JPH0430725U - - Google Patents
Info
- Publication number
- JPH0430725U JPH0430725U JP7183890U JP7183890U JPH0430725U JP H0430725 U JPH0430725 U JP H0430725U JP 7183890 U JP7183890 U JP 7183890U JP 7183890 U JP7183890 U JP 7183890U JP H0430725 U JPH0430725 U JP H0430725U
- Authority
- JP
- Japan
- Prior art keywords
- alignment
- matching
- layer
- matching pattern
- deviation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005259 measurement Methods 0.000 claims description 5
- 238000010586 diagram Methods 0.000 description 4
Description
第１図および第２図は本考案に係るアライメン
ト測定装置の一実施例を示す図であり、第１図は
アライメント測定パターンのマスクへの配置例を
示す図、第２図はアライメント測定パターンを示
す図、第３図は従来の合わせマークパターンを示
す図である。
１０……マスクパターン、２０……アライメン
ト測定パターン。
1 and 2 are diagrams showing one embodiment of the alignment measurement device according to the present invention, FIG. 1 is a diagram showing an example of arrangement of an alignment measurement pattern on a mask, and FIG. 2 is a diagram showing an example of arrangement of an alignment measurement pattern on a mask. The figure shown in FIG. 3 is a diagram showing a conventional alignment mark pattern. 10...mask pattern, 20... alignment measurement pattern.
Claims (1)
ント測定用合わせパターンおよび被合わせパター
ンを形成し、該合わせパターンと該被合わせパタ
ーンのずれによりマスク間のアライメントずれを
測定するアライメント測定装置において、 各層のマスクに全層の前記合わせパターンおよ
び被合わせパターンを所定の順序により並べて形
成して、各層間のアライメントずれを測定するよ
うに構成されたことを特徴とするアライメント測
定装置。[Claims for Utility Model Registration] Rectangular matching patterns and matching patterns for alignment measurement of different sizes are formed on the masks of each layer, and the alignment deviation between the masks is measured based on the deviation between the matching pattern and the matching pattern. An alignment measuring device, characterized in that the alignment measuring device is configured to form the matching pattern and the matching pattern of all layers in a predetermined order on a mask of each layer, and measure the alignment deviation between each layer. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990071838U JP2530950Y2 (en) | 1990-07-05 | 1990-07-05 | Substrate alignment pattern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990071838U JP2530950Y2 (en) | 1990-07-05 | 1990-07-05 | Substrate alignment pattern |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0430725U true JPH0430725U (en) | 1992-03-12 |
| JP2530950Y2 JP2530950Y2 (en) | 1997-04-02 |
Family
ID=31609231
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1990071838U Expired - Lifetime JP2530950Y2 (en) | 1990-07-05 | 1990-07-05 | Substrate alignment pattern |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2530950Y2 (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5382173A (en) * | 1976-12-27 | 1978-07-20 | Fujitsu Ltd | Positioning method |
-
1990
- 1990-07-05 JP JP1990071838U patent/JP2530950Y2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5382173A (en) * | 1976-12-27 | 1978-07-20 | Fujitsu Ltd | Positioning method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2530950Y2 (en) | 1997-04-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |