JPS61116741U - - Google Patents
Info
- Publication number
- JPS61116741U JPS61116741U JP19690884U JP19690884U JPS61116741U JP S61116741 U JPS61116741 U JP S61116741U JP 19690884 U JP19690884 U JP 19690884U JP 19690884 U JP19690884 U JP 19690884U JP S61116741 U JPS61116741 U JP S61116741U
- Authority
- JP
- Japan
- Prior art keywords
- plasma processing
- processing apparatus
- resin molded
- processing chamber
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004140 cleaning Methods 0.000 claims description 2
- 239000011347 resin Substances 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- 238000009832 plasma treatment Methods 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000010926 purge Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- Separation Of Particles Using Liquids (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1984196908U JPH0454200Y2 (enrdf_load_stackoverflow) | 1984-12-28 | 1984-12-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1984196908U JPH0454200Y2 (enrdf_load_stackoverflow) | 1984-12-28 | 1984-12-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61116741U true JPS61116741U (enrdf_load_stackoverflow) | 1986-07-23 |
| JPH0454200Y2 JPH0454200Y2 (enrdf_load_stackoverflow) | 1992-12-18 |
Family
ID=30754839
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1984196908U Expired JPH0454200Y2 (enrdf_load_stackoverflow) | 1984-12-28 | 1984-12-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0454200Y2 (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019511817A (ja) * | 2016-03-22 | 2019-04-25 | コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． | 表面を処理するための低温プラズマ装置 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50153073A (enrdf_load_stackoverflow) * | 1974-05-31 | 1975-12-09 |
-
1984
- 1984-12-28 JP JP1984196908U patent/JPH0454200Y2/ja not_active Expired
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50153073A (enrdf_load_stackoverflow) * | 1974-05-31 | 1975-12-09 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019511817A (ja) * | 2016-03-22 | 2019-04-25 | コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． | 表面を処理するための低温プラズマ装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0454200Y2 (enrdf_load_stackoverflow) | 1992-12-18 |