JPH0451019B2 - - Google Patents

Info

Publication number
JPH0451019B2
JPH0451019B2 JP59159345A JP15934584A JPH0451019B2 JP H0451019 B2 JPH0451019 B2 JP H0451019B2 JP 59159345 A JP59159345 A JP 59159345A JP 15934584 A JP15934584 A JP 15934584A JP H0451019 B2 JPH0451019 B2 JP H0451019B2
Authority
JP
Japan
Prior art keywords
weight
developer
parts
positive
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59159345A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6139041A (ja
Inventor
Hiroshi Komano
Toshimi Aoyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP15934584A priority Critical patent/JPS6139041A/ja
Publication of JPS6139041A publication Critical patent/JPS6139041A/ja
Publication of JPH0451019B2 publication Critical patent/JPH0451019B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP15934584A 1984-07-31 1984-07-31 ポジ型レジスト現像液 Granted JPS6139041A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15934584A JPS6139041A (ja) 1984-07-31 1984-07-31 ポジ型レジスト現像液

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15934584A JPS6139041A (ja) 1984-07-31 1984-07-31 ポジ型レジスト現像液

Publications (2)

Publication Number Publication Date
JPS6139041A JPS6139041A (ja) 1986-02-25
JPH0451019B2 true JPH0451019B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-08-17

Family

ID=15691810

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15934584A Granted JPS6139041A (ja) 1984-07-31 1984-07-31 ポジ型レジスト現像液

Country Status (1)

Country Link
JP (1) JPS6139041A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5094934A (en) * 1987-04-06 1992-03-10 Morton International, Inc. Method of developing a high contrast, positive photoresist using a developer containing alkanolamine
US5126230A (en) * 1987-04-06 1992-06-30 Morton International, Inc. High contrast, positive photoresist developer containing alkanolamine
JPS6462359A (en) * 1987-09-02 1989-03-08 Japan Synthetic Rubber Co Ltd Radiation-sensitive composition
JP2751849B2 (ja) * 1995-01-30 1998-05-18 日立プラント建設株式会社 現像原液の希釈装置
KR101144643B1 (ko) 2004-06-30 2012-05-08 엘지디스플레이 주식회사 칼라 필터 기판 제조 방법 및 포토 장비
JP7335757B2 (ja) * 2019-02-28 2023-08-30 東京応化工業株式会社 感光性樹脂組成物、及びガラス基板のエッチング方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5688135A (en) * 1979-12-21 1981-07-17 Hitachi Ltd Developer

Also Published As

Publication number Publication date
JPS6139041A (ja) 1986-02-25

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term