JPH0480427B2 - - Google Patents
Info
- Publication number
- JPH0480427B2 JPH0480427B2 JP57015463A JP1546382A JPH0480427B2 JP H0480427 B2 JPH0480427 B2 JP H0480427B2 JP 57015463 A JP57015463 A JP 57015463A JP 1546382 A JP1546382 A JP 1546382A JP H0480427 B2 JPH0480427 B2 JP H0480427B2
- Authority
- JP
- Japan
- Prior art keywords
- circuit
- pattern
- signal
- bits
- bit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/302—Contactless testing
- G01R31/308—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
- G06T7/0006—Industrial image inspection using a design-rule based approach
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30164—Workpiece; Machine component
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Quality & Reliability (AREA)
- Toxicology (AREA)
- General Engineering & Computer Science (AREA)
- Electromagnetism (AREA)
- Health & Medical Sciences (AREA)
- Theoretical Computer Science (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Image Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Image Analysis (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57015463A JPS58134429A (ja) | 1982-02-04 | 1982-02-04 | パタ−ン欠陥検査装置 |
US06/462,515 US4589139A (en) | 1982-02-04 | 1983-01-31 | Apparatus for detecting defects in pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57015463A JPS58134429A (ja) | 1982-02-04 | 1982-02-04 | パタ−ン欠陥検査装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58134429A JPS58134429A (ja) | 1983-08-10 |
JPH0480427B2 true JPH0480427B2 (en:Method) | 1992-12-18 |
Family
ID=11889484
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57015463A Granted JPS58134429A (ja) | 1982-02-04 | 1982-02-04 | パタ−ン欠陥検査装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58134429A (en:Method) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60223124A (ja) * | 1984-04-18 | 1985-11-07 | Mitsubishi Electric Corp | パタ−ン検査装置 |
KR102735596B1 (ko) * | 2019-01-30 | 2024-11-28 | 삼성디스플레이 주식회사 | 접착 결함 검출 장치 및 이를 이용한 검출 방법 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5919387B2 (ja) * | 1976-12-29 | 1984-05-04 | 富士通株式会社 | パタ−ン検査方法 |
JPS5427370A (en) * | 1977-08-02 | 1979-03-01 | Olympus Optical Co Ltd | Edge processing method in pattern test |
JPS54102837A (en) * | 1978-01-28 | 1979-08-13 | Nippon Telegr & Teleph Corp <Ntt> | Pattern check system |
JPS5914782B2 (ja) * | 1979-12-24 | 1984-04-06 | 日本電信電話株式会社 | 2値パタ−ンの数値化処理方式 |
-
1982
- 1982-02-04 JP JP57015463A patent/JPS58134429A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS58134429A (ja) | 1983-08-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4589139A (en) | Apparatus for detecting defects in pattern | |
US5305391A (en) | Method of and apparatus for inspecting bottle or the like | |
JP3132565B2 (ja) | 欠陥検査方法及びその装置 | |
US5774574A (en) | Pattern defect detection apparatus | |
US5659630A (en) | Advanced manufacturing inspection system | |
JPH0160767B2 (en:Method) | ||
JPH0526136B2 (en:Method) | ||
US4942619A (en) | Pattern inspecting apparatus | |
JPS6355650B2 (en:Method) | ||
JPH05264467A (ja) | 繰返しパターンの欠陥検査装置 | |
JPH0480427B2 (en:Method) | ||
JP2710527B2 (ja) | 周期性パターンの検査装置 | |
JPS5924361B2 (ja) | 2次元画像比較検査装置 | |
JPH0224323B2 (en:Method) | ||
JPH0224322B2 (en:Method) | ||
JPH063541B2 (ja) | パターン検査装置 | |
JPS5816837B2 (ja) | パタ−ン検出装置 | |
JPS58199528A (ja) | パタ−ン欠陥検査装置 | |
JPS5821109A (ja) | パタ−ン欠陥検査装置 | |
JP3283866B2 (ja) | 回路パターンの欠陥検査方法及びその装置 | |
JPH0332723B2 (en:Method) | ||
JPS5821108A (ja) | パタ−ン欠陥検査装置 | |
JP2705052B2 (ja) | パターン検査装置 | |
JPS642992B2 (en:Method) | ||
JP2001050906A (ja) | パターン検査装置およびパターン検査方法 |