JPH0473775B2 - - Google Patents

Info

Publication number
JPH0473775B2
JPH0473775B2 JP58217434A JP21743483A JPH0473775B2 JP H0473775 B2 JPH0473775 B2 JP H0473775B2 JP 58217434 A JP58217434 A JP 58217434A JP 21743483 A JP21743483 A JP 21743483A JP H0473775 B2 JPH0473775 B2 JP H0473775B2
Authority
JP
Japan
Prior art keywords
reticle
foreign matter
substrate
cleaning
arm
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58217434A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60110194A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP58217434A priority Critical patent/JPS60110194A/ja
Publication of JPS60110194A publication Critical patent/JPS60110194A/ja
Priority to US07/011,413 priority patent/US4715392A/en
Publication of JPH0473775B2 publication Critical patent/JPH0473775B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP58217434A 1983-11-10 1983-11-18 基板の洗浄装置 Granted JPS60110194A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP58217434A JPS60110194A (ja) 1983-11-18 1983-11-18 基板の洗浄装置
US07/011,413 US4715392A (en) 1983-11-10 1987-02-04 Automatic photomask or reticle washing and cleaning system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58217434A JPS60110194A (ja) 1983-11-18 1983-11-18 基板の洗浄装置

Publications (2)

Publication Number Publication Date
JPS60110194A JPS60110194A (ja) 1985-06-15
JPH0473775B2 true JPH0473775B2 (enExample) 1992-11-24

Family

ID=16704160

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58217434A Granted JPS60110194A (ja) 1983-11-10 1983-11-18 基板の洗浄装置

Country Status (1)

Country Link
JP (1) JPS60110194A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011257304A (ja) * 2010-06-10 2011-12-22 Hitachi High-Technologies Corp 基板検査方法及び装置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4644565B2 (ja) * 2004-09-01 2011-03-02 三洋電機株式会社 洗浄装置
JP5855428B2 (ja) * 2011-11-11 2016-02-09 株式会社ディスコ 筐体カバー機構
JP7336308B2 (ja) * 2019-08-09 2023-08-31 池上通信機株式会社 シート体の検査装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5892225A (ja) * 1981-11-27 1983-06-01 Fujitsu Ltd ウエハ洗浄装置
JPS5899734A (ja) * 1981-12-10 1983-06-14 Fujitsu Ltd フォト・マスク検査方法及びその装置
JPS58182826A (ja) * 1982-04-20 1983-10-25 Nippon Kogaku Kk <Nikon> 異物の自動除去装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011257304A (ja) * 2010-06-10 2011-12-22 Hitachi High-Technologies Corp 基板検査方法及び装置

Also Published As

Publication number Publication date
JPS60110194A (ja) 1985-06-15

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