JPH0430575B2 - - Google Patents

Info

Publication number
JPH0430575B2
JPH0430575B2 JP57192461A JP19246182A JPH0430575B2 JP H0430575 B2 JPH0430575 B2 JP H0430575B2 JP 57192461 A JP57192461 A JP 57192461A JP 19246182 A JP19246182 A JP 19246182A JP H0430575 B2 JPH0430575 B2 JP H0430575B2
Authority
JP
Japan
Prior art keywords
protective film
substrate
pellicle
mounting frame
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57192461A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5982726A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP57192461A priority Critical patent/JPS5982726A/ja
Priority to US06/548,516 priority patent/US4669875A/en
Publication of JPS5982726A publication Critical patent/JPS5982726A/ja
Priority to US07/360,971 priority patent/USRE33991E/en
Publication of JPH0430575B2 publication Critical patent/JPH0430575B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/02—Investigating particle size or size distribution
    • G01N15/0205—Investigating particle size or size distribution by optical means
    • G01N2015/0238—Single particle scatter
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4792—Polarisation of scatter light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/10—Scanning
    • G01N2201/105—Purely optical scan
    • G01N2201/1053—System of scan mirrors for composite motion of beam

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57192461A 1982-11-04 1982-11-04 ペリクル付基板の異物検査装置 Granted JPS5982726A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP57192461A JPS5982726A (ja) 1982-11-04 1982-11-04 ペリクル付基板の異物検査装置
US06/548,516 US4669875A (en) 1982-11-04 1983-11-03 Foreign particle detecting method and apparatus
US07/360,971 USRE33991E (en) 1982-11-04 1989-06-02 Foreign particle detecting method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57192461A JPS5982726A (ja) 1982-11-04 1982-11-04 ペリクル付基板の異物検査装置

Publications (2)

Publication Number Publication Date
JPS5982726A JPS5982726A (ja) 1984-05-12
JPH0430575B2 true JPH0430575B2 (enrdf_load_stackoverflow) 1992-05-22

Family

ID=16291678

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57192461A Granted JPS5982726A (ja) 1982-11-04 1982-11-04 ペリクル付基板の異物検査装置

Country Status (1)

Country Link
JP (1) JPS5982726A (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2559470B2 (ja) * 1988-08-12 1996-12-04 株式会社日立製作所 外観検査方法
JP2538338B2 (ja) * 1989-05-30 1996-09-25 キヤノン株式会社 異物検査装置
JPH09204038A (ja) * 1996-09-24 1997-08-05 Hitachi Ltd マスクの製造方法
WO2005052687A1 (ja) * 2003-11-25 2005-06-09 Nikon Corporation 異物検査装置及び方法並びに露光装置
JP4519832B2 (ja) 2006-12-28 2010-08-04 株式会社堀場製作所 欠陥検査装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5411068B2 (enrdf_load_stackoverflow) * 1972-08-28 1979-05-11

Also Published As

Publication number Publication date
JPS5982726A (ja) 1984-05-12

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