JPH042938B2 - - Google Patents
Info
- Publication number
- JPH042938B2 JPH042938B2 JP7633786A JP7633786A JPH042938B2 JP H042938 B2 JPH042938 B2 JP H042938B2 JP 7633786 A JP7633786 A JP 7633786A JP 7633786 A JP7633786 A JP 7633786A JP H042938 B2 JPH042938 B2 JP H042938B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- photomask
- resist
- pattern
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010409 thin film Substances 0.000 claims description 25
- 239000010408 film Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 8
- 238000004544 sputter deposition Methods 0.000 claims description 5
- 238000007740 vapor deposition Methods 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 3
- 239000010453 quartz Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims description 2
- 238000005530 etching Methods 0.000 description 7
- 238000007796 conventional method Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 3
- 238000001312 dry etching Methods 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Manufacturing Optical Record Carriers (AREA)
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61076337A JPS62231959A (ja) | 1986-04-01 | 1986-04-01 | フオトマスクの製造方法 |
| CA000530396A CA1313792C (en) | 1986-02-28 | 1987-02-23 | Method of manufacturing photo-mask and photo-mask manufactured thereby |
| EP92120246A EP0533217B1 (en) | 1986-02-28 | 1987-02-24 | Photo-mask and method of production thereof |
| DE3752197T DE3752197T2 (de) | 1986-02-28 | 1987-02-24 | Photomaske und Herstellungsverfahren dafür |
| EP87102561A EP0234547B1 (en) | 1986-02-28 | 1987-02-24 | Method of manufacturing photomask and photo-mask manufactured thereby |
| DE3789881T DE3789881T2 (de) | 1986-02-28 | 1987-02-24 | Verfahren zur Herstellung von Photomasken und Photomaske. |
| US07/019,704 US5087535A (en) | 1986-02-28 | 1987-02-27 | Method of manufacturing photo-mask and photo-mask manufactured thereby |
| US07/684,680 US5457006A (en) | 1986-02-28 | 1991-03-29 | Method of manufacturing photo-mask and photo-mask manufactured thereby |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61076337A JPS62231959A (ja) | 1986-04-01 | 1986-04-01 | フオトマスクの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62231959A JPS62231959A (ja) | 1987-10-12 |
| JPH042938B2 true JPH042938B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-01-21 |
Family
ID=13602544
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61076337A Granted JPS62231959A (ja) | 1986-02-28 | 1986-04-01 | フオトマスクの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62231959A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62273543A (ja) * | 1986-05-21 | 1987-11-27 | Sharp Corp | フオトマスクの製造方法 |
-
1986
- 1986-04-01 JP JP61076337A patent/JPS62231959A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62231959A (ja) | 1987-10-12 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |