JPH0479128B2 - - Google Patents
Info
- Publication number
- JPH0479128B2 JPH0479128B2 JP59255588A JP25558884A JPH0479128B2 JP H0479128 B2 JPH0479128 B2 JP H0479128B2 JP 59255588 A JP59255588 A JP 59255588A JP 25558884 A JP25558884 A JP 25558884A JP H0479128 B2 JPH0479128 B2 JP H0479128B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- mark
- substrate
- light beam
- original plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 33
- 238000001514 detection method Methods 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 4
- 230000010287 polarization Effects 0.000 description 20
- 238000003384 imaging method Methods 0.000 description 14
- 238000010586 diagram Methods 0.000 description 5
- 238000007493 shaping process Methods 0.000 description 5
- 230000004075 alteration Effects 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59255588A JPS61134021A (ja) | 1984-12-05 | 1984-12-05 | 投影露光装置 |
| US07/319,820 US4937459A (en) | 1984-11-16 | 1989-03-06 | Alignment signal detecting device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59255588A JPS61134021A (ja) | 1984-12-05 | 1984-12-05 | 投影露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61134021A JPS61134021A (ja) | 1986-06-21 |
| JPH0479128B2 true JPH0479128B2 (en, 2012) | 1992-12-15 |
Family
ID=17280805
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59255588A Granted JPS61134021A (ja) | 1984-11-16 | 1984-12-05 | 投影露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61134021A (en, 2012) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8958526B2 (en) | 2005-12-16 | 2015-02-17 | Rapiscan Systems, Inc. | Data collection, processing and storage systems for X-ray tomographic images |
| US9001973B2 (en) | 2003-04-25 | 2015-04-07 | Rapiscan Systems, Inc. | X-ray sources |
| US9223052B2 (en) | 2008-02-28 | 2015-12-29 | Rapiscan Systems, Inc. | Scanning systems |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4880310A (en) * | 1986-07-28 | 1989-11-14 | Nikon Corporation | Optical device for alignment in a projection exposure apparatus |
| JP2707541B2 (ja) * | 1986-10-24 | 1998-01-28 | 株式会社ニコン | 感光基板のアライメント方法 |
| CN105612460B (zh) * | 2013-10-09 | 2019-06-21 | Asml荷兰有限公司 | 独立于偏振的干涉仪 |
-
1984
- 1984-12-05 JP JP59255588A patent/JPS61134021A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9001973B2 (en) | 2003-04-25 | 2015-04-07 | Rapiscan Systems, Inc. | X-ray sources |
| US8958526B2 (en) | 2005-12-16 | 2015-02-17 | Rapiscan Systems, Inc. | Data collection, processing and storage systems for X-ray tomographic images |
| US9223052B2 (en) | 2008-02-28 | 2015-12-29 | Rapiscan Systems, Inc. | Scanning systems |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61134021A (ja) | 1986-06-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |