JPH0445968B2 - - Google Patents

Info

Publication number
JPH0445968B2
JPH0445968B2 JP63210712A JP21071288A JPH0445968B2 JP H0445968 B2 JPH0445968 B2 JP H0445968B2 JP 63210712 A JP63210712 A JP 63210712A JP 21071288 A JP21071288 A JP 21071288A JP H0445968 B2 JPH0445968 B2 JP H0445968B2
Authority
JP
Japan
Prior art keywords
wafer
mask
light
alignment
projection lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63210712A
Other languages
English (en)
Japanese (ja)
Other versions
JPH01103835A (ja
Inventor
Mitsuyoshi Koizumi
Nobuyuki Akyama
Yoshimasa Ooshima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP63210712A priority Critical patent/JPH01103835A/ja
Publication of JPH01103835A publication Critical patent/JPH01103835A/ja
Publication of JPH0445968B2 publication Critical patent/JPH0445968B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP63210712A 1988-08-26 1988-08-26 半導体ウエハ等の被露光試料 Granted JPH01103835A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63210712A JPH01103835A (ja) 1988-08-26 1988-08-26 半導体ウエハ等の被露光試料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63210712A JPH01103835A (ja) 1988-08-26 1988-08-26 半導体ウエハ等の被露光試料

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP61104659A Division JPS62122129A (ja) 1986-05-09 1986-05-09 ウエハ上パタ−ン位置検出装置

Publications (2)

Publication Number Publication Date
JPH01103835A JPH01103835A (ja) 1989-04-20
JPH0445968B2 true JPH0445968B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-07-28

Family

ID=16593854

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63210712A Granted JPH01103835A (ja) 1988-08-26 1988-08-26 半導体ウエハ等の被露光試料

Country Status (1)

Country Link
JP (1) JPH01103835A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2536403C2 (de) * 1975-08-14 1977-06-30 Siemens AG, 1000 Berlin und 8000 München Tastengesteuerte Anordnung zur Erzeugung von Codezeichen
JPS5352072A (en) * 1976-10-22 1978-05-12 Hitachi Ltd Pattern for alignment

Also Published As

Publication number Publication date
JPH01103835A (ja) 1989-04-20

Similar Documents

Publication Publication Date Title
KR100544439B1 (ko) 얼라인먼트유니트를갖는리소그래픽투영장치
US4362389A (en) Method and apparatus for projection type mask alignment
JPS6227536B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
KR100389976B1 (ko) 얼라인먼트방법및장치
US5907405A (en) Alignment method and exposure system
US5721605A (en) Alignment device and method with focus detection system
JP2530587B2 (ja) 位置決め装置
JP2004071851A (ja) 半導体露光方法及び露光装置
JPH0581046B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH09223650A (ja) 露光装置
JPH055085B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPS62160722A (ja) 露光方法
JP3203676B2 (ja) 投影露光装置
JPS62150106A (ja) 位置検出装置
JPH0230112A (ja) 露光条件測定方法
JPH0445968B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH10172900A (ja) 露光装置
JPH0152893B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPS63107139A (ja) 感光基板のアライメント方法
JPS6151415B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP3209189B2 (ja) 露光装置及び方法
JP3209186B2 (ja) 露光装置及び方法
JPH0237709A (ja) 露光装置
JPH026709A (ja) 表面変位検出装置
JPH0412523A (ja) 位置検出装置