JPH0499356A - Integrated circuit - Google Patents

Integrated circuit

Info

Publication number
JPH0499356A
JPH0499356A JP2217704A JP21770490A JPH0499356A JP H0499356 A JPH0499356 A JP H0499356A JP 2217704 A JP2217704 A JP 2217704A JP 21770490 A JP21770490 A JP 21770490A JP H0499356 A JPH0499356 A JP H0499356A
Authority
JP
Japan
Prior art keywords
output
input
signal
pad
pads
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2217704A
Other languages
Japanese (ja)
Other versions
JP3074710B2 (en
Inventor
Michihiko Uemura
植村 吾彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP02217704A priority Critical patent/JP3074710B2/en
Publication of JPH0499356A publication Critical patent/JPH0499356A/en
Application granted granted Critical
Publication of JP3074710B2 publication Critical patent/JP3074710B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/06Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0555Shape
    • H01L2224/05552Shape in top view
    • H01L2224/05554Shape in top view being square
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits

Abstract

PURPOSE:To decrease the rise time and fall time of output signals by using a circuit structure in which input/output signal pads connected with input/output buffers have smaller areas than other pads so as to decrease parasitic capacitance around the input/output pads. CONSTITUTION:An ECL integrated circuit 1 includes a cell array 2, input/output buffer arrays 3, conventional square signal pads 4, 5 and 6, and smaller square signal pads 7 and 8. Each output buffer 31 has an input terminal 32 connected with a signal line from the cell array and an output terminal 33 connected with both a signal pad and a static protective element. The output terminal has capacitive elements connected: they are the parasitic capacitance C1 between the signal pad and the substrate, the parasitic capacitance C2 between the substrate and the conductor from the output buffer and the pad, and the equivalent capacitance C3 corresponding to the protective element. According to this configuration, it is possible to decrease rise and fall time.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はマスタースライス方式の半導体集積回路装置に
関し、特に入出力端子における容量を低減した半導体集
積回路装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a master slice type semiconductor integrated circuit device, and particularly to a semiconductor integrated circuit device with reduced capacitance at input/output terminals.

〔従来の技術〕[Conventional technology]

従来のマスタースライス方式の半導体集積回路装置の一
例を第4図に示す。同図に示すように半導体集積回路装
置1内に内部セルアレイ2、入出力列バッファ列3、信
号パッド4、静電破保護素子9,10,11,12,1
3、電源バンド14を有している。そして、任意にアル
ミニウム工程のパターンを変更することでそれぞれ所望
の機能を有する半導体集積回路装置が実現されている。
An example of a conventional master slice type semiconductor integrated circuit device is shown in FIG. As shown in the figure, a semiconductor integrated circuit device 1 includes an internal cell array 2, an input/output column buffer column 3, a signal pad 4, and electrostatic discharge protection elements 9, 10, 11, 12, 1.
3. It has a power band 14. By arbitrarily changing the pattern of the aluminum process, semiconductor integrated circuit devices having desired functions are realized.

この種の半導体集積回路装置において、使用される入力
バッファの位置には、入力バッファのアルミニウムパタ
ーン15.21が配置され、入力バッファ3と信号パッ
ド4と静電破壊保護素子10.12とは、信号配線17
.23により接続されていた。使用される出力バッファ
の位置には、出力バッファのアルミニウムパターン18
.24が配置され、出力バッファ3と信号パッド4と静
電破壊保護素子11.13とは、信号配t20゜26に
より接続されていた。信号パッド4は自動ワイヤボンデ
ィング装置によるボンディングを可能にするため一辺1
00μm程度の同一形状となっていた。
In this type of semiconductor integrated circuit device, an aluminum pattern 15.21 of the input buffer is arranged at the position of the input buffer used, and the input buffer 3, signal pad 4, and electrostatic damage protection element 10.12 are arranged as follows. Signal wiring 17
.. It was connected by 23. The output buffer aluminum pattern 18 is located at the location of the output buffer used.
.. 24 was arranged, and the output buffer 3, signal pad 4, and electrostatic discharge protection elements 11 and 13 were connected by a signal wiring t20°26. The signal pad 4 has 1 side on each side to enable bonding by automatic wire bonding equipment.
They had the same shape of about 00 μm.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

この従来のマスタースライス方式の半導体集積回路装置
では、信号パッド4の大きさが100μm程度の同一形
状であるため、信号バンドと半導体集積回路装置の基板
との管に生じる寄生容量により入出力波形の立上がり時
間、立下がり時間が増大するという問題点がある。
In this conventional master slice type semiconductor integrated circuit device, since the signal pads 4 have the same shape with a size of about 100 μm, input/output waveforms are affected by parasitic capacitance generated in the tube between the signal band and the substrate of the semiconductor integrated circuit device. There is a problem that the rise time and fall time increase.

本発明の目的は、このような寄生容量による立上がり時
間と立下がり時間を短縮した半導体集積回路装置を提供
することにある。
An object of the present invention is to provide a semiconductor integrated circuit device in which the rise time and fall time due to such parasitic capacitance are shortened.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

本発明の半導体集積回路装置は、内部セルアレイと、入
出力バッファと、信号および電源パッドとを備える半導
体集積回路装置の、少なくとも入出力バッファに接続さ
れる入出力用の信号パッドを他のパッドよりも小さい面
積に形成している。
A semiconductor integrated circuit device of the present invention includes an internal cell array, an input/output buffer, and a signal and power supply pad. It is also formed in a small area.

(作用〕 本発明によれば、入出力バッファに接続される入出力用
の信号パッドを他のパッドよりも小さい面積に形成する
ことで、入出力パッドに寄生される容量を小さくし、出
力波形の立上がり時間や立下がり時間を短縮する。
(Function) According to the present invention, by forming the input/output signal pad connected to the input/output buffer to have a smaller area than other pads, the parasitic capacitance of the input/output pad is reduced, and the output waveform Shorten the rise time and fall time.

〔実施例〕〔Example〕

次に、本発明を図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.

第1図は本発明の第1の実施例のマスタースライス方式
の半導体集積回路装置のレイアウト図である。回路形式
をECLとする半導体集積回路1内に内部セルアレイ2
、入出力バッファ列3、辺1100pの従来と同じ正方
形の信号パッド4゜5.6、−辺30μmの従来よりも
極めて小さい正方形の信号パッド7.8、静電破壊保護
素子9410.11,12,13、電源パッド14が配
置されている。
FIG. 1 is a layout diagram of a master slice type semiconductor integrated circuit device according to a first embodiment of the present invention. An internal cell array 2 is included in a semiconductor integrated circuit 1 whose circuit format is ECL.
, input/output buffer row 3, square signal pad 4°5.6 with side 1100p, same as conventional one, - square signal pad 7.8 which is much smaller than conventional one with side 30 μm, electrostatic damage protection element 9410.11, 12 , 13, and a power supply pad 14 are arranged.

そして、周波数が高い信号、ここでは周波数IGH2の
クロック信号が小さな信号パッド7に入力されるように
構成し、この信号パッド7は、入力バッファのアルミニ
ウムパターン15の入力端子16と静電破壊保護素子1
0とに信号配線17により接続されている。同様に、周
波数IGH2のクロック信号が小さな信号パッド8に出
力されるように構成し、この信号パッド8は、出カバソ
ファのアルミニウムパターン18の出力端子19と静電
破壊保護素子11とに、信号配線20により接続されて
いる。
A high frequency signal, here a clock signal with a frequency IGH2, is configured to be input to a small signal pad 7, and this signal pad 7 is connected to the input terminal 16 of the input buffer aluminum pattern 15 and the electrostatic damage protection element. 1
0 by a signal wiring 17. Similarly, the clock signal with the frequency IGH2 is configured to be output to a small signal pad 8, and this signal pad 8 is connected to the output terminal 19 of the aluminum pattern 18 of the output sofa and the electrostatic damage protection element 11 through the signal wiring. 20.

一方、周波数の低い信号、ここでは周波数500MH2
以下のデータ信号が大きな信号バンド5に入力されるよ
うに構成し、この信号パッド5は、入力バッファのアル
ミニウムパターン21の入力端子22と静電破壊保護素
子12とに、信号配線23により接続されている。同様
に、周波数500MH2の以下のデータ信号が大きな信
号パッド6に出力されるように構成し、この信号パ・7
ド6は、出力バッファのアルミニウムパターン24の出
力端子25と静電破壊保護素子13とに、信号配線26
により接続されている。
On the other hand, a low frequency signal, here the frequency is 500MH2
The following data signals are input into a large signal band 5, and this signal pad 5 is connected to the input terminal 22 of the aluminum pattern 21 of the input buffer and the electrostatic damage protection element 12 by a signal wiring 23. ing. Similarly, the following data signals with a frequency of 500 MH2 are configured to be output to the large signal pad 6, and this signal pad 7
The signal wiring 26 is connected to the output terminal 25 of the aluminum pattern 24 of the output buffer and the electrostatic discharge protection element 13.
connected by.

なお、電源パッドと1辺100μmの正方形の信号パッ
ド4〜6は、自動ワイヤボンディング装置によりワイヤ
ボンディングされ、1辺30μmの正方形の信号パッド
7.8は、パッドの大きさが小さいため、手動でワイヤ
ボンディングされる。
Note that the power supply pad and the square signal pads 4 to 6 with a side of 100 μm are wire-bonded using an automatic wire bonding machine, and the square signal pads 7 and 8 with a side of 30 μm are wire-bonded manually because the pad size is small. Wire bonded.

第2図は出力バッファの一例を示すブロック図である。FIG. 2 is a block diagram showing an example of an output buffer.

出力バッファ31の入力端子32には、第1図に示した
内部セルアレイからの信号が入力され、出力端子33は
、信号バンドと静電破壊保護素子とに接続され、出力端
子には信号パッドと基板間に生しる寄生容量CIと、出
カバソファからバンドまでの配線と基板間に生じる寄生
容量C2と、静電破壊保護素子に相当する等価容量C3
が接続されている。信号パッドが1辺1100tIの正
方形の場合の信号バンドと基板間に生じる寄生容量C1
lは0.2pF、信号パッドが1辺30μmの正方形の
場合の信号バンドと基板間に生しる寄生容量CI2はo
、ot8p F、 C2はO,]pF、C3は1.0p
Fとすると、第2図に示した出力バッファの各々の出力
波形のシミュレーション結果は、C11=0.2pFの
場合の立上がり時間t11−119ps、立上がり時間
tr =90p s、 CI 2=0.018p Fの
場合の立上がり時間tr 2= 102ps。
The input terminal 32 of the output buffer 31 receives the signal from the internal cell array shown in FIG. 1, the output terminal 33 is connected to the signal band and the electrostatic damage protection element, and the output terminal is connected to the signal pad. Parasitic capacitance CI that occurs between the boards, parasitic capacitance C2 that occurs between the wiring from the output sofa to the band and the board, and equivalent capacitance C3 that corresponds to the electrostatic breakdown protection element.
is connected. Parasitic capacitance C1 that occurs between the signal band and the board when the signal pad is a square with 1100tI on each side
l is 0.2 pF, and when the signal pad is a square with a side of 30 μm, the parasitic capacitance CI2 generated between the signal band and the substrate is o
, ot8p F, C2 is O, ]pF, C3 is 1.0p
Assuming F, the simulation results of the output waveforms of each output buffer shown in FIG. 2 are: rise time t11-119 ps when C11=0.2 pF, rise time tr=90 ps, CI2=0.018 p F The rise time for tr 2 = 102 ps.

立上がり時間t t 2 =77p sとなり、立上が
り時間、立下がり時間を14%改善することができる。
The rise time t t 2 =77 ps, and the rise time and fall time can be improved by 14%.

第3図は本発明の第2実施例のマスタースライス方式の
半導体集積回路装置のレイアウト図であり、第1図と同
一部分には同一符号を付して詳細な説明は省略する。
FIG. 3 is a layout diagram of a master slice type semiconductor integrated circuit device according to a second embodiment of the present invention, and the same parts as in FIG. 1 are given the same reference numerals and detailed explanations are omitted.

この実施例では、30μmの小さい信号パッド7.8と
入出力バッファとの間に静電破壊保護素子を接続してい
ない。このため、静電破壊保護素子の等価容量1pFが
信号端子に接続されないことになる。出力単の容量は、
30μmの正方形の信号パッドの寄生容量に相当する0
、018p Fと、出カバソファからパッドまでの配線
の寄生容量0.1pFの合計0.118p Fとなり、
出力波形の立上がり時間、立下がり時間をより小さくす
ることができる。
In this embodiment, no electrostatic damage protection element is connected between the small signal pad 7.8 of 30 μm and the input/output buffer. Therefore, the equivalent capacitance of 1 pF of the electrostatic discharge protection element is not connected to the signal terminal. The single output capacity is
0, which corresponds to the parasitic capacitance of a 30 μm square signal pad.
, 018pF, and the parasitic capacitance of the wiring from the output sofa to the pad, 0.1pF, totaling 0.118pF,
The rise time and fall time of the output waveform can be made smaller.

[発明の効果] 以上説明したように本発明は、少なくとも人出カバッフ
ァに接続される入出力用の信号パッドを他のパッドより
も小さい面積に形成しているので、入出力パッドに寄生
される容量を小さくし、出力波形の立上がり時間や立下
がり時間を短縮することができる。また、パッドを小さ
くするのは入出力バンドのみであるので、他のパッドは
自動ワイヤボンディングが可能であり、ワイヤボンディ
ング工数が増大することはない。
[Effects of the Invention] As explained above, in the present invention, at least the input/output signal pad connected to the traffic buffer is formed to have a smaller area than other pads, so that parasitic It is possible to reduce the capacitance and shorten the rise time and fall time of the output waveform. Further, since only the input/output band is made smaller, the other pads can be automatically wire bonded, and the number of wire bonding steps does not increase.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例のマスタースライス方式の半
導体集積回路装置のレイアウト図、第2図は出力バッフ
ァの一例のブロック図、第3図は本発明の第2実施例の
半導体集積回路装置のレイアウト図、第4図は従来の半
導体集積回路装置のレイアウト図である。 1・・・半導体集積回路装置、2・・・内部セルアレイ
、3・・・入出力バッファ列、4〜6・・・100μm
信号パッド、7,8・・・30μm信号パッド、9〜1
3・・・静電破壊保護素子、14・・・電源パッド、1
5・・・アルミニウムパターン、16・・・入力端子、
17・・・信号配線、18・・・アルミニウムパターン
、19・・・出力端子、20・・・信号配線、21・・
・アルミニウムバ、ターン、22・・・入力端子、23
・・・信号配線、24・・・アルミニウムパターン、2
5・・・出力端子、26・・・信号配線、31・・・出
力バッファ、32・・・入力端子、第2 図 CI。 苛生宕皇 炉彩峨ぢ1児区科O〃約を 第3 図
FIG. 1 is a layout diagram of a master slice type semiconductor integrated circuit device according to an embodiment of the present invention, FIG. 2 is a block diagram of an example of an output buffer, and FIG. 3 is a semiconductor integrated circuit according to a second embodiment of the present invention. Device Layout Diagram FIG. 4 is a layout diagram of a conventional semiconductor integrated circuit device. DESCRIPTION OF SYMBOLS 1... Semiconductor integrated circuit device, 2... Internal cell array, 3... Input/output buffer row, 4-6... 100 μm
Signal pad, 7, 8...30μm Signal pad, 9-1
3... Electrostatic damage protection element, 14... Power supply pad, 1
5... Aluminum pattern, 16... Input terminal,
17... Signal wiring, 18... Aluminum pattern, 19... Output terminal, 20... Signal wiring, 21...
・Aluminum bar, turn, 22...input terminal, 23
...Signal wiring, 24...Aluminum pattern, 2
5... Output terminal, 26... Signal wiring, 31... Output buffer, 32... Input terminal, FIG. 2 CI. Figure 3

Claims (1)

【特許請求の範囲】[Claims] 1、内部セルアレイと、入出力バッファと、信号および
電源パッドとを備え、これらを所望の配線パターンで接
続する半導体集積回路装置において、少なくとも前記入
出力バッファに接続される入出力用の信号パッドを他の
パッドよりも小さい面積に形成したことを特徴とする半
導体集積回路装置。
1. In a semiconductor integrated circuit device that includes an internal cell array, an input/output buffer, and signal and power supply pads, and connects these with a desired wiring pattern, at least an input/output signal pad connected to the input/output buffer is provided. A semiconductor integrated circuit device characterized in that the pad is formed in a smaller area than other pads.
JP02217704A 1990-08-18 1990-08-18 Semiconductor integrated circuit device Expired - Lifetime JP3074710B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP02217704A JP3074710B2 (en) 1990-08-18 1990-08-18 Semiconductor integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP02217704A JP3074710B2 (en) 1990-08-18 1990-08-18 Semiconductor integrated circuit device

Publications (2)

Publication Number Publication Date
JPH0499356A true JPH0499356A (en) 1992-03-31
JP3074710B2 JP3074710B2 (en) 2000-08-07

Family

ID=16708429

Family Applications (1)

Application Number Title Priority Date Filing Date
JP02217704A Expired - Lifetime JP3074710B2 (en) 1990-08-18 1990-08-18 Semiconductor integrated circuit device

Country Status (1)

Country Link
JP (1) JP3074710B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2006011292A1 (en) * 2004-07-28 2008-05-01 松下電器産業株式会社 Semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2006011292A1 (en) * 2004-07-28 2008-05-01 松下電器産業株式会社 Semiconductor device

Also Published As

Publication number Publication date
JP3074710B2 (en) 2000-08-07

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