JPH0430726U - - Google Patents
Info
- Publication number
- JPH0430726U JPH0430726U JP7183990U JP7183990U JPH0430726U JP H0430726 U JPH0430726 U JP H0430726U JP 7183990 U JP7183990 U JP 7183990U JP 7183990 U JP7183990 U JP 7183990U JP H0430726 U JPH0430726 U JP H0430726U
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- alignment
- layer mask
- alignment measurement
- peripheral part
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005259 measurement Methods 0.000 claims description 7
- 230000002093 peripheral effect Effects 0.000 claims 2
- 238000010586 diagram Methods 0.000 description 6
- 238000000691 measurement method Methods 0.000 description 1
Description
第１図〜第４図は本考案に係るアライメント測
定装置の一実施例を示す図であり、第１図はアラ
イメント測定パターンを示す図、第２図および第
３図はアライメント測定方法を説明するための図
、第４図はアライメント測定パターンのマスクへ
の配置例を示す図、第５図は従来の合わせマーク
パターンを示す図、第６図は従来のアライメント
測定のためのバーニアを示す図である。
１０……アライメント測定パターン、１０ａ〜
１０ｄ……パターン、１１ａ〜１１ｄ……パター
ンの外周部、１２ａ〜１２ｄ……パターンの内周
部、１３，１４……正方形アライメントパターン
、２１……マスク。
1 to 4 are diagrams showing one embodiment of the alignment measuring device according to the present invention, FIG. 1 is a diagram showing an alignment measurement pattern, and FIGS. 2 and 3 are diagrams explaining an alignment measurement method. Figure 4 is a diagram showing an example of placement of an alignment measurement pattern on a mask, Figure 5 is a diagram showing a conventional alignment mark pattern, and Figure 6 is a diagram showing a conventional vernier for alignment measurement. be. 10... Alignment measurement pattern, 10a~
10d... Pattern, 11a-11d... Outer periphery of pattern, 12a-12d... Inner periphery of pattern, 13, 14... Square alignment pattern, 21... Mask.
Claims (1)
によりマスク間のアライメントずれを測定するア
ライメント測定装置において、 第１層マスクに各層マスクに対応するアライメ
ント測定パターンを設け、 該アライメント測定パターンは、矩形の外周部
とその同心上に内包される矩形の内周部とからな
るパターンが複数個並べて形成されたものであつ
て、該パターンの外周部はそれぞれ同一の大きさ
に形成されるとともに、前記内周部は同一の大き
さに形成された外周部よりアライメント精度に対
応する所定の大きさだけ各パターン毎に規則性を
もつて小さく形成されていることを特徴とするア
ライメント測定装置。[Claims for Utility Model Registration] In an alignment measurement device that forms a pattern on each layer mask and measures alignment deviation between the masks using the pattern, an alignment measurement pattern corresponding to each layer mask is provided on the first layer mask; The alignment measurement pattern is formed by arranging a plurality of patterns consisting of a rectangular outer periphery and a rectangular inner periphery contained concentrically with each other, and the outer peripheries of the patterns are each of the same size. At the same time, the inner peripheral part is formed to be smaller with regularity for each pattern by a predetermined size corresponding to alignment accuracy than the outer peripheral part which is formed to the same size. Alignment measuring device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7183990U JP2513540Y2 (en) | 1990-07-05 | 1990-07-05 | Alignment measuring device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7183990U JP2513540Y2 (en) | 1990-07-05 | 1990-07-05 | Alignment measuring device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0430726U true JPH0430726U (en) | 1992-03-12 |
| JP2513540Y2 JP2513540Y2 (en) | 1996-10-09 |
Family
ID=31609233
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7183990U Expired - Fee Related JP2513540Y2 (en) | 1990-07-05 | 1990-07-05 | Alignment measuring device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2513540Y2 (en) |
-
1990
- 1990-07-05 JP JP7183990U patent/JP2513540Y2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2513540Y2 (en) | 1996-10-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |