JPH0451019B2 - - Google Patents
Info
- Publication number
- JPH0451019B2 JPH0451019B2 JP59159345A JP15934584A JPH0451019B2 JP H0451019 B2 JPH0451019 B2 JP H0451019B2 JP 59159345 A JP59159345 A JP 59159345A JP 15934584 A JP15934584 A JP 15934584A JP H0451019 B2 JPH0451019 B2 JP H0451019B2
- Authority
- JP
- Japan
- Prior art keywords
- weight
- developer
- parts
- positive
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15934584A JPS6139041A (ja) | 1984-07-31 | 1984-07-31 | ポジ型レジスト現像液 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15934584A JPS6139041A (ja) | 1984-07-31 | 1984-07-31 | ポジ型レジスト現像液 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6139041A JPS6139041A (ja) | 1986-02-25 |
JPH0451019B2 true JPH0451019B2 (en, 2012) | 1992-08-17 |
Family
ID=15691810
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15934584A Granted JPS6139041A (ja) | 1984-07-31 | 1984-07-31 | ポジ型レジスト現像液 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6139041A (en, 2012) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5094934A (en) * | 1987-04-06 | 1992-03-10 | Morton International, Inc. | Method of developing a high contrast, positive photoresist using a developer containing alkanolamine |
US5126230A (en) * | 1987-04-06 | 1992-06-30 | Morton International, Inc. | High contrast, positive photoresist developer containing alkanolamine |
JPS6462359A (en) * | 1987-09-02 | 1989-03-08 | Japan Synthetic Rubber Co Ltd | Radiation-sensitive composition |
JP2751849B2 (ja) * | 1995-01-30 | 1998-05-18 | 日立プラント建設株式会社 | 現像原液の希釈装置 |
KR101144643B1 (ko) | 2004-06-30 | 2012-05-08 | 엘지디스플레이 주식회사 | 칼라 필터 기판 제조 방법 및 포토 장비 |
JP7335757B2 (ja) * | 2019-02-28 | 2023-08-30 | 東京応化工業株式会社 | 感光性樹脂組成物、及びガラス基板のエッチング方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5688135A (en) * | 1979-12-21 | 1981-07-17 | Hitachi Ltd | Developer |
-
1984
- 1984-07-31 JP JP15934584A patent/JPS6139041A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6139041A (ja) | 1986-02-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |