JPH0427691B2 - - Google Patents

Info

Publication number
JPH0427691B2
JPH0427691B2 JP29220288A JP29220288A JPH0427691B2 JP H0427691 B2 JPH0427691 B2 JP H0427691B2 JP 29220288 A JP29220288 A JP 29220288A JP 29220288 A JP29220288 A JP 29220288A JP H0427691 B2 JPH0427691 B2 JP H0427691B2
Authority
JP
Japan
Prior art keywords
carbon
substrate
valent
present
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP29220288A
Other languages
English (en)
Japanese (ja)
Other versions
JPH01152621A (ja
Inventor
Shunpei Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP63292202A priority Critical patent/JPH01152621A/ja
Publication of JPH01152621A publication Critical patent/JPH01152621A/ja
Publication of JPH0427691B2 publication Critical patent/JPH0427691B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122Incoherent waves
    • B01J19/126Microwaves

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Led Devices (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Carbon And Carbon Compounds (AREA)
JP63292202A 1988-11-18 1988-11-18 ダイヤモンド構造を有する炭素被膜の作製方法 Granted JPH01152621A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63292202A JPH01152621A (ja) 1988-11-18 1988-11-18 ダイヤモンド構造を有する炭素被膜の作製方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63292202A JPH01152621A (ja) 1988-11-18 1988-11-18 ダイヤモンド構造を有する炭素被膜の作製方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP56146930A Division JPS5848428A (ja) 1981-09-17 1981-09-17 炭素被膜を有する複合体およびその作製方法

Publications (2)

Publication Number Publication Date
JPH01152621A JPH01152621A (ja) 1989-06-15
JPH0427691B2 true JPH0427691B2 (enrdf_load_stackoverflow) 1992-05-12

Family

ID=17778852

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63292202A Granted JPH01152621A (ja) 1988-11-18 1988-11-18 ダイヤモンド構造を有する炭素被膜の作製方法

Country Status (1)

Country Link
JP (1) JPH01152621A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE180021T1 (de) * 1994-02-23 1999-05-15 Linde Ag Verfahren zur herstellung von diamantschichten
CN103295516B (zh) * 2013-05-30 2015-12-02 京东方科技集团股份有限公司 阵列基板、显示装置及阵列基板的制备方法

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PHILOSàMAG=1977 *
SOLID STATE COMMUN=1980 *

Also Published As

Publication number Publication date
JPH01152621A (ja) 1989-06-15

Similar Documents

Publication Publication Date Title
EP0946959B1 (en) Diamond fim deposition method
Sugino et al. Electron emission from boron nitride coated Si field emitters
US5017264A (en) Method of eliminating carbon material by chemical vapor reaction
US7811149B2 (en) Method for fabricating carbon nanotube-based field emission device
KR20010085509A (ko) 제품 제조 방법
JPH01172572A (ja) 基板上に超硬金属の層を付着させる方法及び装置
JPS5848428A (ja) 炭素被膜を有する複合体およびその作製方法
JP2002338388A (ja) ダイヤモンドコート部材
JP2008520087A (ja) 封入型ウェーハプロセス機器とその作製方法
US4292343A (en) Method of manufacturing semiconductor bodies composed of amorphous silicon
KR101190136B1 (ko) 카본 나노 튜브의 제작 방법 및 그 방법을 실시하는플라즈마 화학기상증착 장치
Takami et al. Catalyst-free growth of networked nanographite on Si and SiO2 substrates by photoemission-assisted plasma-enhanced chemical vapor deposition
JPH05217922A (ja) プラズマによる気相からの層析出方法
JPS62167886A (ja) 炭素被膜を有する複合体
JPS62162366A (ja) 炭素被膜を有する複合体
KR101018668B1 (ko) 산소 또는 질소로 종단된 실리콘 나노 결정 구조체의형성방법과 이것에 의해 형성된 산소 또는 질소로 종단된실리콘 나노 결정 구조체
JPH0427691B2 (enrdf_load_stackoverflow)
JPS62167884A (ja) 炭素被膜を有する複合体
KR100885690B1 (ko) 다이아몬드막의 제조방법 및 다이아몬드막
JPS62162367A (ja) 炭素被膜を有する複合体
JPH02244045A (ja) フォトマスク
JPH0237087B2 (enrdf_load_stackoverflow)
JPH0366280B2 (enrdf_load_stackoverflow)
JPH05117087A (ja) ダイヤモンド様薄膜の保護膜付き物品
JP3370318B2 (ja) ダイヤモンド状炭素膜を設けた部材