, ketones such as MEK, glycols and the like can be used. In order to prevent precipitation even at 0 ° C., A mixed solution of ethyl carbitol, acetone and water is preferable, and the ratio thereof is 5 to 7: 2 to 4: 0.5 to 1, preferably 6 :.
It is 3: 1.

【0019】上記裏止め剤は、エッチング終了後のパタ
ーン形成用レジスト除去の前後に除去されるが、エステ
ル化合物は水可溶性であり、クレゾールノボラック型樹
脂はNaOH水溶液に可溶であるため、パターン形成用
レジストと同時に溶解除去することができる。
The backing agent is removed before and after the removal of the resist for pattern formation after the etching is completed. However, the ester compound is water-soluble and the cresol novolac type resin is soluble in an aqueous NaOH solution. Can be dissolved and removed simultaneously with the resist for use.

【0020】本発明の裏止め剤を使用するときは、膜厚
が15〜30μmとすると良く、15μm未満ではエッチ
ング液のスプレー圧に耐えられず、30μmを超えると
剥離困難となるので望ましくない。
When the backing agent of the present invention is used, the film thickness is preferably 15 to 30 μm. If it is less than 15 μm, the spray pressure of the etching solution cannot be withstood, and if it exceeds 30 μm, peeling becomes difficult, which is not desirable.

【0021】[0021]

【実施例】以下本発明を実施例について説明するが、本
発明はこれらによって限定されるものではない。
EXAMPLES The present invention will be described below with reference to examples, but the present invention is not limited thereto.

【0022】巾35mm、厚さ0.1mmのポリイミドフィ
ルムにエポキシ系接着剤を塗布し、面積50mm2のデバ
イスホールを形成した。本テープに厚さ0.025mmの
圧延銅箔をラミネートした。銅箔表面上にポジ型フォト
レジストを塗布し、デバイスホール上に長さ0.6mm、
巾0.08mm、本数40のリードパターンを露光現像し
た。
An epoxy adhesive was applied to a polyimide film having a width of 35 mm and a thickness of 0.1 mm to form a device hole having an area of 50 mm 2 . This tape was laminated with a rolled copper foil having a thickness of 0.025 mm. Apply positive photoresist on the surface of copper foil, and make it 0.6mm long on the device hole.
A lead pattern having a width of 0.08 mm and a number of 40 was exposed and developed.

【0023】そして、メタクレゾ−ル:パラクレゾ−ル
=6:4を原料として製造されたクレゾールノボラック
型樹脂(スミライトレジンPR−51767,住友ベ−
クライト(株)製)とエステル化合物(パオゲン(PP
−15)、第一工業製薬(株)製)を7:3の割合で混
合し、これを混合割合がエチルカルビト−ル:アセト
ン:水=6:3:1の溶剤に溶かした裏止め剤をデバイ
スホール内に70μm塗布した後乾燥した。尚、比較例
としてドライフィルムを接合する方法を行ったが、この
場合、ロール温度140℃でラミネートした。
A cresol novolac type resin (Sumilite resin PR-51767, Sumitomo Beer Co., Ltd.) produced by using metacresol: paracresol = 6: 4 as a raw material.
Klite Co., Ltd. and ester compound (Paogen (PP
-15), manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd.) at a ratio of 7: 3, and a backing agent obtained by dissolving this in a solvent having a mixing ratio of ethylcarbitol: acetone: water = 6: 3: 1. After applying 70 μm in the device hole, it was dried. As a comparative example, a method of joining dry films was performed, but in this case, lamination was performed at a roll temperature of 140 ° C.

【0024】これらをさらに塩化第2銅水溶液からなる
エッチング液に浸漬してエッチングを行い、リードの変
形と溶解の有無を光学顕微鏡(50倍)で確認した。次
に、残存するポジ型フォトレジストに再度露光(100
0mJ/cm2)し、2%濃度のNaOH水溶液にフィルム
を25℃で、4分間浸漬して、フォトレジスト及び裏止
め剤を溶解除去し、裏止め剤の残存の有無を光学顕微鏡
(50倍)で確認した。
These were further immersed in an etching solution containing an aqueous solution of cupric chloride for etching, and the presence or absence of deformation and dissolution of the leads was confirmed by an optical microscope (50 times). Then, the remaining positive photoresist is exposed again (100
0 mJ / cm 2 ) and immerse the film in a 2% NaOH aqueous solution at 25 ° C for 4 minutes to dissolve and remove the photoresist and the backing agent.
(50 times) confirmed.

【0025】その結果、本発明の裏止め剤を用いた場合
には、膜(レジスト)破壊及び膜剥離は起こらずリ−ド
変形、リ−ド溶解はなく、又、裏止め剤は完全に溶解し
ていたが、ドライフィルムを用いた場合には、デバイス
ホールの端部に空隙が残り、エッチング液がその部分に
滞留してリードの溶解が起こった。
As a result, when the backing agent of the present invention was used, film (resist) destruction and film peeling did not occur, lead deformation and lead dissolution did not occur, and the backing agent was completely removed. Although it was dissolved, when a dry film was used, a void remained at the end of the device hole, and the etching solution stayed in that portion, causing dissolution of the lead.

【0026】[0026]

【発明の効果】以上説明したように、本発明による裏止
め剤を使用することにより、エッチング時に、この裏止
め剤が剥離して抜け落ちて銅箔上のレジストが割れるこ
とがなく、リード変形及び溶解を防止することができ、
精度良く規定のリードパターンを得ることができる。
As described above, by using the backing agent according to the present invention, during etching, the backing agent does not peel off and fall off, and the resist on the copper foil is not cracked. Can prevent dissolution,
A specified lead pattern can be obtained with high accuracy.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 (1)活性水素基を2個有する有機化合
物にアルキレンオキサイドを付加重合せしめたポリヒド
ロキシル化合物と二価カルボン酸との反応生成物である
エステル化合物と(2)クレゾ−ルノボラック型樹脂を
含有することを特徴とするTAB用テープキャリア製造
裏止め剤。
1. An ester compound which is a reaction product of a polyhydroxyl compound obtained by addition-polymerizing an alkylene oxide to an organic compound having two active hydrogen groups and a divalent carboxylic acid, and (2) a cresol novolak type compound. A backing agent for producing a tape carrier for TAB, which contains a resin.
JP24621793A 1993-09-07 1993-09-07 Backing agent for production of tape carrier for tab Pending JPH0770537A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24621793A JPH0770537A (en) 1993-09-07 1993-09-07 Backing agent for production of tape carrier for tab

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24621793A JPH0770537A (en) 1993-09-07 1993-09-07 Backing agent for production of tape carrier for tab

Publications (1)

Publication Number Publication Date
JPH0770537A true JPH0770537A (en) 1995-03-14

Family

ID=17145260

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24621793A Pending JPH0770537A (en) 1993-09-07 1993-09-07 Backing agent for production of tape carrier for tab

Country Status (1)

Country Link
JP (1) JPH0770537A (en)

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