JPH0469558B2 - - Google Patents
Info
- Publication number
- JPH0469558B2 JPH0469558B2 JP17323485A JP17323485A JPH0469558B2 JP H0469558 B2 JPH0469558 B2 JP H0469558B2 JP 17323485 A JP17323485 A JP 17323485A JP 17323485 A JP17323485 A JP 17323485A JP H0469558 B2 JPH0469558 B2 JP H0469558B2
- Authority
- JP
- Japan
- Prior art keywords
- acid
- precipitation
- sodium
- hedpo
- salts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3071—Process control means, e.g. for replenishing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17323485A JPS6234166A (ja) | 1985-08-08 | 1985-08-08 | 平版印刷版用処理液 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17323485A JPS6234166A (ja) | 1985-08-08 | 1985-08-08 | 平版印刷版用処理液 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6234166A JPS6234166A (ja) | 1987-02-14 |
JPH0469558B2 true JPH0469558B2 (enrdf_load_stackoverflow) | 1992-11-06 |
Family
ID=15956634
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17323485A Granted JPS6234166A (ja) | 1985-08-08 | 1985-08-08 | 平版印刷版用処理液 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6234166A (enrdf_load_stackoverflow) |
-
1985
- 1985-08-08 JP JP17323485A patent/JPS6234166A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6234166A (ja) | 1987-02-14 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |