JPH0390428U - - Google Patents
Info
- Publication number
- JPH0390428U JPH0390428U JP15154689U JP15154689U JPH0390428U JP H0390428 U JPH0390428 U JP H0390428U JP 15154689 U JP15154689 U JP 15154689U JP 15154689 U JP15154689 U JP 15154689U JP H0390428 U JPH0390428 U JP H0390428U
- Authority
- JP
- Japan
- Prior art keywords
- alignment marks
- wafer
- exposure apparatus
- photomask
- distances
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Description
第１図は本考案の露光装置の一実施例に適用さ
れるオートアライメントマークの構成を示す平面
図、第２図は本考案の露光装置の一実施例におけ
る概略構成を示す斜視図である。第３図は従来の
オートアライメントマークの構成を示す平面図で
ある。
２……バツクプレート、４……フオトマスクと
、６……ウエハー、１０……ウエハー台、Ａ，Ｂ
，Ａａ，Ｂａ……オートアライメントマーク、１
，２，３，４，５，６，１，２，３，４，５，６
……マーク。
FIG. 1 is a plan view showing the structure of an auto-alignment mark applied to an embodiment of the exposure apparatus of the present invention, and FIG. 2 is a perspective view showing the schematic structure of an embodiment of the exposure apparatus of the present invention. FIG. 3 is a plan view showing the configuration of a conventional auto-alignment mark. 2...back plate, 4...photomask, 6...wafer, 10...wafer stand, A, B
, Aa, Ba...Auto alignment mark, 1
,2,3,4,5,6,1,2,3,4,5,6
……mark.
Claims (1)
される複数のアライメントマークにおいて、それ
ぞれ対応するアライメントマークの間隔が相違し
て形成されることを特徴とする露光装置。 An exposure apparatus characterized in that, in a plurality of alignment marks arranged at a distance on a photomask and a wafer, the distances between corresponding alignment marks are different from each other.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15154689U JPH0390428U (en) | 1989-12-28 | 1989-12-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15154689U JPH0390428U (en) | 1989-12-28 | 1989-12-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0390428U true JPH0390428U (en) | 1991-09-13 |
Family
ID=31697841
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15154689U Pending JPH0390428U (en) | 1989-12-28 | 1989-12-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0390428U (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6345818A (en) * | 1986-08-13 | 1988-02-26 | Nec Corp | Alignment method in semiconductor manufacturing system |
-
1989
- 1989-12-28 JP JP15154689U patent/JPH0390428U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6345818A (en) * | 1986-08-13 | 1988-02-26 | Nec Corp | Alignment method in semiconductor manufacturing system |