JPH0429588Y2 - - Google Patents

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Publication number
JPH0429588Y2
JPH0429588Y2 JP1987189965U JP18996587U JPH0429588Y2 JP H0429588 Y2 JPH0429588 Y2 JP H0429588Y2 JP 1987189965 U JP1987189965 U JP 1987189965U JP 18996587 U JP18996587 U JP 18996587U JP H0429588 Y2 JPH0429588 Y2 JP H0429588Y2
Authority
JP
Japan
Prior art keywords
substrate
firing
plate
straightening
ceramic substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1987189965U
Other languages
Japanese (ja)
Other versions
JPH0193763U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987189965U priority Critical patent/JPH0429588Y2/ja
Publication of JPH0193763U publication Critical patent/JPH0193763U/ja
Application granted granted Critical
Publication of JPH0429588Y2 publication Critical patent/JPH0429588Y2/ja
Expired legal-status Critical Current

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Description

【考案の詳細な説明】 〔産業上の利用分野〕 本考案は、焼成によつてソリ等の変形が生じる
ような基板を矯正するため集積回路を搭載するセ
ラミツク基板を再焼成してその基板の反りを高温
加熱矯正する際に使用されるセラミツク焼成用敷
板の矯正用治具に関するものである。
[Detailed Description of the Invention] [Industrial Field of Application] The present invention is a method of re-firing a ceramic substrate on which an integrated circuit is mounted to correct the deformation of the substrate, such as warpage, due to firing. This invention relates to a jig for straightening ceramic firing plates used when straightening warps by heating at high temperatures.

〔従来の技術〕[Conventional technology]

一般に、アルミナ、またはチタン酸バリウム粉
末等によつて構成される絶縁性のセラミツク基板
に集積回路チツプを搭載封着する場合、セラミツ
ク基板には集積回路チツプ内の電極と接続する導
電性のMo,Wペーストでメタライズパターンが
施されるのが普通である。このように、メタライ
ズパターンを施されたセラミツク基板は敷板上に
搭載され、1200〜1600℃程度の範囲の温度で焼成
される。第2図aは、このときの焼成炉、同図b
は、敷板使用例を示す図で基板焼成の際、メタラ
イズパターンの敷板への溶着防止の為に、実公昭
56−19408号公報で示されるような表面に粗面加
工が施されたモリブデン敷板41が使用されてい
る。この敷板としては、モリブデン板が使用さ
れ、このモリブデン板は、例えば、砥粒を吹きつ
ける方法、ローレツトをかける方法、あるいはフ
ライスをかけル方法等によつて、JIS B 0601で
いう最大高さ(Rmax)が20μm以上で、粗面加
工された導電ペースト接触面を有している。この
敷板41は、メタライズパターンの溶着防止につ
いては、極めて良好であつた。
Generally, when an integrated circuit chip is mounted and sealed on an insulating ceramic substrate made of alumina or barium titanate powder, etc., the ceramic substrate contains conductive Mo, which connects to the electrodes inside the integrated circuit chip. A metallization pattern is usually applied using W paste. In this way, the ceramic substrate provided with the metallized pattern is mounted on a base plate and fired at a temperature in the range of about 1200 to 1600°C. Figure 2a shows the firing furnace at this time, Figure 2b
The figure below shows an example of the use of the bottom plate. When firing the board, in order to prevent the metallized pattern from welding to the bottom plate, Jikosho
A molybdenum base plate 41 with a roughened surface as shown in Japanese Patent No. 56-19408 is used. A molybdenum plate is used as the bottom plate, and this molybdenum plate is heated to the maximum height (as defined in JIS B 0601) by, for example, spraying with abrasive grains, knurling, or milling. Rmax) is 20 μm or more, and has a roughened conductive paste contact surface. This bottom plate 41 was extremely effective in preventing welding of the metallized pattern.

〔考案が解決しようとする問題点〕[Problem that the invention attempts to solve]

しかしながら、製造されるセラミツク基板20
は、焼成中にセラミツク基板固有の各部分の密
度、収縮率の相異による等のセラミツク基板面の
反りが生じる。
However, the manufactured ceramic substrate 20
During firing, the surface of the ceramic substrate warps due to differences in density and shrinkage rate of each part specific to the ceramic substrate.

また、上述の敷板41は、セラミツク基板20
等の高温焼成の繰り返しにより、自重により、
徐々に反りが発生し、これに準じて敷板41に搭
載されたセラミツク基板20の反りを頻繁に生じ
させる。このような種々の原因によるセラミツク
基板20の反りは、別の製造工程においてこの基
板20に集積回路チツプを搭載し、そののち集積
回路マウントの接合することを不能にするという
不具合を生じ、この反りの許容規格は、1インチ
の長さに対して10〜50μmの高さ以下でなければ
ならないものとされている。
Further, the above-mentioned bottom plate 41 is made of ceramic substrate 20.
Due to its own weight, due to repeated high-temperature firing such as
Warping gradually occurs, and accordingly, the ceramic substrate 20 mounted on the bottom plate 41 frequently warps. Warping of the ceramic substrate 20 due to such various causes causes problems such as mounting an integrated circuit chip on the substrate 20 in another manufacturing process and making it impossible to bond an integrated circuit mount afterwards. The permissible standard is that the height must be 10 to 50 μm or less per inch of length.

このように反りの生じたセラミツク基板は、規
格外品として処理されるため、製造コストの上昇
を招くという欠点が生じる。
Ceramic substrates with such warpage are treated as non-standard products, resulting in an increase in manufacturing costs.

本考案は上記欠点を鑑みてなされており、焼成
により反りの生じたセラミツク基板を、メタライ
ズパターンを損傷せずに再焼成し矯正するに適し
たセラミツク基板矯正用治具を提供することを目
的とする。
The present invention has been made in view of the above-mentioned drawbacks, and an object of the present invention is to provide a ceramic substrate straightening jig suitable for re-firing and straightening a ceramic substrate that has warped due to firing without damaging the metallized pattern. do.

〔問題点を解決するための手段〕[Means for solving problems]

本考案によれば、焼成によつて変形が生じる基
板を矯正する矯正用治具において、前記基板を支
持する支持板と、この支持板と組合せて使用さ
れ、この支持板上の基板を押圧するためのウエイ
ト板とを有し、この支持板とウエイト板は粗面加
工されており、且つMo及びMo合金のグループ
から選択された材料からなることを特徴とするセ
ラミツク基板矯正用治具が得られる。
According to the present invention, in a straightening jig for straightening a substrate that is deformed due to firing, the tool includes a support plate that supports the substrate, and is used in combination with the support plate to press the substrate on the support plate. A jig for straightening a ceramic substrate is provided, the support plate and the weight plate having a roughened surface and made of a material selected from the group of Mo and Mo alloys. It will be done.

〔作用〕[Effect]

本考案に係る基板矯正用治具の作用について述
べる。
The operation of the substrate straightening jig according to the present invention will be described.

焼成により反りの生じた基板、例えば、セラミ
ツクは支持板の粗面加工された面上に搭載され、
この基板上に、ウエイト板が粗面加工された面を
基板に接触するように重ね合わされる。高温の焼
成炉中で、この矯正用治具を用いた場合、基板が
軟化すると共に、ウエイト板の重さによつて基板
の反りが矯正される。この板体の基板との接触面
は、(Rmaxが3μm以上で20μmを越えない)適度
の粗さに仕上げられているため、基板に対して局
部的な熱供給量の差や局部的な荷重の集中による
キズやクラツクを生じない。
A substrate warped by firing, such as ceramic, is mounted on the roughened surface of the support plate,
A weight plate is placed on top of this substrate so that its roughened surface is in contact with the substrate. When this straightening jig is used in a high-temperature firing furnace, the substrate is softened and the warp of the substrate is corrected by the weight of the weight plate. The contact surface of this plate with the substrate is finished with a moderate roughness (Rmax is 3 μm or more and does not exceed 20 μm), so it is possible to prevent local differences in the amount of heat supplied to the substrate and local loads. Does not cause scratches or cracks due to concentration of

〔実施例〕〔Example〕

本考案の実施例を図面を参照しながら説明す
る。第1図は、本考案の基板矯正治具の一例を示
している。
Embodiments of the present invention will be described with reference to the drawings. FIG. 1 shows an example of the substrate straightening jig of the present invention.

この例においては、支持板10の上に反りの生
じた基板20、ここでは、セラミツク基板が搭載
され、さらにその上にウエイト板30が積み重ね
られている。この結果、基板20はウエイト板3
0によつて押圧された状態になつている。この基
板は、その両面にメタライズパターン部21及び
22を有し、このメタライズパターン21,22
で支持板10及びウエイト板30の表面11及び
31は接している。
In this example, a warped substrate 20, in this case a ceramic substrate, is mounted on a support plate 10, and a weight plate 30 is further stacked thereon. As a result, the substrate 20 is
It is in a state where it is pressed by 0. This substrate has metallized pattern parts 21 and 22 on both sides, and these metallized patterns 21 and 22
The surfaces 11 and 31 of the support plate 10 and the weight plate 30 are in contact with each other.

この支持板10及びウエイト板30の図示され
た表面11及び31は、部分拡大図のように粗面
加工が施されており、その粗面加工は表面へ100
メツシユのホワイトアランダム砥粒を液体ホーミ
ングで吹きつけることにより行われた。この粗面
加工以外の粗面加工法としては、例えば、乾式サ
ンドブラストなど砥粒を吹きつける方法、ローレ
ツトをかける方法、あるいはフライスをかける方
法等でもよい。
The illustrated surfaces 11 and 31 of the support plate 10 and the weight plate 30 are roughened as shown in the partially enlarged view.
This was done by spraying Metsuyu's white alundum abrasive grains with liquid homing. As a surface roughening method other than this surface roughening, for example, a method of spraying abrasive grains such as dry sandblasting, a method of knurling, a method of milling, etc. may be used.

実験によれば、この治具10,30に挾設され
たセラミツク基板20の反りは、約1600℃で焼成
した結果、その反りが全て矯正された。このとき
の治具10,30の表面の粗さは、JIS B 0610
による最大の高さ(Rmax)が5μm以上で20μm
を越えない範囲である。比較の為にこの範囲より
大すなわち、Rmaxが20μmより大なる粗面加工
が施された治具を用いて、上記の反りを有するセ
ラミツク基板の焼成を行つた場合、基板の軟化に
加えてメタライズパターン21及び22への傷が
生じた。また、さらに比較のためにRmaxが3μm
より小の粗面加工が施された治具を用いた場合、
メタライズパターン21及び22の各板体表面へ
の溶着が生じた。以上のことから、基板矯正用治
具に施される粗面加工はRmaxが3μm以上で20μ
mを越えない範囲で行うことが望ましい。また、
最も望ましくは、Rmaxが5〜15μm、粗面加工
を施した面を有する基板矯正用治具であることが
確認された。また、上述の例は、セラミツク基板
の矯正の為に施されたものであるが、セラミツク
基板に限ることなく、焼成によつて変形が生じる
基板、例えば、磁性体等にも適用できうる。
According to experiments, all the warpage of the ceramic substrate 20 held between the jigs 10 and 30 was corrected by firing at about 1600°C. The surface roughness of the jigs 10 and 30 at this time is JIS B 0610
Maximum height (Rmax) is 5μm or more and 20μm
This is a range that does not exceed. For comparison, if a ceramic substrate with the above warp is fired using a jig with a roughened surface larger than this range, that is, Rmax is larger than 20 μm, the substrate will soften and metallize. Damage to patterns 21 and 22 occurred. Also, for further comparison, Rmax is 3μm
When using a jig with a smaller roughened surface,
The metallized patterns 21 and 22 were welded to the surface of each plate. From the above, the roughening process performed on the board straightening jig is 20 μm when Rmax is 3 μm or more.
It is desirable to do this within a range that does not exceed m. Also,
It was confirmed that a substrate straightening jig having an Rmax of 5 to 15 μm and having a roughened surface is most desirable. Furthermore, although the above-mentioned example was applied to straighten a ceramic substrate, the present invention is not limited to ceramic substrates, but can also be applied to substrates that are deformed by firing, such as magnetic materials.

〔考案の効果〕[Effect of idea]

以上述べたとおり、本考案においては、焼成に
より反りの生じたセラミツク基板を、1対の粗面
加工が施された板体からなる治具に挾設して再焼
成することによつて、このセラミツク基板の表面
に形成されたメタライズパターンの溶着、破損、
ひび割れ等の損傷なしに、セラミツク基板の反り
を矯正できる。
As described above, in the present invention, a ceramic substrate that has warped due to firing is held in a jig consisting of a pair of roughened plates and re-fired. Welding, damage, and damage to the metallized pattern formed on the surface of the ceramic substrate.
Warpage in ceramic substrates can be corrected without damage such as cracks.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本考案の実施例に係る基板矯正用治
具部分拡大断面図、第2図aは、従来のセラミツ
ク用の焼成炉を示す一部切欠断面図、第2図b
は、従来のセラミツク用敷板の使用例を示す図で
ある。
FIG. 1 is a partially enlarged sectional view of a substrate straightening jig according to an embodiment of the present invention, FIG. 2a is a partially cutaway sectional view showing a conventional firing furnace for ceramics, and FIG. 2b
1 is a diagram showing an example of the use of a conventional ceramic floor plate.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 焼成によつて変形が生じるような基板を矯正す
る矯正用治具において、前記基板を支持する支持
板と、該支持板と組合せて使用され、前記基板を
押圧するためのウエイト板とを有し前記支持板及
び前記ウエイト板は最大の高さ(Rmax)が3μm
以上で20μmを越えない範囲で粗面加工されてお
り、且つMo及びMo合金のグループから選択さ
れた材料からなることを特徴とする基板矯正用治
具。
A straightening jig for straightening a substrate that is deformed by firing, comprising a support plate that supports the substrate, and a weight plate that is used in combination with the support plate and presses the substrate. The maximum height (Rmax) of the support plate and the weight plate is 3 μm.
A substrate straightening jig characterized in that the surface is roughened within a range not exceeding 20 μm and is made of a material selected from the group of Mo and Mo alloys.
JP1987189965U 1987-12-16 1987-12-16 Expired JPH0429588Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987189965U JPH0429588Y2 (en) 1987-12-16 1987-12-16

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987189965U JPH0429588Y2 (en) 1987-12-16 1987-12-16

Publications (2)

Publication Number Publication Date
JPH0193763U JPH0193763U (en) 1989-06-20
JPH0429588Y2 true JPH0429588Y2 (en) 1992-07-17

Family

ID=31480971

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987189965U Expired JPH0429588Y2 (en) 1987-12-16 1987-12-16

Country Status (1)

Country Link
JP (1) JPH0429588Y2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018148163A (en) * 2017-03-09 2018-09-20 日本特殊陶業株式会社 Method of manufacturing component for semiconductor manufacturing equipment

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6016998B2 (en) * 1976-07-12 1985-04-30 三井東圧化学株式会社 Masking film with improved weather resistance
JPS62119155A (en) * 1985-11-20 1987-05-30 鳴海製陶株式会社 Method of burning low temperature burning ceramic substrate

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6016998U (en) * 1984-06-13 1985-02-05 株式会社東芝 Ceramic firing jig

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6016998B2 (en) * 1976-07-12 1985-04-30 三井東圧化学株式会社 Masking film with improved weather resistance
JPS62119155A (en) * 1985-11-20 1987-05-30 鳴海製陶株式会社 Method of burning low temperature burning ceramic substrate

Also Published As

Publication number Publication date
JPH0193763U (en) 1989-06-20

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