JPH0470732U - - Google Patents

Info

Publication number
JPH0470732U
JPH0470732U JP11354690U JP11354690U JPH0470732U JP H0470732 U JPH0470732 U JP H0470732U JP 11354690 U JP11354690 U JP 11354690U JP 11354690 U JP11354690 U JP 11354690U JP H0470732 U JPH0470732 U JP H0470732U
Authority
JP
Japan
Prior art keywords
pattern
reduction
projection exposure
measurement
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11354690U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11354690U priority Critical patent/JPH0470732U/ja
Publication of JPH0470732U publication Critical patent/JPH0470732U/ja
Pending legal-status Critical Current

Links

JP11354690U 1990-10-31 1990-10-31 Pending JPH0470732U (sv)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11354690U JPH0470732U (sv) 1990-10-31 1990-10-31

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11354690U JPH0470732U (sv) 1990-10-31 1990-10-31

Publications (1)

Publication Number Publication Date
JPH0470732U true JPH0470732U (sv) 1992-06-23

Family

ID=31861147

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11354690U Pending JPH0470732U (sv) 1990-10-31 1990-10-31

Country Status (1)

Country Link
JP (1) JPH0470732U (sv)

Similar Documents

Publication Publication Date Title
ATE176416T1 (de) Laserbearbeitungsgerät
JPS59210311A (ja) 物体のモアレ縞パタ−ン像を得るための方法及びその装置
US6141082A (en) Alignment method, exposure method, and exposure apparatus
US6101267A (en) Position detecting method and apparatus, and exposure method and apparatus
JPS5654038A (en) Checking device for shape of photomask
JPH0732109B2 (ja) 光露光方法
JPH0470732U (sv)
JPH09160651A (ja) ワーク位置決め装置
JPH0321842U (sv)
JPH0443407B2 (sv)
JPS5972134A (ja) パタ−ン検出装置
JPH0149007B2 (sv)
JPH0420226U (sv)
JPS6238853B2 (sv)
JPH04131929U (ja) 縮小投影露光装置
JPS6180212A (ja) 自動焦点検出機構
JPS62112140U (sv)
JPS60166144U (ja) 投影露光装置
JPS57153432A (en) Reducing projecting exposing device
JPH0227811B2 (sv)
JPS63133008A (ja) チツプ部品の装着検査装置
JPS5885339U (ja) 縮小投影露光装置
JPS6473719A (en) Stepper
JP2000114141A (ja) 半導体装置の製造方法およびそれに用いる半導体製造装置
JPS5985906U (ja) 平面度測定装置