JPH043499Y2 - - Google Patents

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Publication number
JPH043499Y2
JPH043499Y2 JP7415486U JP7415486U JPH043499Y2 JP H043499 Y2 JPH043499 Y2 JP H043499Y2 JP 7415486 U JP7415486 U JP 7415486U JP 7415486 U JP7415486 U JP 7415486U JP H043499 Y2 JPH043499 Y2 JP H043499Y2
Authority
JP
Japan
Prior art keywords
glass
semiconductor element
lid
glass layer
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7415486U
Other languages
Japanese (ja)
Other versions
JPS62186433U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP7415486U priority Critical patent/JPH043499Y2/ja
Publication of JPS62186433U publication Critical patent/JPS62186433U/ja
Application granted granted Critical
Publication of JPH043499Y2 publication Critical patent/JPH043499Y2/ja
Expired legal-status Critical Current

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  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)

Description

【考案の詳細な説明】 〔産業上の利用分野〕 本考案は半導体集積回路素子を収納する半導体
パツケージに関し、特にガラス溶着によつてパツ
ケージの封止を行うガラス封止形半導体パツケー
ジの改良に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a semiconductor package that houses a semiconductor integrated circuit element, and particularly relates to an improvement in a glass-sealed semiconductor package in which the package is sealed by glass welding.

〔従来の技術〕[Conventional technology]

従来、半導体素子、特に半導体集積回路素子を
収納するためのパツケージは内部に半導体素子を
収納するための空所を有する絶縁基体と蓋体とか
ら成る絶縁容器と、該容器内に収納される半導体
素子を外部回路に電気的に接続するための外部リ
ード端子とにより構成されており、基体および蓋
体の相対向する主面にあらかじめ封止用のガラス
層を被着形成するとともに基体主面に外部リード
端子を固定し、半導体素子の各電極と外部リード
端子とをワイヤボンドした後、それぞれのガラス
層を溶融一体化させることによつて内部に半導体
素子を気密に封止している。
Conventionally, a package for accommodating semiconductor devices, particularly semiconductor integrated circuit devices, includes an insulating container consisting of an insulating base and a lid body having a cavity for accommodating the semiconductor device therein, and a semiconductor to be accommodated in the container. It consists of an external lead terminal for electrically connecting the element to an external circuit, and a glass layer for sealing is formed in advance on the opposing main surfaces of the base and lid. After fixing the external lead terminals and wire-bonding each electrode of the semiconductor element to the external lead terminals, the respective glass layers are melted and integrated, thereby airtightly sealing the semiconductor element inside.

〔考案が解決しようとする問題点〕[Problem that the invention attempts to solve]

しかし乍ら、この従来のガラス封止形半導体パ
ツケージは絶縁基体及び蓋体の相対向する主面に
被着されたそれぞれのガラス層が、通常低融点の
ガラス粉末に適当な溶剤を添加混合して得たガラ
スペーストをスクリーン印刷等の厚膜手法によつ
て塗布するとともに溶剤を加熱飛散させることに
より形成しており、その表面粗さがRmax50〜
70μmと極めて粗い。そのためこのガラス層はそ
の表面に大気中に含まれる水分等が付着し易く、
該付着した水分等は絶縁容器を封止した際、容器
内部に入り込み、内部に収納する半導体素子に作
用して半導体素子の特性に劣化やバラツキを発生
させるという欠点を有していた。
However, in this conventional glass-sealed semiconductor package, each glass layer attached to the opposing main surfaces of the insulating base and the lid is usually made by adding and mixing a suitable solvent to a low-melting-point glass powder. It is formed by applying the obtained glass paste using a thick film method such as screen printing and heating and scattering the solvent, and the surface roughness is Rmax50 ~
Extremely rough at 70μm. Therefore, moisture contained in the atmosphere easily adheres to the surface of this glass layer.
When the insulating container is sealed, the attached moisture and the like enter the inside of the container and act on the semiconductor elements housed inside, resulting in deterioration and variation in the characteristics of the semiconductor elements.

また前記ガラス層は表面が粗く凸凹があること
から組立工程等において外力が印加された場合、
該外力は凸部に集中してガラス層の一部に欠落を
発生させてしまい、その結果、絶縁容器の気密が
ガラスの量不足によつて不良となつたり、欠落し
たガラスが内部に収納する半導体素子に衝突し、
半導体素子の特性に劣化やバラツキを発生させて
しまうという欠点も有していた。
Furthermore, since the surface of the glass layer is rough and uneven, when external force is applied during the assembly process, etc.
The external force concentrates on the convex part and causes a part of the glass layer to break off, resulting in the insulating container becoming airtight due to insufficient glass, or the missing glass being stored inside. collides with a semiconductor element,
It also has the disadvantage of causing deterioration and variation in the characteristics of semiconductor elements.

〔考案の目的〕[Purpose of invention]

本考案は上記欠点に鑑み案出されたもので、そ
の目的は封止用ガラスの水分等の付着及び封止用
ガラスの外力印加による欠落の発生を有効に防止
し、内部に収納される半導体素子の気密封止を完
全として半導体素子を長期間にわたり、正常に、
かつ安定に作動させることができるガラス封止形
半導体パツケージを提供することにある。
The present invention was devised in view of the above-mentioned drawbacks, and its purpose is to effectively prevent the adhesion of moisture etc. to the sealing glass and the occurrence of chipping due to the application of external force to the sealing glass, and to prevent the semiconductors housed inside. The device is completely hermetically sealed to ensure that the semiconductor device operates normally for a long period of time.
Another object of the present invention is to provide a glass-sealed semiconductor package that can be stably operated.

〔問題点を解決するための手段〕[Means for solving problems]

本考案は、相対向する主面にガラス層を被着さ
せた絶縁基体と蓋体とで外部リード端子を挟持
し、前記ガラス層を溶融一体化することにより半
導体素子を内部に気密封止するガラス封止形半導
体パツケージにおいて、前記絶縁基体及び蓋体の
主面に被着させたガラス層の表面粗さを
Rmax5.0μm以下としたことを特徴とするもので
ある。
In the present invention, an external lead terminal is sandwiched between an insulating base and a lid whose main surfaces facing each other are coated with a glass layer, and the semiconductor element is hermetically sealed inside by melting and integrating the glass layer. In the glass-sealed semiconductor package, the surface roughness of the glass layer deposited on the main surfaces of the insulating base and the lid is
It is characterized by an Rmax of 5.0 μm or less.

〔実施例〕〔Example〕

次に本考案を添付図面に基づき詳細に説明す
る。
Next, the present invention will be explained in detail based on the accompanying drawings.

第1図及び第2図は本考案のガラス封止型半導
体パツケージの一実施例を示し、1はセラミツ
ク、ガラス等の電気絶縁材料から成るパツケージ
基体、2は同じく電気絶縁材料から成る蓋体であ
る。この絶縁基体1と蓋体2とにより絶縁容器3
が構成される。
1 and 2 show an embodiment of the glass-sealed semiconductor package of the present invention, in which 1 is a package base made of an electrically insulating material such as ceramic or glass, and 2 is a lid body also made of an electrically insulating material. be. An insulating container 3 is formed by this insulating base 1 and lid 2.
is configured.

前記絶縁基体1及び蓋体2にはそれぞれの中央
部に半導体素子を収納するための凹部が形成して
あり該基体1の凹部底面には半導体素子4が樹
脂、ガラス、ロウ材等の接着材を介して取着固定
される。前記基体1及び蓋体2には、その相対向
する主面に封止用のガラス層6a,6bがそれぞ
れ被着されており、該ガラス層6a,6bを加熱
溶融させ一体化させることにより絶縁容器3内の
半導体素子4を気密に封止する。
The insulating base body 1 and the lid body 2 each have a recess formed in the center thereof to accommodate a semiconductor element, and the semiconductor element 4 is placed on the bottom surface of the recess of the base body 1 with an adhesive such as resin, glass, or brazing material. It is attached and fixed through. Glass layers 6a and 6b for sealing are respectively adhered to the opposing main surfaces of the base body 1 and the lid body 2, and insulation is achieved by heating and melting the glass layers 6a and 6b to integrate them. The semiconductor element 4 inside the container 3 is hermetically sealed.

前記ガラス層6a,6bは例えば低融点のガラ
スから成り、該ガラス粉末に適当な溶剤を添加し
て得たガラスペーストを従来周知の厚膜手法を採
用することにより基体1及び蓋体2の相対向する
主面に形成される。
The glass layers 6a and 6b are made of, for example, low melting point glass, and a glass paste obtained by adding a suitable solvent to the glass powder is applied to the substrate 1 and the lid 2 by employing a conventionally well-known thick film method. It is formed on the main surface facing the opposite direction.

また、前記ガラス層6a,6bは絶縁基体1と
蓋体2の相対向する主面にガラスペーストを塗布
した後、約470℃の温度で焼成され、ガラスを一
旦溶融させることによつて表面の凸凹が取り除か
れており、表面粗さがRmax5.0μm以下となつて
いる。
Further, the glass layers 6a and 6b are formed by applying glass paste to the opposing main surfaces of the insulating base 1 and the lid 2, and then firing at a temperature of about 470°C to temporarily melt the glass, thereby changing the surface area. Unevenness has been removed, and the surface roughness is Rmax5.0μm or less.

この絶縁基体1と蓋体2の相対向する主面に被
着されたガラス層6a,6bはその表面粗さが
Rmax5.0μm以下であり、鏡面をなしていること
から大気中に含まれる水分等は極めて付着しにく
く、ガラス層6a,6bに付着した水分等が絶縁
容器3の封止の際に容器3内に入り込み、内部に
収納する半導体素子4に作用して半導体素子4の
特性にバラツキや劣化を発生させてしまうという
ことが有効に防止される。また前記ガラス層6
a,6bはその表面がRmax5.0μm以下の鏡面で
あることから、組立工程等において外力が印加さ
れたとしても該外力は一点に集中することなく全
体に分散され、ガラス層6a,6bの一部に欠落
を発生することもない。
The glass layers 6a and 6b attached to the opposing main surfaces of the insulating base 1 and the lid 2 have a rough surface.
Rmax is 5.0μm or less, and because it has a mirror surface, moisture contained in the atmosphere is extremely difficult to adhere to. This effectively prevents the particles from entering the semiconductor element 4 and acting on the semiconductor element 4 housed therein, thereby causing variations and deterioration in the characteristics of the semiconductor element 4. Further, the glass layer 6
Since the surfaces of glass layers a and 6b are mirror surfaces with an Rmax of 5.0 μm or less, even if an external force is applied during the assembly process, the external force is not concentrated at one point but is dispersed throughout the glass layers 6a and 6b. There are no gaps in the parts.

そのためこれによつてガラスの量不足による絶
縁容器3の気密不良や欠落したガラスが半導体素
子4に衝突し、半導体素子4の特性が劣化したり
バラツキを発生したりすることも有効に防止され
る。
Therefore, this effectively prevents poor airtightness of the insulating container 3 due to insufficient amount of glass, and collision of chipped glass with the semiconductor element 4, resulting in deterioration and variation in the characteristics of the semiconductor element 4. .

前記絶縁基体1と蓋体2との間には導電性材
料、例えばアルミニウム(Al)、銅(Cu)、コバ
ール(Fe−Ni−Co)等の金属から成る外部リー
ド端子5が配されており、該外部リード端子5は
半導体素子4の各電極7がワイヤ5aを介し電気
的に接続され、外部リード端子5を外部回路に接
続することにより半導体素子4が外部回路と接続
されることになる。
An external lead terminal 5 made of a conductive material such as metal such as aluminum (Al), copper (Cu), Kovar (Fe-Ni-Co), etc. is arranged between the insulating base 1 and the lid 2. , the external lead terminals 5 are electrically connected to each electrode 7 of the semiconductor element 4 via a wire 5a, and by connecting the external lead terminals 5 to an external circuit, the semiconductor element 4 is connected to the external circuit. .

前記外部リード端子5は、絶縁容器3をガラス
層6a,6bを溶融一体化させて気密封止する際
に同時に基体1と蓋体2の間に取着される。
The external lead terminal 5 is attached between the base body 1 and the lid body 2 at the same time when the insulating container 3 is hermetically sealed by melting and integrating the glass layers 6a and 6b.

かくして、この半導体パツケージによれば、基
体1の凹部底面に半導体素子4を取着固定すると
ともに該半導体素子4の各電極7をワイヤ5aに
より外部リード端子5に接続させた後、基体1と
蓋体2にあらかじめ被着させておいたガラス層6
a,6bを加熱溶融させ、一体化させることによ
りその内部に半導体素子4を気密に封止する。
Thus, according to this semiconductor package, after the semiconductor element 4 is attached and fixed to the bottom of the recess of the base 1 and each electrode 7 of the semiconductor element 4 is connected to the external lead terminal 5 by the wire 5a, the base 1 and the lid are connected. Glass layer 6 previously applied to body 2
By heating and melting a and 6b and integrating them, the semiconductor element 4 is hermetically sealed therein.

〔考案の効果〕[Effect of idea]

本考案のガラス封止形半導体パツケージによれ
ば、絶縁基体及び蓋体の相対向する主面に被着さ
れたガラス層の表面粗さをRmax5.0μm以下とし
たことから大気中に含まれる水分等のガラス層表
面への付着を極小となすことができ、該水分等の
半導体素子への作用を皆無として半導体素子を長
期間にわたり正常、かつ安定に作動させることが
できる。
According to the glass-sealed semiconductor package of the present invention, since the surface roughness of the glass layer adhered to the opposing main surfaces of the insulating base and the lid is set to Rmax5.0 μm or less, moisture contained in the atmosphere can be reduced. The adhesion of moisture and the like to the surface of the glass layer can be minimized, and the semiconductor element can be operated normally and stably for a long period of time without any effect of the moisture or the like on the semiconductor element.

また組立工程等においてガラス層に外力が印加
されても該外力はガラス層の表面がRmax5.0μm
以下の鏡面であることから一点に集中することな
く全体に分散されて小となり、ガラス層の一部が
欠落することは皆無となる。そのため、これによ
りガラスの量不足による絶縁容器の気密不良及び
欠落したガラスの半導体素子への衝突による半導
体素子の特性劣化も有効に防止することが可能と
なる。
In addition, even if an external force is applied to the glass layer during the assembly process, etc., the external force will cause the surface of the glass layer to have an Rmax of 5.0 μm.
Since it is a mirror surface, it is not concentrated in one point but is dispersed throughout and becomes small, and there is no possibility that a part of the glass layer will be missing. Therefore, it is thereby possible to effectively prevent poor airtightness of the insulating container due to insufficient amount of glass and deterioration of the characteristics of the semiconductor element due to collision of the chipped glass with the semiconductor element.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案のガラス封止形半導体パツケー
ジの一実施例を示す分解斜視図、第2図は第1図
のガラス封止形半導体パツケージの封止後の断面
図である。 1……絶縁基体、2……蓋体、4……半導体素
子、5……外部リード端子、6a,6b……ガラ
ス層、7……電極。
FIG. 1 is an exploded perspective view showing an embodiment of the glass-sealed semiconductor package of the present invention, and FIG. 2 is a sectional view of the glass-sealed semiconductor package of FIG. 1 after being sealed. DESCRIPTION OF SYMBOLS 1... Insulating base, 2... Lid, 4... Semiconductor element, 5... External lead terminal, 6a, 6b... Glass layer, 7... Electrode.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 相対向する主面にガラス層を被着させた絶縁基
体と蓋体とで外部リード端子を挟持し、前記ガラ
ス層を溶融一体化することにより半導体素子を内
部に気密封止するガラス封止形半導体パツケージ
において、前記絶縁基体及び蓋体の主面に被着さ
せたガラス層の表面粗さをRmax5.0μm以下とし
たことを特徴とするガラス封止形半導体パツケー
ジ。
A glass-sealed type in which an external lead terminal is sandwiched between an insulating base and a lid whose main surfaces that face each other are covered with a glass layer, and the semiconductor element is hermetically sealed inside by melting and integrating the glass layer. 1. A glass-sealed semiconductor package, characterized in that the surface roughness of the glass layer deposited on the main surfaces of the insulating base and the lid is Rmax5.0 μm or less.
JP7415486U 1986-05-16 1986-05-16 Expired JPH043499Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7415486U JPH043499Y2 (en) 1986-05-16 1986-05-16

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7415486U JPH043499Y2 (en) 1986-05-16 1986-05-16

Publications (2)

Publication Number Publication Date
JPS62186433U JPS62186433U (en) 1987-11-27
JPH043499Y2 true JPH043499Y2 (en) 1992-02-04

Family

ID=30919115

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7415486U Expired JPH043499Y2 (en) 1986-05-16 1986-05-16

Country Status (1)

Country Link
JP (1) JPH043499Y2 (en)

Also Published As

Publication number Publication date
JPS62186433U (en) 1987-11-27

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