JPH04333600A - ニッケルイオン蓄積が減少されたニッケル電気メッキ処理 - Google Patents
ニッケルイオン蓄積が減少されたニッケル電気メッキ処理Info
- Publication number
- JPH04333600A JPH04333600A JP3301226A JP30122691A JPH04333600A JP H04333600 A JPH04333600 A JP H04333600A JP 3301226 A JP3301226 A JP 3301226A JP 30122691 A JP30122691 A JP 30122691A JP H04333600 A JPH04333600 A JP H04333600A
- Authority
- JP
- Japan
- Prior art keywords
- anode
- nickel
- current
- bath
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 112
- 229910052759 nickel Inorganic materials 0.000 title claims abstract description 53
- 238000009713 electroplating Methods 0.000 title claims abstract description 35
- 229910001453 nickel ion Inorganic materials 0.000 title claims abstract description 22
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 33
- 239000000758 substrate Substances 0.000 claims abstract description 23
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical group [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 claims abstract description 19
- 238000009825 accumulation Methods 0.000 claims abstract description 18
- 229910052742 iron Inorganic materials 0.000 claims abstract description 14
- 230000005611 electricity Effects 0.000 claims abstract 3
- 238000007747 plating Methods 0.000 claims description 45
- 238000000034 method Methods 0.000 claims description 35
- 239000003792 electrolyte Substances 0.000 claims description 13
- 239000000203 mixture Substances 0.000 claims description 10
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims description 9
- 229910000480 nickel oxide Inorganic materials 0.000 claims description 5
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 claims description 5
- VBMVTYDPPZVILR-UHFFFAOYSA-N iron(2+);oxygen(2-) Chemical class [O-2].[Fe+2] VBMVTYDPPZVILR-UHFFFAOYSA-N 0.000 claims description 3
- 235000013980 iron oxide Nutrition 0.000 claims 4
- 230000008021 deposition Effects 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 3
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 229910000859 α-Fe Inorganic materials 0.000 description 15
- UGKDIUIOSMUOAW-UHFFFAOYSA-N iron nickel Chemical compound [Fe].[Ni] UGKDIUIOSMUOAW-UHFFFAOYSA-N 0.000 description 14
- 229910052751 metal Inorganic materials 0.000 description 14
- 239000002184 metal Substances 0.000 description 14
- 239000000243 solution Substances 0.000 description 13
- 238000012360 testing method Methods 0.000 description 13
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 6
- 239000000654 additive Substances 0.000 description 6
- 239000000460 chlorine Substances 0.000 description 6
- 229910052801 chlorine Inorganic materials 0.000 description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 4
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 230000004580 weight loss Effects 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000000536 complexating effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910001430 chromium ion Inorganic materials 0.000 description 1
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 239000007857 degradation product Substances 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000003306 harvesting Methods 0.000 description 1
- -1 iron ions Chemical class 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 239000006259 organic additive Substances 0.000 description 1
- UUWCBFKLGFQDME-UHFFFAOYSA-N platinum titanium Chemical compound [Ti].[Pt] UUWCBFKLGFQDME-UHFFFAOYSA-N 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000001223 reverse osmosis Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Electrolytic Production Of Metals (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US60886990A | 1990-10-22 | 1990-10-22 | |
| US07/608,869 | 1990-10-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04333600A true JPH04333600A (ja) | 1992-11-20 |
Family
ID=24438391
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3301226A Pending JPH04333600A (ja) | 1990-10-22 | 1991-10-22 | ニッケルイオン蓄積が減少されたニッケル電気メッキ処理 |
Country Status (8)
| Country | Link |
|---|---|
| JP (1) | JPH04333600A (de) |
| CA (1) | CA2053342A1 (de) |
| DE (1) | DE4134656C2 (de) |
| ES (1) | ES2034897B1 (de) |
| FR (1) | FR2668173A1 (de) |
| GB (1) | GB2249107A (de) |
| IT (1) | IT1249854B (de) |
| SE (1) | SE9103061L (de) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4229917C1 (en) * | 1992-09-08 | 1993-07-15 | Lpw-Anlagen Gmbh, 4040 Neuss, De | Electrolytic bath for meter coating - has sec. anode contg. alkaline or ammonium soln. with acid added to electrolyte to compensate for pH rise |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4943876A (de) * | 1972-09-01 | 1974-04-25 | ||
| JPS558493A (en) * | 1978-07-05 | 1980-01-22 | Mazda Motor Corp | Nickel recovery system of nickel plating apparatus |
| JPS56112500A (en) * | 1980-02-09 | 1981-09-04 | Ebara Yuujiraito Kk | Method for electroplating |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2393516A (en) * | 1943-08-19 | 1946-01-22 | Indiana Steel & Wire Company | Process for electroplating |
| US2504238A (en) * | 1945-07-13 | 1950-04-18 | Int Nickel Co | Anode assembly |
| BE564995A (de) * | 1957-02-20 | |||
| DE1250712B (de) * | 1963-05-22 | 1967-09-21 | International Nickel Limited, London | Galvanisches Nickelsulfamatbad und Verfahren zum Abscheiden von Nickeluberzugen |
| US3374154A (en) * | 1965-07-12 | 1968-03-19 | Int Nickel Co | Electroforming and electrodeposition of stress-free nickel from the sulfamate bath |
| US3474011A (en) * | 1967-08-03 | 1969-10-21 | American Bank Note Co | Electroplating method and apparatus |
| US4466865A (en) * | 1982-01-11 | 1984-08-21 | Omi International Corporation | Trivalent chromium electroplating process |
| US4469569A (en) * | 1983-01-03 | 1984-09-04 | Omi International Corporation | Cyanide-free copper plating process |
| DE3347593A1 (de) * | 1983-01-03 | 1984-07-05 | Omi International Corp., Warren, Mich. | Waessriger alkalischer cyanidfreier kupferelektrolyt und verfahren zur galvanischen abscheidung einer kornverfeinerten duktilen und haftfesten kupferschicht auf einem leitfaehigen substrat |
| JPS63317698A (ja) * | 1987-06-20 | 1988-12-26 | Toyota Motor Corp | 電気めっき液の金属イオン濃度と水素イオン濃度の制御装置 |
| US4778572A (en) * | 1987-09-08 | 1988-10-18 | Eco-Tec Limited | Process for electroplating metals |
| US4933051A (en) * | 1989-07-24 | 1990-06-12 | Omi International Corporation | Cyanide-free copper plating process |
-
1991
- 1991-10-11 CA CA002053342A patent/CA2053342A1/en not_active Abandoned
- 1991-10-18 FR FR9112923A patent/FR2668173A1/fr active Pending
- 1991-10-18 IT ITTO910789A patent/IT1249854B/it active IP Right Grant
- 1991-10-18 ES ES9102320A patent/ES2034897B1/es not_active Expired - Lifetime
- 1991-10-19 DE DE4134656A patent/DE4134656C2/de not_active Expired - Fee Related
- 1991-10-21 SE SE9103061A patent/SE9103061L/ not_active Application Discontinuation
- 1991-10-22 GB GB9122383A patent/GB2249107A/en not_active Withdrawn
- 1991-10-22 JP JP3301226A patent/JPH04333600A/ja active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4943876A (de) * | 1972-09-01 | 1974-04-25 | ||
| JPS558493A (en) * | 1978-07-05 | 1980-01-22 | Mazda Motor Corp | Nickel recovery system of nickel plating apparatus |
| JPS56112500A (en) * | 1980-02-09 | 1981-09-04 | Ebara Yuujiraito Kk | Method for electroplating |
Also Published As
| Publication number | Publication date |
|---|---|
| ITTO910789A0 (it) | 1991-10-18 |
| ITTO910789A1 (it) | 1992-04-23 |
| DE4134656C2 (de) | 1994-02-03 |
| ES2034897A1 (es) | 1993-04-01 |
| SE9103061D0 (sv) | 1991-10-21 |
| DE4134656A1 (de) | 1992-04-23 |
| CA2053342A1 (en) | 1992-04-23 |
| IT1249854B (it) | 1995-03-28 |
| ES2034897B1 (es) | 1994-04-16 |
| GB9122383D0 (en) | 1991-12-04 |
| FR2668173A1 (fr) | 1992-04-24 |
| SE9103061L (sv) | 1992-04-23 |
| GB2249107A (en) | 1992-04-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| AU647402B2 (en) | Cyanide-free copper plating process | |
| JPH01159395A (ja) | 金属の電気メッキ方法 | |
| US5196109A (en) | Trivalent chromium electrolytes and plating processes employing same | |
| US2436316A (en) | Bright alloy plating | |
| US4389286A (en) | Alkaline plating baths and electroplating process | |
| US4462874A (en) | Cyanide-free copper plating process | |
| US4543167A (en) | Control of anode gas evolution in trivalent chromium plating bath | |
| JP2001172790A (ja) | 電気ニッケルめっき浴。 | |
| JPS6141999B2 (de) | ||
| US4466865A (en) | Trivalent chromium electroplating process | |
| JPH04333600A (ja) | ニッケルイオン蓄積が減少されたニッケル電気メッキ処理 | |
| GB2117406A (en) | Electrolytic stripping | |
| EP0088192B1 (de) | Überwachung von Anodengasentwicklung in einem dreiwertigen Chromplattierungsbad | |
| US4439285A (en) | Trivalent chromium electrolyte and process employing neodymium reducing agent | |
| Narasimhamurthy et al. | Electrodeposition of zinc-iron from an alkaline sulfate bath containing triethanolamine | |
| CA1225064A (en) | Cyanide-free copper plating process | |
| US4923573A (en) | Method for the electro-deposition of a zinc-nickel alloy coating on a steel band | |
| JP2013534277A (ja) | ニッケルのｐＨを調整する方法及び装置 | |
| JPH1060683A (ja) | 電気めっき三元系亜鉛合金とその方法 | |
| US3374154A (en) | Electroforming and electrodeposition of stress-free nickel from the sulfamate bath | |
| CA1244377A (en) | Cyanide-free copper plating process | |
| US2358995A (en) | Method of nickel plating using electrolytic nickel anodes | |
| JP4517177B2 (ja) | 無電解ニッケルめっき液の処理方法 | |
| Abd El Rehim et al. | Role of halides in the electroplating of tin from the alkaline-stannate bath | |
| Campbell et al. | Some uses of pyrophosphates in metal finishing part II. Cobalt-tungsten alloys to zinc, including pretreatment for magnesium |