JPH049866B2 - - Google Patents

Info

Publication number
JPH049866B2
JPH049866B2 JP61217914A JP21791486A JPH049866B2 JP H049866 B2 JPH049866 B2 JP H049866B2 JP 61217914 A JP61217914 A JP 61217914A JP 21791486 A JP21791486 A JP 21791486A JP H049866 B2 JPH049866 B2 JP H049866B2
Authority
JP
Japan
Prior art keywords
film
stress
internal stress
sputtering
ions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61217914A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6376872A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP21791486A priority Critical patent/JPS6376872A/ja
Publication of JPS6376872A publication Critical patent/JPS6376872A/ja
Publication of JPH049866B2 publication Critical patent/JPH049866B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP21791486A 1986-09-18 1986-09-18 膜の内部圧縮応力低減方法 Granted JPS6376872A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21791486A JPS6376872A (ja) 1986-09-18 1986-09-18 膜の内部圧縮応力低減方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21791486A JPS6376872A (ja) 1986-09-18 1986-09-18 膜の内部圧縮応力低減方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP62162670A Division JPS6376325A (ja) 1987-06-30 1987-06-30 Ｘ線リソグラフィ−用マスクのｘ線吸収体膜

Publications (2)

Publication Number Publication Date
JPS6376872A JPS6376872A (ja) 1988-04-07
JPH049866B2 true JPH049866B2 (enrdf_load_stackoverflow) 1992-02-21

Family

ID=16711721

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21791486A Granted JPS6376872A (ja) 1986-09-18 1986-09-18 膜の内部圧縮応力低減方法

Country Status (1)

Country Link
JP (1) JPS6376872A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5196283A (en) * 1989-03-09 1993-03-23 Canon Kabushiki Kaisha X-ray mask structure, and x-ray exposure process
JP2810973B2 (ja) * 1993-08-09 1998-10-15 工業技術院長 高温型燃料電池用燃料電極の製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5466767A (en) * 1977-11-08 1979-05-29 Fujitsu Ltd Manufacture for sos construction

Also Published As

Publication number Publication date
JPS6376872A (ja) 1988-04-07

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