JPH0473940B2 - - Google Patents

Info

Publication number
JPH0473940B2
JPH0473940B2 JP60294610A JP29461085A JPH0473940B2 JP H0473940 B2 JPH0473940 B2 JP H0473940B2 JP 60294610 A JP60294610 A JP 60294610A JP 29461085 A JP29461085 A JP 29461085A JP H0473940 B2 JPH0473940 B2 JP H0473940B2
Authority
JP
Japan
Prior art keywords
photomask
light
glass substrate
shielding film
atomic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60294610A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62153957A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP60294610A priority Critical patent/JPS62153957A/ja
Publication of JPS62153957A publication Critical patent/JPS62153957A/ja
Publication of JPH0473940B2 publication Critical patent/JPH0473940B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP60294610A 1985-12-27 1985-12-27 フォトマスクブランクとフォトマスク Granted JPS62153957A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60294610A JPS62153957A (ja) 1985-12-27 1985-12-27 フォトマスクブランクとフォトマスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60294610A JPS62153957A (ja) 1985-12-27 1985-12-27 フォトマスクブランクとフォトマスク

Publications (2)

Publication Number Publication Date
JPS62153957A JPS62153957A (ja) 1987-07-08
JPH0473940B2 true JPH0473940B2 (enrdf_load_stackoverflow) 1992-11-25

Family

ID=17809986

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60294610A Granted JPS62153957A (ja) 1985-12-27 1985-12-27 フォトマスクブランクとフォトマスク

Country Status (1)

Country Link
JP (1) JPS62153957A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5007843B2 (ja) * 2009-09-24 2012-08-22 信越化学工業株式会社 フォトマスクブランク及びフォトマスク

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5831336A (ja) * 1981-08-19 1983-02-24 Konishiroku Photo Ind Co Ltd ホトマスク素材
JPS60176235A (ja) * 1984-02-22 1985-09-10 Nippon Kogaku Kk <Nikon> Ｘ線露光用マスク原板
JPS60202441A (ja) * 1984-03-27 1985-10-12 Mitsubishi Electric Corp 半導体装置用パタ−ン形成マスク

Also Published As

Publication number Publication date
JPS62153957A (ja) 1987-07-08

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term