JPH0478025B2 - - Google Patents
Info
- Publication number
- JPH0478025B2 JPH0478025B2 JP58160360A JP16036083A JPH0478025B2 JP H0478025 B2 JPH0478025 B2 JP H0478025B2 JP 58160360 A JP58160360 A JP 58160360A JP 16036083 A JP16036083 A JP 16036083A JP H0478025 B2 JPH0478025 B2 JP H0478025B2
- Authority
- JP
- Japan
- Prior art keywords
- floating gate
- region
- conductivity type
- layer
- impurity concentration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/68—Floating-gate IGFETs
- H10D30/681—Floating-gate IGFETs having only two programming levels
Landscapes
- Non-Volatile Memory (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58160360A JPS6053083A (ja) | 1983-09-02 | 1983-09-02 | 不揮発性メモリの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58160360A JPS6053083A (ja) | 1983-09-02 | 1983-09-02 | 不揮発性メモリの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6053083A JPS6053083A (ja) | 1985-03-26 |
JPH0478025B2 true JPH0478025B2 (enrdf_load_stackoverflow) | 1992-12-10 |
Family
ID=15713287
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58160360A Granted JPS6053083A (ja) | 1983-09-02 | 1983-09-02 | 不揮発性メモリの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6053083A (enrdf_load_stackoverflow) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5464785A (en) * | 1994-11-30 | 1995-11-07 | United Microelectronics Corporation | Method of making a flash EPROM device having a drain edge P+ implant |
KR960026960A (ko) * | 1994-12-16 | 1996-07-22 | 리 패치 | 비대칭 저전력 모스(mos) 소자 |
US6214666B1 (en) * | 1998-12-18 | 2001-04-10 | Vantis Corporation | Method of forming a non-volatile memory device |
US6282123B1 (en) | 1998-12-21 | 2001-08-28 | Lattice Semiconductor Corporation | Method of fabricating, programming, and erasing a dual pocket two sided program/erase non-volatile memory cell |
US6232631B1 (en) | 1998-12-21 | 2001-05-15 | Vantis Corporation | Floating gate memory cell structure with programming mechanism outside the read path |
US6294809B1 (en) | 1998-12-28 | 2001-09-25 | Vantis Corporation | Avalanche programmed floating gate memory cell structure with program element in polysilicon |
US6215700B1 (en) | 1999-01-07 | 2001-04-10 | Vantis Corporation | PMOS avalanche programmed floating gate memory cell structure |
US6326663B1 (en) | 1999-03-26 | 2001-12-04 | Vantis Corporation | Avalanche injection EEPROM memory cell with P-type control gate |
US6424000B1 (en) | 1999-05-11 | 2002-07-23 | Vantis Corporation | Floating gate memory apparatus and method for selected programming thereof |
-
1983
- 1983-09-02 JP JP58160360A patent/JPS6053083A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6053083A (ja) | 1985-03-26 |
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