JPH0431572B2 - - Google Patents

Info

Publication number
JPH0431572B2
JPH0431572B2 JP60210908A JP21090885A JPH0431572B2 JP H0431572 B2 JPH0431572 B2 JP H0431572B2 JP 60210908 A JP60210908 A JP 60210908A JP 21090885 A JP21090885 A JP 21090885A JP H0431572 B2 JPH0431572 B2 JP H0431572B2
Authority
JP
Japan
Prior art keywords
artwork
master
pattern
forming
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60210908A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61105889A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS61105889A publication Critical patent/JPS61105889A/ja
Publication of JPH0431572B2 publication Critical patent/JPH0431572B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/02—Sensitometric processes, e.g. determining sensitivity, colour sensitivity, gradation, graininess, density; Making sensitometric wedges
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/0286—Programmable, customizable or modifiable circuits
    • H05K1/0292—Programmable, customizable or modifiable circuits having a modifiable lay-out, i.e. adapted for engineering changes or repair
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0548—Masks
    • H05K2203/056—Using an artwork, i.e. a photomask for exposing photosensitive layers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/15—Position of the PCB during processing
    • H05K2203/1572—Processing both sides of a PCB by the same process; Providing a similar arrangement of components on both sides; Making interlayer connections from two sides
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/108—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by semi-additive methods; masks therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
JP60210908A 1984-09-24 1985-09-24 マスタ−・ア−トワ−クの分布密度の均等化方法 Granted JPS61105889A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US654335 1984-09-24
US06/654,335 US4627005A (en) 1984-09-24 1984-09-24 Equal density distribution process

Publications (2)

Publication Number Publication Date
JPS61105889A JPS61105889A (ja) 1986-05-23
JPH0431572B2 true JPH0431572B2 (enExample) 1992-05-26

Family

ID=24624440

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60210908A Granted JPS61105889A (ja) 1984-09-24 1985-09-24 マスタ−・ア−トワ−クの分布密度の均等化方法

Country Status (9)

Country Link
US (1) US4627005A (enExample)
EP (1) EP0176088B1 (enExample)
JP (1) JPS61105889A (enExample)
KR (1) KR900005307B1 (enExample)
AU (1) AU586640B2 (enExample)
CA (1) CA1232972A (enExample)
DE (1) DE3583475D1 (enExample)
FI (1) FI81690C (enExample)
YU (1) YU172985A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4584337A (en) * 1984-12-18 1986-04-22 Dow Corning Corporation Aqueous emulsions containing hydrophilic silicone-organic copolymers
US7146593B2 (en) * 2003-11-04 2006-12-05 Freescale Semiconductor, Inc. Method of implementing polishing uniformity and modifying layout data
EP3885961A1 (en) * 2020-03-26 2021-09-29 Elsyca N.V. Pcb metal balancing

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2414509C3 (de) * 1974-03-26 1979-02-01 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur Herstellung von Druckoriginalen für Leiterbahnanordnungen
AU2747784A (en) * 1979-05-24 1984-08-16 Eocom Corp. Laser image producing system
US4336320A (en) * 1981-03-12 1982-06-22 Honeywell Inc. Process for dielectric stenciled microcircuits
US4571072A (en) * 1983-09-30 1986-02-18 Honeywell Information Systems Inc. System and method for making changes to printed wiring boards

Also Published As

Publication number Publication date
US4627005A (en) 1986-12-02
CA1232972A (en) 1988-02-16
KR860002940A (ko) 1986-04-30
EP0176088A3 (en) 1987-03-18
FI81690C (fi) 1990-11-12
FI853637L (fi) 1986-03-25
YU172985A (en) 1989-02-28
AU586640B2 (en) 1989-07-20
KR900005307B1 (ko) 1990-07-27
AU4769585A (en) 1986-04-10
FI853637A0 (fi) 1985-09-23
FI81690B (fi) 1990-07-31
DE3583475D1 (de) 1991-08-22
JPS61105889A (ja) 1986-05-23
EP0176088B1 (en) 1991-07-17
EP0176088A2 (en) 1986-04-02

Similar Documents

Publication Publication Date Title
US4374911A (en) Photo method of making tri-level density photomask
US4897326A (en) Process to manufacture printed circuit boards
US3169063A (en) Method of making printed circuits
US4571072A (en) System and method for making changes to printed wiring boards
US3784380A (en) Method for manufacturing artwork for printed circuit boards
JPH0431572B2 (enExample)
WO2000073855A1 (en) Production device for printed board, production method for printed board and printed board
US3369293A (en) Method of manufacturing etched circuitry
US3782942A (en) Method for preparing artwork to be used in manufacturing of printed circuits
US3649273A (en) Printed circuit process and articles
US3508919A (en) Master artwork technique for producing printed wiring boards
CN85107672A (zh) 均匀分布密度的加工方法
US3607474A (en) Method of making an optical mask for reproducing circuit boards
US3829213A (en) Artproof method for semiconductor devices
US3775119A (en) Photomechanical method of producing grounded printed circuits
US3607585A (en) Printed circuit board artwork pad
JPH06503904A (ja) 印刷配線板のクローニング法
WO2006095892A1 (en) Image processing method, image processor, drawing system, and program
RU2079211C1 (ru) Способ изготовления печатных плат
US3573910A (en) Method of making reproduction art work layouts and printing plates for composite unit record cards
JPS6053308B2 (ja) 両面用フォトマスクの作成方法
US3775118A (en) Photomechanical method of producing grounded printed circuits
Brody Large Area Masking Techniques For Thin Film Transistor Arrays
JPH02304560A (ja) ハイブリッドｉｃの製造に用いるフィルムマスクの作成方法
US3756129A (en) Apparatus for fabricating a printed circuit board photomaster