JPH0441487B2 - - Google Patents

Info

Publication number
JPH0441487B2
JPH0441487B2 JP61191946A JP19194686A JPH0441487B2 JP H0441487 B2 JPH0441487 B2 JP H0441487B2 JP 61191946 A JP61191946 A JP 61191946A JP 19194686 A JP19194686 A JP 19194686A JP H0441487 B2 JPH0441487 B2 JP H0441487B2
Authority
JP
Japan
Prior art keywords
soft
film
ray
pattern
resin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61191946A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62155518A (ja
Inventor
Juji Kikuchi
Akira Kaneki
Norihiko Tsukui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP52154430A external-priority patent/JPS6045419B2/ja
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP61191946A priority Critical patent/JPS62155518A/ja
Publication of JPS62155518A publication Critical patent/JPS62155518A/ja
Publication of JPH0441487B2 publication Critical patent/JPH0441487B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP61191946A 1977-12-23 1986-08-15 軟ｘ線リソグラフイ−用マスク Granted JPS62155518A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61191946A JPS62155518A (ja) 1977-12-23 1986-08-15 軟ｘ線リソグラフイ−用マスク

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP52154430A JPS6045419B2 (ja) 1977-12-23 1977-12-23 軟ｘ線リソグラフイ−用マスクおよびその製造法
JP61191946A JPS62155518A (ja) 1977-12-23 1986-08-15 軟ｘ線リソグラフイ−用マスク

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP52154430A Division JPS6045419B2 (ja) 1977-12-23 1977-12-23 軟ｘ線リソグラフイ−用マスクおよびその製造法

Publications (2)

Publication Number Publication Date
JPS62155518A JPS62155518A (ja) 1987-07-10
JPH0441487B2 true JPH0441487B2 (en, 2012) 1992-07-08

Family

ID=26482710

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61191946A Granted JPS62155518A (ja) 1977-12-23 1986-08-15 軟ｘ線リソグラフイ−用マスク

Country Status (1)

Country Link
JP (1) JPS62155518A (en, 2012)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7389619B2 (ja) * 2019-11-11 2023-11-30 住重アテックス株式会社 マスクホルダ、固定装置、イオン照射方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4979176A (en, 2012) * 1972-12-04 1974-07-31
DE2346719C3 (de) * 1973-09-17 1980-01-24 Siemens Ag, 1000 Berlin Und 8000 Muenchen Mehrschichtige Bestrahlungsmaske für die Röntgenstrahl-Fotolithografie
JPS5279069U (en, 2012) * 1975-12-09 1977-06-13
JPS52139375A (en) * 1976-05-18 1977-11-21 Toshiba Corp Mask for x-ray exposure

Also Published As

Publication number Publication date
JPS62155518A (ja) 1987-07-10

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