JPH0461068B2 - - Google Patents

Info

Publication number
JPH0461068B2
JPH0461068B2 JP59027839A JP2783984A JPH0461068B2 JP H0461068 B2 JPH0461068 B2 JP H0461068B2 JP 59027839 A JP59027839 A JP 59027839A JP 2783984 A JP2783984 A JP 2783984A JP H0461068 B2 JPH0461068 B2 JP H0461068B2
Authority
JP
Japan
Prior art keywords
base material
aluminum base
oxide film
film
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59027839A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60174863A (ja
Inventor
Kenji Tsukamoto
Yutaka Kato
Eizo Isoyama
Shigemi Tanimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Altemira Co Ltd
Original Assignee
Showa Aluminum Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Aluminum Corp filed Critical Showa Aluminum Corp
Priority to JP2783984A priority Critical patent/JPS60174863A/ja
Publication of JPS60174863A publication Critical patent/JPS60174863A/ja
Publication of JPH0461068B2 publication Critical patent/JPH0461068B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C23C8/10—Oxidising

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Formation Of Insulating Films (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Physical Vapour Deposition (AREA)
JP2783984A 1984-02-15 1984-02-15 薄膜形成用アルミニウム基材の表面処理方法 Granted JPS60174863A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2783984A JPS60174863A (ja) 1984-02-15 1984-02-15 薄膜形成用アルミニウム基材の表面処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2783984A JPS60174863A (ja) 1984-02-15 1984-02-15 薄膜形成用アルミニウム基材の表面処理方法

Publications (2)

Publication Number Publication Date
JPS60174863A JPS60174863A (ja) 1985-09-09
JPH0461068B2 true JPH0461068B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-09-29

Family

ID=12232093

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2783984A Granted JPS60174863A (ja) 1984-02-15 1984-02-15 薄膜形成用アルミニウム基材の表面処理方法

Country Status (1)

Country Link
JP (1) JPS60174863A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH065627Y2 (ja) * 1985-11-12 1994-02-09 昭和アルミニウム株式会社 アルミニウム材中のガス分析装置
JP2598019B2 (ja) * 1987-06-01 1997-04-09 富士通株式会社 感光体の製造方法
JPS6479755A (en) * 1987-09-21 1989-03-24 Furukawa Aluminium Drum of photosensitive body for laser beam printer and manufacture of same
JP2629348B2 (ja) * 1989-04-17 1997-07-09 富士電機株式会社 電子写真用感光体の製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6053749B2 (ja) * 1979-06-13 1985-11-27 松下電子工業株式会社 アルミニウムのプラズマエッチング方法およびそのプラズマエッチング装置
JPS57147644A (en) * 1981-03-10 1982-09-11 Ricoh Co Ltd Photoreceptor for electrophotography
JPS57161067A (en) * 1981-03-27 1982-10-04 Mitsubishi Electric Corp Dry etching method for aluminum film
JPS5811944A (ja) * 1981-07-16 1983-01-22 Ricoh Co Ltd 電子写真用感光体の製造方法
JPS5815239A (ja) * 1981-07-21 1983-01-28 Ricoh Co Ltd 半導体素子
JPS5860747A (ja) * 1981-10-07 1983-04-11 Oki Electric Ind Co Ltd 電子写真感光体

Also Published As

Publication number Publication date
JPS60174863A (ja) 1985-09-09

Similar Documents

Publication Publication Date Title
US6565984B1 (en) Clean aluminum alloy for semiconductor processing equipment
US5811195A (en) Corrosion-resistant aluminum article for semiconductor processing equipment
JPH0461068B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH0461069B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH0461070B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
EP0146115B1 (en) Process for producing aluminum material for use in vacuum
KR100749145B1 (ko) 보호막 부착 실리콘 보트 및 그 제조방법, 그를 이용하여열처리된 실리콘 웨이퍼
JPS6140747B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH07201673A (ja) 電解コンデンサ電極用アルミニウム材料の製造方法
JPH11283924A (ja) 半導体ウエハ製造方法
FR2575764A1 (fr) Procede de fabrication d'un feuillard en alliage de zirconium zircaloy 2 ou zircaloy 4 restaure, et feuillard obtenu
JPS6140748B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
US11776805B2 (en) Selective oxidation and simplified pre-clean
JPH10194876A (ja) 半導体用治具の製造方法
JP2595127B2 (ja) 金属酸化物膜の形成方法及びフォトマスク原板の製造方法
JPH0471880B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPS6155205B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH06136495A (ja) 電解コンデンサ電極用アルミニウム材料の製造方法
JPH0328515B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH09162146A (ja) 半導体用治工具の清浄化方法
JPS60159164A (ja) 真空蒸着用アルミニウム基材の製造方法
JPH02129364A (ja) 真空蒸着用銅基材の製造方法
JPH02177539A (ja) 保管用保護被膜付きシリコンウエハ及びシリコンウエハの保管用保護被膜の形成方法
JPH0513335A (ja) 膜形成方法
JPH0788557B2 (ja) 電解コンデンサ電極用アルミニウム箔の製造方法