JPH049874B2 - - Google Patents
Info
- Publication number
- JPH049874B2 JPH049874B2 JP59136042A JP13604284A JPH049874B2 JP H049874 B2 JPH049874 B2 JP H049874B2 JP 59136042 A JP59136042 A JP 59136042A JP 13604284 A JP13604284 A JP 13604284A JP H049874 B2 JPH049874 B2 JP H049874B2
- Authority
- JP
- Japan
- Prior art keywords
- solution
- copper
- electroless plating
- catalyst
- palladium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/422—Plated through-holes or plated via connections characterised by electroless plating method; pretreatment therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemically Coating (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13604284A JPS6115983A (ja) | 1984-06-29 | 1984-06-29 | 無電解めつき用触媒 |
DE8585304381T DE3574270D1 (en) | 1984-06-29 | 1985-06-19 | Sensitizing agent for electroless plating and method for sensitizing substrate with the agent |
EP85304381A EP0167326B1 (en) | 1984-06-29 | 1985-06-19 | Sensitizing agent for electroless plating and method for sensitizing substrate with the agent |
US06/750,779 US4734299A (en) | 1984-06-29 | 1985-07-01 | Sensitizing agent for electroless plating and method for sensitizing substrate with the agent |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13604284A JPS6115983A (ja) | 1984-06-29 | 1984-06-29 | 無電解めつき用触媒 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6115983A JPS6115983A (ja) | 1986-01-24 |
JPH049874B2 true JPH049874B2 (enrdf_load_stackoverflow) | 1992-02-21 |
Family
ID=15165814
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13604284A Granted JPS6115983A (ja) | 1984-06-29 | 1984-06-29 | 無電解めつき用触媒 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6115983A (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4900618A (en) * | 1986-11-07 | 1990-02-13 | Monsanto Company | Oxidation-resistant metal coatings |
JP2012084640A (ja) * | 2010-10-08 | 2012-04-26 | Fujifilm Corp | 積層体の製造方法 |
JP6272673B2 (ja) | 2013-10-30 | 2018-01-31 | ローム・アンド・ハース電子材料株式会社 | 無電解めっき用触媒液 |
JP6926120B2 (ja) * | 2016-05-04 | 2021-08-25 | アトテツク・ドイチユラント・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツングAtotech Deutschland GmbH | 基板表面の活性化を含む基板表面に金属または金属合金を析出させるための方法 |
-
1984
- 1984-06-29 JP JP13604284A patent/JPS6115983A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6115983A (ja) | 1986-01-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4232060A (en) | Method of preparing substrate surface for electroless plating and products produced thereby | |
US4632857A (en) | Electrolessly plated product having a polymetallic catalytic film underlayer | |
JP2769954B2 (ja) | プラスチック基質上に直接的に金属メッキを電着させるための方法 | |
JPH0711487A (ja) | 自己促進補充型浸漬被覆法及び組成物 | |
EP0167326B1 (en) | Sensitizing agent for electroless plating and method for sensitizing substrate with the agent | |
US4160050A (en) | Catalyzation processes for electroless metal deposition | |
JP6463013B2 (ja) | 5員複素環式窒素化合物を含有する無電解メタライゼーション触媒 | |
CN104561947A (zh) | 用包含碱性稳定吡嗪衍生物的催化剂化学镀金属化电介质 | |
US5474798A (en) | Method for the manufacture of printed circuit boards | |
US5219815A (en) | Low corrosivity catalyst containing ammonium ions for activation of copper for electroless nickel plating | |
JPS61194183A (ja) | 無電解めつき法 | |
JP2003160876A (ja) | 無電解メッキ用触媒および金属メッキパターンの形成方法 | |
US5206052A (en) | Electroless plating process | |
JP5004336B2 (ja) | 無電解めっき法で用いる触媒溶液及びその触媒溶液を用いた無電解めっき法並びにその無電解めっき法を用いて金属皮膜を形成した被めっき物 | |
JPH049874B2 (enrdf_load_stackoverflow) | ||
JPH03170680A (ja) | 非導電性支持体を直接金属被覆する方法 | |
JPH0547637B2 (enrdf_load_stackoverflow) | ||
US4222778A (en) | Liquid seeders for electroless metal deposition | |
JP2513270B2 (ja) | 無電解めっき用触媒溶液 | |
JPH06256960A (ja) | 銅被覆アラミド基板の製造方法 | |
US5254156A (en) | Aqueous solution for activation accelerating treatment | |
EP0109402A1 (en) | CATALYTIC SOLUTIONS FOR ACTIVATING NON-CONDUCTIVE SUBSTRATES AND METHOD OF PLATING WITHOUT ELECTRICAL CURRENT. | |
JPH05345637A (ja) | ガラス表面へのめっきにおける前処理用エッチング液、めっき方法及びガラス基板の製造方法 | |
JP3336535B2 (ja) | 選択的めっき用組成物及び方法 | |
JPH0230769A (ja) | 無電解めっき用前処理液 |