JPH043624Y2 - - Google Patents
Info
- Publication number
- JPH043624Y2 JPH043624Y2 JP1986061432U JP6143286U JPH043624Y2 JP H043624 Y2 JPH043624 Y2 JP H043624Y2 JP 1986061432 U JP1986061432 U JP 1986061432U JP 6143286 U JP6143286 U JP 6143286U JP H043624 Y2 JPH043624 Y2 JP H043624Y2
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- air supply
- processing
- natural air
- automatic opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000012545 processing Methods 0.000 claims description 23
- 239000007788 liquid Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000001035 drying Methods 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 238000007664 blowing Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- ing And Chemical Polishing (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986061432U JPH043624Y2 (US08088918-20120103-C00476.png) | 1986-04-23 | 1986-04-23 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986061432U JPH043624Y2 (US08088918-20120103-C00476.png) | 1986-04-23 | 1986-04-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62174635U JPS62174635U (US08088918-20120103-C00476.png) | 1987-11-06 |
| JPH043624Y2 true JPH043624Y2 (US08088918-20120103-C00476.png) | 1992-02-04 |
Family
ID=30894765
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986061432U Expired JPH043624Y2 (US08088918-20120103-C00476.png) | 1986-04-23 | 1986-04-23 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH043624Y2 (US08088918-20120103-C00476.png) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2740805B2 (ja) * | 1988-11-30 | 1998-04-15 | 東京エレクトロン株式会社 | レジスト塗布装置 |
| JP2753492B2 (ja) * | 1988-12-12 | 1998-05-20 | 東京エレクトロン株式会社 | 現像装置 |
| JP5318010B2 (ja) * | 2010-03-26 | 2013-10-16 | 大日本スクリーン製造株式会社 | 基板処理装置 |
| US9698029B2 (en) * | 2014-02-19 | 2017-07-04 | Lam Research Ag | Method and apparatus for processing wafer-shaped articles |
| JP6289341B2 (ja) * | 2014-10-31 | 2018-03-07 | 東京エレクトロン株式会社 | 基板液処理装置、排気切替ユニットおよび基板液処理方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59217329A (ja) * | 1983-05-25 | 1984-12-07 | Hitachi Ltd | スピンナ装置 |
| JPS6173334A (ja) * | 1984-09-19 | 1986-04-15 | Hitachi Ltd | 処理装置 |
-
1986
- 1986-04-23 JP JP1986061432U patent/JPH043624Y2/ja not_active Expired
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59217329A (ja) * | 1983-05-25 | 1984-12-07 | Hitachi Ltd | スピンナ装置 |
| JPS6173334A (ja) * | 1984-09-19 | 1986-04-15 | Hitachi Ltd | 処理装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62174635U (US08088918-20120103-C00476.png) | 1987-11-06 |
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