JPH04270720A - Epoxy resin, its production and cured product - Google Patents
Epoxy resin, its production and cured productInfo
- Publication number
- JPH04270720A JPH04270720A JP3053125A JP5312591A JPH04270720A JP H04270720 A JPH04270720 A JP H04270720A JP 3053125 A JP3053125 A JP 3053125A JP 5312591 A JP5312591 A JP 5312591A JP H04270720 A JPH04270720 A JP H04270720A
- Authority
- JP
- Japan
- Prior art keywords
- weight
- epoxy resin
- trinuclear
- compound
- content
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 53
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 53
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 150000001875 compounds Chemical class 0.000 claims abstract description 83
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims abstract description 36
- 229920003986 novolac Polymers 0.000 claims abstract description 30
- 229920005989 resin Polymers 0.000 claims abstract description 29
- 239000011347 resin Substances 0.000 claims abstract description 29
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 claims abstract description 19
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 18
- 150000002367 halogens Chemical class 0.000 claims abstract description 18
- 239000004593 Epoxy Substances 0.000 claims description 21
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 238000007789 sealing Methods 0.000 abstract 1
- 239000000047 product Substances 0.000 description 41
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 36
- 238000006243 chemical reaction Methods 0.000 description 33
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 31
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 16
- 239000000460 chlorine Substances 0.000 description 16
- 229910052801 chlorine Inorganic materials 0.000 description 16
- 239000000243 solution Substances 0.000 description 16
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 15
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 15
- 238000004458 analytical method Methods 0.000 description 13
- 235000011121 sodium hydroxide Nutrition 0.000 description 12
- 239000000203 mixture Substances 0.000 description 11
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 8
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 8
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 8
- 239000003795 chemical substances by application Substances 0.000 description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 8
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 8
- 239000002904 solvent Substances 0.000 description 7
- 238000005406 washing Methods 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 239000003377 acid catalyst Substances 0.000 description 4
- 229920000768 polyamine Polymers 0.000 description 4
- 238000003918 potentiometric titration Methods 0.000 description 4
- 229910001961 silver nitrate Inorganic materials 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- KUMMBDBTERQYCG-UHFFFAOYSA-N 2,6-bis(hydroxymethyl)-4-methylphenol Chemical compound CC1=CC(CO)=C(O)C(CO)=C1 KUMMBDBTERQYCG-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 229960000583 acetic acid Drugs 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- 239000012362 glacial acetic acid Substances 0.000 description 3
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000012071 phase Substances 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 239000000565 sealant Substances 0.000 description 3
- 235000002639 sodium chloride Nutrition 0.000 description 3
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 2
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- -1 amine compounds Chemical class 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- 238000006735 epoxidation reaction Methods 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 238000004255 ion exchange chromatography Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 238000011417 postcuring Methods 0.000 description 2
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 2
- 238000007363 ring formation reaction Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000001256 steam distillation Methods 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- AGIBHMPYXXPGAX-UHFFFAOYSA-N 2-(iodomethyl)oxirane Chemical compound ICC1CO1 AGIBHMPYXXPGAX-UHFFFAOYSA-N 0.000 description 1
- FUIQBJHUESBZNU-UHFFFAOYSA-N 2-[(dimethylazaniumyl)methyl]phenolate Chemical compound CN(C)CC1=CC=CC=C1O FUIQBJHUESBZNU-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- GISYGQUPPLNCJX-UHFFFAOYSA-N 2-tert-butyl-4,6-bis(hydroxymethyl)phenol Chemical compound CC(C)(C)C1=CC(CO)=CC(CO)=C1O GISYGQUPPLNCJX-UHFFFAOYSA-N 0.000 description 1
- SIBBGGADHQDMHI-UHFFFAOYSA-N 4-tert-butyl-2,6-bis(hydroxymethyl)phenol Chemical compound CC(C)(C)C1=CC(CO)=C(O)C(CO)=C1 SIBBGGADHQDMHI-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000006352 cycloaddition reaction Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000012777 electrically insulating material Substances 0.000 description 1
- GKIPXFAANLTWBM-UHFFFAOYSA-N epibromohydrin Chemical compound BrCC1CO1 GKIPXFAANLTWBM-UHFFFAOYSA-N 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000004780 naphthols Chemical class 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- XGVXKJKTISMIOW-ZDUSSCGKSA-N simurosertib Chemical compound N1N=CC(C=2SC=3C(=O)NC(=NC=3C=2)[C@H]2N3CCC(CC3)C2)=C1C XGVXKJKTISMIOW-ZDUSSCGKSA-N 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- DDFYFBUWEBINLX-UHFFFAOYSA-M tetramethylammonium bromide Chemical compound [Br-].C[N+](C)(C)C DDFYFBUWEBINLX-UHFFFAOYSA-M 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- ILWRPSCZWQJDMK-UHFFFAOYSA-N triethylazanium;chloride Chemical compound Cl.CCN(CC)CC ILWRPSCZWQJDMK-UHFFFAOYSA-N 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、耐湿性、耐熱性に優れ
た硬化物を与え、しかも加水分解性塩素等のハロゲン量
の低減した信頼性の面でも優位な高純度エポキシ樹脂、
その製法及び硬化物に関する。[Industrial Application Field] The present invention provides a high-purity epoxy resin that provides a cured product with excellent moisture resistance and heat resistance, and is superior in terms of reliability with a reduced amount of halogens such as hydrolyzable chlorine.
The present invention relates to its manufacturing method and cured product.
【0002】0002
【従来の技術】一般にエポキシ樹脂は接着性、耐薬品性
、電気特性、機械特性、耐熱性に優れた硬化物を与える
ため、接着剤、塗料あるいは、電気絶縁材料、封止剤、
各種複合材料などの電気・電子部品材料として広く使用
されている。[Prior Art] In general, epoxy resins provide cured products with excellent adhesiveness, chemical resistance, electrical properties, mechanical properties, and heat resistance, so they can be used as adhesives, paints, electrically insulating materials, sealants, etc.
It is widely used as a material for electrical and electronic components such as various composite materials.
【0003】なかでも、クレゾールノボラック型エポキ
シ樹脂は、特に封止剤などの電気・電子部品の材料とし
て、その硬化物の耐熱性等のバランスの良さから広く一
般的に使用されている。Among them, cresol novolac type epoxy resins are widely used, especially as materials for electrical and electronic parts such as sealants, because of their well-balanced properties such as heat resistance of the cured products.
【0004】一方、これら電気・電子部品では、信頼性
を確保する為、さまざまな処置がとられてきた。このひ
とつとして、エポキシ樹脂の純度を高める試みがなされ
、特に樹脂中の加水分解性塩素等のハロゲン量の低減化
が行なわれている。これは加水分解性塩素等が電気絶縁
性の低下、リード線の腐食等を引き起こす原因となるか
らである。On the other hand, various measures have been taken to ensure the reliability of these electrical and electronic components. As one of these efforts, attempts have been made to increase the purity of epoxy resins, and in particular efforts have been made to reduce the amount of halogens such as hydrolyzable chlorine in the resins. This is because hydrolyzable chlorine and the like cause deterioration of electrical insulation and corrosion of lead wires.
【0005】[0005]
【発明が解決しようとする課題】しかしながら、現在の
ところ、耐熱性、耐湿性に優れた硬化物を与え、低粘度
で作業性が優れ、しかも全ハロゲン量の少ないエポキシ
樹脂は提案されていない。例えば、特開平3−717号
公報にはナフトールとフェノール類との縮合物のエポキ
シ樹脂が提案されているが、この公報に開示された方法
では、全ハロゲン量の少ないエポキシ樹脂は得られない
。[Problems to be Solved by the Invention] However, at present, no epoxy resin has been proposed that provides a cured product with excellent heat resistance and moisture resistance, has low viscosity and excellent workability, and has a low total halogen content. For example, JP-A-3-717 proposes an epoxy resin made from a condensate of naphthol and phenols, but the method disclosed in this publication does not yield an epoxy resin with a low total halogen content.
【0006】[0006]
【課題を解決するための手段】そこで、本発明者らは、
上記問題点を解決すべくエポキシ樹脂の構造及びその製
造条件について詳細に検討した結果、特定のエポキシ樹
脂を特定の条件で製造することにより、はじめて全ハロ
ゲン量が少なくかつ各種要求特性を満足する新規なエポ
キシ樹脂が得られることを見出し、本発明を完成した。[Means for solving the problem] Therefore, the present inventors
In order to solve the above problems, we conducted a detailed study on the structure of epoxy resin and its manufacturing conditions.We found that by manufacturing a specific epoxy resin under specific conditions, we can create a new product that has a low total halogen content and satisfies various required properties. The present invention was completed based on the discovery that an epoxy resin having the following properties can be obtained.
【0007】即ち、本発明は、(1)式(A)That is, the present invention provides formula (1) (A)
【000
8】000
8]
【0009】(式中、Rは炭素数1−4のアルキル基を
示す)で示される三核体化合物とエピハロヒドリンとを
反応させて得られ、全ハロゲン量が800ppm以下で
あるエポキシ樹脂。An epoxy resin obtained by reacting a trinuclear compound represented by the formula (wherein R represents an alkyl group having 1 to 4 carbon atoms) with epihalohydrin and having a total halogen content of 800 ppm or less.
【0010】(2)式(B)(2) Formula (B)
【0011】[0011]
【0012】(式中、Rは炭素数1−4のアルキル基を
示す)で示されるジメチロール化合物とナフトールとを
反応させて得られる、上記(1)記載の三核体化合物(
A)を含むノボラック型樹脂と、エピハロヒドリンとを
反応させて得られ、全ハロゲン量が800ppm以下で
あるエポキシ樹脂。The trinuclear compound described in (1) above, obtained by reacting the dimethylol compound represented by the formula (wherein R represents an alkyl group having 1 to 4 carbon atoms) with naphthol (
An epoxy resin obtained by reacting a novolac type resin containing A) with epihalohydrin and having a total halogen content of 800 ppm or less.
【0013】(3)式(C)(3) Formula (C)
【0014】[0014]
【0015】(式中、Rは炭素数1−4のアルキル基を
示す)で示される三核体エポキシ化合物を30重量%以
上含み、該三核体エポキシ化合物より低分子量の化合物
の含有量が10重量%以下であり、七核体以上の多核体
化合物の合計含有量が40重量%以下である上記(1)
又は(2)記載のエポキシ樹脂。Contains 30% by weight or more of a trinuclear epoxy compound represented by the formula (wherein R represents an alkyl group having 1 to 4 carbon atoms), and contains a compound having a lower molecular weight than the trinuclear epoxy compound. 10% by weight or less, and the total content of polynuclear compounds of heptanucleates or more is 40% by weight or less (1) above.
Or the epoxy resin described in (2).
【0016】(4)上記(1)記載の三核体化合物(A
)又は上記(2)記載のノボラック型樹脂とエピハロヒ
ドリンとを、ジメチルスルホキシドの存在下に反応させ
ることを特徴とする上記(1)、(2)又は(3)記載
のエポキシ樹脂の製法。(4) The trinuclear compound (A
) or the method for producing an epoxy resin as described in (1), (2) or (3) above, which comprises reacting the novolac type resin described in (2) above with epihalohydrin in the presence of dimethyl sulfoxide.
【0017】(5)三核体化合物(A)又はノボラック
型樹脂100重量部に対しジメチルスルホキシドを10
〜300重量部用いる上記(4)記載のエポキシ樹脂の
製法。(6)上記(1)、(2)又は(3)記載のエポ
キシ樹脂の硬化物。に関する。(5) 10 parts by weight of dimethyl sulfoxide per 100 parts by weight of the trinuclear compound (A) or novolac type resin.
The method for producing an epoxy resin as described in (4) above using 300 parts by weight. (6) A cured product of the epoxy resin described in (1), (2) or (3) above. Regarding.
【0018】式(A)、(B)又は(C)の化合物にお
いて、Rとしては、メチル基、エチル基、n−プロピル
基、イソプロピル基、n−ブチル基、イソブチル基、s
ec−ブチル基、t−ブチル基が挙げられる。In the compound of formula (A), (B) or (C), R is a methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, s
Examples include ec-butyl group and t-butyl group.
【0019】式(A)で示される三核体化合物は、式(
B)で示されるジメチロール化合物とナフトールとを、
一般に酸触媒の存在下に反応(脱水縮合)させることに
より製造することができる。The trinuclear compound represented by formula (A) has the formula (
The dimethylol compound represented by B) and naphthol,
Generally, it can be produced by reaction (dehydration condensation) in the presence of an acid catalyst.
【0020】ジメチロール化合物(B)としては、例え
ば、2,6−ジメチロール−4−メチルフェノール、2
,6−ジメチロール−4−t−ブチルフェノール、4,
6−ジメチロール−2−メチルフェノール、4,6−ジ
メチロール−2−t−ブチルフェノール等が挙げられる
。ナフトールとしては、α−ナフトール及びβ−ナフト
ールが挙げられる。Examples of the dimethylol compound (B) include 2,6-dimethylol-4-methylphenol, 2
,6-dimethylol-4-t-butylphenol, 4,
Examples include 6-dimethylol-2-methylphenol and 4,6-dimethylol-2-t-butylphenol. Naphthols include α-naphthol and β-naphthol.
【0021】三核体化合物(A)の収量を上げ、又、例
えば前記(3)のエポキシ樹脂を製造するのに好適なノ
ボラック型樹脂を得るための好ましい方法は、ジメチロ
ール化合物(B)とナフトールとを酸触媒の存在下40
〜85℃の温度で反応させ、反応混合物中の過剰のナフ
トールを減圧下200℃以下の温度で加熱蒸留して除去
する方法であり、この方法により、反応生成物の分解や
再縮合又は高分子化を抑制できる。[0021] A preferred method for increasing the yield of the trinuclear compound (A) and obtaining a novolac type resin suitable for producing the epoxy resin described in (3) above, for example, is to combine the dimethylol compound (B) with naphthol. and in the presence of an acid catalyst 40
This is a method in which the reaction is carried out at a temperature of ~85°C, and excess naphthol in the reaction mixture is removed by heating and distillation at a temperature of 200°C or less under reduced pressure. can be suppressed.
【0022】ここで、ジメチロール化合物(B)に対し
てナフトールを2〜10倍モル特に3〜6倍モル用いる
のが好ましく、又、酸触媒としては塩酸、硫酸、リン酸
、p−トルエンスルホン酸等が使用できるが、p−トル
エンスルホン酸を用いるのが特に好ましい。酸触媒の使
用量は、ジメチロール化合物(B)に対して、0.1〜
1重量%用いれば十分である。Here, it is preferable to use naphthol in an amount of 2 to 10 times the mole, especially 3 to 6 times the mole of the dimethylol compound (B), and as the acid catalyst, hydrochloric acid, sulfuric acid, phosphoric acid, p-toluenesulfonic acid is used. Although p-toluenesulfonic acid can be used, it is particularly preferable to use p-toluenesulfonic acid. The amount of acid catalyst used is 0.1 to 0.1 to dimethylol compound (B).
It is sufficient to use 1% by weight.
【0023】反応は無溶媒でも、メタノール、エタノー
ル、プロパノール、ブタノール、ベンゼン、トルエン、
メチルイソブチルケトン等の溶媒中でも行なうことがで
きる。反応時間は好ましくは4〜10時間である。The reaction can be carried out without a solvent using methanol, ethanol, propanol, butanol, benzene, toluene,
It can also be carried out in a solvent such as methyl isobutyl ketone. The reaction time is preferably 4 to 10 hours.
【0024】このようにして得られるノボラック型樹脂
は、三核体化合物(A)を30重量%以上、特に35重
量%以上という高い含有率で含み、一方、三核体化合物
(A)の含有量は10重量%以下、特に7重量%以下に
なり、更に、七核体以上の多核体化合物の合計含有量は
25重量%以下、特に20重量%以下となる。The novolak resin thus obtained contains the trinuclear compound (A) at a high content of 30% by weight or more, particularly 35% by weight or more, while the content of the trinuclear compound (A) is The amount is 10% by weight or less, especially 7% by weight or less, and furthermore, the total content of polynuclear compounds of heptanucleates or higher is 25% by weight or less, especially 20% by weight or less.
【0025】なお、X核体化合物とは、1分子中のベン
ゼン核とナフタレン核の数の和がXである化合物をいう
。このようにして得られるノボラック型樹脂は、低粘度
であり、取り扱い易く作業性に優れている。[0025] The term "X-nuclear compound" refers to a compound in which the sum of the numbers of benzene nuclei and naphthalene nuclei in one molecule is X. The novolac type resin thus obtained has a low viscosity, is easy to handle, and has excellent workability.
【0026】三核体化合物(A)又はこれを含むノボラ
ック型樹脂とエピハロヒドリンとの反応(エポキシ化反
応)は、公知の方法に準じて行なうことができる。エピ
ハロヒドリンとしては、例えば、エピクロルヒドリン、
エピブロムヒドリン、エピヨードヒドリン等が挙げられ
る。The reaction (epoxidation reaction) between the trinuclear compound (A) or the novolak resin containing it and epihalohydrin can be carried out according to a known method. Examples of epihalohydrin include epichlorohydrin,
Examples include epibromohydrin and epiiodohydrin.
【0027】上記エポキシ化反応の一例を示すと、例え
ば、三核体化合物(A)又はこれを含むノボラック型樹
脂と、その水酸基当量に対して過剰モル量のエピハロヒ
ドリンとを、テトラメチルアンモニウムクロリド、テト
ラメチルアンモニウムブロミド、トリエチルアンモニウ
ムクロリドなどの第4級アンモニウム塩または水酸化ナ
トリウム、水酸化カリウムなどのアルカリ金属水酸化物
などの存在下で反応させ、第4級アンモニウム塩などを
用いた場合は開環付加反応の段階で反応がとまるので次
いで上記アルカリ金属水酸化物を加えて閉環反応させる
。To illustrate an example of the above epoxidation reaction, for example, the trinuclear compound (A) or a novolak type resin containing the same and an excess molar amount of epihalohydrin relative to the hydroxyl equivalent thereof are reacted with tetramethylammonium chloride, The reaction is carried out in the presence of a quaternary ammonium salt such as tetramethylammonium bromide or triethylammonium chloride or an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide. Since the reaction stops at the stage of the cycloaddition reaction, the alkali metal hydroxide is then added to carry out the ring-closing reaction.
【0028】また、最初からアルカリ金属水酸化物を加
えて反応する場合は、開環付加反応および閉環反応を一
気に行わせる。エピハロヒドリンの使用割合は、三核体
化合物(A)又はこれを含むノボラック型樹脂の水酸基
当量1に対して通常1〜50モル、好ましくは2〜15
モル、特に好ましくは3〜6モルの範囲である。When the alkali metal hydroxide is added from the beginning and the reaction is carried out, the ring-opening addition reaction and the ring-closing reaction are carried out at once. The usage ratio of epihalohydrin is usually 1 to 50 mol, preferably 2 to 15 mol per hydroxyl equivalent of the trinuclear compound (A) or the novolac type resin containing the same.
mol, particularly preferably in the range from 3 to 6 mol.
【0029】アルカリ金属水酸化物の使用量は、三核体
化合物(A)又はこれを含むノボラック型樹脂の水酸基
当量1に対して好ましくは0.9〜1.3モルの範囲で
あり、第4級アンモニウム塩を使用する場合その使用量
は、三核体化合物(A)又はこれを含むノボラック型樹
脂の水酸基当量1に対して通常0.001〜1モル、好
ましくは0.005〜0.5モルの範囲である。The amount of the alkali metal hydroxide used is preferably in the range of 0.9 to 1.3 mol per hydroxyl equivalent of the trinuclear compound (A) or the novolac type resin containing the same. When a quaternary ammonium salt is used, the amount used is usually 0.001 to 1 mol, preferably 0.005 to 0.1 mol, per 1 hydroxyl equivalent of the trinuclear compound (A) or the novolac type resin containing it. It is in the range of 5 moles.
【0030】反応温度は通常20〜130℃好ましくは
30〜80℃である。反応時間は、反応温度にもよるが
、通常2〜10時間でよい。The reaction temperature is usually 20 to 130°C, preferably 30 to 80°C. The reaction time may be generally 2 to 10 hours, although it depends on the reaction temperature.
【0031】本発明のエポキシ樹脂は、全ハロゲン量が
800ppm以下であるが、上記反応をジメチルスルホ
キシドの存在下で行なうことにより、得られるエポキシ
樹脂中の全ハロゲン量を800ppm以下とすることが
できる。ジメチルスルホキシドの使用量は、三核体化合
物(A)又はこれを含むノボラック型樹脂100重量部
に対し、好ましくは10〜300重量部であり、特に好
ましくは50〜250重量部である。The epoxy resin of the present invention has a total halogen content of 800 ppm or less, but by carrying out the above reaction in the presence of dimethyl sulfoxide, the total halogen content in the resulting epoxy resin can be reduced to 800 ppm or less. . The amount of dimethyl sulfoxide used is preferably 10 to 300 parts by weight, particularly preferably 50 to 250 parts by weight, based on 100 parts by weight of the trinuclear compound (A) or the novolac type resin containing the same.
【0032】なお、アルカリ金属水酸化物を水溶液の形
で反応系に加え反応を行なう場合は、三核体化合物(A
)又はこれを含むノボラック型樹脂100重量部に対し
、ジメチルスルホキシドを100〜300重量部用いる
のが好ましい。Note that when the alkali metal hydroxide is added to the reaction system in the form of an aqueous solution, the trinuclear compound (A
) or 100 parts by weight of a novolak type resin containing this, it is preferable to use 100 to 300 parts by weight of dimethyl sulfoxide.
【0033】このように、原料として三核体化合物(A
)又はこれを含むノボラック型樹脂を用い、反応をジメ
チルスルホキシドの存在下で行なうことにより、次の如
き利点が得られる。即ち、反応は、減圧下でも常圧下で
も可能であるが、特に常圧下で行なうことが容易となる
。In this way, the trinuclear compound (A
) or a novolak-type resin containing the same and carrying out the reaction in the presence of dimethyl sulfoxide, the following advantages can be obtained. That is, although the reaction can be carried out under reduced pressure or normal pressure, it is particularly easy to carry out the reaction under normal pressure.
【0034】又、100〜110℃というような反応温
度にする必要は特になく、30〜80℃というような低
い反応温度で十分である。更に、反応を行なう際、系内
の水を共沸脱水により系外に除去することも特に必要と
しない。但し、系内の水の影響を少なくするために、ア
ルカリ金属水酸化物は固形の状態で使用するのが好まし
い。Further, it is not necessary to set the reaction temperature to 100 to 110°C, and a low reaction temperature of 30 to 80°C is sufficient. Furthermore, when carrying out the reaction, it is not particularly necessary to remove water within the system from the system by azeotropic dehydration. However, in order to reduce the influence of water in the system, it is preferable to use the alkali metal hydroxide in a solid state.
【0035】かくして反応が終了した後、ジメチルスル
ホキシドを、工業的な方法でジメチルスルホキシドの再
使用を可能ならしめる為、水洗等の方法をとらずに減圧
下回収する。After the reaction is thus completed, the dimethyl sulfoxide is recovered under reduced pressure without washing with water or the like in order to enable reuse of the dimethyl sulfoxide in an industrial manner.
【0036】この際、反応物の高分子化あるいは、高純
度化を阻害しないように130℃以下の温度で未反応の
エピハロヒドリンとジメチルスルホキシドを一気に回収
する。130℃を超えると、高分子化及び加水分解性塩
素等の全ハロゲン量の増大が起きる。At this time, unreacted epihalohydrin and dimethyl sulfoxide are recovered all at once at a temperature of 130° C. or lower so as not to inhibit polymerization or high purity of the reactants. When the temperature exceeds 130°C, polymerization and an increase in the total amount of halogens such as hydrolyzable chlorine occur.
【0037】又、このようにして回収された、エピハロ
ヒドリンとジメチルスルホキシド及び水は、蒸留により
容易に分離され、再使用できる。Furthermore, the epihalohydrin, dimethyl sulfoxide and water thus recovered can be easily separated by distillation and reused.
【0039】さらに必要に応じ、得られたエポキシ樹脂
(生成した食塩を含む)はメチルイソブチルケトン、ベ
ンゼン、トルエン、キシレンなどの溶媒に樹脂分を再溶
解し、わずかに残っている加水分解性塩素等のハロゲン
をさらに除く為、アルカリ金属水酸化物を三核体化合物
(A)又はこれを含むノボラック型樹脂の水酸基当量1
に対して好ましくは0.01〜0.2モル再度添加し、
好ましくは50℃〜80℃で0.5〜2時間反応させる
工程を更に設けるのが望ましい。Furthermore, if necessary, the resin content of the obtained epoxy resin (including the produced salt) is redissolved in a solvent such as methyl isobutyl ketone, benzene, toluene, or xylene to remove the slight remaining hydrolyzable chlorine. In order to further remove halogens such as, the alkali metal hydroxide is converted into a trinuclear compound (A) or a novolak type resin containing the same with a hydroxyl equivalent of 1
Preferably 0.01 to 0.2 mol is added again to
It is desirable to further provide a step of reacting preferably at 50°C to 80°C for 0.5 to 2 hours.
【0040】反応終了後の反応生成物は、溶媒を含まな
い場合はメチルイソブチルケトン等の溶媒に溶解した後
、生成した食塩及び未反応のアルカリ金属水酸化物を除
く為、水洗をくり返し、その後、メチルイソブチルケト
ンなどの溶媒を減圧下除去し、本発明の高純度エポキシ
樹脂が得られる。After completion of the reaction, the reaction product is dissolved in a solvent such as methyl isobutyl ketone if it does not contain a solvent, and then washed repeatedly with water to remove the generated common salt and unreacted alkali metal hydroxide. The high purity epoxy resin of the present invention is obtained by removing the solvent such as , methyl isobutyl ketone, etc. under reduced pressure.
【0041】本発明のエポキシ樹脂において、全ハロゲ
ン量は800ppm以下であるが、好ましくは700p
pm以下、特に好ましくは600ppm以下である。[0041] In the epoxy resin of the present invention, the total amount of halogen is 800 ppm or less, preferably 700 ppm.
pm or less, particularly preferably 600 ppm or less.
【0042】本発明のエポキシ樹脂において、三核体エ
ポキシ化合物(C)の含有量は、好ましくは30重量%
以上、より好ましくは35重量%以上、特に好ましくは
40重量%以上である。又、三核体エポキシ化合物(C
)より低分子量の化合物(副生物等)の含有量は、好ま
しくは10重量%以下、より好ましくは7重量%以下、
特に好ましくは5重量%以下である。In the epoxy resin of the present invention, the content of the trinuclear epoxy compound (C) is preferably 30% by weight.
The content is more preferably 35% by weight or more, particularly preferably 40% by weight or more. In addition, trinuclear epoxy compounds (C
) The content of lower molecular weight compounds (by-products, etc.) is preferably 10% by weight or less, more preferably 7% by weight or less,
Particularly preferably, it is 5% by weight or less.
【0043】更に、七核体以上の多核体化合物の合計含
有量は、好ましくは40重量%以下であり、より好まし
くは35重量%以下であり、特に好ましくは30重量%
以下である。各成分の範囲が上記のような場合には、エ
ポキシ樹脂は低粘度であり作業性に優れていると共に、
その硬化物の耐熱性、耐湿性がより向上する。Furthermore, the total content of polynuclear compounds of hepta-nuclear or higher is preferably 40% by weight or less, more preferably 35% by weight or less, particularly preferably 30% by weight.
It is as follows. When the range of each component is as above, the epoxy resin has low viscosity and excellent workability,
The heat resistance and moisture resistance of the cured product are further improved.
【0044】本発明のエポキシ樹脂は加水分解性塩素等
の全ハロゲン量が少ないため、表面実装等の封止剤とし
て好適に使用でき、信頼性の高い、耐熱性、耐湿性に優
れた硬化物を提供することができる。Since the epoxy resin of the present invention has a small total amount of halogens such as hydrolyzable chlorine, it can be suitably used as a sealant for surface mounting, etc., and is a highly reliable cured product with excellent heat resistance and moisture resistance. can be provided.
【0045】本発明のエポキシ樹脂は公知の方法に準じ
て硬化することができる。即ち、本発明のエポキシ樹脂
、硬化剤、硬化促進剤及び必要により公知の添加剤を均
一に混合し、得られた組成物を硬化する。これにより、
本発明の硬化物が得られる。The epoxy resin of the present invention can be cured according to known methods. That is, the epoxy resin of the present invention, a curing agent, a curing accelerator, and, if necessary, known additives are mixed uniformly, and the resulting composition is cured. This results in
A cured product of the present invention is obtained.
【0046】硬化剤としては、前記の三核体化合物(A
)又はこれを含むノボラック樹脂が使用できるが、その
他の公知の硬化剤、例えば脂肪属ポリアミン、芳香属ポ
リアミン、ポリアミドポリアミン等のポリアミン系硬化
剤、無水ヘキサヒドロフタル酸、無水メチルテトラヒド
ロフタル酸等の酸無水物系硬化剤、フェノールノボラッ
ク、クレゾールノボラック等のフェノール系硬化剤、三
フッ化ホウ素等のルイス酸又はそれらの塩類、ジシアン
ジアミド類等の硬化剤等も使用でき、これらに限定され
るものではない。これらは単独で用いてもよく、2種以
上併用してもよい。As the curing agent, the trinuclear compound (A
) or a novolac resin containing these can be used, but other known curing agents such as polyamine curing agents such as aliphatic polyamines, aromatic polyamines, polyamide polyamines, hexahydrophthalic anhydride, methyltetrahydrophthalic anhydride, etc. Acid anhydride curing agents, phenolic curing agents such as phenol novolak and cresol novolak, Lewis acids such as boron trifluoride or their salts, and curing agents such as dicyandiamides can also be used, but are not limited to these. do not have. These may be used alone or in combination of two or more.
【0047】硬化剤の使用量は、エポキシ樹脂のエポキ
シ基1当量に対して0.5〜1.5当量が好ましく特に
0.6〜1.2当量が好ましい。The amount of curing agent used is preferably 0.5 to 1.5 equivalents, particularly preferably 0.6 to 1.2 equivalents, per equivalent of epoxy groups in the epoxy resin.
【0048】硬化促進剤としては、2−メチルイミダゾ
ール、2−エチルイミダゾール等のイミダゾール系化合
物、2−(ジメチルアミノメチル)フェノール等の第3
アミン系化合物、トリフェニルホスフィン等のホスフィ
ン化合物等が挙げられ、公知の種々の硬化促進剤が使用
でき、特に限定されるものではない。Examples of the curing accelerator include imidazole compounds such as 2-methylimidazole and 2-ethylimidazole, and tertiary compounds such as 2-(dimethylaminomethyl)phenol.
Various known curing accelerators can be used, including amine compounds and phosphine compounds such as triphenylphosphine, and are not particularly limited.
【0049】硬化促進剤の使用量はエポキシ樹脂100
重量部に対して0.01〜15重量部の範囲が好ましく
、特に0.1〜10重量部の範囲が好ましい。[0049] The amount of curing accelerator used is epoxy resin 100%
The range is preferably from 0.01 to 15 parts by weight, particularly preferably from 0.1 to 10 parts by weight.
【0050】公知の添加剤としては、例えばシリカ、ア
ルミナ、タルク、ガラス繊維等の無機充填剤、シランカ
ップリング剤のような充填剤の表面処理剤、離型剤、顔
料等が挙げられる。Examples of known additives include inorganic fillers such as silica, alumina, talc, and glass fibers, surface treatment agents for fillers such as silane coupling agents, mold release agents, and pigments.
【0051】組成物は、通常130〜170の温度で3
0〜300秒の範囲で予備硬化し、さらに150〜20
0℃の温度で2〜8時間後硬化することにより充分な硬
化反応が進行し、本発明の硬化物が得られる。こうして
得られた硬化物は耐熱性を保持しながら、低吸水性(耐
湿性)を有している。[0051] The composition is usually heated at a temperature of 130 to 170°C.
Precure in the range of 0 to 300 seconds, and further cure for 150 to 20 seconds.
By post-curing at a temperature of 0° C. for 2 to 8 hours, a sufficient curing reaction proceeds and the cured product of the present invention is obtained. The cured product thus obtained has low water absorption (moisture resistance) while maintaining heat resistance.
【0052】なお、本発明において、全ハロゲン量とは
、約1gの試料(エポキシ樹脂)を100ミリリットル
の共栓付きフラスコに精秤し、n−ブチルカルビトール
25ミリリットルを加え、加熱溶解し、溶解後、1N−
KOHプロピレングリコール溶液25ミリリットルを加
え、10分間加熱還流し、その後、この溶液を完全に2
00ミリリットルのビーカーに移し、氷酢酸50ミリリ
ットルを加えて硝酸銀水溶液にて電位差滴定を行い定量
した値である。In the present invention, the total amount of halogen means approximately 1 g of sample (epoxy resin) is accurately weighed into a 100 ml stoppered flask, 25 ml of n-butylcarbitol is added, and the mixture is heated and dissolved. After dissolving, 1N-
Add 25 ml of KOH propylene glycol solution and heat to reflux for 10 minutes, then completely reflux the solution.
This value was determined by transferring the mixture to a 00 ml beaker, adding 50 ml of glacial acetic acid, and performing potentiometric titration with an aqueous silver nitrate solution.
【0053】[0053]
【実施例】以下に実施例を挙げて本発明を更に具体的に
説明する。[Examples] The present invention will be explained in more detail with reference to Examples below.
【0054】合成例
パラクレゾール108g(1モル)、パラホルムアルデ
ヒド60g(2モル)
及び水100mlを温度計、冷却管、滴下ロート及び攪
拌機を付けた1リットルのフラスコに仕込み、窒素を吹
込みながら攪拌した。Synthesis Example 108 g (1 mol) of para-cresol, 60 g (2 mol) of paraformaldehyde, and 100 ml of water were placed in a 1-liter flask equipped with a thermometer, condenser, dropping funnel, and stirrer, and stirred while blowing nitrogen. did.
【0055】室温下、15%苛性ソーダ水溶液80g(
苛性ソーダとして0.3モル)を発熱に注意しながら液
温が50℃を越えないようにゆっくり滴下した。At room temperature, 80g of 15% caustic soda aqueous solution (
0.3 mol (as caustic soda) was slowly added dropwise to the solution while being careful not to generate heat so that the liquid temperature did not exceed 50°C.
【0056】その後、水浴中で50℃まで加熱し、10
時間反応した。反応終了後、水200mlを加え室温ま
で冷却し発熱に注意しながら、10%塩酸水溶液で徐々
に中和しながら、さらにpHが4になるまで塩酸水溶液
を添加した。[0056] Thereafter, it was heated to 50°C in a water bath and heated to 10°C.
Time reacted. After the reaction was completed, 200 ml of water was added, the mixture was cooled to room temperature, and while being careful not to generate heat, the mixture was gradually neutralized with a 10% aqueous hydrochloric acid solution, and the aqueous hydrochloric acid solution was further added until the pH reached 4.
【0057】その後、析出した結晶を口別し、結晶をさ
らに水により洗浄した。得られた結晶を減圧下(10m
mHg)50℃で乾燥し、白色の2,6−ジメチロール
−4−メチルフェノールを得た。得量は143gであっ
た。
(パラクレゾールからの収率は85%)Thereafter, the precipitated crystals were separated and further washed with water. The obtained crystals were dried under reduced pressure (10 m
mHg) and dried at 50°C to obtain white 2,6-dimethylol-4-methylphenol. The yield was 143g. (Yield from para-cresol is 85%)
【0058】実
施例1.
合成例で得られた2,6−ジメチロール−4−メチルフ
ェノール168gを温度計、攪拌機を付けたガラス容器
に仕込み、さらにα−ナフトール576g及びメチルイ
ソブチルケトン1000mlを加えて窒素雰囲気下で室
温で攪拌した。Example 1. 168 g of 2,6-dimethylol-4-methylphenol obtained in the synthesis example was placed in a glass container equipped with a thermometer and a stirrer, and 576 g of α-naphthol and 1000 ml of methyl isobutyl ketone were added and stirred at room temperature under a nitrogen atmosphere. did.
【0059】そして、p−トルエンスルホン酸1g(2
,6−ジメチロール−4−メチルフェノールに対して0
.6重量%)を発熱に注意しながら、液温が50℃を越
えないように徐々に添加した。Then, 1 g of p-toluenesulfonic acid (2
, 0 for 6-dimethylol-4-methylphenol
.. 6% by weight) was gradually added while paying attention to heat generation so that the liquid temperature did not exceed 50°C.
【0060】添加後、油浴上で50℃まで加温し2時間
反応させた後、さらに70℃に加温して7時間反応させ
、その後、分液ロートに移し水洗した。After the addition, the mixture was heated to 50°C on an oil bath and reacted for 2 hours, then further heated to 70°C and reacted for 7 hours, and then transferred to a separatory funnel and washed with water.
【0061】洗浄水が中性を示すまで水洗後、エバポレ
ーターにより有機層から未反応ナフトールを除去する為
、減圧下(10mmHg以下) 、浴温を195℃とし
て減圧加熱蒸留した。蒸留時間は2時間を要した。この
操作によりノボラック型樹脂(A−1)372gを得た
。After washing with water until the washing water showed neutrality, in order to remove unreacted naphthol from the organic layer using an evaporator, vacuum distillation was carried out under reduced pressure (10 mmHg or less) at a bath temperature of 195°C. Distillation time required 2 hours. Through this operation, 372 g of novolac type resin (A-1) was obtained.
【0062】生成物(A−1)の軟化温度は112℃で
水酸基当量(g/mol)は137であった。又、生成
物(A−1)中の未反応ナフトールの量はガスクロマト
グラフィーの分析の結果1重量%以下であった。Product (A-1) had a softening temperature of 112°C and a hydroxyl equivalent (g/mol) of 137. Further, the amount of unreacted naphthol in the product (A-1) was found to be 1% by weight or less as a result of gas chromatography analysis.
【0063】又、GPC分析により、生成物(A−1)
中の三核体化合物(A)の含有量は52重量%で、三核
体化合物(A)より低分子量の化合物の含有量は3.5
重量%であり、七核体以上の多核体化合物の合計含有量
は15重量%であった。生成物(A−1)の粘度は25
ポイズであった。[0063] Furthermore, by GPC analysis, product (A-1)
The content of the trinuclear compound (A) is 52% by weight, and the content of compounds with lower molecular weight than the trinuclear compound (A) is 3.5% by weight.
% by weight, and the total content of polynuclear compounds of heptanucleates or more was 15% by weight. The viscosity of the product (A-1) is 25
It was Poise.
【0064】生成物(A−1)137gを温度計、攪拌
機、及び減圧回収装置のついた反応装置に仕込み、さら
にエピクロルヒドリン374g(3.5モル)、ジメチ
ルスルホキシド68g(ノボラック型樹脂に対して50
重量%)を添加し、溶解させた。この間、系内は窒素が
導入されている。137 g of the product (A-1) was charged into a reaction apparatus equipped with a thermometer, a stirrer, and a vacuum recovery device, and 374 g (3.5 mol) of epichlorohydrin and 68 g of dimethyl sulfoxide (50 g based on the novolak type resin) were charged.
% by weight) was added and dissolved. During this time, nitrogen is introduced into the system.
【0065】溶解後、反応温度を40℃に保ちながら、
固形の苛性ソーダ40g(1モル)を徐々に添加した。
添加時間は1時間を要した。苛性ソーダ添加後、さらに
40℃で1時間反応させた後、反応温度を70℃に上げ
て、さらに1時間反応させた。その結果、合計の反応時
間は3時間であった。After dissolution, while keeping the reaction temperature at 40°C,
40 g (1 mole) of solid caustic soda was slowly added. The addition time required 1 hour. After the addition of caustic soda, the reaction was further carried out at 40°C for 1 hour, and then the reaction temperature was raised to 70°C, and the reaction was further carried out for 1 hour. As a result, the total reaction time was 3 hours.
【0066】ついで、反応装置の浴温を130℃に上昇
させ、突沸に注意しながら徐々に減圧にし未反応のエピ
クロルヒドリン、ジメチルスルホキシド及び生成水を一
気に追い出した。最終の減圧度は5mmHgであり、こ
の間、2時間を要した。Next, the bath temperature of the reactor was raised to 130° C., and the pressure was gradually reduced while paying attention to bumping to remove unreacted epichlorohydrin, dimethyl sulfoxide, and produced water all at once. The final degree of pressure reduction was 5 mmHg, and it took 2 hours.
【0067】その後、メチルイソブチルケトン500m
lを加え、樹脂分を溶解し、20%苛性ソーダ水溶液2
0gを加え、反応温度70℃で2時間反応した。反応終
了後、分液ロートで水洗をくり返し、水相を中性に戻し
た。ついで、メチルイソブチルケトン相を減圧下で加熱
し、メチルイソブチルケトンを除去した。Then, 500 m of methyl isobutyl ketone
1, dissolve the resin, and add 20% caustic soda aqueous solution 2.
0 g was added, and the reaction was carried out at a reaction temperature of 70° C. for 2 hours. After the reaction was completed, washing with water was repeated using a separatory funnel to return the aqueous phase to neutrality. The methyl isobutyl ketone phase was then heated under reduced pressure to remove the methyl isobutyl ketone.
【0068】これにより、エポキシ樹脂である淡黄色の
固体(B−1)175gを得た。生成物(B−1)の軟
化温度は75℃で、エポキシ当量(g/mol)は21
2、粘度10ポイズ、フリー塩素量1ppm以下、加水
分解性塩素量230ppm、全塩素量は510ppm、
PCTによる抽出水中の塩素イオン濃度は3ppmであ
った。As a result, 175 g of a pale yellow solid (B-1), which is an epoxy resin, was obtained. The softening temperature of the product (B-1) is 75°C, and the epoxy equivalent (g/mol) is 21
2. Viscosity 10 poise, free chlorine amount 1 ppm or less, hydrolyzable chlorine amount 230 ppm, total chlorine amount 510 ppm,
The chloride ion concentration in the extracted water by PCT was 3 ppm.
【0069】又、GPC分析により、生成物(B−1)
中の三核体エポキシ化合物(C)の含有量は50重量%
で、三核体エポキシ化合物(C)より低分子量の化合物
の含有量は3.2重量%であり、七核体以上の多核体化
合物の合計含有量は25重量%であった。[0069] Furthermore, by GPC analysis, product (B-1)
The content of trinuclear epoxy compound (C) in it is 50% by weight.
The content of compounds having a lower molecular weight than the trinuclear epoxy compound (C) was 3.2% by weight, and the total content of polynuclear compounds of heptanuclear or higher was 25% by weight.
【0070】実施例2.
実施例1において、α−ナフトールの使用量を504g
(3.5モル)とし、その他は実施例1と同様にしてノ
ボラック型樹脂(A−2)375gを得た。この生成物
(A−2)139gを用い、その他は実施例1と同様に
してエポキシ樹脂(B−2)172gを得た。Example 2. In Example 1, the amount of α-naphthol used was 504g.
(3.5 mol), and in the same manner as in Example 1, 375 g of novolac type resin (A-2) was obtained. Using 139 g of this product (A-2), 172 g of an epoxy resin (B-2) was obtained in the same manner as in Example 1 except for the above.
【0071】又、GPC分析により、生成物(B−2)
中の三核体エポキシ化合物(C)の含有量は45重量%
で、三核体エポキシ化合物(C)より低分子量の化合物
の含有量は3.2重量%であり、七核体以上の多核体化
合物の合計含有量は17重量%であった。[0071] Furthermore, by GPC analysis, product (B-2)
The content of trinuclear epoxy compound (C) in it is 45% by weight.
The content of compounds having a lower molecular weight than the trinuclear epoxy compound (C) was 3.2% by weight, and the total content of polynuclear compounds of heptanuclear or higher was 17% by weight.
【0072】実施例3.
実施例1においてエピクロルヒドリン509g(5.5
モル)を使用した以外は実施例1と同様の操作によりエ
ポキシ樹脂(B−3)180gを得た。Example 3. In Example 1, 509 g of epichlorohydrin (5.5
180 g of epoxy resin (B-3) was obtained in the same manner as in Example 1 except that 180 g of epoxy resin (B-3) was used.
【0073】又、GPC分析により、生成物(B−3)
中の三核体エポキシ化合物(C)の含有量は51重量%
で、三核体エポキシ化合物(C)より低分子量の化合物
の含有量は3.1重量%であり、七核体以上の多核体化
合物の合計含有量は24重量%であった。[0073] Furthermore, by GPC analysis, product (B-3)
The content of trinuclear epoxy compound (C) in it is 51% by weight.
The content of compounds having a lower molecular weight than the trinuclear epoxy compound (C) was 3.1% by weight, and the total content of polynuclear compounds of heptanuclear or higher was 24% by weight.
【0074】実施例4.
実施例1においてジメチルスルホキシド136g(ノボ
ラック型樹脂に対して100重量%)を使用した以外は
実施例1と同様の操作によりエポキシ樹脂(B−4)1
79gを得た。Example 4. Epoxy resin (B-4) 1 was prepared in the same manner as in Example 1 except that 136 g of dimethyl sulfoxide (100% by weight based on the novolac type resin) was used in Example 1.
79g was obtained.
【0075】又、GPC分析により、生成物(B−4)
中の三核体エポキシ化合物(C)の含有量は50重量%
で、三核体エポキシ化合物(C)より低分子量の化合物
の含有量は3.1重量%であり、七核体以上の多核体化
合物の合計含有量は23重量%であった。[0075] Furthermore, by GPC analysis, product (B-4)
The content of trinuclear epoxy compound (C) in it is 50% by weight.
The content of compounds having a lower molecular weight than the trinuclear epoxy compound (C) was 3.1% by weight, and the total content of polynuclear compounds of heptanuclear or higher was 23% by weight.
【0076】実施例5.
実施例1においてジメチルスルホキシド274g(ノボ
ラック型樹脂に対して200重量%)を使用し、固形の
苛性ソーダの代りに48%苛性ソーダ水溶液85g(苛
性ソーダとして1モル)を使用した以外は実施例1と同
様の操作によりエポキシ樹脂(B−5)178gを得た
。Example 5. The same procedure as in Example 1 was carried out, except that 274 g of dimethyl sulfoxide (200% by weight based on the novolak type resin) was used in Example 1, and 85 g of a 48% aqueous solution of caustic soda (1 mol as caustic soda) was used instead of solid caustic soda. Through the operation, 178 g of epoxy resin (B-5) was obtained.
【0077】又、GPC分析により、生成物(B−5)
中の三核体エポキシ化合物(C)の含有量は49重量%
で、三核体エポキシ化合物(C)より低分子量の化合物
の含有量は3.2重量%であり、七核体以上の多核体化
合物の合計含有量は30重量%であった。[0077] Furthermore, by GPC analysis, product (B-5)
The content of trinuclear epoxy compound (C) in it is 49% by weight
The content of compounds having a lower molecular weight than the trinuclear epoxy compound (C) was 3.2% by weight, and the total content of polynuclear compounds of heptanuclear or higher was 30% by weight.
【0078】比較例1.
実施例1において、ノボラック樹脂を製造する工程にお
いて、分液ロートで洗浄水が中性を示すまで水洗後、1
50℃の蒸気により実施例1と同様の未反応ナフトール
量(1重量%以下)となるまで水蒸気蒸留を実施した。
水蒸気蒸留は5時間を要した。(尚、実施例1.と同様
の操作時間である2時間後での未反応ナフトール量は3
.5重量%であった。)Comparative Example 1. In Example 1, in the process of producing a novolac resin, after washing with water in a separating funnel until the washing water shows neutrality, 1
Steam distillation was carried out using steam at 50° C. until the amount of unreacted naphthol was reduced to the same amount as in Example 1 (1% by weight or less). Steam distillation took 5 hours. (The amount of unreacted naphthol after 2 hours, which is the same operation time as in Example 1.
.. It was 5% by weight. )
【0079】かくして、ノボラック型樹脂(A−6)3
65gを得た。得られた生成物(A−6)の軟化温度は
135℃、水酸基当量は143であった。又、生成物(
A−6)中の未反応ナフトールはガスクロマトグラフィ
ーの分析の結果1重量%以下であった。[0079] Thus, novolac type resin (A-6) 3
65g was obtained. The resulting product (A-6) had a softening temperature of 135°C and a hydroxyl equivalent of 143. Also, the product (
Gas chromatography analysis showed that unreacted naphthol in A-6) was 1% by weight or less.
【0080】又、GPC分析により、生成物(A−6)
中の三核体化合物(A)の含有量は25重量%で、三核
体化合物(A)より低分子量の化合物の含有量は15重
量%であり、七核体以上の多核体化合物の合計含有量は
30重量%であった。[0080] Furthermore, by GPC analysis, product (A-6)
The content of trinuclear compound (A) is 25% by weight, the content of compounds with lower molecular weight than trinuclear compound (A) is 15% by weight, and the total content of polynuclear compounds of heptanuclear or higher is 25% by weight. The content was 30% by weight.
【0081】この生成物(A−6)143gを使用し、
ジメチルスルホキシド68gの代りにメタノール68g
を用いた以外は実施例1と同様の操作を実施してエポキ
シ樹脂(B−6)150gを得た。Using 143 g of this product (A-6),
68g of methanol instead of 68g of dimethyl sulfoxide
The same operation as in Example 1 was carried out except that 150 g of epoxy resin (B-6) was obtained.
【0082】又、GPC分析により、生成物(B−6)
中の三核体エポキシ化合物(C)の含有量は18重量%
で、三核体エポキシ化合物(C)より低分子量の化合物
の含有量は16重量%であり、七核体以上の多核体化合
物の合計含有量は41重量%であった。[0082] Furthermore, by GPC analysis, product (B-6)
The content of trinuclear epoxy compound (C) in it is 18% by weight
The content of compounds having a lower molecular weight than the trinuclear epoxy compound (C) was 16% by weight, and the total content of polynuclear compounds of heptanuclear or higher was 41% by weight.
【0083】比較例2.
実施例1の生成物(A−1)137gを温度計、攪拌機
、滴下ロート及び生成水分離装置のついた1リットルの
反応器に仕込み、エピクロルヒドリン509g(5.5
モル)を添加し、窒素吹込みを行ないながら溶解した。Comparative example 2. 137 g of the product (A-1) of Example 1 was charged into a 1-liter reactor equipped with a thermometer, a stirrer, a dropping funnel, and a water separation device, and 509 g (5.5 g) of epichlorohydrin was charged.
mol) was added and dissolved while blowing with nitrogen.
【0084】溶解後、反応温度60℃、圧力100〜1
50mmHgの条件下、48%苛性ソーダ水溶液85g
を5時間かけて滴下した。この間、生成水及び苛性ソー
ダ水溶液の水をエピクロルヒドリンとの共沸により連続
的に反応系外に除去し、エピクロルヒドリンは系内に戻
した。After dissolution, reaction temperature: 60°C, pressure: 100~1
85g of 48% caustic soda aqueous solution under 50mmHg condition
was added dropwise over 5 hours. During this time, the produced water and the water in the caustic soda aqueous solution were continuously removed from the reaction system by azeotroping with epichlorohydrin, and epichlorohydrin was returned to the system.
【0085】ついで過剰の未反応エピクロルヒドリンを
減圧下に回収した後、メチルイソブチルケトン500m
lを加え、水で水層が中性を示すまで洗浄した。メチル
イソブチルケトン相からメチルイソブチルケトンを減圧
下に除去し、その後、再びメチルイソブチルケトン50
0mlを加え再溶解した。[0085] After recovering excess unreacted epichlorohydrin under reduced pressure, 500 m of methyl isobutyl ketone was added.
1 was added and washed with water until the aqueous layer became neutral. Methyl isobutyl ketone was removed from the methyl isobutyl ketone phase under reduced pressure, and then 50% of methyl isobutyl ketone was removed again.
0ml was added and redissolved.
【0086】得られたメチルイソブチルケトン溶液に2
0%水酸化ナトリウム溶液20gを加え反応温度70℃
で2時間反応した。反応終了後、水で水層が中性を示す
まで洗浄をくり返した。ついで、メチルイソブチルケト
ン相からメチルイソブチルケトンを減圧下に除去し、エ
ポキシ樹脂(B−7)170gを得た。2 to the obtained methyl isobutyl ketone solution.
Add 20g of 0% sodium hydroxide solution and reaction temperature: 70℃
It reacted for 2 hours. After the reaction was completed, washing was repeated with water until the aqueous layer became neutral. Then, methyl isobutyl ketone was removed from the methyl isobutyl ketone phase under reduced pressure to obtain 170 g of epoxy resin (B-7).
【0087】又、GPC分析により、生成物(B−7)
中の三核体エポキシ化合物(C)の含有量は43重量%
で、三核体エポキシ化合物(C)より低分子量の化合物
の含有量は3.3重量%であり、七核体以上の多核体化
合物の合計含有量は35重量%であった。[0087] Furthermore, by GPC analysis, product (B-7)
The content of trinuclear epoxy compound (C) in it is 43% by weight.
The content of compounds having a lower molecular weight than the trinuclear epoxy compound (C) was 3.3% by weight, and the total content of polynuclear compounds of heptanuclear or higher was 35% by weight.
【0088】生成物(B−1)〜(B−7)の特性を表
−1に示した。The properties of the products (B-1) to (B-7) are shown in Table-1.
【0089】[0089]
【0090】[0090]
【0091】なお、実施例及び比較例において、フリー
塩素量、加水分解性塩素量、粘度、軟化温度、全塩素量
及びPCT(プレッシャー・クッカー・テスト)による
塩素量、GPC分析は次のように測定した。In the examples and comparative examples, free chlorine amount, hydrolyzable chlorine amount, viscosity, softening temperature, total chlorine amount, chlorine amount by PCT (pressure cooker test), and GPC analysis were as follows. It was measured.
【0092】(フリー塩素量)約10gの試料(エポキ
シ樹脂)を200ミリリットルのビーカーに精秤し、1
00ミリリットルのアセトンで溶解し、更に、蒸留水2
ミリリットルと氷酢酸1ミリリットルを加え、硝酸銀水
溶液にて電位差滴定を行い定量した。(Amount of free chlorine) Approximately 10 g of sample (epoxy resin) was accurately weighed in a 200 ml beaker, and 1
Dissolve in 00 ml of acetone, and add 2 ml of distilled water.
ml and 1 ml of glacial acetic acid were added, and potentiometric titration was performed using an aqueous silver nitrate solution for quantitative determination.
【0093】(加水分解性塩素量)約0.5gの試料(
エポキシ樹脂)を100ミリリットルの共栓付きフラス
コに精秤し、ジオキサン30ミリリットルで溶解する。
溶解後、1N−KOHエタノール溶液5ミリリットルを
加え、30分間煮沸還流する。その後、この溶液を完全
に200ミリリットルのビーカーに移し、80%濃度の
アセトン水溶液100ミリリットルを加え、更に濃硝酸
2ミリリットルを加えて硝酸銀水溶液にて電位差滴定を
行い定量した。(Amount of hydrolyzable chlorine) Approximately 0.5 g of sample (
Precisely weigh the epoxy resin into a 100 ml flask with a stopper, and dissolve it in 30 ml of dioxane. After dissolution, 5 ml of 1N-KOH ethanol solution is added, and the mixture is boiled and refluxed for 30 minutes. Thereafter, this solution was completely transferred to a 200 ml beaker, 100 ml of an 80% aqueous acetone solution was added thereto, 2 ml of concentrated nitric acid was further added, and the amount was determined by potentiometric titration with an aqueous silver nitrate solution.
【0094】ICI粘度計(コーンプレートタイプ)に
より150℃における粘度を測定した。
(軟化温度)JIS K2425環球法により測定し
た。The viscosity at 150° C. was measured using an ICI viscometer (cone plate type). (Softening temperature) Measured by JIS K2425 ring and ball method.
【0095】(全塩素量)約1gの試料(エポキシ樹脂
)を100ミリリットルの共栓付きフラスコに精秤し、
n−ブチルカルビトール25ミリリットルを加え、加熱
溶解する。溶解後、1N−KOHプロピレングリコール
溶液25ミリリットルを加え、10分間加熱還流する。
その後、この溶液を完全に200ミリリットルのビーカ
ーに移し、氷酢酸50ミリリットルを加えて硝酸銀水溶
液にて電位差滴定を行い定量した。(Total chlorine amount) Approximately 1 g of sample (epoxy resin) was accurately weighed into a 100 ml flask with a stopper.
Add 25 ml of n-butyl carbitol and dissolve by heating. After dissolving, add 25 ml of 1N-KOH propylene glycol solution and heat under reflux for 10 minutes. Thereafter, this solution was completely transferred to a 200 ml beaker, 50 ml of glacial acetic acid was added, and the amount was determined by potentiometric titration with an aqueous silver nitrate solution.
【0096】(PCT)エポキシ樹脂5gにイオン交換
水50gを加え、180℃で20時間保持した時の抽出
水中の塩素イオン濃度をイオンクロマトにより定量した
。(PCT) 50 g of ion-exchanged water was added to 5 g of epoxy resin, and the mixture was held at 180° C. for 20 hours. The chlorine ion concentration in the extracted water was determined by ion chromatography.
【0097】(GPC分析)GPC装置;島津製作所(
カラム;TSK−G−3000XL(1本)+TSK−
G−2000XL(2本))
溶 媒;テトラヒドロフラン 1ml/min 検
出;UV(254nm)(GPC analysis) GPC device; Shimadzu Corporation (
Column; TSK-G-3000XL (1 piece) + TSK-
G-2000XL (2 bottles) Solvent: Tetrahydrofuran 1ml/min Detection: UV (254nm)
【0098】応用例1〜5、応用比較例1〜2表2に示
す割合で、フェノールノボラック(日本化薬(株)製、
軟化温度85℃、水酸基当量(g/mol)105と実
施例1〜5及び比較例1〜2で得られた生成物(B−1
)〜(B−7)と2−メチルイミダゾールを配合し、組
成物を得た。Application Examples 1 to 5, Application Comparative Examples 1 to 2 Phenol novolak (manufactured by Nippon Kayaku Co., Ltd.,
The products obtained in Examples 1 to 5 and Comparative Examples 1 to 2 (B-1) with a softening temperature of 85°C and a hydroxyl equivalent (g/mol) of 105
) to (B-7) and 2-methylimidazole were blended to obtain a composition.
【0099】この組成物を70〜80℃で15分間ロー
ル混練し、これを冷却、粉砕し、タブレット化し、更に
トランスファー成形機により成型後、160℃で2時間
予備硬化し、180℃で8時間ポストキュアを行なって
硬化物(試験片)を得た。この硬化物のガラス転移温度
(Tg)、熱変形温度(HDT)及び吸水率を次の条件
で測定した。This composition was roll-kneaded at 70 to 80°C for 15 minutes, cooled, crushed, and tableted. After molding using a transfer molding machine, it was precured at 160°C for 2 hours, and then at 180°C for 8 hours. Post-curing was performed to obtain a cured product (test piece). The glass transition temperature (Tg), heat distortion temperature (HDT), and water absorption of this cured product were measured under the following conditions.
【0100】ガラス転移温度
熱機械測定装置(TMA):真空理工(株)TM−70
00
昇温速度:2℃/min
熱変形温度
JIS K7207に規定された条件Glass transition temperature thermomechanical measuring device (TMA): Shinku Riko Co., Ltd. TM-70
00 Heating rate: 2℃/min Heat distortion temperature Conditions specified in JIS K7207
【0101】吸
水 率
試 験 片 直径 50mm(硬化物
)
厚サ 3mm 円板
条 件 100℃の水中で50時間煮
沸した後の重量増加量(重量%)[0101] Water absorption test Piece Diameter: 50 mm (cured product) Thickness: 3 mm Disc conditions Weight increase after boiling in water at 100°C for 50 hours (weight %)
【0102】PCT
試 験 片 粉砕品60〜100メッシュ(
硬化物)
条 件 粉砕品5gを脱イオン水50
gにより180℃で50時間加圧抽出後、抽出水中の塩
素イオン濃度をイオンクロマトにより測定(ppm)硬
化物の評価結果を表−2に示した。[0102] PCT test piece crushed product 60-100 mesh (
(hardened product) Conditions: 5 g of crushed product mixed with 50 g of deionized water
After pressure extraction at 180° C. for 50 hours, the chlorine ion concentration in the extracted water was measured (ppm) using ion chromatography. The evaluation results of the cured product are shown in Table 2.
【0103】[0103]
【0104】[0104]
【0105】[0105]
【0106】[0106]
【発明の効果】本発明のエポキシ樹脂は全ハロゲン量が
少なく、信頼性の高い、耐熱性、耐湿性に優れた硬化物
を得ることが出来、本発明の方法によれば、本発明のエ
ポキシ樹脂を容易に製造することができる。Effects of the Invention The epoxy resin of the present invention has a small total halogen content, and a cured product with high reliability and excellent heat resistance and moisture resistance can be obtained. Resin can be easily produced.
Claims (6)
れる三核体化合物とエピハロヒドリンとを反応させて得
られ、全ハロゲン量が800ppm以下であるエポキシ
樹脂。Claim 1: Obtained by reacting a trinuclear compound represented by formula (A) (wherein R represents an alkyl group having 1 to 4 carbon atoms) with epihalohydrin, the total amount of halogen is 800 ppm or less. Some epoxy resin.
れるジメチロール化合物とナフトールとを反応させて得
られる、請求項1記載の三核体化合物(A)を含むノボ
ラック型樹脂と、エピハロヒドリンとを反応させて得ら
れ、全ハロゲン量が800ppm以下であるエポキシ樹
脂。2. The trinuclear compound according to claim 1, which is obtained by reacting a dimethylol compound represented by formula (B) (wherein R represents an alkyl group having 1 to 4 carbon atoms) with naphthol. An epoxy resin obtained by reacting a novolac type resin containing (A) with epihalohydrin, and having a total halogen content of 800 ppm or less.
れる三核体エポキシ化合物を30重量%以上含み、該三
核体エポキシ化合物より低分子量の化合物の含有量が1
0重量%以下であり、七核体以上の多核体化合物の合計
含有量が40重量%以下である請求項1又は2記載のエ
ポキシ樹脂。3. Contains 30% by weight or more of a trinuclear epoxy compound represented by formula (C) (wherein R represents an alkyl group having 1 to 4 carbon atoms), and has a lower molecular weight than the trinuclear epoxy compound. The content of the compound is 1
The epoxy resin according to claim 1 or 2, wherein the total content of polynuclear compounds of hepta-nuclear or higher is 40% by weight or less.
求項2記載のノボラック型樹脂とエピハロヒドリンとを
、ジメチルスルホキシドの存在下に反応させることを特
徴とする請求項1、2又は3記載のエポキシ樹脂の製法
。4. The trinuclear compound (A) according to claim 1 or the novolac type resin according to claim 2 and epihalohydrin are reacted in the presence of dimethyl sulfoxide. 3. The method for producing the epoxy resin described in 3.
100重量部に対しジメチルスルホキシドを10〜30
0重量部用いる請求項4記載のエポキシ樹脂の製法。5. 10 to 30 parts by weight of dimethyl sulfoxide per 100 parts by weight of the trinuclear compound (A) or novolac type resin.
5. The method for producing an epoxy resin according to claim 4, wherein 0 parts by weight is used.
硬化物。6. A cured product of the epoxy resin according to claim 1, 2 or 3.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5312591A JP2865439B2 (en) | 1991-02-26 | 1991-02-26 | Epoxy resin and its cured product |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5312591A JP2865439B2 (en) | 1991-02-26 | 1991-02-26 | Epoxy resin and its cured product |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04270720A true JPH04270720A (en) | 1992-09-28 |
JP2865439B2 JP2865439B2 (en) | 1999-03-08 |
Family
ID=12934089
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5312591A Expired - Fee Related JP2865439B2 (en) | 1991-02-26 | 1991-02-26 | Epoxy resin and its cured product |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2865439B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002121263A (en) * | 2000-10-17 | 2002-04-23 | Sumitomo Bakelite Co Ltd | Epoxy resin composition and semiconductor device |
CN112585189A (en) * | 2018-08-27 | 2021-03-30 | 日铁化学材料株式会社 | Phosphorus-containing epoxy resin, epoxy resin composition, prepreg, laminate, material for circuit board, and cured product |
CN112898738A (en) * | 2019-12-04 | 2021-06-04 | 日铁化学材料株式会社 | Epoxy resin composition, prepreg, laminate, printed wiring board, and cured product using same |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56102392U (en) * | 1980-01-09 | 1981-08-11 | ||
JPS56121878U (en) * | 1980-02-20 | 1981-09-17 | ||
JPS6271284U (en) * | 1985-10-25 | 1987-05-07 |
-
1991
- 1991-02-26 JP JP5312591A patent/JP2865439B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56102392U (en) * | 1980-01-09 | 1981-08-11 | ||
JPS56121878U (en) * | 1980-02-20 | 1981-09-17 | ||
JPS6271284U (en) * | 1985-10-25 | 1987-05-07 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002121263A (en) * | 2000-10-17 | 2002-04-23 | Sumitomo Bakelite Co Ltd | Epoxy resin composition and semiconductor device |
CN112585189A (en) * | 2018-08-27 | 2021-03-30 | 日铁化学材料株式会社 | Phosphorus-containing epoxy resin, epoxy resin composition, prepreg, laminate, material for circuit board, and cured product |
CN112585189B (en) * | 2018-08-27 | 2023-08-01 | 日铁化学材料株式会社 | Epoxy resin composition, prepreg, laminated board, material for circuit board, cured product, and method for producing phosphorus-containing epoxy resin |
CN112898738A (en) * | 2019-12-04 | 2021-06-04 | 日铁化学材料株式会社 | Epoxy resin composition, prepreg, laminate, printed wiring board, and cured product using same |
CN112898738B (en) * | 2019-12-04 | 2024-03-22 | 日铁化学材料株式会社 | Epoxy resin composition, prepreg, laminate, printed wiring board, and cured product using same |
Also Published As
Publication number | Publication date |
---|---|
JP2865439B2 (en) | 1999-03-08 |
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