JPH0462168B2 - - Google Patents
Info
- Publication number
- JPH0462168B2 JPH0462168B2 JP58087087A JP8708783A JPH0462168B2 JP H0462168 B2 JPH0462168 B2 JP H0462168B2 JP 58087087 A JP58087087 A JP 58087087A JP 8708783 A JP8708783 A JP 8708783A JP H0462168 B2 JPH0462168 B2 JP H0462168B2
- Authority
- JP
- Japan
- Prior art keywords
- cylindrical surface
- heating element
- rotary plate
- gas introduction
- jig
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/24—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using chemical vapour deposition [CVD]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/34—Deposited materials, e.g. layers
- H10P14/3402—Deposited materials, e.g. layers characterised by the chemical composition
- H10P14/3404—Deposited materials, e.g. layers characterised by the chemical composition being Group IVA materials
- H10P14/3411—Silicon, silicon germanium or germanium
Landscapes
- Photovoltaic Devices (AREA)
- Light Receiving Elements (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58087087A JPS59211220A (ja) | 1983-05-17 | 1983-05-17 | プラズマｃｖｄ装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58087087A JPS59211220A (ja) | 1983-05-17 | 1983-05-17 | プラズマｃｖｄ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59211220A JPS59211220A (ja) | 1984-11-30 |
| JPH0462168B2 true JPH0462168B2 (cg-RX-API-DMAC7.html) | 1992-10-05 |
Family
ID=13905162
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58087087A Granted JPS59211220A (ja) | 1983-05-17 | 1983-05-17 | プラズマｃｖｄ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59211220A (cg-RX-API-DMAC7.html) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106756888B (zh) | 2016-11-30 | 2018-07-13 | 江苏菲沃泰纳米科技有限公司 | 一种纳米镀膜设备旋转货架装置 |
| CN106622824B (zh) | 2016-11-30 | 2018-10-12 | 江苏菲沃泰纳米科技有限公司 | 一种等离子体聚合涂层装置 |
| US11339477B2 (en) | 2016-11-30 | 2022-05-24 | Jiangsu Favored Nanotechnology Co., LTD | Plasma polymerization coating apparatus and process |
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1983
- 1983-05-17 JP JP58087087A patent/JPS59211220A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59211220A (ja) | 1984-11-30 |