JPH0465901B2 - - Google Patents
Info
- Publication number
- JPH0465901B2 JPH0465901B2 JP61168053A JP16805386A JPH0465901B2 JP H0465901 B2 JPH0465901 B2 JP H0465901B2 JP 61168053 A JP61168053 A JP 61168053A JP 16805386 A JP16805386 A JP 16805386A JP H0465901 B2 JPH0465901 B2 JP H0465901B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon steel
- zone
- base material
- material plate
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910000976 Electrical steel Inorganic materials 0.000 claims description 47
- 239000000463 material Substances 0.000 claims description 34
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 23
- 229910052710 silicon Inorganic materials 0.000 claims description 23
- 239000010703 silicon Substances 0.000 claims description 23
- 238000004519 manufacturing process Methods 0.000 claims description 18
- 238000002791 soaking Methods 0.000 claims description 16
- 230000001590 oxidative effect Effects 0.000 claims description 14
- 238000010438 heat treatment Methods 0.000 claims description 12
- 238000007740 vapor deposition Methods 0.000 claims description 12
- 238000001816 cooling Methods 0.000 claims description 11
- 239000013078 crystal Substances 0.000 claims description 11
- 238000005019 vapor deposition process Methods 0.000 claims description 2
- 238000004804 winding Methods 0.000 claims description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims 2
- 229910002092 carbon dioxide Inorganic materials 0.000 claims 1
- 239000001569 carbon dioxide Substances 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 description 23
- 238000000034 method Methods 0.000 description 11
- 238000009792 diffusion process Methods 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910003902 SiCl 4 Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000002386 leaching Methods 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000005049 silicon tetrachloride Substances 0.000 description 2
- 206010040844 Skin exfoliation Diseases 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000004299 exfoliation Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Landscapes
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
- Chemical Vapour Deposition (AREA)
- Manufacturing Of Steel Electrode Plates (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16805386A JPS6326312A (ja) | 1986-07-18 | 1986-07-18 | 高珪素鋼板の製造装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16805386A JPS6326312A (ja) | 1986-07-18 | 1986-07-18 | 高珪素鋼板の製造装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6326312A JPS6326312A (ja) | 1988-02-03 |
| JPH0465901B2 true JPH0465901B2 (de) | 1992-10-21 |
Family
ID=15860956
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16805386A Granted JPS6326312A (ja) | 1986-07-18 | 1986-07-18 | 高珪素鋼板の製造装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6326312A (de) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5217245A (en) * | 1991-09-03 | 1993-06-08 | Monroe Auto Equipment Company | Switchable roll-stabilizer bar |
| KR101404136B1 (ko) * | 2012-03-19 | 2014-06-10 | 한국기계연구원 | 고규소 전기 강판의 제조방법 및 전기 강판의 제조시스템 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4893522A (de) * | 1972-03-13 | 1973-12-04 |
-
1986
- 1986-07-18 JP JP16805386A patent/JPS6326312A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4893522A (de) * | 1972-03-13 | 1973-12-04 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6326312A (ja) | 1988-02-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |