JPH0451019B2 - - Google Patents

Info

Publication number
JPH0451019B2
JPH0451019B2 JP59159345A JP15934584A JPH0451019B2 JP H0451019 B2 JPH0451019 B2 JP H0451019B2 JP 59159345 A JP59159345 A JP 59159345A JP 15934584 A JP15934584 A JP 15934584A JP H0451019 B2 JPH0451019 B2 JP H0451019B2
Authority
JP
Japan
Prior art keywords
weight
developer
parts
positive
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59159345A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6139041A (ja
Inventor
Hiroshi Komano
Toshimi Aoyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP15934584A priority Critical patent/JPS6139041A/ja
Publication of JPS6139041A publication Critical patent/JPS6139041A/ja
Publication of JPH0451019B2 publication Critical patent/JPH0451019B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP15934584A 1984-07-31 1984-07-31 ポジ型レジスト現像液 Granted JPS6139041A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15934584A JPS6139041A (ja) 1984-07-31 1984-07-31 ポジ型レジスト現像液

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15934584A JPS6139041A (ja) 1984-07-31 1984-07-31 ポジ型レジスト現像液

Publications (2)

Publication Number Publication Date
JPS6139041A JPS6139041A (ja) 1986-02-25
JPH0451019B2 true JPH0451019B2 (enrdf_load_stackoverflow) 1992-08-17

Family

ID=15691810

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15934584A Granted JPS6139041A (ja) 1984-07-31 1984-07-31 ポジ型レジスト現像液

Country Status (1)

Country Link
JP (1) JPS6139041A (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5094934A (en) * 1987-04-06 1992-03-10 Morton International, Inc. Method of developing a high contrast, positive photoresist using a developer containing alkanolamine
US5126230A (en) * 1987-04-06 1992-06-30 Morton International, Inc. High contrast, positive photoresist developer containing alkanolamine
JPS6462359A (en) * 1987-09-02 1989-03-08 Japan Synthetic Rubber Co Ltd Radiation-sensitive composition
JP2751849B2 (ja) * 1995-01-30 1998-05-18 日立プラント建設株式会社 現像原液の希釈装置
KR101144643B1 (ko) 2004-06-30 2012-05-08 엘지디스플레이 주식회사 칼라 필터 기판 제조 방법 및 포토 장비
JP7335757B2 (ja) * 2019-02-28 2023-08-30 東京応化工業株式会社 感光性樹脂組成物、及びガラス基板のエッチング方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5688135A (en) * 1979-12-21 1981-07-17 Hitachi Ltd Developer

Also Published As

Publication number Publication date
JPS6139041A (ja) 1986-02-25

Similar Documents

Publication Publication Date Title
US5964951A (en) Rinsing solution
JP3978255B2 (ja) リソグラフィー用洗浄剤
CN101523296B (zh) 精细图案形成方法及用于此法的抗蚀基板处理溶液
US4983490A (en) Photoresist treating composition consisting of a mixture of propylene glycol alkyl ether and propylene glycol alkyl ether acetate
JP5306755B2 (ja) 基板処理液およびそれを用いたレジスト基板処理方法
JPH0326827B2 (enrdf_load_stackoverflow)
US4847178A (en) Positive photosensitive o-quinone diazide composition with benzotriazole carboxylic acid or alkyl ester
US4692398A (en) Process of using photoresist treating composition containing a mixture of a hexa-alkyl disilazane, propylene glycol alkyl ether and propylene glycol alkyl ether acetate
JPH10512973A (ja) ポジ型フォトレジストの現像方法およびそのための組成物
JP3924317B2 (ja) 陰イオン交換樹脂を使用する、ノボラック樹脂溶液中の金属イオン低減
JPH0451019B2 (enrdf_load_stackoverflow)
JP3224602B2 (ja) 感光性基材及びそれを用いたレジストパターン形成方法
JPH0157895B2 (enrdf_load_stackoverflow)
JPH0683051A (ja) 放射線に感光性の混合物のための増感剤としてのポリラクチド化合物
JPH0562735B2 (enrdf_load_stackoverflow)
US4806458A (en) Composition containing a mixture of hexa-alkyl disilazane and propylene glycol alkyl ether and/or propylene glycol alkyl ether acetate
JP2527811B2 (ja) ポジ型レジスト用現像液
JPS62105145A (ja) 基板から硬化および未硬化のフォトレジスト層を剥離する方法
JP2836916B2 (ja) ポジ型ホトレジスト組成物
JP2001117241A (ja) リソグラフィー用リンス液
JPH0354340B2 (enrdf_load_stackoverflow)
JPH043865B2 (enrdf_load_stackoverflow)
JPH0128370B2 (enrdf_load_stackoverflow)
JP2001117221A (ja) ポジティブ型フォトレジスト組成物
JP2698228B2 (ja) 感光性樹脂用現像液

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term