JPH0476489B2 - - Google Patents
Info
- Publication number
- JPH0476489B2 JPH0476489B2 JP60227103A JP22710385A JPH0476489B2 JP H0476489 B2 JPH0476489 B2 JP H0476489B2 JP 60227103 A JP60227103 A JP 60227103A JP 22710385 A JP22710385 A JP 22710385A JP H0476489 B2 JPH0476489 B2 JP H0476489B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- grating
- optical system
- reticle
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 42
- 238000001228 spectrum Methods 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 5
- 230000003595 spectral effect Effects 0.000 claims description 4
- 238000005286 illumination Methods 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 241000213951 Salmonella enterica subsp. enterica serovar Austin Species 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000005305 interferometry Methods 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60227103A JPS6286722A (ja) | 1985-10-11 | 1985-10-11 | 露光装置 |
| US06/916,738 US4771180A (en) | 1985-10-11 | 1986-10-08 | Exposure apparatus including an optical system for aligning a reticle and a wafer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60227103A JPS6286722A (ja) | 1985-10-11 | 1985-10-11 | 露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6286722A JPS6286722A (ja) | 1987-04-21 |
| JPH0476489B2 true JPH0476489B2 (enEXAMPLES) | 1992-12-03 |
Family
ID=16855526
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60227103A Granted JPS6286722A (ja) | 1985-10-11 | 1985-10-11 | 露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6286722A (enEXAMPLES) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06105679B2 (ja) * | 1987-09-29 | 1994-12-21 | 松下電器産業株式会社 | 露光装置 |
| US5325176A (en) * | 1988-02-16 | 1994-06-28 | Canon Kabushiki Kaisha | Position detecting method and apparatus including Fraunhofer diffraction detector |
| JPH0732116B2 (ja) * | 1989-07-13 | 1995-04-10 | 松下電器産業株式会社 | 露光装置 |
| US7433018B2 (en) * | 2005-12-27 | 2008-10-07 | Asml Netherlands B.V. | Pattern alignment method and lithographic apparatus |
-
1985
- 1985-10-11 JP JP60227103A patent/JPS6286722A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6286722A (ja) | 1987-04-21 |
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