JPH0477074B2 - - Google Patents
Info
- Publication number
- JPH0477074B2 JPH0477074B2 JP6370788A JP6370788A JPH0477074B2 JP H0477074 B2 JPH0477074 B2 JP H0477074B2 JP 6370788 A JP6370788 A JP 6370788A JP 6370788 A JP6370788 A JP 6370788A JP H0477074 B2 JPH0477074 B2 JP H0477074B2
- Authority
- JP
- Japan
- Prior art keywords
- hollow cathode
- ionization
- ion plating
- hcd
- evaporation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007789 gas Substances 0.000 claims description 20
- 238000007733 ion plating Methods 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 18
- 230000008020 evaporation Effects 0.000 claims description 15
- 238000001704 evaporation Methods 0.000 claims description 15
- 239000012495 reaction gas Substances 0.000 claims description 14
- 239000000126 substance Substances 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 8
- 238000000151 deposition Methods 0.000 claims description 5
- 230000008021 deposition Effects 0.000 claims description 5
- 238000010894 electron beam technology Methods 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 238000004804 winding Methods 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 description 13
- 239000000376 reactant Substances 0.000 description 10
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 7
- 238000005524 ceramic coating Methods 0.000 description 6
- 229910000831 Steel Inorganic materials 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 1
- 238000001241 arc-discharge method Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004035 construction material Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000004663 powder metallurgy Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6370788A JPH01240646A (ja) | 1988-03-18 | 1988-03-18 | 大量蒸着用ｈｃｄ法イオンプレーティング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6370788A JPH01240646A (ja) | 1988-03-18 | 1988-03-18 | 大量蒸着用ｈｃｄ法イオンプレーティング装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01240646A JPH01240646A (ja) | 1989-09-26 |
| JPH0477074B2 true JPH0477074B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-12-07 |
Family
ID=13237116
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6370788A Granted JPH01240646A (ja) | 1988-03-18 | 1988-03-18 | 大量蒸着用ｈｃｄ法イオンプレーティング装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01240646A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT1279238B1 (it) * | 1995-06-19 | 1997-12-09 | Galileo Vacuum Tec Spa | Sistema continuo di evaporazione con ossidazione assistita da plasma, per depositare sotto vuoto ossidi di metalli su pellicole plastiche |
| US6946031B2 (en) | 2002-02-08 | 2005-09-20 | Fuji Photo Film Co., Ltd. | Rod for a coating device, and process for producing the same |
-
1988
- 1988-03-18 JP JP6370788A patent/JPH01240646A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01240646A (ja) | 1989-09-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4992153A (en) | Sputter-CVD process for at least partially coating a workpiece | |
| US4919968A (en) | Method and apparatus for vacuum vapor deposition | |
| US5227203A (en) | Ion-plating method and apparatus therefor | |
| US5384021A (en) | Sputtering apparatus | |
| US4419202A (en) | Metal coatings | |
| US4619748A (en) | Method and apparatus for the reactive vapor deposition of layers of oxides, nitrides, oxynitrides and carbides on a substrate | |
| US4863581A (en) | Hollow cathode gun and deposition device for ion plating process | |
| JP2009543951A (ja) | 電気絶縁皮膜の堆積方法 | |
| JPH0372067A (ja) | 複数の蒸発ルツボを備えたアーク放電型蒸発器 | |
| US5976636A (en) | Magnetic apparatus for arc ion plating | |
| EP1173629B1 (en) | Vacuum cathodic arc evaporation process for the preparation of wear resistant coatings | |
| JPH0356675A (ja) | 超硬合金基体の被覆法および該被覆法によって作製される超硬工具 | |
| JPH0477074B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
| JP3514127B2 (ja) | 粗大ドロップレットの少ない金属化合物薄膜の形成を可能とするアーク式イオンプレーティング装置 | |
| JPH02280310A (ja) | 電解コンデンサ用電極材料の製造方法 | |
| EP0776987A1 (de) | Vakuumbeschichtungsanlage mit einem in der Vakuumkammer angeordneten Tiegel zur Aufnahme von zu verdampfendem Material | |
| US11926890B2 (en) | Cathode arc source | |
| KR20010021341A (ko) | 아크형 이온 플레이팅 장치 | |
| JP2877058B2 (ja) | 膜形成方法 | |
| JPH09165673A (ja) | 薄膜形成装置および薄膜形成方法 | |
| JP2898652B2 (ja) | イオンプレーティング用蒸発装置 | |
| JPH0258350B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
| JPH06116711A (ja) | アルミナ膜の製膜方法 | |
| JP2667309B2 (ja) | Ｈｃｄイオンプレーティングによる耐摩耗性被膜形成法 | |
| JPH02118062A (ja) | 発色セラミック被覆鋼板の製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |