JPH04280667A - High integrated semiconductor device - Google Patents

High integrated semiconductor device

Info

Publication number
JPH04280667A
JPH04280667A JP3043891A JP4389191A JPH04280667A JP H04280667 A JPH04280667 A JP H04280667A JP 3043891 A JP3043891 A JP 3043891A JP 4389191 A JP4389191 A JP 4389191A JP H04280667 A JPH04280667 A JP H04280667A
Authority
JP
Japan
Prior art keywords
wiring
board
chip
solder
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3043891A
Other languages
Japanese (ja)
Inventor
Koichi Nakajima
浩一 中嶋
Tsuneo Endo
恒雄 遠藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Renesas Eastern Japan Semiconductor Inc
Original Assignee
Hitachi Ltd
Hitachi Tohbu Semiconductor Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitachi Tohbu Semiconductor Ltd filed Critical Hitachi Ltd
Priority to JP3043891A priority Critical patent/JPH04280667A/en
Publication of JPH04280667A publication Critical patent/JPH04280667A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/73Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1515Shape
    • H01L2924/15153Shape the die mounting substrate comprising a recess for hosting the device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1532Connection portion the connection portion being formed on the die mounting surface of the substrate
    • H01L2924/1533Connection portion the connection portion being formed on the die mounting surface of the substrate the connection portion being formed both on the die mounting surface of the substrate and outside the die mounting surface of the substrate
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/14Structural association of two or more printed circuits
    • H05K1/144Stacked arrangements of planar printed circuit boards
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/36Assembling printed circuits with other printed circuits
    • H05K3/368Assembling printed circuits with other printed circuits parallel to each other

Abstract

PURPOSE:To obtain a high integrated semiconductor device which is hardly enlarged in size even if semiconductor chips are increased in number by a method wherein wiring boards are arranged nearly in parallel at prescribed intervals, which are assembled into a multiboard structure with a single lead wire. CONSTITUTION:A chip 1 is mounted on a wiring board 2 through the intermediary of adhesive agent or the like, a wiring pattern 3 is provided onto the upside of the board 2, and the front and the rear of the board 2 are electrically connected together to constitute a rigid wiring board. For instance, the rear and the front of a printed board are electrically connected together through a through-hole wiring 4, and the through-hole wirings 4 are connected to the terminals provided onto the chip 1 through a wiring pattern 3 and a bonding wire 5 of the board 2. Solderable lands 4A are formed around the through-hole wirings 4 provided to the front and the rear of the board 2, a solder guide line 4B formed of the same material with the wiring is provided extending from a part near the end of the board 2 to the land 4A, a lead wire 7 and the land 4A are surely soldered to each other even if the gap is narrow.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、メモリカード、メモリ
モジュール、ハイブリッドIC、VTR、テレビカメラ
等に用いられる複数の半導体チップで構成される高集積
半導体装置に関し、特に、半導体チップを搭載した複数
の配線基板をほぼ平行に重ね合せて積層構造体に組み立
て、それらを電気的に接続する技術に関するものである
[Field of Industrial Application] The present invention relates to a highly integrated semiconductor device composed of a plurality of semiconductor chips used in memory cards, memory modules, hybrid ICs, VTRs, television cameras, etc. The present invention relates to a technology for assembling wiring boards substantially parallel to each other to form a laminated structure and electrically connecting them.

【0002】0002

【従来の技術】従来の積層構造による三次元的回路構成
を成しているデバイスは、日経マイクロデバイス(’8
9,11月号,P15,日経BP社発行)に記載される
ように、TAB(Tape AoutmatedBon
ding )のアウターリードをもって、隣り合うリー
ド同士を電気的に接続するものである。
[Prior Art] A conventional device with a three-dimensional circuit configuration based on a laminated structure is the Nikkei Micro Device ('88
As described in the September and November issue, P15, published by Nikkei BP, TAB (Tape Aoutmated Bon
Adjacent leads are electrically connected using the outer leads of the ding.

【0003】メモリチップを積層する場合を例にとると
、TABのアウターリードを垂直方向に折り曲げ、これ
を必要なチップ数だけ積み上げた後、重なり合ったアウ
ターリード同士を半田材等により電気的接続を行う。 しかる後、接続されたアウターリードを水平方向に曲げ
、ガルウィング状に成形する。
For example, when stacking memory chips, the outer leads of the TAB are bent vertically, stacked as many as the required number of chips, and then the overlapping outer leads are electrically connected to each other using a solder material or the like. conduct. Thereafter, the connected outer leads are bent horizontally to form a gull wing shape.

【0004】また、メモリチップのチップセレクト端子
は各チップ毎に電気的に独立させておくことが必要であ
るために、TABを積層以前に不必要なアウターリード
部分を切り落しておくか、あるいはアウターリードを半
田等による接続を行った後に切り離しておく必要がある
Furthermore, since the chip select terminals of the memory chips must be electrically independent for each chip, it is necessary to cut off unnecessary outer lead portions of the TAB before stacking the TAB, or to remove the outer leads from the TAB. It is necessary to disconnect the leads after connecting them with solder or the like.

【0005】また、刊行物「混成集積回路(1968年
6月工業調査会発行)」に記載されているように、ベア
チップの電極端子と配線基板側の電極端子の間に金属性
のボールを介在させ、半田材等によってベアチップの電
極と基板側の電極端子を電気的に接続するフリップチッ
プ実装がある。
Furthermore, as described in the publication ``Hybrid Integrated Circuits'' (published by Kogyo Kenkyukai in June 1968), metal balls are interposed between the electrode terminals of the bare chip and the electrode terminals of the wiring board. There is flip-chip mounting in which electrodes on a bare chip and electrode terminals on a substrate are electrically connected using a solder material or the like.

【0006】また、プリント板に電子部品を組み立てた
ものを三次元的に実装する場合には、複数のプリント板
同士を所定の間隔(5mm〜1cm)でほぼ平行に重ね
て配置し、各プリント板にリード線を貫通させてリード
線と各プリント板とを半田付けし、電気的機械的接続を
行っている。
[0006] Furthermore, when mounting electronic components assembled on printed boards three-dimensionally, a plurality of printed boards are arranged almost parallel to each other at a predetermined interval (5 mm to 1 cm), and each printed board is Electrical and mechanical connections are made by passing lead wires through the board and soldering the lead wires to each printed board.

【0007】[0007]

【発明が解決しようとする課題】前記従来技術では、フ
リップチップ実装の場合、チップに裏面と表面につなが
った電極を付けることができないために積層構造をとる
ことができず、表裏の導通をとるためには何らかの中継
点を付ける必要があった。このために考案されたのが積
層TABであり、TABのアウターリードがこの中継点
に相当する。
[Problems to be Solved by the Invention] In the above-mentioned conventional technology, in the case of flip-chip mounting, it is not possible to attach an electrode connected to the back surface and the front surface of the chip, so a laminated structure cannot be formed, and conduction between the front and back surfaces cannot be established. In order to do this, it was necessary to attach some kind of relay point. A laminated TAB was devised for this purpose, and the outer lead of the TAB corresponds to this relay point.

【0008】しかしながら、積層TABでは、上下のT
ABの間にはチップの厚さに相当するギャップがあり、
このギャップを埋めるためにアウターリードを折り曲げ
成形する必要があり、その際に、アウターリードは非常
に薄く、成形精度が出しづらい、強度も弱という欠点が
ある。そのために、マザーボードに組み付ける際に接続
部がはずれやすいという問題があった。
However, in a laminated TAB, the upper and lower T
There is a gap between AB that corresponds to the thickness of the chip,
In order to fill this gap, it is necessary to bend and mold the outer lead, but when doing so, the outer lead has the drawbacks of being extremely thin, making it difficult to achieve molding precision, and having low strength. Therefore, there was a problem in that the connection part easily came off when assembled to the motherboard.

【0009】また、アウターリードの取り出しがチップ
周囲に限られているために接続ピン数に制限があり、電
気的に接続不要なピンがあった場合、アウターリードを
切断しなければならないという問題があった。
Furthermore, since the outer leads can only be taken out around the chip, the number of connection pins is limited, and if there are pins that do not need to be electrically connected, the outer leads must be cut. there were.

【0010】また、前記従来のプリント板に電子部品を
組み立てたものを三次元的に実装する場合では、プリン
ト板上に実装される部品がより薄型化し、積層化したプ
リント板積層体の厚さも薄くして小型化してきており、
かつプリント板(材質:ガラスエポキシ、フェノール等
)と半田のなじみが悪い(半田の表面張力による)ため
、半田が狭い隙間に入りづらくなるという問題があった
[0010] Furthermore, when electronic components are assembled three-dimensionally on the conventional printed board, the parts mounted on the printed board become thinner, and the thickness of the printed board laminate becomes thinner. It has become thinner and smaller,
In addition, the solder does not fit well with the printed board (material: glass epoxy, phenol, etc.) (due to the surface tension of the solder), making it difficult for the solder to fit into narrow gaps.

【0011】本発明は、前記問題点を解決するためにな
されたものであり、その課題は、半導体チップの数を増
しても平面的には大きくならない高集積半導体装置が得
られる技術を提供することにある。
The present invention has been made to solve the above problems, and its object is to provide a technique for obtaining a highly integrated semiconductor device that does not become larger in plan view even when the number of semiconductor chips is increased. There is a particular thing.

【0012】本発明の他の課題は、半導体チップを搭載
した複数の配線基板が重ね合せられた積層構造の半導体
装置において、配線基板同士間の電気的接続の信頼性を
向上することが可能な技術を提供することにある。
Another object of the present invention is to improve the reliability of electrical connections between wiring boards in a semiconductor device having a stacked structure in which a plurality of wiring boards each carrying a semiconductor chip are stacked on top of each other. The goal is to provide technology.

【0013】本発明の他の課題は、アウターリードを折
り曲げ又は切断することなく、安価な部品で配線基板同
士間を電気的に接続することが可能な技術を提供するこ
とにある。
Another object of the present invention is to provide a technique that enables electrical connection between wiring boards using inexpensive parts without bending or cutting the outer leads.

【0014】本発明の前記ならびにその他の課題と新規
な特徴は、本明細書の記述及び添付図面によって明らか
になるであろう。
The above and other objects and novel features of the present invention will become apparent from the description of this specification and the accompanying drawings.

【0015】[0015]

【課題を解決するための手段】本願において開示される
発明のうち、代表的なものの概要を簡単に説明すれば、
下記のとおりである。
[Means for Solving the Problems] Among the inventions disclosed in this application, a brief overview of typical inventions will be as follows.
It is as follows.

【0016】(1)半導体チップを搭載した複数の配線
基板がほぼ平行に所定の間隔で配置され、これらが各配
線基板を貫通する少なくとも一本のリード線で積層構造
体に組み立てられ、前記リード線と前記各配線基板上の
電極端子とを半田付けして電気的に接続した高集積半導
体装置である。
(1) A plurality of wiring boards on which semiconductor chips are mounted are arranged approximately parallel to each other at predetermined intervals, and these are assembled into a laminated structure with at least one lead wire penetrating each wiring board, and the leads This is a highly integrated semiconductor device in which wires and electrode terminals on each of the wiring boards are electrically connected by soldering.

【0017】(2)前記各配線基板の端面から半田が侵
入し得る距離より端面側に、配線基板上に設けられてい
る電極端子に接続される半田誘導線を配置したものであ
る。
(2) Solder guide wires connected to electrode terminals provided on the wiring boards are arranged closer to the end faces than the distance from which solder can penetrate from the end faces of each of the wiring boards.

【0018】(3)前記各配線基板の対向面側の端部に
テーパを設けたものである。
(3) A taper is provided at the end of each wiring board on the opposing surface side.

【0019】[0019]

【作用】前述の手段によれば、以下の作用効果を奏する
[Operation] According to the above-mentioned means, the following operation and effect can be achieved.

【0020】ここでは、ベアチップを搭載した配線基板
を拡大された新たなチップと見なす。スルーホールによ
り配線基板には表と裏に同一電位の端子が設けられてお
り、この基板上にベアチップをボンディングしたことに
よって、ベアチップだけでは表側にしか電極端子がなか
ったものが、チップの両面に電極端子が形成されたのと
同じ状態になる。これにより積層した基板同士の電極が
向き合う形となるため、半田付け等の接続手段により向
き合った端子同士を接続することができるようになる。
[0020] Here, the wiring board on which the bare chip is mounted is regarded as a new enlarged chip. Through holes provide terminals with the same potential on the front and back sides of the wiring board, and by bonding the bare chip onto this board, electrode terminals are now available on both sides of the chip, whereas bare chips only had electrode terminals on the front side. The state is the same as when the electrode terminal was formed. As a result, the electrodes of the laminated substrates face each other, so that the facing terminals can be connected to each other by a connecting means such as soldering.

【0021】しかし、配線基板の表面から上にチップ,
ワイヤー及びこれらを保護するための物質による出っ張
りがあり、積層した時に配線基板と配線基板の間には隙
間がある。この隙間を埋めるために導電性の物質を介在
させる必要がある。本発明では導電性の物質としてリー
ド線を適用し、このリード線を前記配線基板のスルーホ
ールに貫通し、リード線と各配線基板とを半田で電気的
機械的に接続する。
However, there are chips and
There are protrusions made of wires and materials to protect them, and there is a gap between the wiring boards when they are stacked. In order to fill this gap, it is necessary to interpose a conductive substance. In the present invention, a lead wire is used as the conductive material, the lead wire is passed through the through hole of the wiring board, and the lead wire and each wiring board are electrically and mechanically connected with solder.

【0022】また、導電性物体の位置合せがまずく、ず
れた場合には導通不良やショート不良となるため、本発
明では位置ずれが起きにくくするためにリード線を前記
スルーホールに貫通している。
[0022] Furthermore, if the conductive object is misaligned and misaligned, it will result in poor continuity or short-circuiting, so in the present invention, the lead wire is passed through the through hole in order to prevent misalignment from occurring. .

【0023】また、前記各配線基板の端面から半田が侵
入し得る距離より端面側に、配線基板上に設けられてい
る電極端子に接続される半田誘導線を配置したので、リ
ード線と配線基板上の配線端子との半田付けを容易に行
うことができる。
Furthermore, since the solder guide wires connected to the electrode terminals provided on the wiring boards are placed closer to the end faces than the distance at which solder can penetrate from the end faces of each of the wiring boards, the lead wires and the wiring boards are connected to each other. It can be easily soldered to the upper wiring terminal.

【0024】また、前記各配線基板の間対向面側の端部
にテーパを設けていることにより、半田の表面張力が小
さくなるので、半田のなじみが良くなり、半田が各配線
基板間の隙間に入り易くなる。
Furthermore, by providing a taper at the end of the opposing surface between the wiring boards, the surface tension of the solder is reduced, so that the solder fits better, and the solder fills the gaps between the wiring boards. It becomes easier to enter.

【0025】このようにすることにより、複数の配線基
板の積層構造体における各配線基板同士とリード線とが
半田により固着されるので、位置ズレが発生せず、かつ
電気的接続が良好で機械的衝撃にも強い構造となる。
[0025] By doing this, the wiring boards and the lead wires in the laminated structure of a plurality of wiring boards are fixed to each other by solder, so that positional deviation does not occur, and the electrical connection is good and the mechanical connection is good. It has a structure that is resistant to impact.

【0026】[0026]

【実施例】以下、本発明の一実施例を図面を用いて具体
的に説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described in detail below with reference to the drawings.

【0027】なお、実施例を説明するための全図におい
て、同一機能を有するものは同一符号を付け、その繰り
返しの説明は省略する。
In all the figures for explaining the embodiment, parts having the same functions are given the same reference numerals, and repeated explanations thereof will be omitted.

【0028】[実施例1]図1は、本発明をSRAMメ
モリチップを搭載した配線基板に適用した一実施例の高
集積半導体装置の全体概略構成を示す断面図、図2は、
図1のSRAMメモリチップを搭載した配線基板の一個
の概略構成を示す断面図、図3は、図1に示す(イ)−
(イ)線で切った断面図である。
[Embodiment 1] FIG. 1 is a cross-sectional view showing the overall schematic configuration of a highly integrated semiconductor device according to an embodiment in which the present invention is applied to a wiring board mounted with an SRAM memory chip, and FIG.
FIG. 3 is a cross-sectional view showing a schematic configuration of one wiring board on which the SRAM memory chip of FIG. 1 is mounted, and FIG.
(A) It is a sectional view cut along the line.

【0029】図1図,図2及び図3に示すように、本実
施例の半導体装置100A,100B,100C,10
0Dは、それぞれ256kbitSRAMメモリチップ
(以下、単にチップという)1が配線基板(以下、単に
基板という)2上に接着剤等を介して搭載されている。
As shown in FIGS. 1, 2 and 3, semiconductor devices 100A, 100B, 100C, 10 of this embodiment
In each 0D, a 256 kbit SRAM memory chip (hereinafter simply referred to as a chip) 1 is mounted on a wiring board (hereinafter simply referred to as a board) 2 via an adhesive or the like.

【0030】前記基板2は、その上面(表面)に配線パ
ターン3が設けられ、かつスルーホール配線4により基
板2の表面と裏面が電気的に接続されているリジッドな
配線基板となっている。例えば、スルーホール配線4に
よって表裏両面が電気的に接続されたプリント基板であ
り、各スルーホール配線4は基板2の配線パターン3及
びボンディングワイヤー5により、チップ1上の端子と
電気的に接続されている。
The substrate 2 is a rigid wiring board with a wiring pattern 3 provided on its upper surface (front surface), and the front and back surfaces of the substrate 2 are electrically connected by through-hole wiring 4. For example, it is a printed circuit board whose front and back surfaces are electrically connected by through-hole wiring 4, and each through-hole wiring 4 is electrically connected to a terminal on a chip 1 by a wiring pattern 3 of the board 2 and a bonding wire 5. ing.

【0031】そして、前記スルーホール配線4の周辺の
表面と裏面には半田付可能なランド4Aが形成されてい
る。このランド4Aには、図5の(a)に示すように、
半田8が前記基板2の端面から侵入し易くするために、
配線と同材料の半田誘導線4Bが前記基板2の端面の近
かくからランド4Aまで配置されている。このようにす
ることにより、半田8が基板2の端面から侵入し易い位
置から半田誘導線4Bによりランド4まで誘導されるの
で、基板2間が狭くてもリード線7とランド4Aとを確
実に半田付けすることができる。
[0031] Solderable lands 4A are formed on the front and back surfaces of the periphery of the through-hole wiring 4. In this land 4A, as shown in FIG. 5(a),
In order to make it easier for the solder 8 to penetrate from the end surface of the substrate 2,
A solder guide wire 4B made of the same material as the wiring is arranged from near the end surface of the substrate 2 to the land 4A. By doing this, the solder 8 is guided to the land 4 by the solder guide wire 4B from a position where it easily enters from the end surface of the board 2, so even if the space between the boards 2 is narrow, the lead wire 7 and the land 4A can be securely connected. Can be soldered.

【0032】なお、前記配線パターン3,スルーホール
配線4,ランド4A及び半田誘導線4Bは、基板2に個
々に形成してもよいし、一体に形成してもよい。また、
配線パターン3,スルーホール配線4及びランド4Aは
、それぞれ電気的に接続されている。また、半田誘導線
4Bは、ランド4Aと電気的に接続されていなくてもよ
く、半田8がランド4Aに誘導される機能さえもってい
ればよい。
Note that the wiring pattern 3, through-hole wiring 4, land 4A, and solder guide wire 4B may be formed individually on the substrate 2, or may be formed integrally. Also,
The wiring pattern 3, through-hole wiring 4, and land 4A are electrically connected to each other. Moreover, the solder guide wire 4B does not need to be electrically connected to the land 4A, and only needs to have the function of guiding the solder 8 to the land 4A.

【0033】また、図5の(b)に示すように、前記基
板2上に設けられている配線パターン3に接続されてい
るランド4Aの端部は、基板2を半田槽に浸け込んで半
田付けを行う際に、前記各基板2の対向面側の端部に、
半田8の表面張力が小さくなるようにテーパ(斜めの切
り欠き)2Aを設けてもよい。このようにすることによ
り、半田8の表面張力が小さくなるので、基板2間が狭
くなっても半田のなじみが良くなり、基板2の端面から
半田が配線パターン3の端部までの隙間に入り易くなる
Further, as shown in FIG. 5(b), the ends of the lands 4A connected to the wiring pattern 3 provided on the board 2 are soldered by dipping the board 2 into a solder bath. When attaching, on the end of the opposing surface of each board 2,
A taper (diagonal notch) 2A may be provided to reduce the surface tension of the solder 8. By doing this, the surface tension of the solder 8 is reduced, so even if the space between the boards 2 becomes narrow, the solder will fit better, and the solder will enter the gap from the end surface of the board 2 to the end of the wiring pattern 3. It becomes easier.

【0034】そして、前記チップ1及びボンディングワ
イヤー5を保護するために、レジン等の封止用樹脂6の
トランスファモールドにより封止されている。また、マ
ザーボード10には、前記各半導体装置端部に形成され
ているスルーホール配線4と同位置に設けられたスルー
ホール配線11が設けられている。
In order to protect the chip 1 and the bonding wires 5, they are sealed by transfer molding with a sealing resin 6 such as resin. Further, the motherboard 10 is provided with through-hole wiring 11 provided at the same position as the through-hole wiring 4 formed at the end of each of the semiconductor devices.

【0035】本実施例の高集積半導体装置100は、前
記チップ1が搭載されている基板2の複数枚、すなわち
、半導体装置100A,100B,100C,100D
が、図3に示すように、前記リード線7を延長させたリ
ード線延長部7Aは、マザーボード10に設けられてい
るスルーホール配線11の貫通穴に挿入される。このリ
ード線延長部7Aとスルーホール配線11の周辺の表面
と裏面に設けられているランド11Aとが半田8で電気
的機械的に接続される。従って、チップ1のアドレス端
子、データ端子、電源端子は共通に接続される。
The highly integrated semiconductor device 100 of this embodiment includes a plurality of substrates 2 on which the chips 1 are mounted, that is, semiconductor devices 100A, 100B, 100C, and 100D.
However, as shown in FIG. 3, a lead wire extension portion 7A, which is an extension of the lead wire 7, is inserted into a through hole of a through hole wiring 11 provided on the motherboard 10. This lead wire extension 7A and lands 11A provided on the front and back surfaces around the through-hole wiring 11 are electrically and mechanically connected by solder 8. Therefore, the address terminal, data terminal, and power supply terminal of chip 1 are commonly connected.

【0036】また、各半導体装置100A,100B,
100C,100Dの各チップ1を選択するためのチッ
プセレクト端子はそれぞれ独立に接続してある。
[0036] Furthermore, each semiconductor device 100A, 100B,
Chip select terminals for selecting each chip 1 of 100C and 100D are connected independently.

【0037】次に、チップ1A,1B,1C,1Dを選
択する手段について説明する。
Next, the means for selecting chips 1A, 1B, 1C, and 1D will be explained.

【0038】図6図,図7,図8は、チップセレクト端
子部の構成を説明するための説明図であり、図6は断面
説明図、図7及び図8は各基板2の配線パターン3が全
て異なる場合の例を示す説明図である。
6, FIG. 7, and FIG. 8 are explanatory views for explaining the structure of the chip select terminal section, FIG. 6 is an explanatory cross-sectional view, and FIGS. 7 and 8 are explanatory views of the wiring pattern 3 of each board 2. FIG. 3 is an explanatory diagram showing an example where all of the values are different.

【0039】例えば、各半導体装置100A,100B
,100C,100Dの各チップをそれぞれ1A,1B
,1C,1Dとすると、それらの選択は、図6,図7及
び図8に示すように、それぞれチップセレクト端子CS
1,CS2,CS3,CS4によってなされる。
For example, each semiconductor device 100A, 100B
, 100C, 100D chips respectively 1A, 1B
, 1C, and 1D, their selection is performed by the chip select terminal CS as shown in FIGS. 6, 7, and 8, respectively.
1, CS2, CS3, and CS4.

【0040】図6において、上から一番目のチップ1A
はチップセレクト端子CS1により選択される。同様に
、上から二番目のチップ1Bはチップセレクト端子CS
2で、上から三番目のチップ1Cはチップセレクト端子
CS3で、上から四番目のチップ1Dはチップセレクト
端子CS4でそれぞれ選択される。
In FIG. 6, the first chip 1A from the top
is selected by the chip select terminal CS1. Similarly, the second chip 1B from the top has a chip select terminal CS.
2, the third chip 1C from the top is selected by the chip select terminal CS3, and the fourth chip 1D from the top is selected by the chip select terminal CS4.

【0041】前記チップセレクト端子CS1は、図7に
示すように、上から一番目のチップ1Aのチップセレク
ト配線パターン9Aにスルーホール配線4により電気的
に接続され、チップセレクト配線パターン9Aはボンデ
ィングワイヤー5によりチップ1Aに電気的に接続され
ている。
As shown in FIG. 7, the chip select terminal CS1 is electrically connected to the chip select wiring pattern 9A of the first chip 1A from the top by a through-hole wiring 4, and the chip select wiring pattern 9A is a bonding wire. 5 is electrically connected to the chip 1A.

【0042】同様に、チップセレクト端子CS2は、上
から二番目のチップ1Bの配線端子パターン9B(図示
していない)にスルーホール配線4により電気的に接続
され、チップセレクト配線パターン9Bはボンディング
ワイヤー5によりチップ1Bに電気的に接続されている
Similarly, the chip select terminal CS2 is electrically connected to the wiring terminal pattern 9B (not shown) of the second chip 1B from the top by the through-hole wiring 4, and the chip select wiring pattern 9B is connected to the bonding wire. 5, it is electrically connected to the chip 1B.

【0043】チップセレクト端子CS3は、上から三番
目のチップ1Cのチップセレクト配線パターン9C(図
示していない)にスルーホール配線4により電気的に接
続され、チップセレクト配線パターン9Cはボンディン
グワイヤー5によりチップ1Cに電気的に接続されてい
る。
The chip select terminal CS3 is electrically connected to the chip select wiring pattern 9C (not shown) of the third chip 1C from the top by the through-hole wiring 4, and the chip select wiring pattern 9C is connected to the chip select wiring pattern 9C by the bonding wire 5. It is electrically connected to chip 1C.

【0044】チップセレクト端子CS4は、図8に示す
ように、上から四番目のチップ1Dの配線端子パターン
9Dにスルーホール配線4により電気的に接続され、チ
ップセレクト配線パターン9Dはボンディングワイヤー
5によりチップ1Dに電気的に接続されている。
As shown in FIG. 8, the chip select terminal CS4 is electrically connected to the wiring terminal pattern 9D of the fourth chip 1D from the top by the through-hole wiring 4, and the chip select wiring pattern 9D is connected to the wiring terminal pattern 9D by the bonding wire 5. It is electrically connected to chip 1D.

【0045】また、前記各チップ1A,1B,1C,1
Dの選択は、図9及び図10(基板2のチップセレクト
配線パターンが全て同じでワイヤーボンディングを打ち
変える場合の例を示す図)に示すように、各基板2にチ
ップセレクト配線パターン9A,9B,9C,9Dが全
て設けられ、各基板2が選択されるチップセレクト配線
パターンのみが、ワイヤーボンディングされるようにし
てもよい。
[0045] Also, each of the chips 1A, 1B, 1C, 1
The selection of D is based on the chip select wiring patterns 9A and 9B on each board 2, as shown in FIGS. , 9C, and 9D may be provided, and only the chip select wiring pattern for which each board 2 is selected may be wire-bonded.

【0046】また、図11(断面説明図),図12及び
図13(チップセレクト配線パターン)に示すように、
各基板2に全て共通のチップセレクト配線パターン9E
を設け、基板2を重ね合せる時に金属ボール12や半田
でショートさせるようにしてもよい。
Furthermore, as shown in FIG. 11 (explanatory cross-sectional view), FIG. 12 and FIG. 13 (chip select wiring pattern),
Chip select wiring pattern 9E common to each board 2
It is also possible to provide a short-circuit with the metal ball 12 or solder when the substrates 2 are stacked on top of each other.

【0047】次に、本実施例の高集積半導体装置100
の組み立て方法について簡単に説明する。
Next, the highly integrated semiconductor device 100 of this embodiment
We will briefly explain how to assemble the .

【0048】図14に示すように、本実施例の前記半導
体装置100A,100B,100C,100Dは、チ
ップ1を前記基板2(a)上に接着剤等を介して搭載す
る(b)。次に、チップ1上の端子と基板2の配線パタ
ーン3とをボンディングワイヤー5により、電気的に接
続する(b)。その後、前記チップ1及びボンディング
ワイヤー5を保護するために、レジン等の封止用樹脂6
のトランスファモールドにより封止する(c)。これに
より、各半導体装置100A,100B,100C,1
00Dが完成する。
As shown in FIG. 14, in the semiconductor devices 100A, 100B, 100C, and 100D of this embodiment, a chip 1 is mounted on the substrate 2 (a) with an adhesive or the like (b). Next, the terminals on the chip 1 and the wiring patterns 3 on the substrate 2 are electrically connected by bonding wires 5 (b). After that, in order to protect the chip 1 and the bonding wires 5, a sealing resin 6 such as resin is used.
It is sealed by transfer molding (c). As a result, each semiconductor device 100A, 100B, 100C, 1
00D is completed.

【0049】次に、半導体装置100A,100Bを積
み重ね、スルーホール配線4の貫通孔にリード線7を串
刺し状に挿入し、リード線7が半導体装置100Bの裏
面に長く突き出させる。この状態で半田槽の中にディピ
ングし、スルーホール配線4の周辺の表面と裏面に設け
られているランド4Aとリード線7とを半田付けして電
気的に接続する(d)。
Next, the semiconductor devices 100A and 100B are stacked, and the lead wire 7 is inserted into the through hole of the through-hole wiring 4 in a skewered manner, so that the lead wire 7 protrudes long from the back surface of the semiconductor device 100B. In this state, it is dipped into a solder bath, and the lands 4A provided on the front and back surfaces around the through-hole wiring 4 are soldered to the lead wires 7 to electrically connect them (d).

【0050】次に、前記長く突き出ている当該リード線
7をマザーボード10のスルーホール配線11の貫通孔
に挿入する(e)。この貫通孔にはあらかじめ半田ペー
ストを塗布しておく。この状態で前記マザーボード10
に熱風(240℃)をかけ、半田ペーストをとかすこと
により、マザーボード10のスルーホール配線11の周
辺の表面と裏面に設けられているランド11Aとリード
線7とを半田付けして電気的機械的に接続する(f)。 最後に余分なリード線7を切断して組み立ては完了する
Next, the long protruding lead wire 7 is inserted into the through hole of the through hole wiring 11 of the motherboard 10 (e). Solder paste is applied to this through hole in advance. In this state, the motherboard 10
By applying hot air (240 degrees Celsius) to melt the solder paste, the lands 11A provided on the front and back surfaces of the through-hole wiring 11 of the motherboard 10 and the lead wires 7 are soldered to electrically and mechanically. Connect to (f). Finally, the excess lead wire 7 is cut off to complete the assembly.

【0051】もし、電気的に接続したくない端子があっ
たならば、その部分の半田付け用ランドを形成しておか
なければ、電気的には接続されない。
If there is a terminal that you do not want to electrically connect, it will not be electrically connected unless a soldering land is formed in that area.

【0052】以上の説明からわかるように、本実施例に
よれば、チップ1が基板2を介して三次元的に相互接続
され、回路網を形成することにより、チップ1の数を増
しても平面的には大きくならないので、半導体素子を高
密度に実装することができる。例えば、1MbitSR
AMのメモリ容量と同一機能を持ったメモリが、ほぼ同
一パッケージサイズで実現でき、高集積回路のメモリが
短期間で製作することができる。
As can be seen from the above description, according to this embodiment, the chips 1 are three-dimensionally interconnected via the substrate 2 to form a circuit network, so that even if the number of chips 1 is increased, Since it does not become large in plan, semiconductor elements can be mounted with high density. For example, 1MbitSR
A memory with the same functionality as AM memory capacity can be realized with almost the same package size, and a highly integrated circuit memory can be manufactured in a short period of time.

【0053】また、基板2のスルーホール4には貫通孔
があけられており、上下の基板同士をリード線7により
電気的に接続することが容易にできる。
Further, the through hole 4 of the substrate 2 is provided with a through hole, so that the upper and lower substrates can be easily electrically connected to each other by the lead wire 7.

【0054】また、基板2同士又は基板2とマザーボー
ド10がリード線7により固定されるので、位置ズレが
おきにくく、かつ機械的に衝撃にも強く電気的接続の信
頼性の高い高集積半導体装置100が得られる。
Furthermore, since the substrates 2 or the substrate 2 and the motherboard 10 are fixed by the lead wires 7, the highly integrated semiconductor device is difficult to misalign, is resistant to mechanical shock, and has highly reliable electrical connections. 100 is obtained.

【0055】また、接続用のリード線7があるために、
基板同士の接続の際に配線部を曲げたり変形させる必要
がないので、精度の良い安定した形状が得られる。
Furthermore, since there is a lead wire 7 for connection,
Since there is no need to bend or deform the wiring part when connecting the boards, a stable shape with high precision can be obtained.

【0056】また、接続用のリード線7は容易に取り付
けたり取り除いたりできるので、回路形成が容易にでき
る。
Furthermore, since the lead wire 7 for connection can be easily attached or removed, circuit formation can be facilitated.

【0057】また、マザーボード10に搭載する際に上
向き搭載と下向き搭載の2通りの搭載をしたい場合、一
種類の部品を用意するだけでよい。
[0057] Furthermore, if it is desired to mount the device on the motherboard 10 in two ways, upward mounting and downward mounting, it is sufficient to prepare only one type of component.

【0058】以上、本発明を実施例にもとづき具体的に
説明したが、本発明は、前記実施例に限定されるもので
はなく、その要旨を逸脱しない範囲において種々変更し
得ることは言うまでもない。
Although the present invention has been specifically explained above based on examples, it goes without saying that the present invention is not limited to the above-mentioned examples and can be modified in various ways without departing from the gist thereof.

【0059】[0059]

【発明の効果】本願において開示される発明のうち代表
的なものによって得られる効果を簡単に説明すれば、下
記のとおりである。
Effects of the Invention A brief explanation of the effects obtained by typical inventions disclosed in this application is as follows.

【0060】(1)半導体チップが基板を介して三次元
的に相互接続され、回路網を形成しているために、半導
体チップの数を増しても平面的には大きくならない高集
積半導体装置が得られる。
(1) Since the semiconductor chips are three-dimensionally interconnected via the substrate to form a circuit network, a highly integrated semiconductor device that does not become larger in plan even if the number of semiconductor chips is increased. can get.

【0061】(2)半田が基板の端面から侵入し易い位
置からランドまで誘導されるので、基板間が狭くてもリ
ード線とランドとを確実に半田付けすることができる。
(2) Since the solder is guided from the end surface of the board to the land from a position where it is easy to enter, the lead wire and the land can be reliably soldered even if the distance between the boards is narrow.

【0062】(3)各基板の間対向面側の端部にテーパ
を設けたことにより、半田の表面張力が小さくなるので
、半田のなじみが良くなり、各基板間の狭い隙間であっ
ても、半田が電極端子パターンの端部までの隙間に入り
易くなる。
(3) By providing a taper at the end of the facing surface between each board, the surface tension of the solder is reduced, so the solder blends better, and even in narrow gaps between each board. , solder easily enters the gap up to the end of the electrode terminal pattern.

【0063】前記(2),(3)により、基板同士又は
基板とマザーボード間の位置ズレがおきにくく、かつ機
械的に衝撃にも強く電気的接続の信頼性の高い高集積半
導体装置が得られる。
According to (2) and (3) above, it is possible to obtain a highly integrated semiconductor device in which positional displacement between the substrates or between the substrates and the motherboard is difficult to occur, and which is resistant to mechanical shock and has highly reliable electrical connections. .

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】本発明をSRAMメモリチップを搭載した基板
に適用した一実施例の高集積半導体装置の全体概略構成
を示す外観斜視図。
FIG. 1 is an external perspective view showing the overall schematic configuration of a highly integrated semiconductor device according to an embodiment in which the present invention is applied to a substrate on which an SRAM memory chip is mounted.

【図2】図1図に示す一個のSRAMメモリチップを搭
載した基板の概略構成を示す断面図。
FIG. 2 is a cross-sectional view showing a schematic configuration of a board on which one SRAM memory chip shown in FIG. 1 is mounted.

【図3】図1に示す(イ)−(イ)線で切った断面図。FIG. 3 is a sectional view taken along line (A)-(A) shown in FIG. 1;

【図4】図1に示す基板上のランド近傍の拡大図。FIG. 4 is an enlarged view of the vicinity of a land on the substrate shown in FIG. 1;

【図5】図3に示す基板端部の構造を説明するための断
面図。
FIG. 5 is a cross-sectional view for explaining the structure of the end portion of the substrate shown in FIG. 3;

【図6】本実施例のチップセレクト手段を説明するため
の説明図。
FIG. 6 is an explanatory diagram for explaining the chip select means of this embodiment.

【図7】本実施例のチップセレクト手段を説明するため
の説明図。
FIG. 7 is an explanatory diagram for explaining the chip selection means of this embodiment.

【図8】本実施例のチップセレクト手段を説明するため
の説明図。
FIG. 8 is an explanatory diagram for explaining chip selection means of this embodiment.

【図9】本実施例のチップセレクト手段の変形例を説明
するための説明図。
FIG. 9 is an explanatory diagram for explaining a modification of the chip select means of this embodiment.

【図10】本実施例のチップセレクト手段の変形例を説
明するための説明図。
FIG. 10 is an explanatory diagram for explaining a modification of the chip select means of this embodiment.

【図11】本実施例のチップセレクト手段の他の変形例
を説明するための説明図。
FIG. 11 is an explanatory diagram for explaining another modification of the chip select means of this embodiment.

【図12】本実施例のチップセレクト手段の他の変形例
を説明するための説明図。
FIG. 12 is an explanatory diagram for explaining another modification of the chip select means of this embodiment.

【図13】本実施例のチップセレクト手段の他の変形例
を説明するための説明図。
FIG. 13 is an explanatory diagram for explaining another modification of the chip select means of this embodiment.

【図14】本実施例の高集積半導体装置の組み立て方法
を説明するための図。
FIG. 14 is a diagram for explaining a method of assembling the highly integrated semiconductor device of this embodiment.

【符号の説明】[Explanation of symbols]

1,1A,1B,1C,1D…チップ、2…基板、3…
配線パターン、4,11…スルーホール配線、4A,1
1A…ランド、4B…半田誘導線、5…ボンディングワ
イヤー、6…封止用樹脂、7…リード線、8…半田、S
1,CS2,CS3,CS4…チップセレクト端子、9
A,9B,9C,9D…チップセレクト配線パターン、
10…マザーボード、100A,100B,100C,
100D…半導体装置、100…高集積半導体装置。
1, 1A, 1B, 1C, 1D...chip, 2...substrate, 3...
Wiring pattern, 4, 11...Through hole wiring, 4A, 1
1A... Land, 4B... Solder guide wire, 5... Bonding wire, 6... Sealing resin, 7... Lead wire, 8... Solder, S
1, CS2, CS3, CS4...chip select terminal, 9
A, 9B, 9C, 9D...Chip select wiring pattern,
10...Motherboard, 100A, 100B, 100C,
100D...semiconductor device, 100...highly integrated semiconductor device.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】  半導体チップを搭載した複数の配線基
板がほぼ平行に所定の間隔で配置され、これらが各配線
基板を貫通する少なくとも一本のリード線で積層構造体
に組み立てられ、前記リード線と前記各配線基板上の電
極端子とを半田付けして電気的に接続したことを特徴と
する高集積半導体装置。
1. A plurality of wiring boards on which semiconductor chips are mounted are arranged substantially in parallel at predetermined intervals, and these are assembled into a laminated structure with at least one lead wire penetrating each wiring board, and the lead wire and electrode terminals on each of the wiring boards are electrically connected by soldering.
【請求項2】  前記請求項1に記載の高集積半導体装
置において、前記配線基板上の基板端面から半田が侵入
し得る距離より端面側に設けられている電極端子に接続
される半田誘導線を配置したことを特徴とする高集積半
導体装置。
2. The highly integrated semiconductor device according to claim 1, wherein the solder guide wire is connected to an electrode terminal provided on the wiring board at a distance from the end surface of the wiring board that allows solder to penetrate into the end surface. A highly integrated semiconductor device characterized by the following:
【請求項3】  前記請求項1又は2に記載の高集積半
導体装置において、各配線基板の対向面側の端部にテー
パを設けたことを特徴とする高集積半導体装置。
3. The highly integrated semiconductor device according to claim 1, wherein each wiring board has a tapered end on the opposing surface side.
JP3043891A 1991-03-08 1991-03-08 High integrated semiconductor device Pending JPH04280667A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3043891A JPH04280667A (en) 1991-03-08 1991-03-08 High integrated semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3043891A JPH04280667A (en) 1991-03-08 1991-03-08 High integrated semiconductor device

Publications (1)

Publication Number Publication Date
JPH04280667A true JPH04280667A (en) 1992-10-06

Family

ID=12676330

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3043891A Pending JPH04280667A (en) 1991-03-08 1991-03-08 High integrated semiconductor device

Country Status (1)

Country Link
JP (1) JPH04280667A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09270575A (en) * 1996-03-29 1997-10-14 Nec Corp Connection structure and connection for printed board
WO1998025305A1 (en) * 1996-12-04 1998-06-11 Hitachi, Ltd. Method for manufacturing semiconductor device
US6025648A (en) * 1997-04-17 2000-02-15 Nec Corporation Shock resistant semiconductor device and method for producing same
JP3619523B2 (en) * 1996-12-04 2005-02-09 株式会社ルネサステクノロジ Semiconductor device
US6900074B2 (en) 1999-07-30 2005-05-31 Renesas Technology Corp. Method of manufacturing a semiconductor device having plural semiconductor chips, wherein electrodes of the semiconductor chips are electrically connected together via wiring substrates of the semiconductor chips
JP2008077779A (en) * 2006-09-22 2008-04-03 Toshiba Corp Semiconductor memory
DE102013210972A1 (en) 2012-08-24 2014-02-27 Mitsubishi Electric Corp. Semiconductor device
CN103974535A (en) * 2014-04-30 2014-08-06 苏州倍辰莱电子科技有限公司 Fold line overlapped type printed circuit substrate

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09270575A (en) * 1996-03-29 1997-10-14 Nec Corp Connection structure and connection for printed board
JP3619523B2 (en) * 1996-12-04 2005-02-09 株式会社ルネサステクノロジ Semiconductor device
WO1998025305A1 (en) * 1996-12-04 1998-06-11 Hitachi, Ltd. Method for manufacturing semiconductor device
US7138722B2 (en) 1996-12-04 2006-11-21 Renesas Technology Corp. Semiconductor device
US6287892B1 (en) 1997-04-17 2001-09-11 Nec Corporation Shock-resistant semiconductor device and method for producing same
US6025648A (en) * 1997-04-17 2000-02-15 Nec Corporation Shock resistant semiconductor device and method for producing same
US6900074B2 (en) 1999-07-30 2005-05-31 Renesas Technology Corp. Method of manufacturing a semiconductor device having plural semiconductor chips, wherein electrodes of the semiconductor chips are electrically connected together via wiring substrates of the semiconductor chips
JP2008077779A (en) * 2006-09-22 2008-04-03 Toshiba Corp Semiconductor memory
DE102013210972A1 (en) 2012-08-24 2014-02-27 Mitsubishi Electric Corp. Semiconductor device
CN103633044A (en) * 2012-08-24 2014-03-12 三菱电机株式会社 Semiconductor device
US9171772B2 (en) 2012-08-24 2015-10-27 Mitsubishi Electric Corporation Semiconductor device
DE102013210972B4 (en) 2012-08-24 2019-04-18 Mitsubishi Electric Corp. Semiconductor device having a plurality of semiconductor device packages
CN103974535A (en) * 2014-04-30 2014-08-06 苏州倍辰莱电子科技有限公司 Fold line overlapped type printed circuit substrate
CN103974535B (en) * 2014-04-30 2017-02-15 苏州倍辰莱电子科技有限公司 Printed circuit substrate

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