JPH043863B2 - - Google Patents

Info

Publication number
JPH043863B2
JPH043863B2 JP59046873A JP4687384A JPH043863B2 JP H043863 B2 JPH043863 B2 JP H043863B2 JP 59046873 A JP59046873 A JP 59046873A JP 4687384 A JP4687384 A JP 4687384A JP H043863 B2 JPH043863 B2 JP H043863B2
Authority
JP
Japan
Prior art keywords
silicone rubber
rubber layer
photosensitive
dampening water
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59046873A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60191262A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP59046873A priority Critical patent/JPS60191262A/ja
Priority to CA000476245A priority patent/CA1238879A/en
Priority to DE8585102839T priority patent/DE3578586D1/de
Priority to EP85102839A priority patent/EP0154981B1/en
Priority to US06/710,892 priority patent/US4590148A/en
Publication of JPS60191262A publication Critical patent/JPS60191262A/ja
Publication of JPH043863B2 publication Critical patent/JPH043863B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/138—Corona discharge process
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/151—Matting or other surface reflectivity altering material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/162—Protective or antiabrasion layer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
JP59046873A 1984-03-12 1984-03-12 湿し水不要感光性平版印刷版の製造法 Granted JPS60191262A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP59046873A JPS60191262A (ja) 1984-03-12 1984-03-12 湿し水不要感光性平版印刷版の製造法
CA000476245A CA1238879A (en) 1984-03-12 1985-03-11 Process for producing light sensitive lithographic plate requiring no dampening solution
DE8585102839T DE3578586D1 (de) 1984-03-12 1985-03-12 Verfahren zur herstellung einer lichtempfindlichen trockenflachdruckplatte.
EP85102839A EP0154981B1 (en) 1984-03-12 1985-03-12 Process for producing light-sensitive lithographic plate requiring no dampening solution
US06/710,892 US4590148A (en) 1984-03-12 1985-03-12 Process for producing light sensitive lithographic plate requiring no dampening solution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59046873A JPS60191262A (ja) 1984-03-12 1984-03-12 湿し水不要感光性平版印刷版の製造法

Publications (2)

Publication Number Publication Date
JPS60191262A JPS60191262A (ja) 1985-09-28
JPH043863B2 true JPH043863B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-01-24

Family

ID=12759462

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59046873A Granted JPS60191262A (ja) 1984-03-12 1984-03-12 湿し水不要感光性平版印刷版の製造法

Country Status (5)

Country Link
US (1) US4590148A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
EP (1) EP0154981B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS60191262A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CA (1) CA1238879A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3578586D1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61153655A (ja) * 1984-12-27 1986-07-12 Fuji Photo Film Co Ltd 湿し水不要感光性平版印刷版
US4769308A (en) * 1985-11-11 1988-09-06 Fuji Photo Film Co., Ltd. Dry presensitized plate with photosensitive layer containing organotin
US4741992A (en) * 1986-09-22 1988-05-03 Eastman Kodak Company Thermally processable element comprising an overcoat layer containing poly(silicic acid)
JPS63133153A (ja) * 1986-11-26 1988-06-04 Fuji Photo Film Co Ltd 湿し水不要感光性平版印刷版
JP2577604B2 (ja) * 1988-04-08 1997-02-05 コニカ株式会社 湿し水不要平版印刷版材料
JPH03160453A (ja) * 1989-11-17 1991-07-10 Konica Corp 湿し水不要平版印刷版材料及びその製造方法
JPH067278U (ja) * 1991-03-13 1994-01-28 ティアック株式会社 防塵構造の電気機器
US5672460A (en) * 1994-06-10 1997-09-30 Nippon Hoso Kyokai Method for forming conductive or insulating layers
JP4361651B2 (ja) * 1999-11-08 2009-11-11 コダックグラフィックコミュニケーションズ株式会社 感光性印刷版およびその製造方法
WO2006062348A1 (en) * 2004-12-09 2006-06-15 Kolon Industries, Inc Positive type dry film photoresist and composition for preparing the same

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5426923B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1972-03-21 1979-09-06
DE2308711C2 (de) * 1973-02-22 1983-08-04 Felix Schoeller jr. GmbH & Co KG, 4500 Osnabrück Verfahren zur Herstellung eines polyolefinbeschichteten fotografischen Schriftträgers mit einer kristallinen Schicht
JPS5353403A (en) * 1976-10-22 1978-05-15 Asahi Chemical Ind Original form for press plate and method of producing waterrfree lithographic press plate adopting same
JPS5818914B2 (ja) * 1978-05-04 1983-04-15 神鋼電機株式会社 切符等の表・裏両面印刷装置
GB2034911B (en) * 1978-10-26 1983-02-09 Toray Industries Dry planographic printing plate
JPS55101951A (en) * 1979-01-30 1980-08-04 Konishiroku Photo Ind Co Ltd Manufacture of photosensitive printing plate
US4292389A (en) * 1979-01-31 1981-09-29 Konishiroku Photo Industry Co., Ltd. Process for preparing photosensitive plates for printing
JPS5627150A (en) * 1979-08-13 1981-03-16 Toray Ind Inc Damping water nonrequiring lithographic original plate and its preparation
JPS56130752A (en) * 1980-03-17 1981-10-13 Dainippon Printing Co Ltd Printing plate for lithographic printing and its manufacture
US4292397A (en) * 1980-04-17 1981-09-29 Dai Nippon Printing Co., Ltd. Method for preparing dry planographic plates with plasma
JPS58186746A (ja) * 1982-04-26 1983-10-31 Toray Ind Inc 湿し水不要平版材の製造方法

Also Published As

Publication number Publication date
DE3578586D1 (de) 1990-08-16
US4590148A (en) 1986-05-20
CA1238879A (en) 1988-07-05
JPS60191262A (ja) 1985-09-28
EP0154981B1 (en) 1990-07-11
EP0154981A2 (en) 1985-09-18
EP0154981A3 (en) 1987-06-16

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees