JPH0454200Y2 - - Google Patents

Info

Publication number
JPH0454200Y2
JPH0454200Y2 JP1984196908U JP19690884U JPH0454200Y2 JP H0454200 Y2 JPH0454200 Y2 JP H0454200Y2 JP 1984196908 U JP1984196908 U JP 1984196908U JP 19690884 U JP19690884 U JP 19690884U JP H0454200 Y2 JPH0454200 Y2 JP H0454200Y2
Authority
JP
Japan
Prior art keywords
processing chamber
plasma processing
plasma
cleaning
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1984196908U
Other languages
English (en)
Japanese (ja)
Other versions
JPS61116741U (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1984196908U priority Critical patent/JPH0454200Y2/ja
Publication of JPS61116741U publication Critical patent/JPS61116741U/ja
Application granted granted Critical
Publication of JPH0454200Y2 publication Critical patent/JPH0454200Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Physical Or Chemical Processes And Apparatus (AREA)
  • Separation Of Particles Using Liquids (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
JP1984196908U 1984-12-28 1984-12-28 Expired JPH0454200Y2 (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1984196908U JPH0454200Y2 (enrdf_load_stackoverflow) 1984-12-28 1984-12-28

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1984196908U JPH0454200Y2 (enrdf_load_stackoverflow) 1984-12-28 1984-12-28

Publications (2)

Publication Number Publication Date
JPS61116741U JPS61116741U (enrdf_load_stackoverflow) 1986-07-23
JPH0454200Y2 true JPH0454200Y2 (enrdf_load_stackoverflow) 1992-12-18

Family

ID=30754839

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1984196908U Expired JPH0454200Y2 (enrdf_load_stackoverflow) 1984-12-28 1984-12-28

Country Status (1)

Country Link
JP (1) JPH0454200Y2 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2716708C1 (ru) * 2016-03-22 2020-03-16 Конинклейке Филипс Н.В. Аппарат холодной плазмы для обработки поверхности

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50153073A (enrdf_load_stackoverflow) * 1974-05-31 1975-12-09

Also Published As

Publication number Publication date
JPS61116741U (enrdf_load_stackoverflow) 1986-07-23

Similar Documents

Publication Publication Date Title
JP2568371B2 (ja) 真空チャンバ用の新規な蓋および扉、並びにそれに対する前処理
US8850712B2 (en) Vacuum drying method
JP2547529B2 (ja) ウェーハキャリヤの遠心洗浄装置
US4770196A (en) Chemical cleaning system
JPH0454200Y2 (enrdf_load_stackoverflow)
US20180169717A1 (en) Methods and apparatus to treat workpieces with process fluid
US20050066633A1 (en) Method and apparatus for filtering contaminants
KR101140695B1 (ko) 펌프 세정
JP2002334863A (ja) Ｆｏｕｐ用ドアシェルの洗浄乾燥方法及び装置
JPH05166789A (ja) 基板の洗浄乾燥装置
JP4036626B2 (ja) 超音波洗浄方法および超音波洗浄装置
CN119546783A (zh) 一种用于加工皮革和织物的机器
JPS63302521A (ja) 半導体基板の乾燥装置
JP2004174659A (ja) グローブボックス装置
JP2007117838A (ja) ワーク洗浄方法及びワーク洗浄システム
JPH04366385A (ja) 洗浄体の乾燥方法および乾燥装置
JP3595508B2 (ja) 半導体製造装置
KR101189653B1 (ko) 플라즈마를 이용한 금속가공유 제거장치 및 방법
JP2002246374A (ja) プラズマ処理装置とそのメンテナンス方法
JP7008928B1 (ja) 基板洗浄真空乾燥装置
JP2002115880A (ja) 塗装用クリーンルーム
JPH0688264A (ja) 真空脱脂洗浄装置
JPH07201798A (ja) 枚葉基板処理方法およびその装置
JP3746551B2 (ja) 真空洗浄乾燥装置
JP3144036B2 (ja) 薬液処理装置及び薬液処理方法